公开(公告)号：US6151350A

公开(公告)日：2000-11-21

申请号：US155184

申请日：1998-09-22

Applicant: Hiroshi Komori ,  Yoshiho Amada ,  Osamu Wakabayashi

Inventor： Hiroshi Komori ,  Yoshiho Amada ,  Osamu Wakabayashi

IPC: H01S3/041 ,  H01S3/036 ,  H01S3/134 ,  H01S3/22

CPC classification number: H01S3/036

Abstract: A gas laser outputs a prescribed high power from the start of laser oscillation immediately after the laser gas is changed. The laser, in which used laser gas in a laser chamber (1) is replaced with a fresh laser gas, is provided with: a gas leaving means, which leaves a prescribed amount of used gas for mixing with the fresh laser gas during laser gas replacement, or an impurity gas adding means which provides a prescribed amount of impurity gas for mixing with the fresh laser gas; and a controller (11). It is preferable that the concentration of the used gas after a replacement is within a range of 1.5-60%. The gas leaving means can be a gas discharge control mechanism (10), which controls the amount of used gas exhausted so that a prescribed amount of used gas can be left for mixing with the fresh gas, or a laser gas container (21), which can provide a prescribed amount of stored used gas for mixing with the fresh gas. The impurity gas adding means can be a laser gas cylinder containing a prescribed concentration of impurity gas or an impurity gas container (44).

Abstract translation: PCT No.PCT / JP97 / 00845 Sec。 371日期：1998年9月22日 102（e）1998年9月22日PCT 1997年3月17日PCT公布。 公开号WO97 / 36352 日期1997年10月2日气体激光器在激光气体变化后立即从激光振荡开始输出规定的高功率。 在激光室（1）中使用的激光气体被新鲜的激光气体代替的激光器设置有：气体离开装置，其在激光气体期间留下规定量的用于与新鲜激光气体混合的废气 替换或杂质气体添加装置，其提供规定量的用于与新鲜激光气体混合的杂质气体; 和控制器（11）。 更换后的废气浓度优选在1.5〜60％的范围内。 气体离开装置可以是气体排出控制机构（10），其控制排出的废气量使得可以留出规定量的废气与新鲜气体混合，或者激光气体容器（21）， 其可以提供规定量的用于与新鲜气体混合的用过的二氧化碳。 杂质气体添加装置可以是含有规定浓度的杂质气体或杂质气体容器（44）的激光气瓶。

公开(公告)号：US5710787A

公开(公告)日：1998-01-20

申请号：US446858

申请日：1995-06-05

Applicant: Yoshiho Amada ,  Osamu Wakabayashi ,  Noritoshi Ito

Inventor： Yoshiho Amada ,  Osamu Wakabayashi ,  Noritoshi Ito

IPC: H01L21/027 ,  B23K26/00 ,  H01S3/104 ,  H01S3/13 ,  H01S3/134 ,  H01S3/225 ,  H01S3/10

CPC classification number: H01S3/134 ,  H01S3/13

Abstract: An object is to perform controlling operation always accurately to eliminate a spiking phenomenon generated in a laser device. In an output controller (6), excitation intensity data causing energies of continual pulses to be set to have a desired identical value is previously stored in association with the respective continual pulses. In an output monitor (5), the energies of the oscillated pulses are detected. And detected values of energies of pulses in a continual pulse oscillation already done are compared with a desired pulse energy value and previously-stored charging voltages associated with the respective pulses are corrected in the output controller (6) on the basis of the comparison result. When the present invention is applied to control of an output of a light source in an aligner, an accuracy of control of exposure light can be remarkabley improved.

Abstract translation: PCT No.PCT / JP94 / 01601 Sec。 371日期：1995年6月5日 102（e）日期1995年6月5日PCT 1994年9月28日PCT公布。 第WO95 / 10131号公报 日期1995年04月13日目的是总是精确地执行控制操作，以消除在激光装置中产生的尖峰现象。 在输出控制器（6）中，与相应的连续脉冲相关联地预先存储使连续脉冲的能量被设定为具有期望的相同值的激励强度数据。 在输出监视器（5）中，检测振荡脉冲的能量。 并且将已经完成的连续脉冲振荡中的脉冲的能量的检测值与期望的脉冲能量值进行比较，并且基于比较结果在输出控制器（6）中校正与各个脉冲相关联的预先存储的充电电压。 当本发明应用于对准器中的光源的输出的控制时，可以显着提高曝光光的控制精度。

公开(公告)号：US5373523A

公开(公告)日：1994-12-13

申请号：US136448

申请日：1993-10-14

Applicant: Junichi Fujimoto ,  Hakaru Mizoguchi ,  Yoshiho Amada ,  Osamu Wakabayashi

Inventor： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Yoshiho Amada ,  Osamu Wakabayashi

IPC: H01S3/034 ,  H01S3/036 ,  H01S3/225 ,  H01S3/22

CPC classification number: H01S3/0346 ,  H01S3/036 ,  H01S3/225

Abstract: An excimer laser apparatus is provided with a compact high efficiency dust particle removal means which is capable of maintaining the windows clean with only a small volume of purging gas, and which prevents deterioration of aperture masks without having to increase the cavity length or risking the possibility of leakage from piping connections. The excimer laser apparatus uses, as dust particle removal means, filters (13a and 13b) made of metal or ceramic which is non-reactive with fluorine. A ground potential dust collector can be provided at a downstream side of a static dust particle remover, having an anode and a cathode, for collecting any dust particles which have passed through the static dust particle remover. In addition, clean laser medium gas can be introduced into subchambers (14a and 14b) through gas introducing passages (11a and 11b) provided in the walls of the housing (1) and then into the laser chamber (12) through labyrinths (8a and 8b) without disturbing the clean gas which stays near the internal surfaces of the windows (6a and 6b).

Abstract translation: 准分子激光装置设置有紧凑的高效除尘装置，其能够仅利用少量清洗气体来保持窗户清洁，并且防止孔径掩模的劣化，而不必增加空腔长度或冒着可能性 从管道连接泄漏。 准分子激光装置使用与氟反应的金属或陶瓷制成的过滤器（13a，13b）作为除尘装置。 可以在具有阳极和阴极的静电除尘器的下游侧设置地电位集尘器，用于收集通过静电除尘器的任何灰尘颗粒。 此外，可以通过设置在壳体（1）的壁中的气体引入通道（11a和11b）将干净的激光介质气体引入到子室（14a和14b）中，然后通过迷宫（8a和8a）进入激光室 8b），而不干扰保持在窗口（6a和6b）的内表面附近的清洁气体。

公开(公告)号：US6008497A

公开(公告)日：1999-12-28

申请号：US29218

申请日：1998-02-25

Applicant: Hakaru Mizoguchi ,  Osamu Wakabayashi ,  Yukio Kobayashi ,  Yoshiho Amada ,  Tatsuo Mimura

Inventor： Hakaru Mizoguchi ,  Osamu Wakabayashi ,  Yukio Kobayashi ,  Yoshiho Amada ,  Tatsuo Mimura

IPC: B23K26/03 ,  B23K26/06 ,  B23K26/42 ,  G03F7/20 ,  H01S3/134 ,  H01S3/225 ,  B23K26/00

CPC classification number: G03F7/70041 ,  B23K26/03 ,  B23K26/06 ,  B23K26/702 ,  G03F7/70025 ,  H01S3/134 ,  H01S3/225

Abstract: A laser apparatus comprises storage means for storing a power source voltage of each pulse at the time of continuous pulse oscillation for one cycle, with each voltage correlated with an identifier which specifies the respective pulse, and output control means for, when a pulse is generated, reading from the storage means the source voltage of a pulse having the same identifier, and performing pulse oscillation on the basis of the source voltage. Thus the influence of the spiking phenomenon during a burst mode operation is eliminated as much as possible, and thereby the accuracy of laser beam machining is still more improved.

Abstract translation: PCT No.PCT / JP96 / 02820 Sec。 371日期：1998年2月25日 102（e）1998年2月25日PCT PCT 1996年9月27日PCT公布。 公开号WO97 / 11810PC。 日期1997年04月3日激光装置包括存储装置，用于在连续脉冲振荡时存储每个脉冲的电源电压一个周期，其中每个电压与指定相应脉冲的标识符相关，以及输出控制装置， 当产生脉冲时，从存储装置读取具有相同标识符的脉冲的源电压，并且基于源电压执行脉冲振荡。 因此，尽可能地消除了在突发模式操作期间的尖峰现象的影响，从而仍然进一步提高了激光束加工的精度。

公开(公告)号：US5463650A

公开(公告)日：1995-10-31

申请号：US365323

申请日：1994-12-28

Applicant: Noritoshi Ito ,  Yoshiho Amada ,  Osamu Wakabayashi

Inventor： Noritoshi Ito ,  Yoshiho Amada ,  Osamu Wakabayashi

IPC: G03F7/20 ,  H01S3/134 ,  H01S3/225 ,  H01S3/22

CPC classification number: H01S3/134 ,  H01S3/225

Abstract: An apparatus used for elimination of the influence of spiking in an excimer laser device. The values of predetermined parameters which contribute to the spiking such as oscillation suspension time in a successive pulse oscillation are obtained. Discharge voltage for each of the successive laser beam pulses is changed on the basis of the obtained parameter values such that subsequent successive laser beam pulses have the same energy. The discharge voltage is stored according to time elapsed after the start of the successive pulse oscillation, and discharge voltage is controlled such that stored discharge voltage corresponds to the measured elapsed time. During the time when a stepper is not performing processing using the laser beam, the laser beam pulse is oscillated under predetermined conditions and the energy of the resulting pulses is detected. The stored discharge voltage is corrected on the basis of the detected magnitude of the pulse energy, a desired magnitude of the pulse energy and the predetermined conditions. The discharge voltage is controlled such that the corrected discharge voltage is obtained during the time when the stepper performs the processing using the laser beam.

Abstract translation: 用于消除在准分子激光装置中尖峰的影响的装置。 获得有助于尖峰的预定参数的值，例如连续脉冲振荡中的振荡停止时间。 基于获得的参数值改变每个连续激光束脉冲的放电电压，使得后续的连续的激光束脉冲具有相同的能量。 放电电压根据连续脉冲振荡开始后经过的时间进行存储，并且控制放电电压，使得存储的放电电压对应于测量的经过时间。 在步进器不使用激光束进行处理的时间期间，激光束脉冲在预定条件下振荡，并且检测所得到的脉冲的能量。 基于检测到的脉冲能量的大小，脉冲能量的期望幅度和预定条件来校正存储的放电电压。 控制放电电压，使得在步进器使用激光束进行处理的时间期间获得校正的放电电压。

公开(公告)号：US4975919A

公开(公告)日：1990-12-04

申请号：US296120

申请日：1988-11-17

Applicant: Yoshiho Amada ,  Osamu Wakabayashi ,  Masahiko Kowaka

Inventor： Yoshiho Amada ,  Osamu Wakabayashi ,  Masahiko Kowaka

IPC: H01L21/30 ,  H01L21/027 ,  H01S3/106 ,  H01S3/137 ,  H01S3/225

CPC classification number: H01S3/137 ,  H01S3/225

Abstract: According to present invention, the central wavelength of the central wave of the output laser beam, and the sideband wave power or central wave power of the output laser beam are detected, and the wavelength selective characteristics of wavelength selective elements disposed between a laser chamber and a rear mirror are controlled such that the detected central wavelength falls within a desired allowable range and that the detected power becomes minimum or maximum.

Abstract translation: PCT No.PCT / JP88 / 00293 Sec。 371日期：1988年11月17日 102（e）日期1988年11月17日PCT提交1988年3月18日PCT公布。 出版物WO88 / 07276 日期为1988年9月22日。根据本发明，检测输出激光束的中心波的中心波长，输出激光束的边带波功率或中心波功率，波长选择性波长选择特性 控制设置在激光室和后反射镜之间的元件，使得所检测的中心波长落在所需的容许范围内，并且检测的功率变为最小或最大。

公开(公告)号：US6101211A

公开(公告)日：2000-08-08

申请号：US945219

申请日：1997-10-01

Applicant: Osamu Wakabayashi ,  Hiroshi Komori ,  Hakaru Mizoguchi

Inventor： Osamu Wakabayashi ,  Hiroshi Komori ,  Hakaru Mizoguchi

IPC: H01S3/1055 ,  H01S3/225 ,  H01S3/08

CPC classification number: H01S3/225 ,  H01S3/1055

Abstract: A narrow-band laser apparatus comprising a laser generating section having laser activity and capable of generating laser beam; bandwidth narrowing section which is provided on one end side of the laser generating section on the optical axis of the laser beam generated in the laser generating section to narrow the bandwidth of the laser beam by means of at least one angel-dispersion wavelength selection element, fold back the laser beam in the narrowed band and output the folded laser beam toward the laser generating section; beam folding section which is provided on the other end of the laser generating section on the optical axis of the laser beam generated in the laser generating section to fold back the input laser beam and reflect the folded laser beam into the laser generating section; and a laser beam branching unit which is provided between the laser generating section and the bandwidth narrowing section to permit part of the laser beam input from the laser generating section to pass therethrough into the bandwidth narrowing section while deflecting the remaining part of the laser beam and drawing out the same as an output beam. The laser apparatus is constructed so that the light which has passed straight through the laser beam branching unit is input into the bandwidth narrowing section, thereby stabilizing a resonance system to eliminate multiwavelength oscillation accompanying the vibration.

Abstract translation: PCT No.PCT / JP96 / 00921 Sec。 371日期：1997年10月1日 102（e）1997年10月1日PCT PCT 1996年4月3日PCT公布。 第WO96 / 31929号公报 日期：1996年10月10日一种窄带激光装置，包括具有激光活动并能产生激光束的激光发生部分; 带宽窄化部，其在激光发生部生成的激光的光轴上设置在激光发生部的一端侧，通过至少一个角度分散型波长选择元件使激光束的带宽变窄， 折叠在窄带中的激光束并将折叠的激光束输出到激光产生部分; 光束折叠部分，其设置在激光产生部分的另一端上，在激光产生部分中产生的激光束的光轴上折回输入的激光束并将折叠的激光束反射到激光产生部分中; 以及激光束分支单元，其设置在激光产生部分和带宽窄化部分之间，以允许从激光产生部分输入的激光束的一部分通过其进入带宽窄化部分，同时偏转激光束的剩余部分， 绘出与输出光束相同的图像。 激光装置被构造成使直接穿过激光束分支单元的光被输入到带宽窄化部分中，从而稳定谐振系统以消除伴随振动的多波长振荡。

公开(公告)号：US09647415B2

公开(公告)日：2017-05-09

申请号：US14602208

申请日：2015-01-21

Applicant: Hiroaki Tsushima ,  Osamu Wakabayashi ,  Takashi Matsunaga

Inventor： Hiroaki Tsushima ,  Osamu Wakabayashi ,  Takashi Matsunaga

IPC: H01S3/10 ,  H01S3/00 ,  H01S3/097 ,  H01S3/08 ,  H01S3/0971 ,  H01S3/23

CPC classification number: H01S3/09702 ,  H01S3/0014 ,  H01S3/08009 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/2366

Abstract: A laser apparatus according to embodiment may include: a laser chamber filled with a laser gain medium; a pair of electrodes disposed in the laser chamber; a charger configured to apply a charge voltage for causing a discharge to occur between the pair of the electrodes; a pulse power module configured to covert the charge voltage applied by the charger into a short pulsed voltage, and apply the short pulsed voltage between the pair of the electrodes; and a controller configured to calculate input energies Ein applied to the pair of the electrodes based on the charge voltage, calculate an integration value Einsum of the input energies Ein by integrating the calculated input energies Ein, and determine whether the integration value Einsum exceeds an integration lifetime value Einsumlife of input energy or not.

公开(公告)号：US09257809B2

公开(公告)日：2016-02-09

申请号：US13401734

申请日：2012-02-21

Applicant: Hidenori Watanabe ,  Hiroshi Tanaka ,  Osamu Wakabayashi

Inventor： Hidenori Watanabe ,  Hiroshi Tanaka ,  Osamu Wakabayashi

IPC: H01S3/223 ,  H01S3/03 ,  H01S3/134 ,  H01S3/23 ,  H01S3/036 ,  G03F7/20

CPC classification number: H01S3/03 ,  G03F7/70025 ,  H01S3/036 ,  H01S3/134 ,  H01S3/2316 ,  H01S3/2366

Abstract: A laser device for an exposure apparatus may include: a MOPA-type or MOPO-type laser device including a seed laser and at least one gas discharge-pumped amplifier stage that receives output light from the seed laser as an input, amplifies the light, and outputs the amplified light; and at least one of a laser gas control device that at least changes the total pressure of a laser gas in said amplifier stage in accordance with requested energy and a laser power source control device that at least changes pump intensity of discharge electrodes in said amplifier stage in accordance with said requested energy, in a case where the energy of laser output light from said laser device is to be changed discontinuously in response to a request from an exposure apparatus.

Abstract translation: 用于曝光装置的激光装置可以包括：MOPA型或MOPO型激光装置，其包括种子激光器和至少一个气体放电泵浦放大器级，其接收来自种子激光器的输出光作为输入，放大光， 并输出放大的光; 以及激光气体控制装置中的至少一个，所述激光气体控制装置至少根据所要求的能量来改变所述放大器级中的激光气体的总压力，激光电源控制装置至少改变放大器级中的放电电极的泵浦强度 根据所述要求的能量，在来自所述激光装置的激光输出光的能量将根据来自曝光装置的请求而不连续地改变的情况下。

公开(公告)号：US09046651B2

公开(公告)日：2015-06-02

申请号：US13696528

申请日：2011-12-29

Applicant: Hiroshi Someya ,  Yukio Watanabe ,  Katsuhiko Wakana ,  Osamu Wakabayashi

Inventor： Hiroshi Someya ,  Yukio Watanabe ,  Katsuhiko Wakana ,  Osamu Wakabayashi

IPC: G02B7/182 ,  G02B7/18 ,  G03F7/20

CPC classification number: G02B7/181 ,  G02B5/0891 ,  G02B5/10 ,  G03F7/70033 ,  G03F7/70175

Abstract: A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.

Abstract translation: 反射镜装置可以包括：反射镜，包括基板，在基板的第一表面上的反射膜，以及在基板的第二表面上的多个第一突起; 多个用于分别支撑多个第一突起的支撑部分，每个支撑部分具有形成在其中的槽，用于引导第一突起; 以及多个夹具，用于分别将多个第一突起抵靠在多个支撑部分中的相应凹槽上。