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公开(公告)号:US20240132954A1
公开(公告)日:2024-04-25
申请号:US18400702
申请日:2023-12-29
Applicant: ILLUMINA, INC.
Inventor: Timothy J. Merkel , Wayne N. George , Andrew A. Brown , Audrey Zak , Gianluca Andrea Artioli , Julia Morrison , Nikolai Romanov , Lorenzo Berti , Graham Boud
IPC: C12Q1/6874 , C08G77/442 , C08L33/04 , C08L63/00 , C09D153/00 , C09D163/00 , C12Q1/6876
CPC classification number: C12Q1/6874 , C08G77/442 , C08L33/04 , C08L63/00 , C09D153/00 , C09D163/00 , C12Q1/6876
Abstract: An example of a resin composition includes a free radical curable resin matrix including an acrylate and a siloxane, and a free radical photoinitiator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
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公开(公告)号:US20240337582A1
公开(公告)日:2024-10-10
申请号:US18744225
申请日:2024-06-14
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor: Timothy J. Merkel , Wayne N. George , Andrew A. Brown , Audrey Zak , Gianluca Andrea Artioli , Julia Morrison , Nikolai Romanov , Lorenzo Berti , Graham Boud
IPC: G01N15/1434 , C08L63/00 , C08L83/12 , G03F7/00
CPC classification number: G01N15/1436 , C08L63/00 , C08L83/12 , G03F7/0002
Abstract: An example of a resin composition includes an epoxy resin matrix, a free radical photoinitiator selected from the group consisting of 2-ethyl-9,10-dimethoxyanthracene, 2,2-dimethoxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, and a phosphine oxide, and a photoacid generator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
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公开(公告)号:US20220063147A1
公开(公告)日:2022-03-03
申请号:US17460615
申请日:2021-08-30
Applicant: ILLUMINA, INC.
Inventor: Michael Rapp , Timothy Merkel , Audrey Zak
Abstract: Fixtures and related system and methods are disclosed. In accordance with an implementation, a method includes applying a resin onto a substrate and positioning the substrate on over a chuck of a base of a fixture. The method also includes moving a mold into engagement with the resin and curing the resin. The method also includes detaching the mold and the resin and, while detaching the mold and the resin, determining a detachment force applied as a function of a distance of detachment between the mold and the resin.
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公开(公告)号:US20200025670A1
公开(公告)日:2020-01-23
申请号:US16515849
申请日:2019-07-18
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor: Timothy J. Merkel , Wayne N. George , Andrew A. Brown , Audrey Zak , Gianluca Andrea Artioli , Julia Morrison , Nikolai Romanov , Lorenzo Berti , Graham Boud
Abstract: An example of a resin composition includes an epoxy resin matrix, a free radical photoinitiator selected from the group consisting of 2-ethyl-9,10-dimethoxyanthracene, 2,2-dimethoxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, and a phosphine oxide, and a photoacid generator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
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公开(公告)号:US11884976B2
公开(公告)日:2024-01-30
申请号:US16515790
申请日:2019-07-18
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor: Timothy J. Merkel , Wayne N. George , Andrew A. Brown , Audrey Zak , Gianluca Andrea Artioli , Julia Morrison , Nikolai Romanov , Lorenzo Berti , Graham Boud
IPC: C12Q1/6874 , C08G77/442 , C09D153/00 , C12Q1/6876 , C09D163/00 , C08L63/00 , C08L33/04
CPC classification number: C12Q1/6874 , C08G77/442 , C08L33/04 , C08L63/00 , C09D153/00 , C09D163/00 , C12Q1/6876
Abstract: An example of a resin composition includes a free radical curable resin matrix including an acrylate and a siloxane, and a free radical photoinitiator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
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公开(公告)号:US20200024661A1
公开(公告)日:2020-01-23
申请号:US16515790
申请日:2019-07-18
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor: Timothy J. Merkel , Wayne N. George , Andrew A. Brown , Audrey Zak , Gianluca Andrea Artioli , Julia Morrison , Nikolai Romanov , Lorenzo Berti , Graham Boud
IPC: C12Q1/6874 , C08G77/442 , C08L63/00 , C12Q1/6876 , C09D163/00 , C09D153/00
Abstract: An example of a resin composition includes a free radical curable resin matrix including an acrylate and a siloxane, and a free radical photoinitiator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
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公开(公告)号:US12064905B2
公开(公告)日:2024-08-20
申请号:US17460615
申请日:2021-08-30
Applicant: ILLUMINA, INC.
Inventor: Michael Rapp , Timothy Merkel , Audrey Zak
CPC classification number: B29C39/44 , B29C33/202 , B29C39/02 , B29C39/26 , B29C2033/207 , B29C2791/006
Abstract: Fixtures and related system and methods are disclosed. In accordance with an implementation, a method includes applying a resin onto a substrate and positioning the substrate on over a chuck of a base of a fixture. The method also includes moving a mold into engagement with the resin and curing the resin. The method also includes detaching the mold and the resin and, while detaching the mold and the resin, determining a detachment force applied as a function of a distance of detachment between the mold and the resin.
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公开(公告)号:US12013330B2
公开(公告)日:2024-06-18
申请号:US16515849
申请日:2019-07-18
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor: Timothy J. Merkel , Wayne N. George , Andrew A. Brown , Audrey Zak , Gianluca Andrea Artioli , Julia Morrison , Nikolai Romanov , Lorenzo Berti , Graham Boud
IPC: G03F7/00 , C08L63/00 , C08L83/12 , G01N15/1434
CPC classification number: G01N15/1436 , C08L63/00 , C08L83/12 , G03F7/0002
Abstract: An example of a resin composition includes an epoxy resin matrix, a free radical photoinitiator selected from the group consisting of 2-ethyl-9,10-dimethoxyanthracene, 2,2-dimethoxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, and a phosphine oxide, and a photoacid generator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
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