公开(公告)号：US20090038548A1

公开(公告)日：2009-02-12

申请号：US12162132

申请日：2007-03-30

申请人： Hachishiro Iizuka ,  Tomoyuki Sakoda ,  Naofumi Oda ,  Norihiko Tsuji ,  Masayuki Moroi

发明人： Hachishiro Iizuka ,  Tomoyuki Sakoda ,  Naofumi Oda ,  Norihiko Tsuji ,  Masayuki Moroi

IPC分类号： C23C16/455

CPC分类号： C23C16/4557 ,  C23C16/409 ,  C23C16/45565 ,  C23C16/45574 ,  H01L21/31691

摘要： A film forming apparatus includes a process chamber 2 configured to accommodate a semiconductor wafer W; a worktable 5 disposed inside the process chamber 2 and configured to place the semiconductor wafer W thereon; a showerhead 40 used as a process gas delivery mechanism disposed to face the worktable 5 and configured to delivery a process gas into the process chamber 2; and an exhaust unit 101 configured to exhaust gas from inside the process chamber 2, wherein the showerhead 40 has a gas passage formed therein for supplying the process gas, and an annular temperature adjusting cell 400 formed therein around the gas passage.

摘要翻译： 成膜装置包括：配置成容纳半导体晶片W的处理室2; 设置在处理室2内并被配置为将半导体晶片W放置在其上的工作台5; 用作处理气体输送机构的喷头40，其布置成面对工作台5并且构造成将处理气体输送到处理室2中; 以及排气单元101，被配置为从处理室2内部排出气体，其中喷头40具有形成在其中的用于供给处理气体的气体通道，以及围绕气体通道形成的环形温度调节单元400。

公开(公告)号：US08758511B2

公开(公告)日：2014-06-24

申请号：US11660091

申请日：2005-08-12

申请人： Hachishiro Iizuka ,  Akira Yasumuro ,  Koichiro Kimura ,  Norihiko Tsuji

发明人： Hachishiro Iizuka ,  Akira Yasumuro ,  Koichiro Kimura ,  Norihiko Tsuji

IPC分类号： C23C16/448 ,  C23C16/455 ,  C23C16/00 ,  C23C16/44 ,  C23C16/458

CPC分类号： C23C16/4402 ,  C23C16/4401 ,  C23C16/4486 ,  C23C16/45561 ,  C23C16/4585

摘要： A film forming apparatus including a raw material supplying section for supplying a raw material of a liquid or a gas-liquid mixture, a raw material vaporizing section for vaporizing the raw material to form a raw material gas, and a film forming section for conducting a film forming treatment using the formed raw material gas, and a filter on the transport path for the raw material gas from the raw material vaporizing section to the film forming section. An outer edge of the filter is pressed to the inner surface of the transport path over the whole perimeter thereof by a cyclic supporting member, which is less prone to be deformed by a loading in the pressing direction than the outer edge, and is fixed to the inner surface of the transport path in a compressed state between the inner surface of the transport path and the supporting member.

摘要翻译： 一种成膜装置，包括用于供给液体或气液混合物的原料的原料供给部，用于蒸发原料以形成原料气体的原料蒸发部，以及用于导入 使用所形成的原料气体的成膜处理，以及从原料蒸发部到成膜部的原料气体的输送路径上的过滤器。 过滤器的外边缘通过循环支撑构件在其整个周边上被压靠在输送路径的内表面上，循环支撑构件通过沿着挤压方向的加载不如外边缘而变形，并被固定到 传送路径的内表面处于压缩状态，在传送路径的内表面和支撑构件之间。

公开(公告)号：US20070266944A1

公开(公告)日：2007-11-22

申请号：US11660091

申请日：2005-08-12

申请人： Hachishiro Iizuka ,  Akira Yasumuro ,  Koichiro Kimura ,  Norihiko Tsuji

发明人： Hachishiro Iizuka ,  Akira Yasumuro ,  Koichiro Kimura ,  Norihiko Tsuji

IPC分类号： C23C16/02

CPC分类号： C23C16/4402 ,  C23C16/4401 ,  C23C16/4486 ,  C23C16/45561 ,  C23C16/4585

摘要： A film forming apparatus including a raw material supplying section for supplying a raw material of a liquid or a gas-liquid mixture, a raw material vaporizing section for vaporizing the raw material to form a raw material gas, and a film forming section for conducting a film forming treatment using the formed raw material gas, and a filter on the transport path for the raw material gas from the raw material vaporizing section to the film forming section. An outer edge of the filter is pressed to the inner surface of the transport path over the whole perimeter thereof by a cyclic supporting member, which is less prone to be deformed by a loading in the pressing direction than the outer edge, and is fixed to the inner surface of the transport path in a compressed state between the inner surface of the transport path and the supporting member.

摘要翻译： 一种成膜装置，包括用于供给液体或气液混合物的原料的原料供给部，用于蒸发原料以形成原料气体的原料蒸发部，以及用于导入 使用所形成的原料气体的成膜处理，以及从原料蒸发部到成膜部的原料气体的输送路径上的过滤器。 过滤器的外边缘通过循环支撑构件在其整个周边上被压靠在输送路径的内表面上，循环支撑构件通过沿着挤压方向的加载不如外边缘而变形，并被固定到 传送路径的内表面处于压缩状态，在传送路径的内表面和支撑构件之间。

公开(公告)号：US20110265725A1

公开(公告)日：2011-11-03

申请号：US13120681

申请日：2009-09-25

申请人： Norihiko Tsuji ,  Masayuki Moroi ,  Kenichi Yanagitani ,  Yoshiyuki Hanada

发明人： Norihiko Tsuji ,  Masayuki Moroi ,  Kenichi Yanagitani ,  Yoshiyuki Hanada

IPC分类号： C23C16/455 ,  C23C16/46 ,  C23C16/458

CPC分类号： C23C16/54 ,  C23C16/0245 ,  C23C16/45551 ,  C23C16/4583 ,  H01L21/67005 ,  H01L21/67173 ,  H01L21/67201 ,  H01L21/67346 ,  H01L21/67706

摘要： A film deposition device includes a substrate transporting device arranged in a vacuum chamber to include a circulatory transport path in which substrate mounting parts arranged in a row are transported in a circulatory manner, the circulatory transport path including a linear transport path in which the substrate mounting parts are transported linearly. A first reactive gas supplying part is arranged along a transporting direction in which the substrate mounting parts are transported in the linear transport path, to supply a first reactive gas to the substrate mounting parts. A second reactive gas supplying part is arranged alternately with the first reactive gas supplying part along the transporting direction, to supply a second reactive gas to the substrate mounting parts. A separation gas supplying part is arranged to supply a separation gas to a space between the first reactive gas supplying part and the second reactive gas supplying part.

摘要翻译： 一种成膜装置，其特征在于，具备：布置在真空室内的基板输送装置，包括循环输送路径，其中以循环方式输送排成行的基板安装部，所述循环输送路径包括线性输送路径， 零件被线性运输。 第一反应气体供给部沿着输送方向配置，在输送方向上，基板安装部在线性输送路径中输送，向基板安装部供给第一反应气体。 第二反应气体供给部与输送方向的第一反应气体供给部交替配置，向基板安装部供给第二反应气体。 分离气体供给部被配置为将分离气体供给到第一反应气体供给部和第二反应气体供给部之间的空间。

公开(公告)号：US20140027651A1

公开(公告)日：2014-01-30

申请号：US14110094

申请日：2012-10-24

申请人： Koji Kawasaki ,  Daisuke Kakuda ,  Mitsuo Kamino ,  Norihiko Tsuji ,  Jun Masudome

发明人： Koji Kawasaki ,  Daisuke Kakuda ,  Mitsuo Kamino ,  Norihiko Tsuji ,  Jun Masudome

IPC分类号： A61L2/08

CPC分类号： A61L2/087 ,  A61L2/08 ,  A61L2202/23 ,  B65B55/04 ,  B65B55/08 ,  B65G47/30 ,  B65G47/84 ,  B65G47/846

摘要： A continuous sterilization system is provided which reliably supports a sterilization target so that the sterilization target is not tipped over during a sterilization process and can stably ensure uniform irradiation periods on any portion of inner and outer surfaces and moreover, a portion sterilized by electron beam irradiation is not contaminated again. The continuous sterilization system is provided with a first conveying means, a first electron beam accelerator, a second conveying means, a second electron beam accelerator, and a third electron beam accelerator.

摘要翻译： 提供了一种连续灭菌系统，其可靠地支撑灭菌对​​象，使得灭菌目标在灭菌过程中不会翻倒，并且可以稳定地确保内表面和外表面的任何部分上的照射时间均匀，此外，通过电子束照射消毒的部分 不再污染 连续灭菌系统设置有第一输送装置，第一电子束加速器，第二输送装置，第二电子束加速器和第三电子束加速器。

公开(公告)号：US08057564B2

公开(公告)日：2011-11-15

申请号：US12435454

申请日：2009-05-05

申请人： Norihiko Tsuji

发明人： Norihiko Tsuji

IPC分类号： B01D50/00

CPC分类号： H01L21/67109 ,  B01D45/08 ,  C23C16/4412 ,  Y02C20/30 ,  Y02P70/605

摘要： Three exhaust trap units are arranged in series in an exhaust trap device for trapping substances solidified from exhaust gas and exhaust gas paths are formed inside the exhaust trap units. One or more collision plates are placed in each trap unit. The collision plates in each of the two upstream side exhaust trap units are arranged such that a space extending in the axial direction of the exhaust path is present therein without being blocked by any of the collision plates. The collision plates in the downstream side exhaust trap unit are arranged such that such a space is not present. Uneven distribution of the amount of accumulation of solidified substances is suppressed without performing complex control, and outflow of the solidified components to the downstream side of the exhaust trap device can be reliably reduced.

摘要翻译： 在排气收集装置中串联排列有三个排气收集装置，用于捕集从排气中凝固的物质，排气收集装置内形成排气通路。 一个或多个碰撞板放置在每个陷阱单元中。 两个上游侧排气收集器单元中的每一个中的碰撞板布置成使得在排气路径的轴向方向上延伸的空间不被任何碰撞板阻挡。 下游侧排气阱单元中的碰撞板被布置成不存在这样的空间。 在不进行复杂的控制的同时抑制凝固物质的积聚量的不均匀分布，能够可靠地降低凝固成分向排气收集装置的下游侧的流出。

公开(公告)号：US20070175188A1

公开(公告)日：2007-08-02

申请号：US11579114

申请日：2005-05-12

申请人： Norihiko Tsuji

发明人： Norihiko Tsuji

IPC分类号： B01D45/00

CPC分类号： H01L21/67109 ,  B01D45/08 ,  C23C16/4412 ,  Y02C20/30 ,  Y02P70/605

摘要： Exhaust gas collection units (110, 120, 130) are arranged in series in an exhaust gas collection device (100) for collecting objects separated from exhaust gas passing an exhaust gas route, and inside the exhaust gas collection units (110, 120, 130) are formed exhaust gas paths for passing exhaust gas along the exhaust gas route. Collision plates are placed in an exhaust gas collection section in each of the collection units. The collision plates in the exhaust gas collection sections of the upstream side collection units (110, 120) are arranged such that a space extending in the axial direction of the exhaust path is present in the exhaust path without being blocked by any of the collision plates arranged in the exhaust path. The collision plates in the exhaust gas collection section in the exhaust gas collection unit (130) on the downstream side are arranged so that such a space is not present. Uneven distribution of the amount of accumulation of separated objects such as reaction by-products are suppressed without performing complex control, and outflow of the objects to the downstream side of the exhaust gas collection device can be reliably reduced.

摘要翻译： 废气收集单元（110,120,130）串联排列在废气收集装置（100）中，用于收集通过废气路线的废气分离的物体，并且在废气收集单元（110,120,130）内 ）形成用于沿排气路线排放废气的废气路径。 碰撞板被放置在每个收集单元中的废气收集部分中。 上游侧收集单元（110,120）的排气收集部中的碰撞板被布置成使得在排气路径中沿着轴向方向延伸的空间不被任何碰撞板阻挡 排列在排气路径中。 排气收集部（130）的排气收集部中的下游侧的碰撞板配置成不存在空间。 在不进行复杂的控制的情况下，抑制了分离对象如反应副产物的累积量的不均匀分布，可以可靠地降低物品向排气收集装置的下游侧的流出。

公开(公告)号：US20090211213A1

公开(公告)日：2009-08-27

申请号：US12435454

申请日：2009-05-05

申请人： Norihiko Tsuji

发明人： Norihiko Tsuji

IPC分类号： B01D45/08

CPC分类号： H01L21/67109 ,  B01D45/08 ,  C23C16/4412 ,  Y02C20/30 ,  Y02P70/605

摘要： Three exhaust trap units are arranged in series in an exhaust trap device for trapping substances solidified from exhaust gas and exhaust gas paths are formed inside the exhaust trap units. One or more collision plates are placed in each trap unit. The collision plates in each of the two upstream side exhaust trap units are arranged such that a space extending in the axial direction of the exhaust path is present therein without being blocked by any of the collision plates. The collision plates in the downstream side exhaust trap unit are arranged such that such a space is not present. Uneven distribution of the amount of accumulation of solidified substances is suppressed without performing complex control, and outflow of the solidified components to the downstream side of the exhaust trap device can be reliably reduced.

摘要翻译： 在排气收集装置中串联排列有三个排气收集装置，用于捕集从排气中凝固的物质，排气收集装置内形成排气通路。 一个或多个碰撞板放置在每个陷阱单元中。 两个上游侧排气收集器单元中的每一个中的碰撞板布置成使得在排气路径的轴向方向上延伸的空间不被任何碰撞板阻挡。 下游侧排气阱单元中的碰撞板被布置成不存在这样的空间。 在不进行复杂的控制的同时抑制凝固物质的积聚量的不均匀分布，能够可靠地降低凝固成分向排气收集装置的下游侧的流出。

公开(公告)号：US07537628B2

公开(公告)日：2009-05-26

申请号：US11579114

申请日：2005-05-12

申请人： Norihiko Tsuji

发明人： Norihiko Tsuji

IPC分类号： B01D45/00

CPC分类号： H01L21/67109 ,  B01D45/08 ,  C23C16/4412 ,  Y02C20/30 ,  Y02P70/605

摘要： Three exhaust trap units are arranged in series in an exhaust trap device for trapping substances solidified from exhaust gas and exhaust gas paths are formed inside the exhaust trap units. One or more collision plates are placed in each trap unit. The collision plates in each of the two upstream side exhaust trap units are arranged such that a space extending in the axial direction of the exhaust path is present therein without being blocked by any of the collision plates. The collision plates in the downstream side exhaust trap unit are arranged such that such a space is not present. Uneven distribution of the amount of accumulation of solidified substances is suppressed without performing complex control, and outflow of the solidified components to the downstream side of the exhaust trap device can be reliably reduced.

摘要翻译： 在排气收集装置中串联排列有三个排气收集装置，用于捕集从排气中凝固的物质，排气收集装置内形成排气通路。 一个或多个碰撞板放置在每个陷阱单元中。 两个上游侧排气收集器单元中的每一个中的碰撞板布置成使得在排气路径的轴向方向上延伸的空间不被任何碰撞板阻挡。 下游侧排气阱单元中的碰撞板被布置成不存在这样的空间。 在不进行复杂的控制的同时抑制凝固物质的积聚量的不均匀分布，能够可靠地降低凝固成分向排气收集装置的下游侧的流出。