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公开(公告)号：US20110181849A1
公开(公告)日：2011-07-28
申请号：US13010002
申请日：2011-01-20
申请人： Hrishikesh PATEL , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
发明人： Hrishikesh PATEL , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendricus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F7/70991 , H01L21/0274 , H01L21/67098 , Y10T29/49
摘要： An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
摘要翻译： 提供一种浸没式光刻设备，其具有衬底台，该衬底台包括被配置为接收泄漏到衬底台上的衬底的边缘与衬底所在的凹部的边缘之间的间隙中的浸没流体的漏极。 提供热调节系统以通过将一个或多个流体射流引导到支撑衬底的部分的相反侧来至少对支撑衬底的凹部的部分进行热调节。
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2.发明授权公开(公告)号：US09618858B2
公开(公告)日：2017-04-11
申请号：US13010002
申请日：2011-01-20
申请人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendrikus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
发明人： Hrishikesh Patel , Johannes Henricus Wilhelmus Jacobs , Gerardus Adrianus Antonius Maria Kusters , Thibault Simon Mathieu Laurent , Marcio Alexandre Cano Miranda , Ruud Hendrikus Martinus Johannes Bloks , Peng Feng , Johan Gertrudis Cornelis Kunnen
IPC分类号： G03F7/20
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F7/70991 , H01L21/0274 , H01L21/67098 , Y10T29/49
摘要： An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
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公开(公告)号：US20120013865A1
公开(公告)日：2012-01-19
申请号：US13183220
申请日：2011-07-14
申请人： Thibault Simon Mathieu LAURENT , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendricus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
发明人： Thibault Simon Mathieu LAURENT , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendricus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC分类号： G03B27/52
CPC分类号： G03F7/70483 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70875
摘要： A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
摘要翻译： 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。
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4.发明授权公开(公告)号：US09141005B2
公开(公告)日：2015-09-22
申请号：US13488111
申请日：2012-06-04
申请人： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Johan Gertrudis Cornelis Kunnen , Sander Catharina Reinier Derks
发明人： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Johan Gertrudis Cornelis Kunnen , Sander Catharina Reinier Derks
CPC分类号： G03F7/70875 , G01K13/00 , G03F7/707
摘要： A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.
摘要翻译： 一种温度感测探头，其包括在细长壳体中的温度传感器，其中探针的细长壳体在第一方向上是细长的，并且细长壳体由在20℃具有至少500W / mK的热导率的材料构成 在至少一个方向。
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公开(公告)号：US09298107B2
公开(公告)日：2016-03-29
申请号：US13183220
申请日：2011-07-14
申请人： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
发明人： Thibault Simon Mathieu Laurent , Gerardus Adrianus Antonius Maria Kusters , Bastiaan Andreas Wilhelmus Hubertus Knarren , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Takeshi Kaneko , Robbert Jan Voogd , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Johan Gertrudis Cornelis Kunnen , Ramin Badie
IPC分类号： G03F7/20
CPC分类号： G03F7/70483 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F7/70875
摘要： A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
摘要翻译： 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。
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公开(公告)号：US20110007287A1
公开(公告)日：2011-01-13
申请号：US12818724
申请日：2010-06-18
申请人： Johannes Henricus Wilhelmus JACOBS , Hans Jansen , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Gerardus Adrianus Antonius Maria Kusters , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
发明人： Johannes Henricus Wilhelmus JACOBS , Hans Jansen , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Gerardus Adrianus Antonius Maria Kusters , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
IPC分类号： G03B27/58
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.
摘要翻译： 一种浸没式光刻设备，其包括弯曲的表面，使得表面张力引流力沿表面上的浸没液体的膜上的方向作用。
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公开(公告)号：US08462313B2
公开(公告)日：2013-06-11
申请号：US12818724
申请日：2010-06-18
申请人： Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Gerardus Adrianus Antonius Maria Kusters , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
发明人： Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Jeroen Peter Johannes Bruijstens , Ivo Adam Johannes Thomas , Gerardus Adrianus Antonius Maria Kusters , Marcio Alexandre Cano Miranda , Gheorghe Tanasa
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.
摘要翻译： 一种浸没式光刻设备，其包括弯曲的表面，使得表面张力引流力沿表面上的浸没液体的膜上的方向作用。
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8.发明申请公开(公告)号：US20110013169A1
公开(公告)日：2011-01-20
申请号：US12821015
申请日：2010-06-22
申请人： Raymond Wilhelmus Louis Lafarre , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Gerardus Adrianus Antonius Maria Kusters , Alexander Nikolov Zdravkov , Hrishikesh Patel , Sander Van Opstal
发明人： Raymond Wilhelmus Louis Lafarre , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Gerardus Adrianus Antonius Maria Kusters , Alexander Nikolov Zdravkov , Hrishikesh Patel , Sander Van Opstal
IPC分类号： G03B27/58
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/707 , G03F7/70808
摘要： A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.
摘要翻译： 为浸没式光刻设备中的衬底台设置盖子，该衬底台至少覆盖衬底和接收衬底的衬底台中的凹部之间的间隙。
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9.发明授权Substrate table for a lithographic apparatus, lithographic apparatus, method of using a substrate table and device manufacturing method 有权用于光刻设备的基板，光刻设备，使用基板台的方法和器件制造方法公开(公告)号：US08941815B2
公开(公告)日：2015-01-27
申请号：US12821015
申请日：2010-06-22
申请人： Raymond Wilhelmus Louis Lafarre , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Gerardus Adrianus Antonius Maria Kusters , Alexander Nikolov Zdravkov , Hrishikesh Patel , Sander Van Opstal
发明人： Raymond Wilhelmus Louis Lafarre , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Gerardus Adrianus Antonius Maria Kusters , Alexander Nikolov Zdravkov , Hrishikesh Patel , Sander Van Opstal
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/707 , G03F7/70808
摘要： A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.
摘要翻译： 为浸没式光刻设备中的衬底台设置盖子，该衬底台至少覆盖衬底和接收衬底的衬底台中的凹部之间的间隙。
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公开(公告)号：US08913228B2
公开(公告)日：2014-12-16
申请号：US11730749
申请日：2007-04-03
申请人： Maurice Wijckmans , Martinus Agnes Willem Cuijpers , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Theodorus Petrus Maria Cadee , Frederik Eduard De Jong , Wilhelmus Franciscus Johannes Simons , Edwin Augustinus Matheus Van Gompel , Martin Frans Pierre Smeets , Rob Jansen , Gerardus Adrianus Antonius Maria Kusters , Martijn Van Baren
发明人： Maurice Wijckmans , Martinus Agnes Willem Cuijpers , Martinus Hendrikus Antonius Leenders , Frits Van Der Meulen , Joost Jeroen Ottens , Theodorus Petrus Maria Cadee , Frederik Eduard De Jong , Wilhelmus Franciscus Johannes Simons , Edwin Augustinus Matheus Van Gompel , Martin Frans Pierre Smeets , Rob Jansen , Gerardus Adrianus Antonius Maria Kusters , Martijn Van Baren
IPC分类号： G03B27/58 , G03F7/20 , F16L55/053
CPC分类号： G03F7/70875 , F16L55/053 , G03F7/70341 , G03F7/70783
摘要： A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.
摘要翻译： 公开了一种光刻设备，其被布置成将图案从图案形成装置投影到基板上，光刻设备具有被配置为保持基板的基板台。 衬底台包括配置成保持调理流体并调节衬底台的调节系统。 调节系统包括压力调节器，其与调节系统流体连通并且被布置成抑制调节系统中的压力变化。
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