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    FILM FORMATION DEVICE
    4.
    发明申请
    FILM FORMATION DEVICE 审中-公开
    胶片形成装置

    公开(公告)号：US20130247820A1

    公开(公告)日：2013-09-26

    申请号：US13990641

    申请日：2011-03-15

    申请人： Hiroyuki Orita ,  Takahiro Shirahata ,  Akio Yoshida

    发明人： Hiroyuki Orita ,  Takahiro Shirahata ,  Akio Yoshida

    IPC分类号： H01L31/18

    CPC分类号： H01L31/1876 ,  B05B1/04 ,  B05B7/0012 ,  B05B7/0416 ,  B05B7/0458 ,  C23C16/4486 ,  C23C16/45514 ,  C23C16/45595

    摘要： An object of the present invention is to provide a film formation device that is able to prevent a size increase in a configuration around a mist jet nozzle while maintaining uniform spouting of a mist to a substrate on which a film is to be formed. The present invention includes a mist generator (2) that generates a mist of a raw material of a film to be formed, and a mist jet nozzle (1) that jets the mist generated by the mist generator to a substrate on which a film is to be formed. The mist jet nozzle includes: a main body (1A) having a hollow portion (1H); a mist supply port (5a) that supplies the mist; a spout (8) that jets the mist to the outside; a carrier gas supply port (6a) that supplies a carrier gas; and a shower plate (7) having a plurality of holes (7a) formed therein. By the arrangement of the shower plate, the hollow portion is divided into a first space (1S) connected to the carrier gas supply port and a second space (1T) connected to the spout. The mist supply port is connected to the second space.

    摘要翻译： 本发明的目的是提供一种成膜装置，其能够防止喷雾喷嘴周围的构造的尺寸增大，同时保持喷雾到将要形成膜的基板上的均匀喷射。 本发明包括产生要形成的膜的原料雾的雾发生器（2）和将由雾发生器产生的雾喷射到其上的膜的喷雾喷嘴（1） 要形成 雾喷嘴包括：具有中空部分（1H）的主体（1A）; 供给雾的雾供给口（5a） 喷雾器（8）将雾气喷射到外面; 供给载气的载气供给口（6a） 和具有形成在其中的多个孔（7a）的喷淋板（7）。 通过喷淋板的布置，中空部被分成连接到载气供给口的第一空间（1S）和连接到喷口的第二空间（1T）。 雾供应端口连接到第二个空间。

    Film formation device
    5.
    发明授权
    Film formation device 有权

    公开(公告)号：US10121931B2

    公开(公告)日：2018-11-06

    申请号：US13990641

    申请日：2011-03-15

    申请人： Hiroyuki Orita ,  Takahiro Shirahata ,  Akio Yoshida

    发明人： Hiroyuki Orita ,  Takahiro Shirahata ,  Akio Yoshida

    IPC分类号： B05B7/04 ,  C23C16/448 ,  C23C16/455 ,  H01L31/18 ,  B05B1/04 ,  B05B7/00

    摘要： The present invention includes a mist generator that generates a mist of a raw material of a film to be formed, and a mist jet nozzle that jets the mist generated by the mist generator to a substrate on which a film is to be formed. The mist jet nozzle includes: a main body having a hollow portion; a mist supply port that supplies the mist; a spout that jets the mist to the outside; a carrier gas supply port that supplies a carrier gas; and a shower plate having a plurality of holes formed therein. By the arrangement of the shower plate, the hollow portion is divided into a first space connected to the carrier gas supply port and a second space connected to the spout. The mist supply port is connected to the second space.

    APPARATUS FOR FORMING METAL OXIDE FILM, METHOD FOR FORMING METAL OXIDE FILM, AND METAL OXIDE FILM
    7.
    发明申请
    APPARATUS FOR FORMING METAL OXIDE FILM, METHOD FOR FORMING METAL OXIDE FILM, AND METAL OXIDE FILM 有权
    用于形成金属氧化物膜的方法，形成金属氧化物膜的方法和金属氧化物膜

    公开(公告)号：US20130039843A1

    公开(公告)日：2013-02-14

    申请号：US13643380

    申请日：2010-06-01

    申请人： Takahiro Shirahata ,  Hiroyuki Orita ,  Akio Yoshida ,  Shizuo Fujita ,  Toshiyuki Kawaharamura

    发明人： Takahiro Shirahata ,  Hiroyuki Orita ,  Akio Yoshida ,  Shizuo Fujita ,  Toshiyuki Kawaharamura

    IPC分类号： C23C16/06 ,  C01B13/00 ,  C23C16/02

    CPC分类号： C23C16/407 ,  C23C18/1216 ,  C23C18/1279 ,  C23C18/1287 ,  C23C18/1291

    摘要： A film forming apparatus (100) according to one embodiment of the present invention includes a first solution container (5A), a second solution container (5B), a reaction chamber (1), a first path (L1), and a second path (L2). The first solution container (5A) stores a source solution (10) containing metal. The second solution container (5B) stores hydrogen peroxide. A substrate (2) is disposed in the reaction chamber (1), and the reaction chamber (1) includes a heating unit (3) that heats the substrate. The first path (L1) supplies a source solution (11) from the first solution container (5A) to the reaction chamber (1). The second path (L2) supplies hydrogen peroxide from the second solution container (5B) to the reaction chamber (1).

    摘要翻译： 根据本发明的一个实施方案的成膜设备（100）包括第一溶液容器（5A），第二溶液容器（5B），反应室（1），第一路径（L1）和第二路径 （L2）。 第一溶液容器（5A）存储含有金属的源溶液（10）。 第二溶液容器（5B）存储过氧化氢。 基板（2）设置在反应室（1）中，反应室（1）包括加热基板的加热单元（3）。 第一路径（L1）将源解决方案（11）从第一溶液容器（5A）供应到反应室（1）。 第二路径（L2）从第二溶液容器（5B）向反应室（1）供应过氧化氢。