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公开(公告)号：US20090036039A1
公开(公告)日：2009-02-05
申请号：US12239720
申请日：2008-09-26
申请人： Ho Seon Shin , Gary C. Ettinger , Donald J. K. Olgado , Erik C. Wasinger , Sen-Hour Ko , Yufei Chen , Charles I. Dodds , Wei-Yung Hsu
发明人： Ho Seon Shin , Gary C. Ettinger , Donald J. K. Olgado , Erik C. Wasinger , Sen-Hour Ko , Yufei Chen , Charles I. Dodds , Wei-Yung Hsu
IPC分类号： B24B7/00
CPC分类号： B24B9/065 , B24B21/002 , B24B41/067 , B24B49/16 , B24B57/02
摘要： Methods of and systems for polishing an edge of a substrate are provided. The invention includes a substrate rotation driver adapted to rotate the edge of a substrate against a polishing film; and a first sensor coupled to the rotation driver adapted to detect one of an energy and torque exerted by the substrate rotation driver as it rotates the substrate against the polishing film. Numerous other aspects are provided.
摘要翻译： 提供了抛光衬底边缘的方法和系统。 本发明包括一个衬底旋转驱动器，其适于使衬底的边缘抵靠抛光膜旋转; 以及耦合到所述旋转驱动器的第一传感器，其适于检测由所述基板旋转驱动器在基板旋转所述抛光膜时施加的能量和扭矩中的一个。 提供了许多其他方面。
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公开(公告)号：US20090036042A1
公开(公告)日：2009-02-05
申请号：US12239725
申请日：2008-09-26
申请人： Ho Seon Shin , Gary C. Ettinger , Donald J. K. Olgado , Erik C. Wasinger , Sen-Hou Ko , Charles I. Dodds , Yufei Chen , Wei-Yung Hsu
发明人： Ho Seon Shin , Gary C. Ettinger , Donald J. K. Olgado , Erik C. Wasinger , Sen-Hou Ko , Charles I. Dodds , Yufei Chen , Wei-Yung Hsu
IPC分类号： B24B5/00
CPC分类号： B24B9/065 , B24B21/002 , B24B41/067 , B24B49/16 , B24B57/02
摘要： Methods, systems and apparatus are provided for polishing an edge of a substrate. The invention includes an apparatus adapted to apply a preset pressure to a polishing film in contact with an edge of a substrate. The apparatus includes an actuator adapted to apply a preset pressure to the polishing film; and a controller coupled to the actuator and adapted to receive a signal indicative of a condition of the edge of the substrate, and to adjust a pressure applied by the actuator to the polishing film so as to maintain the preset pressure based on the received signal. Numerous other aspects are provided.
摘要翻译： 提供了用于抛光衬底边缘的方法，系统和装置。 本发明包括适于将预设压力施加到与衬底的边缘接触的抛光膜的装置。 该装置包括致动器，其适于对抛光膜施加预设压力; 以及控制器，其耦合到所述致动器并且适于接收指示所述基板的边缘的状态的信号，并且调整由所述致动器施加到所述抛光膜的压力，以便基于所接收的信号来保持所述预设压力。 提供了许多其他方面。
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公开(公告)号：US20090029629A1
公开(公告)日：2009-01-29
申请号：US12239726
申请日：2008-09-26
申请人： Ho Seon Shin , Gary C. Ettinger , Donald J.K. Olgado , Erik C. Wasinger , Sen-Hou Ko , Charles I. Dodds , Yufei Chen , Wei-Yung Hsu
发明人： Ho Seon Shin , Gary C. Ettinger , Donald J.K. Olgado , Erik C. Wasinger , Sen-Hou Ko , Charles I. Dodds , Yufei Chen , Wei-Yung Hsu
IPC分类号： B24B49/00
CPC分类号： B24B9/065 , B24B21/002 , B24B41/067 , B24B49/16 , B24B57/02
摘要： Methods for polishing an edge of a substrate are provided. The invention includes rotating a substrate against a polishing film so as to remove material from the edge of the substrate; and detecting an amount of force exerted in pressing the polishing film against the substrate. Numerous other aspects are provided.
摘要翻译： 提供了抛光衬底边缘的方法。 本发明包括将衬底旋转抵靠抛光膜，以便从衬底的边缘去除材料; 并且检测在将抛光膜压在基板上时施加的力的量。 提供了许多其他方面。
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公开(公告)号：US20090017731A1
公开(公告)日：2009-01-15
申请号：US12239730
申请日：2008-09-26
申请人： Gary C. Ettinger , Erik C. Wasinger , Sen-Hou Ko , Wei-Yung Hsu , Liang-Yuh Chen , Ho Seon Shin , Donald Olgado
发明人： Gary C. Ettinger , Erik C. Wasinger , Sen-Hou Ko , Wei-Yung Hsu , Liang-Yuh Chen , Ho Seon Shin , Donald Olgado
IPC分类号： B24B1/00
CPC分类号： B24B9/065 , B24B21/002 , B24B41/002 , H01L21/02021
摘要： Methods and apparatus for cleaning an edge of a substrate are provided. The invention includes a polishing film having a polishing side and a second side; an inflatable pad disposed adjacent the second side of the polishing film; a frame adapted to support the polishing film and the inflatable pad; and a substrate rotation driver adapted to rotate a substrate against the polishing side of the polishing film, wherein the polishing film is disposed between an edge of the substrate and the inflatable pad so that the inflatable pad and polishing film contour to the edge of the substrate with the polishing film contacting the edge of the substrate. Numerous other aspects are provided.
摘要翻译： 提供了用于清洁基板边缘的方法和设备。 本发明包括具有抛光侧和第二面的抛光膜; 邻近抛光膜的第二侧设置的可充气垫; 适于支撑抛光膜和可充气垫的框架; 以及衬底旋转驱动器，其适于将衬底旋转抵靠所述抛光膜的抛光侧，其中所述抛光膜设置在所述衬底的边缘和所述可充气垫之间，使得所述可充气衬垫和抛光膜轮廓到所述衬底的边缘 抛光膜与基板的边缘接触。 提供了许多其他方面。
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公开(公告)号：US20090036033A1
公开(公告)日：2009-02-05
申请号：US12245765
申请日：2008-10-05
申请人： Erik C. Wasinger , Gary C. Ettinger , Sen-Hou Ko , Wei-Yung Hsu , Liang-Yuh Chen , Ho Seon Shin , Donald Olgado
发明人： Erik C. Wasinger , Gary C. Ettinger , Sen-Hou Ko , Wei-Yung Hsu , Liang-Yuh Chen , Ho Seon Shin , Donald Olgado
CPC分类号： C03C19/00 , B24B1/04 , B24B9/065 , B24B21/004 , H01L21/02021
摘要： A method of cleaning an edge of a substrate is provided. The method comprises tensioning a first polishing film in a frame; contacting the first polishing film against an edge of a substrate; conforming the first polishing film to the edge of the substrate, the edge including an outer edge and at least one bevel; and rotating the substrate while the first polishing film remains in contact with the substrate. Numerous other aspects are provided.
摘要翻译： 提供了清洁基板的边缘的方法。 该方法包括在框架中张紧第一抛光膜; 使所述第一抛光膜与衬底的边缘接触; 使所述第一抛光膜与所述基板的边缘一致，所述边缘包括外边缘和至少一个斜面; 并且在第一研磨膜与基板保持接触的同时旋转基板。 提供了许多其他方面。
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公开(公告)号：US07993485B2
公开(公告)日：2011-08-09
申请号：US11299295
申请日：2005-12-09
申请人： Erik C. Wasinger , Gary C. Ettinger , Sen-Hou Ko , Wei-Yung Hsu , Liang-Yuh Chen , Ho Seon Shin , Donald Olgado
发明人： Erik C. Wasinger , Gary C. Ettinger , Sen-Hou Ko , Wei-Yung Hsu , Liang-Yuh Chen , Ho Seon Shin , Donald Olgado
IPC分类号： C03C15/00 , H01I21/306
CPC分类号： C03C19/00 , B24B1/04 , B24B9/065 , B24B21/004 , H01L21/02021
摘要： Apparatus and methods adapted to polish an edge of a substrate include a polishing film, a frame adapted to tension and load the polishing film so that at least a portion of the film is supported in a plane, and a substrate rotation driver adapted to rotate a substrate against the plane of the polishing film such that the polishing film is adapted to apply force to the substrate, contour to an edge of the substrate, the edge including at least an outer edge and a first bevel, and polish the outer edge and the first bevel as the substrate is rotated. Numerous other aspects are provided.
摘要翻译： 适于抛光衬底边缘的装置和方法包括抛光膜，适于张紧和加载抛光膜的框架，使得膜的至少一部分被支撑在平面中，以及基板旋转驱动器，其适于旋转 衬底抵靠抛光膜的平面，使得抛光膜适于对衬底施加力，轮廓到衬底的边缘，边缘至少包括外边缘和第一斜面，并且抛光外边缘和 第一斜面作为基底旋转。 提供了许多其他方面。
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公开(公告)号：US20080216867A1
公开(公告)日：2008-09-11
申请号：US11411215
申请日：2006-04-24
IPC分类号： B08B7/00
CPC分类号： H01L21/67046 , B08B1/04 , H01L21/67028
摘要： In one aspect, an apparatus for cleaning an edge of a substrate is provided. The apparatus includes (1) one or more rollers of a first diameter adapted to contact an edge of a substrate and rotate the substrate; and (2) one or more rollers of a second diameter that is larger than the first diameter adapted to contact an edge of the substrate and to clean the edge of the substrate. The one or more rollers of the first diameter and the one or more rollers of the second diameter may be adapted to rotate at substantially the same speed. Numerous other aspects are provided.
摘要翻译： 一方面，提供了一种用于清洁基板的边缘的装置。 该设备包括（1）一个或多个第一直径的辊，其适于接触衬底的边缘并旋转衬底; 和（2）一个或多个第二直径的辊，其大于适于接触所述衬底的边缘并且清洁所述衬底的所述边缘的所述第一直径。 第一直径的一个或多个辊和第二直径的一个或多个辊可以适于以基本上相同的速度旋转。 提供了许多其他方面。
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8.发明授权Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas 有权用于引起处理室清洁气体的紊流的方法和装置公开(公告)号：US08910644B2
公开(公告)日：2014-12-16
申请号：US13041230
申请日：2011-03-04
申请人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J. K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
发明人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J. K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
CPC分类号： B08B5/00 , C23C16/4405 , C23C16/45506 , C23C16/45591 , H01L21/02041 , H01L21/67115 , Y10S438/905
摘要： Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.
摘要翻译： 本发明的实施例一般涉及使用清洁板清洁腔室部件的设备和方法。 清洁板适于在清洁过程期间定位在基板支撑件上，并且包括多个湍流诱导结构。 湍流诱导结构在清洁过程中清洁板旋转时引起清洁气体的湍流。 在清洁过程中，清洁板增加了喷头附近清洁气体的停留时间。 此外，清洁板减少清洁板内的浓度梯度以提供更有效的清洁。 该方法包括将清洁板定位在与喷头相邻的位置，并将清洁气体引入到喷头和清洁板之间的空间。 然后将沉积在喷头表面上的材料在清洁气体的存在下加热和蒸发，然后从处理室中排出。
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9.外观设计Cleaning plate for inducing turbulent flow of a processing chamber cleaning glass 有权用于引起处理室清洁玻璃的湍流的清洁板公开(公告)号：USD664170S1
公开(公告)日：2012-07-24
申请号：US29386850
申请日：2011-03-04
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公开(公告)号：US20090038642A1
公开(公告)日：2009-02-12
申请号：US12249922
申请日：2008-10-11
申请人： Wei-Yung Hsu , Donald J.K. Olgado , Ho Seon Shin , Liang-Yuh Chen
发明人： Wei-Yung Hsu , Donald J.K. Olgado , Ho Seon Shin , Liang-Yuh Chen
IPC分类号： B08B1/04
CPC分类号： H01L21/67046 , B08B1/04 , H01L21/67028
摘要： In one aspect, a method for cleaning an edge of a substrate is provided. The method comprises employing one or more rollers of a first diameter to rotate a substrate; contacting an edge of the substrate with one or more rollers of a second diameter that is larger than the first diameter; and cleaning the edge of the substrate using the one or more rollers of the second diameter. Numerous other aspects are provided.
摘要翻译： 一方面，提供一种清洗基板的边缘的方法。 该方法包括采用一个或多个第一直径的辊来旋转衬底; 使所述基板的边缘与大于所述第一直径的第二直径的一个或多个辊接触; 以及使用所述第二直径的所述一个或多个辊清洁所述基板的边缘。 提供了许多其他方面。
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