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公开(公告)号：US20090036039A1
公开(公告)日：2009-02-05
申请号：US12239720
申请日：2008-09-26
申请人： Ho Seon Shin , Gary C. Ettinger , Donald J. K. Olgado , Erik C. Wasinger , Sen-Hour Ko , Yufei Chen , Charles I. Dodds , Wei-Yung Hsu
发明人： Ho Seon Shin , Gary C. Ettinger , Donald J. K. Olgado , Erik C. Wasinger , Sen-Hour Ko , Yufei Chen , Charles I. Dodds , Wei-Yung Hsu
IPC分类号： B24B7/00
CPC分类号： B24B9/065 , B24B21/002 , B24B41/067 , B24B49/16 , B24B57/02
摘要： Methods of and systems for polishing an edge of a substrate are provided. The invention includes a substrate rotation driver adapted to rotate the edge of a substrate against a polishing film; and a first sensor coupled to the rotation driver adapted to detect one of an energy and torque exerted by the substrate rotation driver as it rotates the substrate against the polishing film. Numerous other aspects are provided.
摘要翻译： 提供了抛光衬底边缘的方法和系统。 本发明包括一个衬底旋转驱动器，其适于使衬底的边缘抵靠抛光膜旋转; 以及耦合到所述旋转驱动器的第一传感器，其适于检测由所述基板旋转驱动器在基板旋转所述抛光膜时施加的能量和扭矩中的一个。 提供了许多其他方面。
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公开(公告)号：US20090036042A1
公开(公告)日：2009-02-05
申请号：US12239725
申请日：2008-09-26
申请人： Ho Seon Shin , Gary C. Ettinger , Donald J. K. Olgado , Erik C. Wasinger , Sen-Hou Ko , Charles I. Dodds , Yufei Chen , Wei-Yung Hsu
发明人： Ho Seon Shin , Gary C. Ettinger , Donald J. K. Olgado , Erik C. Wasinger , Sen-Hou Ko , Charles I. Dodds , Yufei Chen , Wei-Yung Hsu
IPC分类号： B24B5/00
CPC分类号： B24B9/065 , B24B21/002 , B24B41/067 , B24B49/16 , B24B57/02
摘要： Methods, systems and apparatus are provided for polishing an edge of a substrate. The invention includes an apparatus adapted to apply a preset pressure to a polishing film in contact with an edge of a substrate. The apparatus includes an actuator adapted to apply a preset pressure to the polishing film; and a controller coupled to the actuator and adapted to receive a signal indicative of a condition of the edge of the substrate, and to adjust a pressure applied by the actuator to the polishing film so as to maintain the preset pressure based on the received signal. Numerous other aspects are provided.
摘要翻译： 提供了用于抛光衬底边缘的方法，系统和装置。 本发明包括适于将预设压力施加到与衬底的边缘接触的抛光膜的装置。 该装置包括致动器，其适于对抛光膜施加预设压力; 以及控制器，其耦合到所述致动器并且适于接收指示所述基板的边缘的状态的信号，并且调整由所述致动器施加到所述抛光膜的压力，以便基于所接收的信号来保持所述预设压力。 提供了许多其他方面。
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公开(公告)号：US20080216867A1
公开(公告)日：2008-09-11
申请号：US11411215
申请日：2006-04-24
IPC分类号： B08B7/00
CPC分类号： H01L21/67046 , B08B1/04 , H01L21/67028
摘要： In one aspect, an apparatus for cleaning an edge of a substrate is provided. The apparatus includes (1) one or more rollers of a first diameter adapted to contact an edge of a substrate and rotate the substrate; and (2) one or more rollers of a second diameter that is larger than the first diameter adapted to contact an edge of the substrate and to clean the edge of the substrate. The one or more rollers of the first diameter and the one or more rollers of the second diameter may be adapted to rotate at substantially the same speed. Numerous other aspects are provided.
摘要翻译： 一方面，提供了一种用于清洁基板的边缘的装置。 该设备包括（1）一个或多个第一直径的辊，其适于接触衬底的边缘并旋转衬底; 和（2）一个或多个第二直径的辊，其大于适于接触所述衬底的边缘并且清洁所述衬底的所述边缘的所述第一直径。 第一直径的一个或多个辊和第二直径的一个或多个辊可以适于以基本上相同的速度旋转。 提供了许多其他方面。
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公开(公告)号：US07297047B2
公开(公告)日：2007-11-20
申请号：US11292839
申请日：2005-12-01
申请人： Songjae Lee , Ho Seon Shin , Donald J. K. Olgado
发明人： Songjae Lee , Ho Seon Shin , Donald J. K. Olgado
IPC分类号： B24B49/00
摘要： A method and apparatus for the delivery of slurry solution comprising an ultrasonic flow meter positioned between a fluid preparation manifold and a slurry delivery arm, and a shutoff valve positioned between a proportional valve and the slurry delivery arm. Also, a method and apparatus for the delivery of slurry solution including an ultrasonic flow meter positioned to receive fluid from a fluid preparation manifold, a proportional valve and stepper motor in communication with the flow meter, and a reverse flow restrictor in communication with the proportional valve and a slurry delivery arm.
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5.发明授权Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas 有权用于引起处理室清洁气体的紊流的方法和装置公开(公告)号：US08910644B2
公开(公告)日：2014-12-16
申请号：US13041230
申请日：2011-03-04
申请人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J. K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
发明人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J. K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
CPC分类号： B08B5/00 , C23C16/4405 , C23C16/45506 , C23C16/45591 , H01L21/02041 , H01L21/67115 , Y10S438/905
摘要： Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.
摘要翻译： 本发明的实施例一般涉及使用清洁板清洁腔室部件的设备和方法。 清洁板适于在清洁过程期间定位在基板支撑件上，并且包括多个湍流诱导结构。 湍流诱导结构在清洁过程中清洁板旋转时引起清洁气体的湍流。 在清洁过程中，清洁板增加了喷头附近清洁气体的停留时间。 此外，清洁板减少清洁板内的浓度梯度以提供更有效的清洁。 该方法包括将清洁板定位在与喷头相邻的位置，并将清洁气体引入到喷头和清洁板之间的空间。 然后将沉积在喷头表面上的材料在清洁气体的存在下加热和蒸发，然后从处理室中排出。
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6.外观设计Cleaning plate for inducing turbulent flow of a processing chamber cleaning glass 有权用于引起处理室清洁玻璃的湍流的清洁板公开(公告)号：USD664170S1
公开(公告)日：2012-07-24
申请号：US29386850
申请日：2011-03-04
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7.发明授权公开(公告)号：US08449950B2
公开(公告)日：2013-05-28
申请号：US12862244
申请日：2010-08-24
申请人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J. K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
发明人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J. K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
CPC分类号： H01M4/0419 , H01M4/1391
摘要： A method and apparatus for forming an electrochemical layer of a thin film battery is provided. A precursor mixture comprising precursor particles dispersed in a carrying medium is activated in an activation chamber by application of an electric field to ionize at least a portion of the precursor mixture. The activated precursor mixture is then mixed with a combustible gas mixture to add thermal energy to the precursor particles, converting them to nanocrystals, which deposit on a substrate. A second precursor may be blended with the nanocrystals as they deposit on the surface to enhance adhesion and conductivity.
摘要翻译： 提供一种用于形成薄膜电池的电化学层的方法和装置。 包含分散在携带介质中的前体颗粒的前体混合物通过施加电场在活化室中活化，以电离至少一部分前体混合物。 然后将活化的前体混合物与可燃气体混合物混合，以向前体颗粒添加热能，将其转化成沉积在基材上的纳米晶体。 当第二前体沉积在表面上以增强粘附性和导电性时，可与纳米晶体共混。
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公开(公告)号：US07114693B1
公开(公告)日：2006-10-03
申请号：US09676362
申请日：2000-09-29
IPC分类号： F16M13/00
CPC分类号： H01L21/67126 , C25D7/12 , G05B2219/40351 , G05B2219/41457 , H01L21/2885 , H01L21/67051 , H01L21/67742 , H01L21/68707 , H05K3/241
摘要： A stable platform supports a cell, the stable platform comprises a lower mainframe, an upper mainframe, and a dampener system. The upper mainframe includes a plurality of recesses. Each recess is configured to receive a cell. The dampener system connects the lower mainframe to the upper mainframe. In one embodiment, the dampener system comprises a dampener element, such as sand, to dampen vibrations between the lower mainframe and the lower mainframe.
摘要翻译： 稳定的平台支持电池，稳定的平台包括下主机，上主机和减振器系统。 上主机包括多个凹槽。 每个凹槽被配置成接收单元。 阻尼器系统将下主机连接到上主机。 在一个实施例中，阻尼器系统包括阻尼器元件，例如沙子，以阻尼下主机和下主机之间的振动。
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公开(公告)号：US06770565B2
公开(公告)日：2004-08-03
申请号：US10043561
申请日：2002-01-08
IPC分类号： H01L2302
CPC分类号： H01L21/6708 , C23F1/18 , H01L21/32115 , H01L21/32134 , H01L21/32136 , H01L21/7684
摘要： A method of planarizing a metal conductive layer on a substrate is provided. In one embodiment, a substrate having a metal conductive layer disposed on a top surface of the substrate is provided on a substrate support. The substrate support is rotated and the top surface of the substrate is contacted with a liquid etching composition. The metal conductive layer is then exposed to an etchant gas in order to planarize the top surface of the metal conductive layer. Also provided is an apparatus for etching a metal conductive layer on a substrate. The apparatus comprises a container, a substrate support disposed in the container, a rotation actuator attached to the substrate support, and a fluid delivery assembly disposed in the container.
摘要翻译： 提供了在基板上平面化金属导电层的方法。 在一个实施例中，在衬底支架上设置具有设置在衬底顶表面上的金属导电层的衬底。 衬底支撑件旋转并且衬底的顶表面与液体蚀刻组合物接触。 然后将金属导电层暴露于蚀刻剂气体，以平坦化金属导电层的顶表面。 还提供了一种用于在基板上蚀刻金属导电层的装置。 该装置包括容器，设置在容器中的基板支撑件，附接到基板支撑件的旋转致动器以及设置在容器中的流体输送组件。
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公开(公告)号：US06662673B1
公开(公告)日：2003-12-16
申请号：US09684500
申请日：2000-10-06
申请人： Donald J. K. Olgado
发明人： Donald J. K. Olgado
IPC分类号： B25J1800
CPC分类号： C25D7/123 , C25D17/001 , C25D21/00 , H01L21/2885 , H01L21/67028 , H01L21/67051 , H01L21/6708 , H01L21/67126 , H01L21/6723 , H05K3/241 , Y10T29/49826 , Y10T74/20305
摘要： A guide apparatus comprising a plurality of guide linkages. Each one of the plurality of guide linkages comprises a pair of linkage members, each pair of the linkage members are rotatably connected about a guide pivot axis. The guide pivot axis of each guide linkage is arranged in a direction opposed to the direction of the guide pivot axis of the remainder of the guide linkages. In one aspect, each guide linkage is arranged between a robot platform or a cassette and a base such that extending each of the plurality of guide linkages acts to linearly displace the robot platform relative to the base while limiting tilting of the robot platform or the cassette. In another aspect a robot can extend its end effectors while limiting tilting of the end effectors.
摘要翻译： 一种引导装置，包括多个引导连杆。 多个引导连杆中的每一个包括一对连杆构件，每对连杆构件围绕导向枢转轴线可旋转地连接。 每个引导连杆的引导枢转轴线布置在与引导连杆的其余部分的引导枢转轴线的方向相反的方向上。 在一个方面，每个引导联动装置被布置在机器人平台或盒和基座之间，使得延伸多个引导连接件中的每个引导连杆起作用以使机器人平台相对于基座线性移位，同时限制机器人平台或盒的倾斜 。 在另一方面，机器人可以延伸其末端执行器，同时限制末端执行器的倾斜。
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