Laundry dryer
    1.
    发明申请
    Laundry dryer 审中-公开
    洗衣机

    公开(公告)号:US20060289533A1

    公开(公告)日:2006-12-28

    申请号:US11412097

    申请日:2006-04-27

    IPC分类号: H05B6/64

    CPC分类号: D06F58/04 D06F39/12

    摘要: A laundry dryer is provided. The laundry dryer includes a cabinet, a drying drum, a heating unit and a blower fan, a cabinet cover, an outer cover, and a fringe frame. The cabinet is opened at a side thereof. The drying drum is disposed within the cabinet, to insert articles to be dried. The heating unit and a blower fan supply hot air into the drying drum. The cabinet cover is installed on the cabinet. The outer cover is detachably coupled to a front of the cabinet cover, painted with a predetermined color on at least a front surface thereof, and injection molded from a heat resistant plastic. The fringe frame encloses a front edge portion of the cabinet.

    摘要翻译: 提供洗衣机。 衣物烘干机包括机壳,干燥滚筒,加热单元和鼓风机,机壳盖,外盖和边框。 机柜在其一侧打开。 干燥滚筒设置在机柜内,以插入待干燥的物品。 加热单元和鼓风机将干燥鼓中的热空气送入干燥鼓。 机柜盖安装在机柜上。 外盖可拆卸地联接到机柜盖的前部,在其至少前表面上以预定颜色涂漆,并由耐热塑料注射成型。 边缘框架包围机柜的前边缘部分。

    Method for in-situ polycrystalline thin film growth
    2.
    发明申请
    Method for in-situ polycrystalline thin film growth 有权
    原位多晶薄膜生长方法

    公开(公告)号:US20060257569A1

    公开(公告)日:2006-11-16

    申请号:US11433176

    申请日:2006-05-12

    IPC分类号: C23C16/00

    CPC分类号: C23C16/24 C23C16/44

    摘要: A method for in-situ polycrystalline thin film growth is provided. A catalyst enhanced chemical vapor deposition (CECVD) apparatus is used to grow the polycrystalline silicon thin film. No subsequent annealing or dehydrogenating process is needed. The method comprises exhausting a chamber to form a vacuum chamber, and then purging vacuum chamber and introducing a catalyst. A substrate is then placed in the vacuum chamber and reaction gas is injected into the chamber. The reaction gas reacts with the catalyst in the chamber to grow a polycrystalline thin film on the substrate. The inventive method reduces processing time and production cost and can be used to fabricate larger devices due to the elimination of bulky annealing equipment.

    摘要翻译: 提供了一种原位多晶薄膜生长的方法。 使用催化剂增强化学气相沉积(CECVD)装置来生长多晶硅薄膜。 不需要随后的退火或脱氢过程。 该方法包括排空室以形成真空室,然后净化真空室并引入催化剂。 然后将基板放置在真空室中,并将反应气体注入室中。 反应气体与室中的催化剂反应,以在衬底上生长多晶薄膜。 本发明的方法减少了处理时间和生产成本,并且由于消除了大型退火设备而可用于制造更大的装置。

    Device and method for generating thumbnail JPEG image and medium for storing thumbnail JPEG image
    3.
    发明申请
    Device and method for generating thumbnail JPEG image and medium for storing thumbnail JPEG image 审中-公开
    用于生成缩略图JPEG图像和存储缩略图JPEG图像的介质的设备和方法

    公开(公告)号:US20060215915A1

    公开(公告)日:2006-09-28

    申请号:US11271827

    申请日:2005-11-14

    申请人: Myoung Kim

    发明人: Myoung Kim

    IPC分类号: G06K9/36 G06K9/32

    摘要: Disclosed herein is a device and method for generating a thumbnail Joint Picture Experts group (JPEG) image and a medium for storing the thumbnail JPEG. The device includes a scaler, first frame memory, a JPEG signal processing unit, second frame memory and a memory control unit. The scaler scales an input image to a predetermined size to output an image for main JPEG, and scales the input image to a size smaller than the image for main JPEG and to outputs a thumbnail JPEG image. The first frame memory stores the thumbnail JPEG image. The JPEG signal processing unit performs JPEG encoding on the image for main JPEG and the thumbnail JPEG image, and outputs a main JPEG image and a thumbnail JPEG image. The second frame memory stores the main JPEG image and the thumbnail JPEG image. The memory control unit transfers the thumbnail JPEG image to the first frame memory, and transfers the main JPEG image and the thumbnail JPEG image to the second frame memory. Additionally, the JPEG signal processing unit receives the main JPEG image and the thumbnail JPEG image stored in the second frame memory, and outputs the main JPEG image and the thumbnail JPEG image as a single JPEG file.

    摘要翻译: 这里公开了一种用于生成缩略图联合图像专家组(JPEG)图像和用于存储缩略图JPEG的介质的装置和方法。 该设备包括缩放器,第一帧存储器,JPEG信号处理单元,第二帧存储器和存储器控制单元。 缩放器将输入图像缩放到预定大小以输出用于主JPEG的图像,并且将输入图像缩放到小于主JPEG图像的尺寸,并输出缩略图JPEG图像。 第一帧存储器存储缩略图JPEG图像。 JPEG信号处理单元对主JPEG和缩略图JPEG图像的图像执行JPEG编码,并输出主JPEG图像和缩略图JPEG图像。 第二帧存储器存储主JPEG图像和缩略图JPEG图像。 存储器控制单元将缩略图JPEG图像传送到第一帧存储器,并将主JPEG图像和缩略图JPEG图像传送到第二帧存储器。 此外,JPEG信号处理单元接收存储在第二帧存储器中的主JPEG图像和缩略图JPEG图像,并将主JPEG图像和缩略图JPEG图像作为单个JPEG文件输出。

    Organic metal compounds in which compounds for host and compounds for dopant are connected, organic electroluminesence display devices using the compounds and method for preparation of the devices
    4.
    发明申请
    Organic metal compounds in which compounds for host and compounds for dopant are connected, organic electroluminesence display devices using the compounds and method for preparation of the devices 有权
    用于掺杂剂的主体和化合物的化合物连接的有机金属化合物,使用该化合物的有机电致发光显示装置及其制备方法

    公开(公告)号:US20060237715A1

    公开(公告)日:2006-10-26

    申请号:US11364521

    申请日:2006-02-27

    摘要: The present embodiments relate to organic metal compounds in which compounds for host and compounds for dopant are connected, organic electroluminescence display devices using the compounds and a method for preparation of the devices. More precisely, the present embodiments relate to organic metal compounds in which the compounds for host and the compounds for dopant are connected to make energy transmission between host and dopant possible in a molecular level, organic electroluminescence display devices using the same and a preparation method thereof. The organic metal compound of the present embodiments can be effectively used as a coloring material of photoluminescence device since it has low molecular level emitting property. Moreover, the photoluminescence device prepared by using the organic metal compound of the present embodiments has enhanced emitting efficiency, brightness, color purity and lifetime.

    摘要翻译: 本实施例涉及其中连接用于掺杂剂的主体和化合物的化合物的有机金属化合物,使用该化合物的有机电致发光显示装置和该装置的制备方法。 更准确地说,本实施方式涉及有机金属化合物,其中主体化合物和掺杂剂化合物被连接以在分子水平上使主体和掺杂剂之间的能量传递成为可能,有机电致发光显示装置及其制备方法 。 本实施方案的有机金属化合物由于具有低分子量发射性能,因此可以有效地用作光致发光器件的着色材料。 此外,通过使用本实施方案的有机金属化合物制备的光致发光器件具有增强的发光效率,亮度,色纯度和寿命。

    Enhanced method for demodulating constant-amplitude multi-code biorthogonal modulation signals
    6.
    发明申请
    Enhanced method for demodulating constant-amplitude multi-code biorthogonal modulation signals 有权
    用于解调恒幅多码双正交调制信号的增强方法

    公开(公告)号:US20060062285A1

    公开(公告)日:2006-03-23

    申请号:US10995096

    申请日:2004-11-24

    IPC分类号: H04B1/707 H04L27/06

    摘要: The present invention relates to a demodulation method for enhancing decoding performance of information bits in a constant-amplitude multi-code biorthogonal modulation communication system, which performs encoding to cause the level of a transmission symbol to be constant. In the demodulation method of the present invention, a demodulator demodulates the received signal, the demodulator having four blocks. C (c≦2k, k is the number of information bits) bit streams with higher correlation values in descending order are selected and combined among demodulated bit streams to establish c4 bit stream candidates. A parity check is performed with respect to the c4 bit stream candidates, a candidate group having a maximal sum of correlation values is selected among candidate groups in which any error is not generated at the parity check. A bit stream corresponding to the selected candidate group is determined to be an output of a receiver. If a hypothesis in which any error is not generated does not exist, a bit stream determined using a maximum correlation value with respect to each of the blocks is output. According to the present invention, there is an advantage in that an error in reception bits can be detected or corrected, thus improving reception performance.

    摘要翻译: 本发明涉及一种在恒定幅度多码双正交调制通信系统中增强信息比特的解码性能的解调方法,该系统执行编码以使得传输符号的电平恒定。 在本发明的解调方法中,解调器对接收信号进行解调,解调器具有四个块。 C(c <= 2K k,k是信息比特数),选择具有较高相关值的比特流,并且在解调比特流之间进行组合以建立c 4 >位流候选。 对于第4个比特流候选进行奇偶校验,在奇偶校验检查中不产生任何错误的候选组中选择具有最大相关值之和的候选组。 对应于所选择的候选组的比特流被确定为接收机的输出。 如果不存在产生任何错误的假设,则输出使用相对于每个块的最大相关值确定的比特流。 根据本发明,存在可以检测或校正接收位中的错误的优点,从而提高接收性能。

    CVD apparatus for depositing polysilicon
    8.
    发明申请
    CVD apparatus for depositing polysilicon 审中-公开
    用于沉积多晶硅的CVD装置

    公开(公告)号:US20070128861A1

    公开(公告)日:2007-06-07

    申请号:US11405091

    申请日:2006-04-17

    IPC分类号: H01L21/84 H01L21/44 C23C16/00

    摘要: Disclosed is a CVD apparatus for depositing polysilicon without a separate following annealing process, the CVD apparatus comprising: a chamber to form a thin film on a substrate; a showerhead placed in an upper part of the chamber to inject reaction gas onto the substrate; a distributor formed with distributing holes to uniformly distribute the reaction gas; a catalyst hot wire unit to heat and dissolve the reaction gas injected through the distributing holes of the distributor; a chuck on which the substrate is mounted; a discharging hole to discharge the reaction gas; and a shielding wall provided as a lateral wall of the chamber and formed with a heater to suppress particle generation. With this configuration, the particle generation is minimized and thus the yield is enhanced. Also, the thin film has good crystallinity, and decreased hydrogen content.

    摘要翻译: 公开了一种用于在没有单独的跟随退火工艺的情况下沉积多晶硅的CVD装置,该CVD装置包括:在衬底上形成薄膜的腔室; 放置在所述室的上部的喷头,以将反应气体注入到所述基板上; 形成有分布孔以均匀分布反应气体的分配器; 用于加热和溶解通过分配器的分配孔注入的反应气体的催化剂热丝单元; 安装有基板的卡盘; 用于排出反应气体的排出孔; 以及作为室的侧壁设置的屏蔽壁,并且形成有用于抑制颗粒产生的加热器。 利用这种构造,使颗粒生成最小化,从而提高了产率。 此外,薄膜具有良好的结晶度,并降低了氢含量。

    Inductively coupled plasma processing apparatus
    9.
    发明申请
    Inductively coupled plasma processing apparatus 审中-公开
    电感耦合等离子体处理装置

    公开(公告)号:US20070017637A1

    公开(公告)日:2007-01-25

    申请号:US11489656

    申请日:2006-07-18

    IPC分类号: C23F1/00 C23C16/00

    CPC分类号: H01J37/321

    摘要: An inductively coupled plasma processing apparatus is disclosed. The inductively coupled plasma processing apparatus includes a reaction chamber, a substrate holder for forming a plasma space in the reaction chamber and for supporting a processing substrate therein, a shield provided at the lateral side of the substrate holder, a plurality of openings formed below the substrate, and a linear antenna in the lower portion of the reaction chamber to which a high frequency power signal is applied. Thus, the inductively coupled plasma processing apparatus can uniformly distribute the density of the plasma so that a large-sized flat panel display can be implemented.

    摘要翻译: 公开了一种电感耦合等离子体处理装置。 电感耦合等离子体处理装置包括反应室,用于在反应室中形成等离子体空间并用于在其中支撑处理基板的基板保持件,设置在基板保持器的侧面的屏蔽件, 基板和在其上施加高频功率信号的反应室下部的线性天线。 因此,电感耦合等离子体处理装置可以均匀地分配等离子体的密度,从而可以实现大尺寸的平板显示器。

    Slurry for polishing copper film and method for polishing copper film using the same
    10.
    发明申请
    Slurry for polishing copper film and method for polishing copper film using the same 审中-公开
    用于抛光铜膜的浆料和使用其的抛光铜膜的方法

    公开(公告)号:US20060163531A9

    公开(公告)日:2006-07-27

    申请号:US11051757

    申请日:2005-02-04

    申请人: Myoung Kim

    发明人: Myoung Kim

    IPC分类号: C09K13/00 B44C1/22 C23F1/00

    CPC分类号: H01L21/3212 C09G1/02 C23F3/06

    摘要: Disclosed are a slurry for polishing a copper film and a method for polishing a copper film using the slurry. A slurry containing H2O2 as an oxidizer and glycine as an inhibitor is prepared. Polishing of a copper film is performed in such a manner that the slurry is provided onto a polishing pad, and a copper film is contacted with the polishing pad. In the copper film polishing, no contamination occurs and surface roughness of the copper film is favorable.

    摘要翻译: 公开了一种用于抛光铜膜的浆料和使用该浆料抛光铜膜的方法。 制备含有作为氧化剂的H 2 O 2 O 2和作为抑制剂的甘氨酸的浆料。 以这样的方式进行铜膜的抛光,即将浆料提供到抛光垫上,并将铜膜与抛光垫接触。 在铜膜抛光中,不会发生污染,铜膜的表面粗糙度良好。