公开(公告)号：US06526118B2

公开(公告)日：2003-02-25

申请号：US09391171

申请日：1999-09-07

申请人： Hideki Komatsuda ,  Takashi Mori

发明人： Hideki Komatsuda ,  Takashi Mori

IPC分类号： G21K500

CPC分类号： G03F7/70066 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70283 ,  G03F7/70358 ,  G03F7/707 ,  G03F7/70708

摘要： In a projection exposure apparatus used in lithography process for transferring a predetermined pattern formed on a reflection type mask onto a photosensitive substrate, the reflection mask and the substrate are moved relative to each other by a scanning driver, and the illumination optical system located between a radiation light source and the reflection mask includes a field stop located near a position conjugate with the reflection mask. In another embodiment a scanning driver changes the positional relationship between the reflection mask and the projection optical system, or/and between the substrate and the projection optical system. In another embodiment an image of the field stop is formed on the reflection mask by a relay optical system, preferably a catoptric system, forming the predetermined pattern. The projection optical system located between the reflection mask and the substrate directs the light reflected from the mask to the substrate, and illuminance distribution of the light on the exposure area of the substrate is adjustable by changing the position of reflection optical elements located along the optical path of the radiation light in the illumination optical system.

摘要翻译： 在用于将形成在反射型掩模上的预定图案转印到感光基板上的光刻工艺中的投影曝光装置中，反射掩模和基板通过扫描驱动器相对于彼此移动，并且照明光学系统位于 辐射光源和反射掩模包括位于与反射掩模共轭的位置附近的场停止。 在另一个实施例中，扫描驱动器改变反射掩模与投影光学系统之间，或/和基板与投影光学系统之间的位置关系。 在另一个实施例中，通过形成预定图案的中继光学系统，优选地是反射系统，在反射掩模上形成场光阑的图像。 位于反射掩模和衬底之间的投影光学系统将从掩模反射的光引导到衬底，并且通过改变沿着光学器件的反射光学元件的位置来调节光在衬底的曝光区域上的照度分布 在照明光学系统中辐射光的路径。

公开(公告)号：US5615047A

公开(公告)日：1997-03-25

申请号：US259761

申请日：1994-06-14

申请人： Hideki Komatsuda ,  Hideo Hirose ,  Takashi Mori

发明人： Hideki Komatsuda ,  Hideo Hirose ,  Takashi Mori

IPC分类号： F21V5/04 ,  G02B19/00 ,  G02B27/00 ,  G03B27/32 ,  G03F7/20 ,  H01L21/027 ,  G02B27/10 ,  G02B27/02 ,  F21V29/00

CPC分类号： G03F7/70058 ,  F21V5/04

摘要： An illumination apparatus for uniformly illuminating an illuminated object surface. The apparatus comprises light source means for supplying an illumination light beam having parallel rays, an optical integrator for forming a plurality of beams from the illumination light beam from said light source means, a condenser optical system for converging the plurality of beams from said optical integrator to illuminate the illuminated object surface in a superimposed manner, and an optical member having a light quantity attenuator for transmitting said illumination light beam so as to attenuate a light quantity of said illumination light beam by a predetermined amount, said optical member being located at or in the vicinity of a position conjugate with said illuminated object surface.

摘要翻译： 一种用于均匀照射被照射物体表面的照明装置。 该装置包括用于提供具有平行光线的照明光束的光源装置，用于从所述光源装置的照明光束形成多个光束的光学积分器，用于会聚来自所述光学积分器的多个光束的聚光器光学系统 以叠加方式照亮被照明物体表面;以及光学构件，具有用于透射所述照明光束的光衰减器，以将所述照明光束的光量衰减预定量，所述光学构件位于或 在与所述被照射物体表面共轭的位置附近。

公开(公告)号：US06661499B2

公开(公告)日：2003-12-09

申请号：US10226347

申请日：2002-08-23

申请人： Yasuhiro Omura ,  Toshihiko Ozawa ,  Takashi Mori ,  Hideki Komatsuda

发明人： Yasuhiro Omura ,  Toshihiko Ozawa ,  Takashi Mori ,  Hideki Komatsuda

IPC分类号： G03B2772

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70566

摘要： A projection exposure apparatus (10) for forming an image of a pattern present on a first object such as a reticle (R) onto a second object, such as a wafer (W). The apparatus comprises along three optical axes (AZ1, AX, AZ2), an illumination optical system capable of illuminating the reticle with partially polarized light, and a catadioptric projection optical system (40-70) arranged adjacent the reticle and opposite the illumination optical system. The catadioptric projection optical system comprises one or more substantially spherical mirrors (48), a plurality of refractive members (42, 48, 72, 74), and one or more plane mirrors (60, 66). The plane mirrors are designed and arranged so as to allow a substantially unpolarized image of the reticle pattern, which is illuminated with partially polarized light, to be formed on the wafer.

公开(公告)号：US06466303B1

公开(公告)日：2002-10-15

申请号：US09330442

申请日：1999-06-11

申请人： Yasuhiro Omura ,  Toshihiko Ozawa ,  Takashi Mori ,  Hideki Komatsuda

发明人： Yasuhiro Omura ,  Toshihiko Ozawa ,  Takashi Mori ,  Hideki Komatsuda

IPC分类号： G03B2754

CPC分类号： G02B17/0892 ,  G02B13/143 ,  G02B17/08 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70566

摘要： A projection exposure apparatus (10) for forming an image of a pattern present on a first object such as a reticle (R) onto a second object, such as a wafer (W). The apparatus comprises along three optical axes (AZ1, AX, AZ2), an illumination optical system capable of illuminating the reticle with partially polarized light, and a catadioptric projection optical system (40-70) arranged adjacent the reticle and opposite the illumination optical system. The catadioptric projection optical system comprises one or more substantially spherical mirrors (48), a plurality of refractive members (42, 48, 72, 74), and one or more plane mirrors (60, 66). The plane mirrors are designed and arranged so as to allow a substantially unpolarized image of the reticle pattern, which is illuminated with partially polarized light, to be formed on the wafer.

摘要翻译： 一种投影曝光装置（10），用于将存在于诸如光罩（R）的第一物体上的图案的图像形成在诸如晶片（W）的第二物体上。 该装置包括沿着三个光轴（AZ1，AX，AZ2），能够以部分偏振光照射掩模版的照明光学系统，以及布置在掩模版附近并与照明光学系统相对的反射折射投射光学系统（40-70） 。 反折射投影光学系统包括一个或多个基本上为球面的反射镜（48），多个折射构件（42,48,72,74）和一个或多个平面镜（60,66）。 平面镜被设计和布置为允许在晶片上形成用部分偏振光照射的标线图案的基本非偏振图像。

公开(公告)号：US5713660A

公开(公告)日：1998-02-03

申请号：US334665

申请日：1994-11-04

申请人： Takashi Mori ,  Hideki Komatsuda ,  Noriaki Yamamoto

发明人： Takashi Mori ,  Hideki Komatsuda ,  Noriaki Yamamoto

IPC分类号： G02B19/00 ,  G02B27/00 ,  G03F7/20 ,  F21V5/04

CPC分类号： G03F7/70091 ,  G02B19/0028 ,  G02B19/0047

摘要： An illumination optical apparatus according to the present invention comprises a light source, a collector mirror having an ellipsoidal surface of revolution for reflecting and collecting light from the light source, a collimator lens for converting the light collected by the collector mirror into nearly parallel beams, an optical integrator for producing a plurality of light source images from the beams outgoing from the collimator lens, and a condenser lens for condensing light from the plurality of light source images to illuminate a body to be illuminated in a superimposed manner. Wherein the collimator lens is arranged to satisfy the following condition, R.sub.max

摘要翻译： 根据本发明的照明光学装置包括光源，具有用于反射和收集来自光源的光的旋转椭圆面的集光镜，用于将由集光镜收集的光转换成几乎平行的光束的准直透镜， 用于从来自准直透镜的光束产生多个光源图像的光学积分器，以及用于聚集来自多个光源图像的光的聚光镜，以照亮重叠的被照明体。 其中准直透镜被设置为满足以下条件，Rmax

公开(公告)号：US06727980B2

公开(公告)日：2004-04-27

申请号：US09846304

申请日：2001-05-02

申请人： Kazuya Ota ,  Akikazu Tanimoto ,  Tsuneyuki Hagiwara ,  Hideki Komatsuda ,  Takashi Mori

发明人： Kazuya Ota ,  Akikazu Tanimoto ,  Tsuneyuki Hagiwara ,  Hideki Komatsuda ,  Takashi Mori

IPC分类号： G03B2752

CPC分类号： G03F7/706 ,  G03F7/70258

摘要： A method for performing optical adjustments of an exposure apparatus is based on an exposure apparatus having a light source for generating illumination light for exposure, and illumination optics for irradiating a mask with the illumination light generated from the exposure light source so as to imprint a mask pattern on a substrate base. The apparatus uses a wide bandwidth light source for the exposure light source that produces exposure light and non-exposure light having wavelengths different from those in the exposure light, and optical adjustments for optical components in at least a portion of the illumination optics are performed by using non-exposure light

摘要翻译： 用于进行曝光装置的光学调节的方法是基于具有用于产生用于曝光的照明光的光源的曝光装置和用于从曝光光源产生的照明光照射掩模以照射掩模的照明光学器件， 图案在基底上。 该装置使用用于产生具有与曝光光中的波长不同的波长的曝光光和非曝光光的曝光光源的宽带宽光源，并且在照明光学装置的至少一部分中的光学部件的光学调整由 使用非曝光灯

公开(公告)号：US5594526A

公开(公告)日：1997-01-14

申请号：US436070

申请日：1995-05-05

申请人： Takashi Mori ,  Hideki Komatsuda

发明人： Takashi Mori ,  Hideki Komatsuda

IPC分类号： G02B27/00 ,  G02B3/00 ,  G03F7/20 ,  H01L21/027 ,  F21V29/00 ,  G03B27/54 ,  G02B27/09

CPC分类号： G02B3/0056 ,  G02B3/0062 ,  G02B3/0068 ,  G03F7/70075

摘要： A projection exposure apparatus including a light source system, an optical integrator for forming a plurality of light source images, and a condenser optical system for illuminating a target illumination surface in a rectangular or circular arc pattern in a multiple manner. The optical integrator has, from a light source side, a first lens group which has a plurality of first lens element groups each consisting of a plurality of first lens elements, and a second lens group which has a plurality of second lens element groups each consisting of a plurality of second lens elements. The second lens elements are arranged in a one-to-one correspondence with the first lens elements, and dimensions of the lens section of the first and second lens element satisfy a predetermined relations.

摘要翻译： 一种投影曝光装置，包括光源系统，用于形成多个光源图像的光学积分器，以及用于以多重方式照亮矩形或圆弧图案中的目标照明表面的聚光器光学系统。 光学积分器具有从光源侧的具有多个第一透镜元件组的第一透镜组，每个第一透镜组由多个第一透镜元件组成，第二透镜组具有多个第二透镜元件组，每个第二透镜组包括： 的多个第二透镜元件。 第二透镜元件与第一透镜元件一一对应地布置，并且第一和第二透镜元件的透镜部分的尺寸满足预定关系。

公开(公告)号：US09195069B2

公开(公告)日：2015-11-24

申请号：US11783561

申请日：2007-04-10

申请人： Hirohisa Tanaka ,  Hideki Komatsuda

发明人： Hirohisa Tanaka ,  Hideki Komatsuda

IPC分类号： G03B27/54 ,  G03B27/44 ,  G03B27/72 ,  G03B27/32 ,  G02B27/09 ,  G03F7/20 ,  G03B27/68 ,  G03B27/42 ,  G03B27/52

CPC分类号： G02B27/0905 ,  G02B27/0961 ,  G02B27/0972 ,  G03F7/70108 ,  G03F7/70208 ,  G03F7/70275 ,  G03F7/70283

摘要： An illumination optical apparatus has a beam splitting member which splits an incident beam into a first light beam and a second light beam to form a first illumination region and a second illumination region, a first light-guide optical system which guides the first light beam to the first illumination region, and a second light-guide optical system which guides the second light beam to the second illumination region locate apart from the first illumination region.

摘要翻译： 照明光学装置具有：分束构件，其将入射光束分成第一光束和第二光束，以形成第一照明区域和第二照明区域;第一导光光学系统，其将第一光束引导到 第一照明区域和将第二光束引导到第二照明区域的第二导光光学系统与第一照明区域分离。

公开(公告)号：US20090040493A1

公开(公告)日：2009-02-12

申请号：US12170236

申请日：2008-07-09

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03B27/54

CPC分类号： G03F7/702

摘要： An illumination optical apparatus includes a light source, which supplies illumination light including a wavelength of 5 nm to 50 nm, and an illumination optical system, which guides the illumination light to an illuminated surface. The illumination optical system includes an aperture angle restriction member and a condenser optical system, which is arranged in an optical path between the aperture restriction member and the illuminated surface to guide light beam from the aperture angle restriction member to the illuminated surface. A rotation axis of an arcuate-shape of an illumination region formed on the illuminated surface is located outside an opening of the aperture angle restriction member. The condenser optical system includes a plurality of reflection surfaces. Among the plurality of reflection surfaces, the reflection surface closest to the illuminated surface along the optical path includes a concave shape. When, for example, applied to an EUVL exposure apparatus, the illumination optical apparatus illuminates a reflective mask, serving as the illumination plane, without a plane mirror in the optical path between the illumination optical system and the mask.

摘要翻译： 照明光学装置包括提供包括5nm至50nm的波长的照明光的光源和将照明光引导到照明表面的照明光学系统。 照明光学系统包括孔径限制构件和聚光镜系统，其设置在孔径限制构件和被照射表面之间的光路中，以将来自孔径角度限制构件的光束引导到被照射的表面。 形成在被照射面上的照明区域的弧形的旋转轴位于孔径角限制部件的开口的外侧。 聚光镜系统包括多个反射面。 在多个反射面中，沿着光路最靠近被照射面的反射面包括凹形。 例如，当EUVL曝光装置被应用时，照明光学装置在照明光学系统和掩模之间的光路中照射作为照明平面的反射掩模，而没有平面镜。

公开(公告)号：US07483122B2

公开(公告)日：2009-01-27

申请号：US11984192

申请日：2007-11-14

申请人： Hideki Komatsuda ,  Tomowaki Takahashi ,  Masayuki Suzuki

发明人： Hideki Komatsuda ,  Tomowaki Takahashi ,  Masayuki Suzuki

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/7025 ,  G02B17/0657 ,  G03F7/70233

摘要： A projection optical system is a catoptric system in which a field of view region and an imaging region are located spaced from an optical axis, in which a numerical aperture of light reaching each point on an image plane is substantially uniform regardless of an image height and a direction. An aperture stop for defining the numerical aperture of the projection optical system is provided, and the aperture stop is provided with an aperture portion in a predetermined shape in which the numerical aperture of light reaching each point within a predetermined region is substantially uniform over the predetermined region, that is, in a shape in which dimensions concerning two directions perpendicular to each other are different from each other. A predetermined shape of the aperture portion is defined so as to compensate for the effect of non-uniformity of the numerical aperture of light reaching each point within a predetermined region due to a partial optical system arranged between the aperture stop and an image plane not satisfying a desired projective relationship.

摘要翻译： 投影光学系统是其中视野区域和成像区域与光轴间隔开的反射系统，其中到达图像平面上的每个点的光的数值孔径与图像高度无关，并且 一个方向 提供用于限定投影光学系统的数值孔径的孔径光阑，并且孔径光阑设置有预定形状的开口部分，其中到达预定区域内的各点的光的数值孔径在预定的范围内基本均匀 即相对于彼此垂直的两个方向的尺寸彼此不同的形状。 限定孔径部分的预定形状，以补偿由于设置在孔径光阑和不能满足的光阑的图像之间的部分光学系统而在预定区域内到达各点的光的数值孔径的不均匀性的影响 期望的投射关系。