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    Zirconia ceramics
    1.
    发明授权
    Zirconia ceramics 失效
    氧化锆陶瓷

    公开(公告)号：US5279995A

    公开(公告)日：1994-01-18

    申请号：US38051

    申请日：1993-03-25

    申请人： Hiroaki Tanaka ,  Yutaka Kimura ,  Masamichi Obitsu

    发明人： Hiroaki Tanaka ,  Yutaka Kimura ,  Masamichi Obitsu

    IPC分类号： C04B35/486 ,  C04B35/48

    CPC分类号： C04B35/486

    摘要： A zirconia ceramic composed of crystals which scarcely undergo phase transformation from tetragonal system to monoclinic in the temperature range of from 100.degree. C. to 300.degree. C. even in the presence of water vapor or water is disclosed, said zirconia ceramic comprising at least 93% by weight of partially stabilized zirconia mainly composed of tetragonal crystals and containing mainly Y.sub.2 O.sub.3 and ZrO.sub.2 at the former to the latter molar ratio of from 2/98 to 4.5/95.5 and balance of at least one of the oxides selected from the group consisting of boron oxide, germanium oxide, and gallium oxide, wherein the content of the boron oxide is 1% by weight or less.

    摘要翻译： 公开了一种由晶体组成的氧化锆陶瓷，即使在水蒸汽或水的存在下也几乎不会在从100度到300度的温度范围内从四方晶相转变为单斜晶系，所述氧化锆陶瓷包含至少93 主要由四方晶体组成并且主要含有Y 2 O 3和ZrO 2的部分稳定化的氧化锆的重量百分数，其中后者的摩尔比为2/98至4.5 / 95.5，余量为至少一种选自以下的氧化物： 氧化硼，氧化锗和氧化镓，其中氧化硼的含量为1重量％以下。

    Aqueous zirconia sol and method of preparing same
    2.
    发明授权
    Aqueous zirconia sol and method of preparing same 失效
    氧化锆水溶胶及其制备方法

    公开(公告)号：US5643497A

    公开(公告)日：1997-07-01

    申请号：US460593

    申请日：1995-06-02

    申请人： Takao Kaga ,  Yutaka Kimura ,  Fumio Saito ,  Hiroaki Tanaka

    发明人： Takao Kaga ,  Yutaka Kimura ,  Fumio Saito ,  Hiroaki Tanaka

    IPC分类号： B01J13/00

    CPC分类号： B01J13/00

    摘要： A stable aqueous sol of colloidal zirconia having lowered surface activity and useful for polishing semiconductors and the like, is prepared by a process comprising calcining a colloidal zirconia having a specific surface area of 10 to 400 m.sup.2 /g, a particle size of 20 to 500 nm and a dehydratable water content of 4 to 15% by weight at 400.degree. to 1,000.degree. C. to form a calcined zirconia having a dehydratable water content of 0.1 to 2% by weight, and pulverizing the calcined zirconia in the presence of a water-soluble acid or alkali in water, to form the stable sol of colloidal zirconia having a specific surface area of 5 to 200 m.sup.2 /g, a particle size of 20 to 1,500 nm and a dehydratable water content of 0.1 to 3% by weight. The stable sol of colloidal zirconia has a ZrO.sub.2 concentration of 5 to 80% by weight.

    摘要翻译： 通过包括煅烧比表面积为10-400m 2 / g，粒度为20-500的胶体氧化锆的方法制备具有降低的表面活性并可用于抛光半导体等的胶态氧化锆稳定的水性溶胶 并且在400-1000℃下可脱水的含水量为4至15重量％，以形成可脱水水含量为0.1至2重量％的煅烧氧化锆，并在煅烧的水的存在下粉碎煅烧氧化锆 在水中的可溶性酸或碱，形成比表面积为5〜200m 2 / g，粒径为20〜1500nm，脱水水分为0.1〜3重量％的胶态氧化锆的稳定溶胶。 胶体氧化锆的稳定溶胶的ZrO2浓度为5〜80重量％。

    Display device, display system, mobile object, display control method, and recording medium storing program code
    3.
    发明授权
    Display device, display system, mobile object, display control method, and recording medium storing program code 有权

    公开(公告)号：US10962776B2

    公开(公告)日：2021-03-30

    申请号：US16779843

    申请日：2020-02-03

    申请人： Hiroaki Tanaka ,  Toshihiro Yamashiro

    发明人： Hiroaki Tanaka ,  Toshihiro Yamashiro

    IPC分类号： G02B27/01

    摘要： A display device includes a light source; a light deflector configured to deflect light emitted from the light source to scan as scanning light in a main scanning direction and a sub-scanning direction; a screen having a scanning area to be two-dimensionally scanned with the scanning light at a predetermined cycle, the scanning area having a first area and a second area that differ in position in the sub-scanning direction; a light receiver disposed on the screen, configured to detect the light scanning in each of the first area and the second area of the screen; and a control unit configured to adjust a position of the scanning light in the scanning area according to the number of scanning lines in each of the first area and the second area.

    SEMICONDUCTOR DEVICE
    5.
    发明申请
    SEMICONDUCTOR DEVICE 审中-公开
    半导体器件

    公开(公告)号：US20150054075A1

    公开(公告)日：2015-02-26

    申请号：US14501244

    申请日：2014-09-30

    申请人： Tadahiro Ohmi ,  Hiroaki Tanaka

    发明人： Tadahiro Ohmi ,  Hiroaki Tanaka

    IPC分类号： H01L29/10 ,  H01L29/417 ,  H01L29/45 ,  H01L29/78

    CPC分类号： H01L29/1087 ,  H01L27/1203 ,  H01L29/41733 ,  H01L29/458 ,  H01L29/7816

    摘要： There is provided a semiconductor device. An n-type transistor is formed on a (551) surface of a silicon substrate. A silicide layer region in contact with a diffusion region (heavily doped region) of the n-type transistor has a thickness not more than 5 nm. A metal layer region in contact with the silicide layer has a thickness of 25 nm (inclusive) to 400 nm (inclusive). A barrier height between the silicide layer region and the diffusion region has a minimum value in this thickness relationship.

    摘要翻译： 提供了一种半导体器件。 n型晶体管形成在硅衬底的（551）表面上。 与n型晶体管的扩散区域（重掺杂区域）接触的硅化物层区域的厚度不大于5nm。 与硅化物层接触的金属层区域的厚度为25nm（含）〜400nm（含）。 硅化物层区域和扩散区域之间的势垒高度在该厚度关系中具有最小值。

    Imaging optical system, imaging device, and digital apparatus
    7.
    发明授权
    Imaging optical system, imaging device, and digital apparatus 有权
    成像光学系统，成像设备和数字设备

    公开(公告)号：US08704937B2

    公开(公告)日：2014-04-22

    申请号：US13837623

    申请日：2013-03-15

    申请人： Keiji Matsusaka ,  Hiroaki Tanaka

    发明人： Keiji Matsusaka ,  Hiroaki Tanaka

    IPC分类号： H04N5/225 ,  G02B9/34

    CPC分类号： G02B3/00 ,  G02B3/04 ,  G02B13/004 ,  G02B13/18 ,  H04N5/23245

    摘要： An imaging optical system, an imaging device, and a digital apparatus have a four lens construction with positive, negative, positive, and negative refractive powers. A surface position at the maximum effective diameter of the second lens element is located on the object side than a surface vertex thereof. The fourth lens element has an inflection point at a position other than the intersection of the optical axis and the fourth lens element. The optical system satisfies the following conditions. 0.7 72 ν4>50, and 0.55

    摘要翻译： 成像光学系统，成像装置和数字装置具有正，负，正和负折射力的四透镜结构。 第二透镜元件的最大有效直径处的表面位置位于物体侧，而不是其表面​​顶点。 第四透镜元件在光轴和第四透镜元件的交点以外的位置具有拐点。 光学系统满足以下条件。 0.7 72＆ ; 4> 50和0.55

    BAND CLIP
    9.
    发明申请
    BAND CLIP 有权
    带夹

    公开(公告)号：US20130193279A1

    公开(公告)日：2013-08-01

    申请号：US13878792

    申请日：2011-03-28

    申请人： Hiroaki Tanaka

    发明人： Hiroaki Tanaka

    IPC分类号： F16L3/137

    CPC分类号： F16L3/137 ,  B60R16/0215 ,  F16B21/086 ,  H02G3/32 ,  Y10T24/1498

    摘要： A band clip includes a body, a band integral with the body, and a clip that is attached to the body. The body has a vertical plate with a band insertion hole and a horizontal plate with a clip attachment hole. The band extends from the vertical plate. Locking holes penetrate the band at intervals. The clip includes a shaft that is fit into the clip attachment hole of the body, a wing on one end of the shaft, a band locking claw at another end of the shaft, and a body locking claw on an intermediate portion of the shaft. The band is wrapped around a group of wires and inserted into the band insertion hole. The band locking claw of the clip is inserted into and locked to a band locking hole, and the body locking claw contacts the surface of the body.

    摘要翻译： 带夹包括主体，与身体整体的带，以及附接到身体的夹子。 本体具有带有带插孔的垂直板和带有夹子安装孔的水平板。 带从垂直板延伸。 锁孔每隔一段时间穿透。 该夹子包括一个装配在主体的夹子附接孔中的轴，在轴的一端上的翼，在轴的另一端的带锁定爪，以及在轴的中间部分上的主体锁定爪。 带缠绕在一组电线上并插入带插入孔。 夹子的带锁定爪插入并锁定到带锁定孔，并且身体锁定爪接触身体的表面。