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公开(公告)号:US20240337582A1
公开(公告)日:2024-10-10
申请号:US18744225
申请日:2024-06-14
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor: Timothy J. Merkel , Wayne N. George , Andrew A. Brown , Audrey Zak , Gianluca Andrea Artioli , Julia Morrison , Nikolai Romanov , Lorenzo Berti , Graham Boud
IPC: G01N15/1434 , C08L63/00 , C08L83/12 , G03F7/00
CPC classification number: G01N15/1436 , C08L63/00 , C08L83/12 , G03F7/0002
Abstract: An example of a resin composition includes an epoxy resin matrix, a free radical photoinitiator selected from the group consisting of 2-ethyl-9,10-dimethoxyanthracene, 2,2-dimethoxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, and a phosphine oxide, and a photoacid generator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
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公开(公告)号:US12013330B2
公开(公告)日:2024-06-18
申请号:US16515849
申请日:2019-07-18
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor: Timothy J. Merkel , Wayne N. George , Andrew A. Brown , Audrey Zak , Gianluca Andrea Artioli , Julia Morrison , Nikolai Romanov , Lorenzo Berti , Graham Boud
IPC: G03F7/00 , C08L63/00 , C08L83/12 , G01N15/1434
CPC classification number: G01N15/1436 , C08L63/00 , C08L83/12 , G03F7/0002
Abstract: An example of a resin composition includes an epoxy resin matrix, a free radical photoinitiator selected from the group consisting of 2-ethyl-9,10-dimethoxyanthracene, 2,2-dimethoxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, and a phosphine oxide, and a photoacid generator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
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公开(公告)号:US20220088834A1
公开(公告)日:2022-03-24
申请号:US17541089
申请日:2021-12-02
Applicant: Illumina, Inc. , Illumina Cambridge Limited
Inventor: Alexandre Richez , Andrew A. Brown , Julia Morrison , Wayne N. George , Timothy J. Merkel , Audrey Rose Zak
IPC: B29C33/38 , C09D133/26 , B29C59/02 , G03F7/00 , B29C33/40
Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.
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公开(公告)号:US20230272469A1
公开(公告)日:2023-08-31
申请号:US18195321
申请日:2023-05-09
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED , ILLUMINA SINGAPORE PTE. LTD.
Inventor: Sean M. Ramirez , Brian D. Mather , Edwin Li , Sojeong Moon , Innsu Daniel Kim , Alexandre Richez , Ludovic Vincent , Xavier von Hatten , Hai Quang Tran , Maxwell Zimmerley , Julia Morrison , Gianluca Andrea Artioli , Krystal Sly , Hayden Black , Lewis J. Kraft , Hong Xie , Wei Wei , Ryan Sanford
IPC: C12Q1/6874 , C12Q1/6806 , B01L3/00
CPC classification number: C12Q1/6874 , C12Q1/6806 , B01L3/502707 , B01L2300/165 , B01L2300/0819 , B01L2300/0887 , B01L2300/16 , B01L2300/0877
Abstract: An example of a method includes providing a substrate with an exposed surface comprising a first chemical group, wherein the providing optionally comprises modifying the exposed surface of the substrate to incorporate the first chemical group; reacting the first chemical group with a first reactive group of a functionalized polymer molecule to form a functionalized polymer coating layer covalently bound to the exposed surface of the substrate; grafting a primer to the functionalized polymer coating layer by reacting the primer with a second reactive group of the functionalized polymer coating layer; and forming a water-soluble protective coating on the primer and the functionalized polymer coating layer. Examples of flow cells incorporating examples of the water-soluble protective coating are also disclosed herein.
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公开(公告)号:US20200025670A1
公开(公告)日:2020-01-23
申请号:US16515849
申请日:2019-07-18
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor: Timothy J. Merkel , Wayne N. George , Andrew A. Brown , Audrey Zak , Gianluca Andrea Artioli , Julia Morrison , Nikolai Romanov , Lorenzo Berti , Graham Boud
Abstract: An example of a resin composition includes an epoxy resin matrix, a free radical photoinitiator selected from the group consisting of 2-ethyl-9,10-dimethoxyanthracene, 2,2-dimethoxy-2-phenylacetophenone, 2-ethoxy-2-phenylacetophenone, and a phosphine oxide, and a photoacid generator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
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公开(公告)号:US20180178416A1
公开(公告)日:2018-06-28
申请号:US15847150
申请日:2017-12-19
Applicant: Illumina, Inc. , Illumina Cambridge Limited
Inventor: Alexandre Richez , Andrew A. Brown , Julia Morrison , Wayne N. George , Timothy J. Merkel , Audrey Rose Zak
Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.
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公开(公告)号:US20240132954A1
公开(公告)日:2024-04-25
申请号:US18400702
申请日:2023-12-29
Applicant: ILLUMINA, INC.
Inventor: Timothy J. Merkel , Wayne N. George , Andrew A. Brown , Audrey Zak , Gianluca Andrea Artioli , Julia Morrison , Nikolai Romanov , Lorenzo Berti , Graham Boud
IPC: C12Q1/6874 , C08G77/442 , C08L33/04 , C08L63/00 , C09D153/00 , C09D163/00 , C12Q1/6876
CPC classification number: C12Q1/6874 , C08G77/442 , C08L33/04 , C08L63/00 , C09D153/00 , C09D163/00 , C12Q1/6876
Abstract: An example of a resin composition includes a free radical curable resin matrix including an acrylate and a siloxane, and a free radical photoinitiator. When cured, the resin composition has low or no autofluorescence when exposed to blue excitation wavelengths ranging from about 380 nm to about 480 nm or green excitation wavelengths ranging from about 510 nm to about 560 nm.
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公开(公告)号:US11667969B2
公开(公告)日:2023-06-06
申请号:US15969562
申请日:2018-05-02
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED , ILLUMINA SINGAPORE PTE. LTD.
Inventor: Sean M. Ramirez , Brian D. Mather , Edwin Li , Sojeong Moon , Innsu Daniel Kim , Alexandre Richez , Ludovic Vincent , Xavier von Hatten , Hai Quang Tran , Maxwell Zimmerley , Julia Morrison , Gianluca Andrea Artioli , Krystal Sly , Hayden Black , Lewis J. Kraft , Hong Xie , Wei Wei , Ryan Sanford
IPC: B01L3/00 , C12Q1/6874 , C12Q1/6806
CPC classification number: C12Q1/6874 , B01L3/502707 , C12Q1/6806 , B01L2300/0819 , B01L2300/0877 , B01L2300/0887 , B01L2300/16 , B01L2300/165
Abstract: An example of a method includes providing a substrate with an exposed surface comprising a first chemical group, wherein the providing optionally comprises modifying the exposed surface of the substrate to incorporate the first chemical group; reacting the first chemical group with a first reactive group of a functionalized polymer molecule to form a functionalized polymer coating layer covalently bound to the exposed surface of the substrate; grafting a primer to the functionalized polymer coating layer by reacting the primer with a second reactive group of the functionalized polymer coating layer; and forming a water-soluble protective coating on the primer and the functionalized polymer coating layer. Examples of flow cells incorporating examples of the water-soluble protective coating are also disclosed herein.
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公开(公告)号:US11213976B2
公开(公告)日:2022-01-04
申请号:US15847150
申请日:2017-12-19
Applicant: Illumina, Inc. , Illumina Cambridge Limited
Inventor: Alexandre Richez , Andrew A. Brown , Julia Morrison , Wayne N. George , Timothy J. Merkel , Audrey Rose Zak
Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.
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公开(公告)号:US20250114980A1
公开(公告)日:2025-04-10
申请号:US18964377
申请日:2024-11-30
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor: Alexandre Richez , Andrew A. Brown , Julia Morrison , Wayne N. George , Timothy J. Merkel , Audrey Rose Zak
Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.
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