-
公开(公告)号:US12096700B2
公开(公告)日:2024-09-17
申请号:US16909718
申请日:2020-06-23
Applicant: IMEC vzw
Inventor: Sebastien Couet , Van Dai Nguyen
Abstract: The disclosed technology relates generally to magnetic devices, and more particularly to magnetic memory and/or logic devices. In an aspect, a spintronic device comprises a tunnel barrier, a storage layer provided on the tunnel barrier, and a seed layer provided on the storage layer. The storage layer includes a first magnetic layer having a first crystallographic orientation provided on the tunnel barrier, a spacer layer provided on the first magnetic layer, a second magnetic layer having a second crystallographic orientation provided on the spacer layer and exchange coupled to the first magnetic layer, an antiferromagnetic coupling layer provided on the second magnetic layer, and a third magnetic layer having the second crystallographic orientation provided on the antiferromagnetic coupling layer and antiferromagnetically coupled to the second magnetic layer.
-
公开(公告)号:US10325710B2
公开(公告)日:2019-06-18
申请号:US15860478
申请日:2018-01-02
Applicant: IMEC VZW
Inventor: Johan Swerts , Sebastien Couet
IPC: G11B5/39 , H01F10/30 , H01F10/13 , H01F10/32 , H01F41/30 , H01F41/32 , B82Y10/00 , B82Y25/00 , H01L27/22
Abstract: The disclosed technology generally relates to a magnetoresistive device and more particularly to a magnetoresistive device comprising chromium. According to an aspect, a method of forming a magnetoresistive device comprises forming a magnetic tunnel junction (MTJ) structure over a substrate. The MTJ structure includes, in a bottom-up direction away from the substrate, a free layer, a tunnel barrier layer and a reference layer. The method additionally includes forming a pinning layer over the MTJ structure, wherein the pinning layer pins a magnetization direction of the reference layer. The method additionally includes forming capping layer comprising chromium (Cr) over the pinning layer. The method further includes annealing the capping layer under a condition sufficient to cause diffusion of Cr from the capping layer into at least the pinning layer. According to another aspect, a magnetoresistive device is formed according to the method.
-
公开(公告)号:US20210126190A1
公开(公告)日:2021-04-29
申请号:US17079264
申请日:2020-10-23
Applicant: IMEC vzw
Inventor: Sebastien Couet , Siddharth Rao , Robert Carpenter
Abstract: The disclosed technology relates generally to a magnetic device and more particularly to a spintronic device comprising a tunnel barrier, a hybrid storage layer on the tunnel barrier and a metal layer on the hybrid storage layer. The hybrid storage layer comprises a first magnetic layer, a spacer layer on the first magnetic layer and at least one further magnetic layer on the spacer layer and exchange coupled to the first magnetic layer via the spacer layer.
-
公开(公告)号:US10749106B2
公开(公告)日:2020-08-18
申请号:US15801213
申请日:2017-11-01
Applicant: IMEC VZW
Inventor: Hanns Christoph Adelmann , Gouri Sankar Kar , Johan Swerts , Sebastien Couet
Abstract: The disclosed technology generally relates to semiconductor devices and more particularly to semiconductor devices comprising a magnetic tunnel junction (MTJ). In an aspect, a method of forming a magnetoresistive random access memory (MRAM) includes forming a layer stack above a substrate, where the layer stack includes a ferromagnetic reference layer, a tunnel barrier layer and a ferromagnetic free layer and a spin-orbit-torque (SOT)-generating layer. The method additionally includes, subsequent to forming the layer stack, patterning the layer stack to form a MTJ pillar.
-
公开(公告)号:US20180190419A1
公开(公告)日:2018-07-05
申请号:US15860478
申请日:2018-01-02
Applicant: IMEC VZW
Inventor: Johan Swerts , Sebastien Couet
CPC classification number: H01F10/30 , B82Y10/00 , B82Y25/00 , G11B5/3909 , H01F10/138 , H01F10/3254 , H01F41/302 , H01L27/222
Abstract: The disclosed technology generally relates to a magnetoresistive device and more particularly to a magnetoresistive device comprising chromium. According to an aspect, a method of forming a magnetoresistive device comprises forming a magnetic tunnel junction (MTJ) structure over a substrate. The MTJ structure includes, in a bottom-up direction away from the substrate, a free layer, a tunnel barrier layer and a reference layer. The method additionally includes forming a pinning layer over the MTJ structure, wherein the pinning layer pins a magnetization direction of the reference layer. The method additionally includes forming capping layer comprising chromium (Cr) over the pinning layer. The method further includes annealing the capping layer under a condition sufficient to cause diffusion of Cr from the capping layer into at least the pinning layer. According to another aspect, a magnetoresistive device is formed according to the method.
-
公开(公告)号:US11737371B2
公开(公告)日:2023-08-22
申请号:US17079264
申请日:2020-10-23
Applicant: IMEC vzw
Inventor: Sebastien Couet , Siddharth Rao , Robert Carpenter
Abstract: The disclosed technology relates generally to a magnetic device and more particularly to a spintronic device comprising a tunnel barrier, a hybrid storage layer on the tunnel barrier and a metal layer on the hybrid storage layer. The hybrid storage layer comprises a first magnetic layer, a spacer layer on the first magnetic layer and at least one further magnetic layer on the spacer layer and exchange coupled to the first magnetic layer via the spacer layer.
-
公开(公告)号:US20230165159A1
公开(公告)日:2023-05-25
申请号:US18058010
申请日:2022-11-22
Applicant: IMEC VZW
Inventor: Jose Diogo Costa , Sebastien Couet , Geoffrey Pourtois , Benoit Van Troeye
CPC classification number: H01L43/08 , G11C11/161 , H01L43/02
Abstract: The disclosure relates to spin orbit torque (SOT) magnetic random access (MRAM) devices. A magnetic structure for a SOT-MRAM device and a method for fabricating the magnetic structure are presented. The magnetic structure comprises a SOT layer and a magnetic tunnel junction (MTJ) structure arranged on the SOT layer. The SOT layer comprises a material combination of a bismuth-based material and a metal having a melting point of at least 1000° C. As a result, the SOT is thermally stable and also shows a large spin Hall angle (SHA).
-
公开(公告)号:US20230145983A1
公开(公告)日:2023-05-11
申请号:US18051719
申请日:2022-11-01
Applicant: IMEC vzw
Inventor: Sebastien Couet , Van Dai Nguyen , Gouri Sankar Kar , Siddharth Rao , Jose Diogo Costa
CPC classification number: G11C11/161 , G11C11/1673 , G11C11/1675 , H10N50/10 , H10B61/00
Abstract: The disclosed technology relates to a magnetic domain wall-based memory device including a combination of at least one magnetic domain wall track and at least one spin orbit torque (SOT) track, which are arranged in a crossing architecture. The SOT track can include a first strip of a patterned SOT generating layer, wherein the first strip extends into a first direction and is configured to pass a first current along the first direction. The magnetic domain wall track can include a second strip of the patterned SOT generating layer and a first magnetic strip of a patterned magnetic free layer, wherein the second strip extends along a second direction and intersects with the first strip in a first crossing region. The first magnetic strip can be provided on the second strip including the first crossing region and can be configured to pass a second current along the second direction. Further, a first and a second MTJ structure can be provided on the first magnetic strip and can be separated in the second direction. The first MTJ structure can be provided above the first crossing region and can be provided with a first voltage gate.
-
公开(公告)号:US20180123031A1
公开(公告)日:2018-05-03
申请号:US15801213
申请日:2017-11-01
Applicant: IMEC VZW
Inventor: Hanns Christoph Adelmann , Gouri Sankar Kar , Johan Swerts , Sebastien Couet
Abstract: The disclosed technology generally relates to semiconductor devices and more particularly to semiconductor devices comprising a magnetic tunnel junction (MTJ). In an aspect, a method of forming a magnetoresistive random access memory (MRAM) includes forming a layer stack above a substrate, where the layer stack includes a ferromagnetic reference layer, a tunnel barrier layer and a ferromagnetic free layer and a spin-orbit-torque (SOT)-generating layer. The method additionally includes, subsequent to forming the layer stack, patterning the layer stack to form a MTJ pillar.
-
公开(公告)号:US20240023459A1
公开(公告)日:2024-01-18
申请号:US18351308
申请日:2023-07-12
Applicant: IMEC VZW , Katholieke Universiteit Leuven
Inventor: Van Dai Nguyen , Eline Raymenants , Sebastien Couet , Maxwel Gama Monteiro Junior , Bob Vermeulen
CPC classification number: H10N50/10 , H10N50/01 , H10N50/85 , H10B61/00 , G11C11/161
Abstract: A magnetic device may include at least two MTJ pillars, each MTJ pillar comprising a stack of a heavy metal layer portion, a second free magnetic layer portion, a spacer portion, a first free magnetic layer portion, a tunnel barrier layer portion, and a fixed magnetic layer portion, wherein at least the heavy metal layer portions, the second free magnetic layer portions and the spacer portions extend between the MTJ pillars through respectively an interconnecting heavy metal layer portion, an interconnecting second free magnetic layer portion and an interconnecting spacer portion, and wherein the interconnecting second free magnetic layer portion has an in-plane magnetization and the second free magnetic layer portions have an out-of-plane magnetization.
-
-
-
-
-
-
-
-
-