Method and apparatus for measuring a surface profile of a sample
    1.
    发明授权
    Method and apparatus for measuring a surface profile of a sample 失效
    用于测量样品的表面轮廓的方法和装置

    公开(公告)号:US07405089B2

    公开(公告)日:2008-07-29

    申请号:US11096174

    申请日:2005-03-31

    IPC分类号: H01L21/66 G01R31/26

    CPC分类号: H01L22/12 H01L22/24

    摘要: In order to measure a surface profile of a sample, an imprint of the surface profile to be examined is produced in a transfer material. The sample contains processed semiconductor material and is in particular a patterned semiconductor wafer or part of a patterned semiconductor wafer. The transfer material is deformable and curable under suitable ambient conditions. The transfer material may be a thermoplastic material or a material which is deformable as desired after application on a substrate and cures in one case by means of irradiation with photons having a suitable wavelength or alternatively heating. The transfer material may be configured in such a way that the imprint produced is the same size as or alternatively of smaller size than the surface profile. The imprint produced is subsequently measured by known methods.

    摘要翻译: 为了测量样品的表面轮廓,在转印材料中产生待检查的表面轮廓的压印。 样品包含经处理的半导体材料,特别是图案化的半导体晶片或图案化的半导体晶片的一部分。 转印材料可在适当的环境条件下变形和固化。 转印材料可以是热塑性材料或在施加到基底上之后根据需要可变形的材料,并且在一种情况下通过用具有合适波长的光子或替代地加热的光子照射来固化。 转印材料可以以这样的方式构造,使得产生的印记与表面轮廓尺寸相同或更小。 随后通过已知方法测量产生的印迹。

    Method and apparatus for the depth-resolved characterization of layer of a carrier
    2.
    发明申请
    Method and apparatus for the depth-resolved characterization of layer of a carrier 失效
    用于载体层的深度分辨表征的方法和装置

    公开(公告)号:US20060076494A1

    公开(公告)日:2006-04-13

    申请号:US11196513

    申请日:2005-08-04

    IPC分类号: G01J5/02

    CPC分类号: H01L22/12

    摘要: The present invention relates to a method for the depth-resolved characterization of a layer of a carrier. This involves firstly producing a cutout in the layer of the carrier with a sidewall and subsequently removing carrier material adjoining the sidewall with the aid of an ion beam. During the removal process, images of the sidewall are recorded and material compositions of the removed carrier material are determined as well. A depth-resolved characterization of the layer of the carrier is carried out on the basis of a correlation of the determined material compositions of the removed carrier material with the recorded images of the sidewall, layer depths being assigned to the material compositions of the removed carrier material with the aid of the images of the sidewall. The invention furthermore relates to an apparatus for carrying out this method.

    摘要翻译: 本发明涉及用于载体层的深度分辨表征的方法。 这涉及首先在载体的层中产生具有侧壁的切口,随后借助离子束去除与侧壁相邻的载体材料。 在去除过程中,记录侧壁的图像,并且还确定去除的载体材料的材料组成。 基于去除的载体材料的确定的材料组成与侧壁的记录图像的相关性来执行载体层的深度分辨表征,层深度被分配给去除的载体的材料组成 借助于侧壁图像的材料。 本发明还涉及一种用于执行该方法的装置。

    Method and apparatus for measuring a surface profile of a sample
    3.
    发明申请
    Method and apparatus for measuring a surface profile of a sample 失效
    用于测量样品的表面轮廓的方法和装置

    公开(公告)号:US20050258365A1

    公开(公告)日:2005-11-24

    申请号:US11096174

    申请日:2005-03-31

    CPC分类号: H01L22/12 H01L22/24

    摘要: In order to measure a surface profile of a sample, an imprint of the surface profile to be examined is produced in a transfer material. The sample contains processed semiconductor material and is in particular a patterned semiconductor wafer or part of a patterned semiconductor wafer. The transfer material is deformable and curable under suitable ambient conditions. The transfer material may be a thermoplastic material or a material which is deformable as desired after application on a substrate and cures in one case by means of irradiation with photons having a suitable wavelength or alternatively heating. The transfer material may be configured in such a way that the imprint produced is the same size as or alternatively of smaller size than the surface profile. The imprint produced is subsequently measured by known methods.

    摘要翻译: 为了测量样品的表面轮廓,在转印材料中产生待检查的表面轮廓的压印。 样品包含经处理的半导体材料,特别是图案化的半导体晶片或图案化的半导体晶片的一部分。 转印材料可在适当的环境条件下变形和固化。 转印材料可以是热塑性材料或在施加到基底上之后根据需要可变形的材料,并且在一种情况下通过用具有合适波长的光子或替代地加热的光子照射来固化。 转印材料可以以这样的方式构造,使得产生的印记与表面轮廓尺寸相同或更小。 随后通过已知方法测量产生的印迹。

    Method and apparatus for the characterization of a depth structure in a substrate
    5.
    发明授权
    Method and apparatus for the characterization of a depth structure in a substrate 失效
    表征衬底深度结构的方法和装置

    公开(公告)号:US07005640B2

    公开(公告)日:2006-02-28

    申请号:US11008643

    申请日:2004-12-10

    申请人: Harald Bloess

    发明人: Harald Bloess

    摘要: The present invention provides a method for the characterization of a depth structure in a substrate at a surface of the substrate, in which a cutout is produced at the surface of the substrate between an imaging device and the depth structure, the cutout being spaced apart from the depth structure. A layer of the substrate, which incipiently cuts the depth structure and the cutout, is removed by means of an ion beam in order to obtain a cut area, the layer and the normal to the area of the surface of the substrate assuming an acute angle that is greater than zero. The cut area is imaged by means of the imaging device in order to characterize the depth structure.

    摘要翻译: 本发明提供了一种用于表征衬底表面的衬底深度结构的方法,其中在成像器件和深度结构之间在衬底的表面处产生切口,切口与 深度结构。 通过离子束去除初始切割深度结构和切口的基底层,以获得切割面积,该层和垂直于基底表面的区域呈锐角 大于零。 通过成像装置对切割区域进行成像,以便表征深度结构。

    System and Method of Measuring Film Height on a Substrate
    7.
    发明申请
    System and Method of Measuring Film Height on a Substrate 审中-公开
    测量基板上胶片高度的系统和方法

    公开(公告)号:US20090107399A1

    公开(公告)日:2009-04-30

    申请号:US11927043

    申请日:2007-10-29

    IPC分类号: B05C11/00 G01B11/06

    CPC分类号: G01B11/0616 G01B11/0625

    摘要: A system of film height measurements and method of measuring film height on a substrate are disclosed. A radiation source illuminates a beam of radiation in the optical range onto a substrate being coated with a layer having a nominal film height is provided. Reflected signals are recorded for two positions and a film height difference of the layer is calculated.

    摘要翻译: 公开了一种膜高度测量系统和测量衬底上的膜高度的方法。 辐射源将光学范围内的辐射束照射到被涂覆有具有标称膜高度的层的基底上。 记录两个位置的反射信号,并计算该层的膜高差。

    Scanning probe microscopy cantilever, corresponding manufacturing method, scanning probe microscope, and scanning method
    9.
    发明授权
    Scanning probe microscopy cantilever, corresponding manufacturing method, scanning probe microscope, and scanning method 失效
    扫描探针显微镜悬臂,相应的制造方法,扫描探针显微镜和扫描方法

    公开(公告)号:US07635392B2

    公开(公告)日:2009-12-22

    申请号:US11891881

    申请日:2007-08-14

    IPC分类号: G01N13/10

    摘要: The present invention provides a scanning probe microscope cantilever comprising a support portion, a lever portion extended from the support portion, and a needle projecting out of a first surface of the cantilever in the vicinity of a free end of the lever portion. From a second surface of the cantilever opposite the first surface, a bore extends through the needle to an aperture formed at a tip of the needle. To the tip of the needle, a substantially globular particle is attached. A method of scanning a sample surface comprises creating relative cantilever motion substantially toward the sample such that the particle experiences a contact force with the sample, illuminating a top surface of the cantilever with laser light such that a portion of the laser light passes through the hollow needle and is emitted from the aperture onto the particle, and detecting scattered light from the sample.

    摘要翻译: 本发明提供了一种扫描探针显微镜悬臂,其包括支撑部分,从支撑部分延伸的杆部分,以及在杠杆部分的自由端附近从悬臂的第一表面伸出的针。 从所述悬臂的与所述第一表面相对的第二表面,孔延伸穿过所述针到形成在所述针的尖端处的孔。 针头的尖端附着有大致球状的颗粒。 扫描样品表面的方法包括基本上朝向样品产生相对悬臂运动,使得颗粒经受与样品的接触力,用激光照射悬臂的顶表面,使得激光的一部分穿过中空 针,并从孔径发射到颗粒上,并检测来自样品的散射光。