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公开(公告)号：US20110181849A1
公开(公告)日：2011-07-28
申请号：US13010002
申请日：2011-01-20
申请人： Hrishikesh PATEL , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
发明人： Hrishikesh PATEL , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F7/70991 , H01L21/0274 , H01L21/67098 , Y10T29/49
摘要： An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
摘要翻译： 提供一种浸没式光刻设备，其具有衬底台，该衬底台包括被配置为接收泄漏到衬底台上的衬底的边缘与衬底所在的凹部的边缘之间的间隙中的浸没流体的漏极。 提供热调节系统以通过将一个或多个流体射流引导到支撑衬底的部分的相反侧来至少对支撑衬底的凹部的部分进行热调节。
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2.发明授权公开(公告)号：US09618858B2
公开(公告)日：2017-04-11
申请号：US13010002
申请日：2011-01-20
申请人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendrikus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
发明人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendrikus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
IPC分类号： G03F7/20
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F7/70991 , H01L21/0274 , H01L21/67098 , Y10T29/49
摘要： An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
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公开(公告)号：US20120013865A1
公开(公告)日：2012-01-19
申请号：US13183220
申请日：2011-07-14
申请人： Thibault Simon Mathieu LAURENT , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendricus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
发明人： Thibault Simon Mathieu LAURENT , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendricus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC分类号： G03B27/52
CPC分类号： G03F7/70483 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70875
摘要： A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
摘要翻译： 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。
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4.发明授权公开(公告)号：US09141005B2
公开(公告)日：2015-09-22
申请号：US13488111
申请日：2012-06-04
申请人： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Johan Gertrudis Cornelis Kunnen , Sander Catharina Reinier Derks
发明人： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Johan Gertrudis Cornelis Kunnen , Sander Catharina Reinier Derks
CPC分类号： G03F7/70875 , G01K13/00 , G03F7/707
摘要： A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.
摘要翻译： 一种温度感测探头，其包括在细长壳体中的温度传感器，其中探针的细长壳体在第一方向上是细长的，并且细长壳体由在20℃具有至少500W / mK的热导率的材料构成 在至少一个方向。
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公开(公告)号：US09298107B2
公开(公告)日：2016-03-29
申请号：US13183220
申请日：2011-07-14
申请人： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
发明人： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC分类号： G03F7/20
CPC分类号： G03F7/70483 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70875
摘要： A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
摘要翻译： 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。
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6.发明申请公开(公告)号：US20180284627A1
公开(公告)日：2018-10-04
申请号：US15932215
申请日：2018-02-16
申请人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70341
摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
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公开(公告)号：US09632435B2
公开(公告)日：2017-04-25
申请号：US13046211
申请日：2011-03-11
申请人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
CPC分类号： G03F7/70875 , G03F7/7085
摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号：US10551752B2
公开(公告)日：2020-02-04
申请号：US13046283
申请日：2011-03-11
申请人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
IPC分类号： G03F7/20
摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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9.发明授权Substrate table assembly, an immersion lithographic apparatus and a device manufacturing method 有权衬底台组件，浸没式光刻设备和器件制造方法公开(公告)号：US09280063B2
公开(公告)日：2016-03-08
申请号：US13569926
申请日：2012-08-08
申请人： Johan Gertrudis Cornelis Kunnen , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Martijn Houben , Thibault Simon Mathieu Laurent , Frank Johannes Jacobus Van Boxtel , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Sjoerd Nicolaas Lambertus Donders , Johannes Henricus Wilhelmus Jacobs , Martijn Houben , Thibault Simon Mathieu Laurent , Frank Johannes Jacobus Van Boxtel , Sander Catharina Reinier Derks
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/70875 , H01L21/683
摘要： A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m·K) at 298 K.
摘要翻译： 公开了一种衬底台组件，浸没式光刻设备和器件制造方法。 衬底台组件包括用于支撑衬底的衬底台; 以及气体处理系统，用于向衬底台和安装在衬底台上的衬底之间的区域提供气体，其中由气体处理系统提供的气体具有大于或等于100mW /（m·K ）在298K。
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公开(公告)号：US20110222033A1
公开(公告)日：2011-09-15
申请号：US13046283
申请日：2011-03-11
申请人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/7085
摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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