Infrared shielding glass
    1.
    发明申请
    Infrared shielding glass 审中-公开
    红外屏蔽玻璃

    公开(公告)号:US20050164014A1

    公开(公告)日:2005-07-28

    申请号:US11043170

    申请日:2005-01-27

    IPC分类号: B32B17/06 C03C17/00

    摘要: An infrared shielding glass coated with an infrared shielding film which is excellent in heat resistance and exhibits high visible light transmittance, low infrared transmittance (especially infrared transmittance in a near infrared region) and high electromagnetic wave transmittance. An infrared shielding glass comprising a glass substrate having at least one surface thereof coated with a coating liquid containing fine particles of conductive oxide and a matrix component to thereby provide an infrared shielding film, characterized in that the infrared shielding glass exhibits a transmittance at a wavelength of 1.0 μm of at most 35% and a transmittance at a wavelength of 2.0 μm of at most 20% and that the infrared shielding film has a surface resistivity of at least 1 MΩ/□.

    摘要翻译: 具有耐热性优异,可见光透射率高,红外线透过率高(特别是近红外区域的红外线透射率)高的电磁波透过率的红外线屏蔽玻璃的红外线屏蔽玻璃。 一种红外线屏蔽玻璃,其特征在于,具有玻璃基板,所述玻璃基板的至少一面具有包含导电性氧化物微粒和基体成分的涂布液,由此提供红外线屏蔽膜,其特征在于,所述红外线屏蔽玻璃在波长 1.0μm以上35%以下,波长2.0μm下的透光率为20%以下,红外线屏蔽膜的表面电阻率为1momega /□以上。

    INFRARED SHIELDING LAYER-COATED GLASS PLATE AND PROCESS FOR ITS PRODUCTION
    2.
    发明申请
    INFRARED SHIELDING LAYER-COATED GLASS PLATE AND PROCESS FOR ITS PRODUCTION 审中-公开
    红外屏蔽层涂层玻璃板及其生产工艺

    公开(公告)号:US20080090073A1

    公开(公告)日:2008-04-17

    申请号:US11872301

    申请日:2007-10-15

    IPC分类号: B32B7/02 B05D5/06

    摘要: To provide an infrared shielding layer-coated glass plate excellent in visible light transmittance and radiowave transmittance, having a low infrared transmittance, and applicable to a site where mechanical durability is required, such as a window glass plate for an automobile, and its production process. An infrared shielding layer-coated glass plate comprising a glass substrate and an infrared shielding layer having the following first layer and the following second layer adjacent to each other formed on the glass substrate (provided that the first layer is present on the glass substrate side), wherein the first layer is a layer with a thickness of from 0.2 to 2 μm, having such a structure that fine ITO particles with an average primary particle diameter of at most 100 nm are bound to one another by a metal oxide matrix containing silicon oxide and titanium oxide; and the second layer is a metal oxide layer with a thickness of from 0.02 to 0.3 μm, containing silicon oxide and titanium oxide.

    摘要翻译: 为了提供可见光透射率和无线电波透过率优异的红外屏蔽层涂覆玻璃板,具有低红外线透射率,并且适用于需要机械耐久性的位置,例如汽车用窗玻璃板及其制造方法 。 一种红外屏蔽层涂覆的玻璃板,包括玻璃基板和红外屏蔽层,该玻璃基板和红外线屏蔽层具有形成在玻璃基板上的第一层和第二层彼此相邻(条件是第一层存在于玻璃基板侧) 其特征在于,所述第一层为厚度为0.2〜2μm的层,具有通过含有氧化硅的金属氧化物基体将平均一次粒径为100nm以下的优选ITO粒子彼此结合的结构 和氧化钛; 第二层是含有氧化硅和氧化钛的厚度为0.02〜0.3μm的金属氧化物层。

    Process for producing fine particles of bismuth titanate
    3.
    发明申请
    Process for producing fine particles of bismuth titanate 有权
    生产钛酸铋微粒的方法

    公开(公告)号:US20060008928A1

    公开(公告)日:2006-01-12

    申请号:US11223984

    申请日:2005-09-13

    IPC分类号: H01L21/00

    摘要: It is an object to provide fine particles of bismuth titanate having excellent dielectric characteristics, high crystallinity and a small particle diameter, and a process for their production. The object is accomplished by a process which comprises a step of obtaining a melt comprising, as represented by mol % based on oxides, from 23 to 72% of Bi2O3, from 4 to 64% of TiO2 and from 6 to 50% of B2O3, a step of quickly quenching this melt to obtain an amorphous material, a step of crystallization of bismuth titanate crystals from the above amorphous material, and a step of separating the bismuth titanate crystals from the obtained crystallized material, in this order.

    摘要翻译: 本发明的目的是提供具有优异的介电特性,高结晶度和小粒径的钛酸铋微粒及其生产方法。 该目的通过一种方法来实现,该方法包括获得熔体的步骤,其包含以氧化物计的摩尔%表示的23%至72%的Bi 2 O 3 ,4〜64%的TiO 2和6〜50%的B 2 O 3 3,将该熔体迅速骤冷至 获得无定形材料,从上述无定形材料中结晶钛酸铋晶体的步骤,以及从获得的结晶材料中依次分离钛酸铋晶体的步骤。

    INFRARED SHIELDING FILM-COATED GLASS AND PROCESS FOR ITS PRODUCTION
    4.
    发明申请
    INFRARED SHIELDING FILM-COATED GLASS AND PROCESS FOR ITS PRODUCTION 审中-公开
    红外屏蔽膜包覆玻璃及其生产工艺

    公开(公告)号:US20080020134A1

    公开(公告)日:2008-01-24

    申请号:US11859909

    申请日:2007-09-24

    IPC分类号: B05D1/00

    摘要: An infrared shielding film-coated glass comprising a glass substrate and an infrared shielding film formed thereon, wherein the infrared shielding film comprises a first film layer formed in a thickness of from 0.2 to 2 μm on the surface of the glass substrate and having transparent electroconductive oxide fine particles having an average primary particle diameter of at most 100 nm dispersed in a silicon oxide matrix in a mass ratio of transparent electroconductive oxide fine particles/silicon oxide=10/0.5 to 10/20, and a second film layer laminated in a thickness of from 0.02 to 0.2 μm on the first film layer and comprising silicon oxide, silicon oxynitride or silicon nitride, and the increase in haze by abrasion after a 1000 rotation test by a CS-10F abrasive wheel in accordance with the abrasion resistance test stipulated in JIS R3212 (1998) is at most 5%.

    摘要翻译: 一种红外线屏蔽薄膜包覆玻璃,其特征在于,包括玻璃基板和形成在其上的红外屏蔽膜,其中,所述红外屏蔽膜包括在所述玻璃基板的表面上形成为0.2〜2μm厚度的第一薄膜层,并具有透明导电性 以透明导电氧化物微粒/氧化硅= 10 / 0.5〜10/20的质量比分散在氧化硅基体中的平均一次粒径为100nm以下的氧化物微粒和层叠在 在第一膜层上的厚度为0.02至0.2μm,并且包括氧化硅,氮氧化硅或氮化硅,并且根据规定的耐磨性试验,通过CS-10F砂轮进行1000次旋转试验后的磨损增加雾度 在JIS R3212(1998)中,最多为5%。

    Liquid composition for forming ferroelectric thin film and process for producing ferroelectric thin film
    5.
    发明申请
    Liquid composition for forming ferroelectric thin film and process for producing ferroelectric thin film 审中-公开
    用于形成铁电薄膜的液体组合物和用于制备铁电薄膜的方法

    公开(公告)号:US20060124890A1

    公开(公告)日:2006-06-15

    申请号:US11340548

    申请日:2006-01-27

    IPC分类号: H01L41/18

    摘要: The present invention provides a liquid composition for forming a thin film, with which a ferroelectric thin film having excellent characteristics can be prepared even by baking at a low temperature, and a process for producing a ferroelectric thin film using it. A liquid composition for forming a ferroelectric thin film is used, which is characterized by comprising a liquid medium, crystalline ferroelectric oxide particles represented by the formula (Bi2O2)2+(Bim-1TimO3.5m-0.5)2− (wherein m is an integer of from 1 to 5) or (Bi2O2)2+(Am-1TimO3.5m-0.5)2− (wherein A is Bi3+ or La3+, the La3+/Bi3+ ratio is from 0.05 to 0.5, and m is an integer of from 1 to 5) and having an average primary particle diameter of at most 100 nm, dispersed in the liquid medium, and a soluble metal compound capable of forming a ferroelectric oxide by heating, dissolved in the liquid medium.

    摘要翻译: 本发明提供了一种用于形成薄膜的液体组合物,即使通过低温烘烤也可制备出具有优异特性的铁电薄膜,以及使用该薄膜制造铁电薄膜的方法。 使用用于形成铁电薄膜的液体组合物,其特征在于包括液体介质,由式(Bi 2 O 2 O 2)表示的结晶铁电氧化物颗粒, (2-m-1)Ti 3 O 3 3.5m-0.5 3)2 - / SUP >(其中m是1至5的整数)或(Bi 2 O 2 O 2)2 +(A m- 1 3 3 (其中A是Bi 3+ 或La 3+,La 3+ / Bi 3+比为0.05至0.5,m为1至 5),分散在液体介质中的平均一次粒径为100nm以下,溶解在液体介质中的能够通过加热形成铁电氧化物的可溶性金属化合物。

    Liquid composition for forming ferroelectric thin film and process for producing ferroelectric thin film
    7.
    发明申请
    Liquid composition for forming ferroelectric thin film and process for producing ferroelectric thin film 失效
    用于形成铁电薄膜的液体组合物和用于制备铁电薄膜的方法

    公开(公告)号:US20060046320A1

    公开(公告)日:2006-03-02

    申请号:US11260209

    申请日:2005-10-28

    IPC分类号: H01L21/00

    摘要: It is an object to provide a liquid composition for forming a thin film, with which a ferroelectric thin film having excellent characteristics can be prepared even by baking at a low temperature, and a process for producing a ferroelectric thin film using it. The above object is achieved by use of a liquid composition for forming a ferroelectric thin film, characterized in that in a liquid medium, ferroelectric oxide particles being plate or needle crystals, which are represented by the formula ABO3 (wherein A is at least one member selected from the group consisting of Ba2+, Sr2+, Ca2+, Pb2+, La2+, K+ and Na+, and B is at least one member selected from the group consisting of Ti4+, Zr4+, Nb5+, Ta5+ and Fe3+) and have a Perovskite structure and which have an average primary particle size of at most 100 nm and an aspect ratio of at least 2, are dispersed, and a soluble metal compound which forms a ferroelectric oxide by heating, is dissolved.

    摘要翻译: 本发明的目的是提供一种用于形成薄膜的液体组合物,即使通过低温烘烤也可制备出具有优异特性的铁电薄膜,以及使用该薄膜制造铁电薄膜的工艺。 上述目的通过使用用于形成铁电薄膜的液体组合物来实现,其特征在于,在液体介质中,由式ABO 3 3表示的板状或针状晶体的铁电氧化物颗粒 (其中A是选自Ba 2+,Sr 2+,Ca 2+,Pb 2+中的至少一种。 > 2 + ,La 2+,K + +和Na + +,B是选自以下的至少一种: 由Ti 4+,Zr 4+,Nb 5+,Ta 5+和Fe 4+组成, 3 +),并且具有钙钛矿结构,其平均初级粒径为至多100nm,纵横比为2以上,通过加热形成铁电氧化物的可溶性金属化合物, 溶解

    Composition for forming dielectric layer, MIM capacitor and process for its production
    8.
    发明申请
    Composition for forming dielectric layer, MIM capacitor and process for its production 失效
    用于形成介电层的组合物,MIM电容器及其制造方法

    公开(公告)号:US20060001069A1

    公开(公告)日:2006-01-05

    申请号:US11150231

    申请日:2005-06-13

    IPC分类号: H01L21/8242 H01L27/108

    摘要: To provide a composition for forming a dielectric layer excellent in dielectric constant and withstand voltage properties, a MIM capacitor and a process for its production. A composition for forming a dielectric layer, which comprises fine particles of perovskite type dielectric crystal, glass frit, and a hydrolysable silicon compound or its oligomer, and a MIM capacitor comprising a substrate, and a bottom electrode layer, a dielectric layer having a structure such that fine particles of perovskite type dielectric crystal are dispersed in a silicon oxide matrix containing glass-forming ions and a top electrode, formed on the substrate in this order.

    摘要翻译: 为了提供用于形成介电常数和耐电压性能优异的介电层的组合物,MIM电容器及其制造方法。 一种用于形成电介质层的组合物,其包含钙钛矿型电介质晶体的微细颗粒,玻璃料和可水解硅化合物或其低聚物,以及包含基底的MIM电容器和底部电极层,具有结构 使得细小颗粒的钙钛矿型电介质晶体分散在含有玻璃形成离子的氧化硅基体和顶部电极中,所述氧化硅基体依次形成在基板上。

    Process for producing fine particles of bismuth titanate
    10.
    发明授权
    Process for producing fine particles of bismuth titanate 有权
    生产钛酸铋微粒的方法

    公开(公告)号:US07300806B2

    公开(公告)日:2007-11-27

    申请号:US11223984

    申请日:2005-09-13

    IPC分类号: H01L21/00

    摘要: It is an object to provide fine particles of bismuth titanate having excellent dielectric characteristics, high crystallinity and a small particle diameter, and a process for their production. The object is accomplished by a process which comprises a step of obtaining a melt comprising, as represented by mol % based on oxides, from 23 to 72% of Bi2O3, from 4 to 64% of TiO2 and from 6 to 50% of B2O3, a step of quickly quenching this melt to obtain an amorphous material, a step of crystallization of bismuth titanate crystals from the above amorphous material, and a step of separating the bismuth titanate crystals from the obtained crystallized material, in this order.

    摘要翻译: 本发明的目的是提供具有优异的介电特性,高结晶度和小粒径的钛酸铋微粒及其生产方法。 该目的通过一种方法来实现,该方法包括获得熔体的步骤,其包含以氧化物计的摩尔%表示的23%至72%的Bi 2 O 3 ,4〜64%的TiO 2和6〜50%的B 2 O 3 3,将该熔体迅速骤冷至 获得无定形材料,从上述无定形材料中结晶钛酸铋晶体的步骤,以及从获得的结晶材料中依次分离钛酸铋晶体的步骤。