公开(公告)号：US20240116074A1

公开(公告)日：2024-04-11

申请号：US18528554

申请日：2023-12-04

申请人： Nova Engineering Films, Inc.

发明人： Sang In LEE

IPC分类号： B05D1/02 ,  B05B7/16 ,  B05D3/14 ,  C23C16/455 ,  C23C18/12 ,  C23C18/14 ,  H05H1/00 ,  H05H1/42

CPC分类号： B05D1/025 ,  B05B7/16 ,  B05D3/142 ,  B05D3/145 ,  C23C16/455 ,  C23C18/1287 ,  C23C18/14 ,  H05H1/00 ,  H05H1/42 ,  B05B13/041 ,  B05D2401/00 ,  B05D2401/90

摘要： Embodiments relate to surface treating a substrate, spraying precursor onto the substrate using supercritical carrier fluid, and post-treating the substrate sprayed with the precursor to form a layer with nanometer thickness of material on the substrate. A spraying assembly for spraying the precursor includes one or more spraying modules and one or more radical injectors at one or more sides of the spraying module. A differential spread mechanism is provided between the spraying module and the radical injectors to inject spread gas that isolates the sprayed precursor and radicals generated by the radical injectors. As relative movement between the substrate and the spraying assembly is made, portions of the substrate is exposed to first radicals, sprayed with precursors either one of the spraying modules or both spraying modules using supercritical carrier fluid, and then exposed to second radicals again.

公开(公告)号：US20160047049A1

公开(公告)日：2016-02-18

申请号：US14925498

申请日：2015-10-28

申请人： TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION ,  KYOTO UNIVERSITY

发明人： Takahiro SHIRAHATA ,  Hiroyuki ORITA ,  Akio YOSHIDA ,  Shizuo FUJITA ,  Toshiyuki KAWAHARAMURA

IPC分类号： C23C18/12

CPC分类号： C23C16/407 ,  C23C18/1216 ,  C23C18/1279 ,  C23C18/1287 ,  C23C18/1291

摘要： A method for forming a metal oxide film, the method including: forming a source solution containing metal into a mist, heating a substrate, supplying the source solution formed into a mist onto a first main surface of the substrate through a first supply path, and supplying hydrogen peroxide through a second path different from the first supply path onto the first main surface of the substrate, where the method further includes, in the following order, preliminarily preparing data showing a relationship among a molar ratio of an amount of the hydrogen peroxide to an amount of the zinc in the source solution, a carrier concentration of the metal oxide film, and a mobility of the metal oxide film, determining an amount of the hydrogen peroxide supplied with the data, and supplying the determined amount of the hydrogen peroxide through the second path onto the first main surface of the substrate.

摘要翻译： 一种形成金属氧化物膜的方法，该方法包括：将含有金属的源溶液形成为雾状，加热基板，通过第一供给路径将形成为雾的源溶液供给到基板的第一主表面，以及 将不同于第一供给路径的第二路径的过氧化氢供给到基板的第一主面上，其中，以下述顺序还可以预先准备表示二氧化碳的摩尔比的数据的数据 相对于源溶液中的锌的量，金属氧化物膜的载流子浓度和金属氧化物膜的迁移率，确定供给数据的过氧化氢量，并供给确定量的过氧化氢 通过第二路径到达基板的第一主表面。

公开(公告)号：US20140356546A1

公开(公告)日：2014-12-04

申请号：US14451422

申请日：2014-08-04

申请人： Lutz Rebstock ,  Klaus Conrad Wolke

发明人： Lutz Rebstock ,  Klaus Conrad Wolke

IPC分类号： B05D3/06 ,  B05D1/28

CPC分类号： B05D3/06 ,  B05C1/025 ,  B05C1/0808 ,  B05C1/10 ,  B05D1/28 ,  B05D3/0263 ,  B05D2252/10 ,  C23C18/02 ,  C23C18/1204 ,  C23C18/1283 ,  C23C18/1287 ,  C23C18/1291 ,  H01L31/068 ,  H01L31/1804 ,  H01L31/1868 ,  Y02E10/547 ,  Y02P70/521

摘要： Methods and apparatuses for a deposition system are provided to deposit a thin coating layer on flat substrates, such as semiconductors or panels. In an embodiment, liquid supplied rollers accepting liquid media provide liquid chemicals to the substrates for coating the substrates. The liquid delivery system can control the flow and the pressure of the liquid to achieve optimum process condition with minimum excess waste. In another embodiment, rollers with non-uniform distribution of liquid media provide a non-uniform thickness profile on the substrates, which can be used to compensate for the non-uniformity of subsequent processes.

公开(公告)号：US20100137128A1

公开(公告)日：2010-06-03

申请号：US12527770

申请日：2008-02-13

申请人： Anett Berndt ,  Florian Eder ,  Rudolf Gensler ,  Heinrich Zeininger

发明人： Anett Berndt ,  Florian Eder ,  Rudolf Gensler ,  Heinrich Zeininger

IPC分类号： B01J21/06 ,  C09C1/36 ,  C01G23/047 ,  B01J21/02 ,  B01J31/02

CPC分类号： C01G23/047 ,  B01J21/063 ,  B01J35/1014 ,  B01J35/1019 ,  B01J37/0215 ,  B82Y30/00 ,  C01P2004/03 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C03C1/008 ,  C03C17/007 ,  C03C2217/477 ,  C03C2217/71 ,  C03C2218/113 ,  C09C1/3684 ,  C09D1/00 ,  C23C18/1216 ,  C23C18/1225 ,  C23C18/127 ,  C23C18/1287

摘要： A thermocatalytically active titanium dioxide coating has a high BET surface area. With this coating, a catalytic effect can be achieved with only moderately increased temperatures (>200 DEG C.).

摘要翻译： 热分解活性二氧化钛涂层具有高的BET表面积。 使用这种涂层，只有适度升高的温度（> 200℃）才能实现催化效果。

公开(公告)号：US06383555B1

公开(公告)日：2002-05-07

申请号：US09615373

申请日：2000-07-13

申请人： Shinichiro Hayashi ,  Larry D. McMillan ,  Carlos A. Paz de Araujo

发明人： Shinichiro Hayashi ,  Larry D. McMillan ,  Carlos A. Paz de Araujo

IPC分类号： B05D512

CPC分类号： H01L21/31691 ,  B05D1/00 ,  B05D1/60 ,  B05D3/0493 ,  B05D3/062 ,  B05D3/065 ,  C23C8/10 ,  C23C16/4412 ,  C23C16/4486 ,  C23C16/45561 ,  C23C16/4558 ,  C23C16/46 ,  C23C16/482 ,  C23C16/52 ,  C23C18/12 ,  C23C18/1216 ,  C23C18/1287 ,  C23C18/1291 ,  C23C18/14 ,  C23C26/02 ,  C30B7/00 ,  C30B7/005 ,  C30B29/68 ,  H01L21/02197 ,  H01L21/02282 ,  H01L21/02348 ,  H01L27/11502 ,  H01L28/55 ,  H01L28/56 ,  H01L28/60 ,  H01L41/314 ,  H05K3/105 ,  Y10S427/101

摘要： A substrate is located within a deposition chamber, the substrate defining a substrate plane. A liquid precursor is misted by ultrasonic or venturi apparatus, to produce a colloidal mist. The mist is generated, allowed to settle in a buffer chamber, filtered through a system up to 0.01 micron, and flowed into the deposition chamber between the substrate and barrier plate to deposit a liquid layer on the substrate. The liquid is dried to form a thin film of solid material on the substrate, which is then incorporated into an electrical component of an integrated circuit.

摘要翻译： 衬底位于沉积室内，衬底限定衬底平面。 液体前体被超声波或文氏管装置迷雾，产生胶体雾。 产生雾，允许沉淀在缓冲室中，通过高达0.01微米的系统过滤，并流入基板和阻挡板之间的沉积室，以在基板上沉积液体层。 将液体干燥以在基板上形成固体材料的薄膜，然后将其并入集成电路的电气部件中。

公开(公告)号：US11865572B2

公开(公告)日：2024-01-09

申请号：US17192461

申请日：2021-03-04

申请人： Nova Engineering Films, Inc.

发明人： Sang In Lee

IPC分类号： H05H1/42 ,  C23C16/455 ,  H01J37/32 ,  B05D1/02 ,  B05B7/16 ,  B05D3/14 ,  H05H1/00 ,  C23C8/14 ,  C23C18/12 ,  B05B13/04

CPC分类号： B05D1/025 ,  B05B7/16 ,  B05D3/142 ,  B05D3/145 ,  C23C8/14 ,  C23C16/455 ,  C23C18/1287 ,  H05H1/00 ,  H05H1/42 ,  B05B13/041 ,  B05B13/0405 ,  B05D2401/00 ,  B05D2401/90 ,  C23C16/45551 ,  H01J37/32449 ,  B05D2401/00 ,  B05D2401/90

摘要： Embodiments relate to surface treating a substrate, spraying precursor onto the substrate using supercritical carrier fluid, and post-treating the substrate sprayed with the precursor to form a layer with nanometer thickness of material on the substrate. A spraying assembly for spraying the precursor includes one or more spraying modules and one or more radical injectors at one or more sides of the spraying module. A differential spread mechanism is provided between the spraying module and the radical injectors to inject spread gas that isolates the sprayed precursor and radicals generated by the radical injectors. As relative movement between the substrate and the spraying assembly is made, portions of the substrate is exposed to first radicals, sprayed with precursors either one of the spraying modules or both spraying modules using supercritical carrier fluid, and then exposed to second radicals again.

公开(公告)号：US09180429B2

公开(公告)日：2015-11-10

申请号：US14381979

申请日：2013-02-25

申请人： INVENTRAM FIKRI MULKIYET HAKLARI YONETIM TICARET VE YATIRIM ANONIM SIRKETI

发明人： Ayse Senatalar ,  Melkon Tatlier

IPC分类号： B01J20/00 ,  B01J20/32 ,  C23C18/12 ,  C23C18/14 ,  B01J19/08 ,  C23C18/00

CPC分类号： B01J20/3238 ,  B01J19/087 ,  B01J2219/085 ,  C23C18/12 ,  C23C18/1212 ,  C23C18/1287 ,  C23C18/1291 ,  C23C18/14

摘要： The present invention relates to a zeolite coating preparation assembly (1) and operation method wherein zeolite adsorbents are coated by crystallization process on various surfaces heated by induction. The objective of the present invention is to provide a zeolite coating preparation assembly (1) and operation method; by which time saving is achieved owing to heating by induction, material saving is achieved since large heating resistances and complicated reactors are not used; and which is thus more economical; and wherein thicker and more stable coatings with high diffusion coefficients are prepared by using a more practical reaction system in a shorter period of time in comparison to the known methods, and wherein mass production is enabled.

摘要翻译： 本发明涉及一种沸石涂料制备组合物（1）及其操作方法，其中沸石吸附剂通过结晶过程涂覆在通过感应加热的各种表面上。 本发明的目的是提供一种沸石涂料制备组合物（1）和操作方法; 由于通过感应加热实现了节省，由于不使用大的耐热性和复杂的反应器，因此节省了材料; 因此更经济; 并且其中与已知方法相比，通过使用更实际的反应体系在更短的时间内制备具有高扩散系数的更厚和更稳定的涂层，并且其中批量生产是可以实现的。

公开(公告)号：US08715537B2

公开(公告)日：2014-05-06

申请号：US12885317

申请日：2010-09-17

申请人： Kyle L. Fujdala ,  Wayne A. Chomitz ,  Zhongliang Zhu ,  Matthew C. Kuchta

发明人： Kyle L. Fujdala ,  Wayne A. Chomitz ,  Zhongliang Zhu ,  Matthew C. Kuchta

IPC分类号： H01B1/04 ,  B32B15/20 ,  H01L21/02

CPC分类号： C07F5/00 ,  C09D11/03 ,  C23C16/305 ,  C23C18/1204 ,  C23C18/1241 ,  C23C18/1287

摘要： This invention relates to compounds and compositions used to prepare semiconductor and optoelectronic materials and devices. This invention provides a range of compounds, compositions, materials and methods directed ultimately toward photovoltaic applications, as well as devices and systems for energy conversion, including solar cells. In particular, this invention relates to molecular precursor compounds, precursor materials and methods for preparing photovoltaic layers and thin films thereof.

摘要翻译： 本发明涉及用于制备半导体和光电子材料和器件的化合物和组合物。 本发明提供一系列最终指向光伏应用的化合物，组合物，材料和方法，以及用于能量转换的装置和系统，包括太阳能电池。 特别地，本发明涉及分子前体化合物，前体材料以及制备光伏层及其薄膜的方法。

公开(公告)号：US20140042440A1

公开(公告)日：2014-02-13

申请号：US14058403

申请日：2013-10-21

申请人： Industrial Technology Research Institute

发明人： Wen-Ching SUN ,  Tzer-Shen LIN ,  Sheng-Min YU

IPC分类号： H01L31/0216 ,  H01L21/02 ,  H01L29/06

CPC分类号： H01L31/02167 ,  C23C18/1216 ,  C23C18/1245 ,  C23C18/1258 ,  C23C18/1287 ,  C23C18/1291 ,  H01L21/02178 ,  H01L21/02282 ,  H01L29/0607 ,  H01L29/2003 ,  H01L29/66462 ,  H01L31/022425 ,  H01L31/068 ,  H01L31/1868 ,  H01L33/44 ,  Y02E10/547 ,  Y02P70/521

摘要： A passivation layer structure of a semiconductor device is provided, which includes a passivation layer formed of halogen-doped aluminum oxide and disposed on a semiconductor layer on a substrate, in which the semiconductor layer includes indium gallium zinc oxide (IGZO) or nitride-based III-V compounds. A method for forming the passivation layer structure of a semiconductor device is also disclosed.

摘要翻译： 提供半导体器件的钝化层结构，其包括由卤素掺杂的氧化铝形成的钝化层，并且设置在衬底上的半导体层上，其中半导体层包括铟镓锌氧化物（IGZO）或氮化物基 III-V族化合物。 还公开了一种用于形成半导体器件的钝化层结构的方法。

公开(公告)号：US08440158B2

公开(公告)日：2013-05-14

申请号：US12195844

申请日：2008-08-21

申请人： Cheng-Hsien Lin ,  Yao-Wen Bai ,  Rui Zhang ,  Wen-Chin Lee

发明人： Cheng-Hsien Lin ,  Yao-Wen Bai ,  Rui Zhang ,  Wen-Chin Lee

IPC分类号： D01F9/12 ,  H01B1/04 ,  H05K3/00

CPC分类号： H05K3/424 ,  B82Y10/00 ,  C23C18/1204 ,  C23C18/127 ,  C23C18/1287 ,  H05K3/427 ,  H05K2201/026 ,  H05K2201/0323

摘要： A pre-plating solution for making a printed circuit board includes carbon nanotubes of 0.01-3 wt %, a surfactant of 0.01-4 wt %, an alkaline substance of 0.01-1 wt % and a solvent. A method for preparing a pre-plating solution comprising the steps of: providing a plurality of carbon nanotubes; purifying the carbon nanotubes; treating the purified carbon nanotubes with an acid; mixing the treated carbon nanotubes, an alkaline substance and a solvent to form suspension; and adding surfactant into suspension.

摘要翻译： 用于制造印刷电路板的预镀溶液包括0.01-3重量％的碳纳米管，0.01-4重量％的表面活性剂，0.01-1重量％的碱性物质和溶剂。 一种制备预镀液的方法，包括以下步骤：提供多个碳纳米管; 纯化碳纳米管; 用酸处理纯化的碳纳米管; 混合处理的碳纳米管，碱性物质和溶剂以形成悬浮液; 并将表面活性剂加入悬浮液中。