公开(公告)号：US08146022B2

公开(公告)日：2012-03-27

申请号：US12409068

申请日：2009-03-23

申请人： Hiromitsu Mashita ,  Toshiya Kotani ,  Takashi Obara

发明人： Hiromitsu Mashita ,  Toshiya Kotani ,  Takashi Obara

IPC分类号： G06F17/50 ,  G06K9/00

CPC分类号： G03F1/36

摘要： According to an aspect of the present invention, there is provided a mask pattern data generation method including: a first step of obtaining a mask data representing from a design pattern by performing a process simulation with a process parameter having a first value; a second step of obtaining a finished pattern from the mask data by performing the process simulation with the process parameter having a different value; a third step of verifying whether a dimensional error therebetween is within an allowable range; and a fourth step of: if the dimensional error is within the allowable range, determining the mask pattern data; and if the dimensional error is not within the allowable range, repeating the above steps by updating the process parameter until the dimensional error becomes within the allowable range.

摘要翻译： 根据本发明的一个方面，提供了一种掩模图案数据生成方法，包括：第一步骤，通过利用具有第一值的处理参数进行处理模拟来获得表示设计图案的掩模数据; 通过使用具有不同值的处理参数进行处理模拟从掩模数据获得完成图案的第二步骤; 验证其间的尺寸误差是否在允许范围内的第三步骤; 以及第四步骤：如果所述尺寸误差在所述容许范围内，则确定所述掩模图案数据; 并且如果尺寸误差不在允许范围内，则通过更新处理参数重复上述步骤，直到尺寸误差变得在允许范围内。

公开(公告)号：US20090239177A1

公开(公告)日：2009-09-24

申请号：US12409068

申请日：2009-03-23

申请人： Hiromitsu MASHITA ,  Toshiya Kotani ,  Takashi Obara

发明人： Hiromitsu MASHITA ,  Toshiya Kotani ,  Takashi Obara

IPC分类号： G03F7/20 ,  G06F17/50

CPC分类号： G03F1/36

摘要： According to an aspect of the present invention, there is provided a mask pattern data generation method including: a first step of obtaining a mask data representing from a design pattern by performing a process simulation with a process parameter having a first value; a second step of obtaining a finished pattern from the mask data by performing the process simulation with the process parameter having a different value; a third step of verifying whether a dimensional error therebetween is within an allowable range; and a fourth step of: if the dimensional error is within the allowable range, determining the mask pattern data; and if the dimensional error is not within the allowable range, repeating the above steps by updating the process parameter until the dimensional error becomes within the allowable range.

摘要翻译： 根据本发明的一个方面，提供了一种掩模图案数据生成方法，包括：第一步骤，通过利用具有第一值的处理参数进行处理模拟来获得表示设计图案的掩模数据; 通过使用具有不同值的处理参数进行处理模拟从掩模数据获得完成图案的第二步骤; 验证其间的尺寸误差是否在允许范围内的第三步骤; 以及第四步骤：如果所述尺寸误差在所述容许范围内，则确定所述掩模图案数据; 并且如果尺寸误差不在允许范围内，则通过更新处理参数重复上述步骤，直到尺寸误差变得在允许范围内。

公开(公告)号：US20130126959A1

公开(公告)日：2013-05-23

申请号：US13613473

申请日：2012-09-13

申请人： Ryota Aburada ,  Takashi Obara ,  Toshiya Kotani

发明人： Ryota Aburada ,  Takashi Obara ,  Toshiya Kotani

IPC分类号： H01L27/088 ,  H01L21/302 ,  H01L21/336 ,  H01L29/02

CPC分类号： H01L21/0337 ,  H01L21/32139 ,  H01L27/11582

摘要： According to one embodiment, there are provided a first shaped pattern in which a plurality of first holes are arranged and of which a width is periodically changed along an arrangement direction of the first holes, a second shaped pattern in which a plurality of second holes are arranged and of which a width is periodically changed along an arrangement direction of the second holes, and slits which are formed along the arrangement direction of the first holes and separate the first shaped pattern and the second shaped pattern.

摘要翻译： 根据一个实施例，提供了一种第一成形图案，其中布置多个第一孔并且沿着第一孔的排列方向周期性地改变宽度，第二成形图案中多个第二孔是 沿着第二孔的排列方向周期性地改变宽度，沿着第一孔的排列方向形成并分离第一成形图案和第二成形图案的狭缝。

公开(公告)号：US20140080146A1

公开(公告)日：2014-03-20

申请号：US14113385

申请日：2012-04-25

申请人： Takashi Obara ,  Eiji Inoue

发明人： Takashi Obara ,  Eiji Inoue

IPC分类号： G01N33/68

CPC分类号： G01N33/6896 ,  C12N9/12 ,  C12Y207/10001 ,  G01N2800/2814 ,  G01N2800/2821

摘要： A method for detecting a neurological disease associated with cognitive impairment, wherein the extracellular domain of EphA4 is measured from a biological sample taken from a subject.

摘要翻译： 一种用于检测与认知障碍相关的神经疾病的方法，其中从取自受试者的生物样品测量EphA4的细胞外结构域。

公开(公告)号：US08426142B2

公开(公告)日：2013-04-23

申请号：US12995489

申请日：2009-05-29

申请人： Takashi Obara ,  Sadaaki Mizoguchi

发明人： Takashi Obara ,  Sadaaki Mizoguchi

IPC分类号： G01N33/53

CPC分类号： G01N33/6854 ,  G01N33/6893 ,  G01N2800/347

摘要： There is provided a renal disease testing method comprising a complex detection step of detecting a complex of human uromodulin and human IgA in a sample derived from urine collected from a subject. It is preferred that the renal disease testing method of the invention further comprises a determination step of assessing the whether the renal disease is IgA nephropathy based on the ratio of the amount of the complex detected in the complex detection step to the amount of urinary proteins in the sample. The renal disease testing method of the invention has good detection sensitivity and specificity, and can conveniently and safely assess the existence of a renal disease (preferably, IgA nephropathy).

摘要翻译： 提供了一种肾脏疾病测试方法，其包括在从受试者收集的尿中得到的样品中检测人尿调制蛋白和人IgA的复合物的复合物检测步骤。 优选本发明的肾脏疾病检测方法还包括以下步骤：基于复合物检测步骤检测到的复合物的量与尿蛋白质量的比例来评估肾脏疾病是否为IgA肾病的判定步骤 例子。 本发明的肾病检测方法具有良好的检测灵敏度和特异性，可以方便，安全地评估肾病（优选IgA肾病）的存在。

公开(公告)号：US20110143382A1

公开(公告)日：2011-06-16

申请号：US12995507

申请日：2009-05-29

申请人： Takashi Obara ,  Sadaaki Mizoguchi ,  Osamu Hotta

发明人： Takashi Obara ,  Sadaaki Mizoguchi ,  Osamu Hotta

IPC分类号： G01N33/53

CPC分类号： G01N33/6854 ,  G01N2800/347

摘要： There is provided a renal disease testing method comprising a complex detection step of detecting a complex of an antigen derived from human renal mesangial cells and human IgA in a sample derived from urine collected from a subject. It is preferred that the renal disease testing method of the invention further comprises a determination step of assessing the whether the renal disease is IgA nephropathy based on the ratio of the amount of the complex detected in the complex detection step to the amount of urinary proteins in the sample. The renal disease testing method of the invention has good detection sensitivity and specificity, and can conveniently and safely assess the existence of a renal disease (preferably, IgA nephropathy).

摘要翻译： 提供了一种肾病检测方法，其包括检测来自受试者收集的尿液的样品中衍生自人肾小球系膜细胞和人IgA的抗原的复合物检测步骤。 优选本发明的肾脏疾病检测方法还包括以下步骤：基于复合物检测步骤检测到的复合物的量与尿蛋白质量的比例来评估肾脏疾病是否为IgA肾病的判定步骤 例子。 本发明的肾病检测方法具有良好的检测灵敏度和特异性，可以方便，安全地评估肾病（优选IgA肾病）的存在。

公开(公告)号：US07522510B2

公开(公告)日：2009-04-21

申请号：US10571776

申请日：2005-07-20

申请人： Takeshi Miyazaki ,  Hideyuki Ohyi ,  Takashi Obara

发明人： Takeshi Miyazaki ,  Hideyuki Ohyi ,  Takashi Obara

IPC分类号： G11B7/00

CPC分类号： H01J37/3007 ,  G11B7/0045 ,  G11B7/261 ,  G11B9/10 ,  G11B11/002 ,  H01J2237/3175

摘要： An electron beam applying apparatus includes: a thermal field emission type electron source emitting an electron beam; an electrostatic lens disposed immediately below the electron source and acting as a condensing electrode for condensing the electron beam in a first angular aperture emitted by the electron source in a second angular aperture smaller than the first angular aperture; a condenser lens disposed on a downstream side of the electrostatic lens and condensing the electron beam condensed in the second aperture angel by the electrostatic lens in a crossover point; and an objective lens disposed on a downstream side of the condenser lens and condensing the electron beam condensed in the crossover point by the condenser lens on the surface of the material.

摘要翻译： 电子束施加装置包括：发射电子束的热场发射型电子源; 静电透镜，其设置在电子源的正下方，并且用作聚合电极，用于将电子束在由第一角度孔径小于第一角度孔的电子源中发射的第一角孔中聚集; 聚光透镜，设置在所述静电透镜的下游侧，并且以交叉点将由所述静电透镜聚光的所述第二孔径角中的所述电子束聚光; 以及设置在聚光透镜的下游侧的物镜，并且将聚光透镜在交叉点处会聚的电子束会聚在材料的表面上。

公开(公告)号：US20090059773A1

公开(公告)日：2009-03-05

申请号：US12282306

申请日：2007-03-12

申请人： Takashi Obara ,  Takeshi Miyazaki

发明人： Takashi Obara ,  Takeshi Miyazaki

IPC分类号： G11B9/00

CPC分类号： G11B7/261 ,  G11B9/10 ,  G11B11/03

摘要： An electron beam recording apparatus is disclosed that records information onto the surface of a sample by using an electron beam. The electron beam recording apparatus includes an electron source that irradiates the electron beam, a magnetic detector that is configured to move onto and out of an irradiation axis and acquires magnetic information on the irradiation axis, a convergence position control part that calculates a convergence position correction amount for correcting a convergence position of the electron beam with respect to the surface of the sample based on the magnetic information, and a convergence position adjusting part that adjusts the convergence position of the electron beam with respect to the surface of the sample. The convergence position control part causes the convergence position adjusting part to adjust the convergence position of the electron beam with respect to the surface of the sample based on the convergence position correction amount.

摘要翻译： 公开了一种通过使用电子束将信息记录在样品的表面上的电子束记录装置。 电子束记录装置包括照射电子束的电子源，被配置为移动和移出照射轴的磁检测器，并获取照射轴上的磁信息;会聚位置控制部，其计算会聚位置校正 用于基于磁信息校正电子束相对于样品表面的会聚位置的量;以及会聚位置调整部，其调整电子束相对于样品表面的会聚位置。 会聚位置控制部使会聚位置调整部基于会聚位置校正量来调整电子束相对于面的表面的会聚位置。

公开(公告)号：US20090023863A1

公开(公告)日：2009-01-22

申请号：US11664653

申请日：2005-09-09

申请人： Jun Kanega ,  Takashi Obara ,  Takashi Enokida

发明人： Jun Kanega ,  Takashi Obara ,  Takashi Enokida

IPC分类号： C08F214/26

CPC分类号： C08L27/12 ,  C08K5/14 ,  C08L2205/02 ,  C08L2666/04

摘要： A cross-linked fluorine-containing copolymer moldings applicable to a plasma irradiation step, which is molded as a peroxide cross-linking product of a fluorine-containing copolymer blend comprising a fluorine-containing elastomer copolymer and a fluorine-containing resin copolymer, which is a vinylidene fluoride-tetrafluoroethylene copolymer, both of the copolymers having reaction sites capable of reacting with a common peroxide-based cross-linking agent, respectively, has desired normal state physical properties and compression set value, even if applied to a plasma irradiation step, while reducing particle generation quantity of the fluorine-containing copolymers themselves.

摘要翻译： 一种适用于等离子体照射步骤的交联含氟共聚物成型体，其被模制为包含含氟弹性体共聚物和含氟树脂共聚物的含氟共聚物共混物的过氧化物交联产物，其为 偏氟乙烯 - 四氟乙烯共聚物，即使应用于等离子体照射工序也能够分别具有能够与常用的基于过氧化物的交联剂反应的具有反应部位的共聚物具有期望的正常状态物性和压缩永久变形量， 同时减少含氟共聚物本身的颗粒产生量。

公开(公告)号：US20080222597A1

公开(公告)日：2008-09-11

申请号：US12118578

申请日：2008-05-09

申请人： Koji Hashimoto ,  Tadashito Fujisawa ,  Yuko Kono ,  Takashi Obara

发明人： Koji Hashimoto ,  Tadashito Fujisawa ,  Yuko Kono ,  Takashi Obara

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/30 ,  G03F1/32

摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.

摘要翻译： 一种光掩模，其形成有使用曝光装置转印到基板的图案，所述光掩模包括具有由屏蔽部分或半透明膜围绕并沿着一个方向布置的三个或更多孔图案的图案行和辅助图案包围 通过屏蔽部分或半透明膜并具有纵向方向和纬度方向，辅助图案位于与图案行在与该一个方向正交的方向上特定距离处，辅助图案的纵向方向基本上平行于 一个方向，辅助图案的纵向长度等于或大于图案行的纵向长度，辅助图案不被转印到基底。