公开(公告)号：US20130210222A1

公开(公告)日：2013-08-15

申请号：US13758239

申请日：2013-02-04

申请人： Ho-Jin LEE ,  Kyu-ha LEE ,  Gilheyun CHOI ,  YongSoon CHOI ,  Pil-Kyu KANG ,  Byung-Lyul PARK ,  Hyunsoo CHUNG

发明人： Ho-Jin LEE ,  Kyu-ha LEE ,  Gilheyun CHOI ,  YongSoon CHOI ,  Pil-Kyu KANG ,  Byung-Lyul PARK ,  Hyunsoo CHUNG

IPC分类号： H01L21/768 ,  H01L23/00

CPC分类号： H01L21/768 ,  H01L21/02271 ,  H01L21/6836 ,  H01L21/76898 ,  H01L23/3192 ,  H01L23/481 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/13 ,  H01L25/0657 ,  H01L2221/68372 ,  H01L2224/02372 ,  H01L2224/0401 ,  H01L2224/05009 ,  H01L2224/05027 ,  H01L2224/05548 ,  H01L2224/05567 ,  H01L2224/05568 ,  H01L2224/0557 ,  H01L2224/05571 ,  H01L2224/06181 ,  H01L2224/13006 ,  H01L2224/13009 ,  H01L2224/13022 ,  H01L2224/13023 ,  H01L2224/13025 ,  H01L2224/13076 ,  H01L2224/13082 ,  H01L2224/131 ,  H01L2224/14181 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06548 ,  H01L2225/06565 ,  H01L2924/00014 ,  H01L2924/181 ,  H01L2924/351 ,  H01L2924/00012 ,  H01L2924/014 ,  H01L2224/05552 ,  H01L2924/00

摘要： In one embodiment, the method includes forming a conductive via structure in a base layer. The base layer has a first surface and a second surface, and the second surface is opposite the first surface. The method further includes removing the second surface of the base layer to expose the conductive via structure such that the conductive via structure protrudes from the second surface, and forming a first lower insulating layer over the second surface such that an end surface of the conductive via structure remains exposed by the first lower insulating layer.

摘要翻译： 在一个实施例中，该方法包括在基层中形成导电通孔结构。 基层具有第一表面和第二表面，并且第二表面与第一表面相对。 该方法还包括去除基底层的第二表面以暴露导电通路结构，使得导电通孔结构从第二表面突出，并且在第二表面上形成第一下绝缘层，使得导电通孔的端表面 结构保持由第一下绝缘层暴露。