CARBON NANOTUBE TRANSISTOR EMPLOYING EMBEDDED ELECTRODES
    1.
    发明申请
    CARBON NANOTUBE TRANSISTOR EMPLOYING EMBEDDED ELECTRODES 有权
    碳纳米管晶体管采用嵌入式电极

    公开(公告)号:US20140124736A1

    公开(公告)日:2014-05-08

    申请号:US14150954

    申请日:2014-01-09

    IPC分类号: H01L29/775 H01L29/06

    摘要: Carbon nanotubes can be aligned with compatibility with semiconductor manufacturing processes, with scalability for forming smaller devices, and without performance degradation related to structural damages. A planar structure including a buried gate electrode and two embedded electrodes are formed. After forming a gate dielectric, carbon nanotubes are assembled in a solution on a surface of the gate dielectric along the direction of an alternating current (AC) electrical field generated by applying a voltage between the two embedded electrodes. A source contact electrode and a drain contact electrode are formed by depositing a conductive material on both ends of the carbon nanotubes. Each of the source and drain contact electrodes can be electrically shorted to an underlying embedded electrode to reduce parasitic capacitance.

    摘要翻译: 碳纳米管可以与半导体制造工艺的兼容性相一致,具有用于形成较小器件的可扩展性,并且与结构损坏相关的性能下降不受影响。 形成包括掩埋栅电极和两个嵌入电极的平面结构。 在形成栅极电介质之后,沿着通过在两个嵌入电极之间施加电压而产生的交流(AC)电场的方向将碳纳米管组装在栅极电介质的表面上的溶液中。 源极接触电极和漏极接触电极通过在碳纳米管的两端上沉积导电材料而形成。 源极和漏极接触电极中的每一个可以与下面的嵌入式电极电短路以减小寄生电容。

    Carbon nanotube transistor employing embedded electrodes
    2.
    发明授权
    Carbon nanotube transistor employing embedded electrodes 有权
    采用嵌入式电极的碳纳米管晶体管

    公开(公告)号:US08987705B2

    公开(公告)日:2015-03-24

    申请号:US14150954

    申请日:2014-01-09

    摘要: Carbon nanotubes can be aligned with compatibility with semiconductor manufacturing processes, with scalability for forming smaller devices, and without performance degradation related to structural damages. A planar structure including a buried gate electrode and two embedded electrodes are formed. After forming a gate dielectric, carbon nanotubes are assembled in a solution on a surface of the gate dielectric along the direction of an alternating current (AC) electrical field generated by applying a voltage between the two embedded electrodes. A source contact electrode and a drain contact electrode are formed by depositing a conductive material on both ends of the carbon nanotubes. Each of the source and drain contact electrodes can be electrically shorted to an underlying embedded electrode to reduce parasitic capacitance.

    摘要翻译: 碳纳米管可以与半导体制造工艺的兼容性相一致,具有用于形成较小器件的可扩展性,并且与结构损坏相关的性能下降不受影响。 形成包括掩埋栅电极和两个嵌入电极的平面结构。 在形成栅极电介质之后,沿着通过在两个嵌入电极之间施加电压而产生的交流(AC)电场的方向将碳纳米管组装在栅极电介质的表面上的溶液中。 源极接触电极和漏极接触电极通过在碳纳米管的两端上沉积导电材料而形成。 源极和漏极接触电极中的每一个可以与下面的嵌入式电极电短路以减小寄生电容。

    Graphene photodetector
    5.
    发明授权
    Graphene photodetector 有权
    石墨烯光电探测器

    公开(公告)号:US08901689B1

    公开(公告)日:2014-12-02

    申请号:US13891940

    申请日:2013-05-10

    摘要: A set of buried electrodes are embedded in a dielectric material layer, and a graphene layer having a doping of a first conductivity type are formed thereupon. A first upper electrode is formed over a center portion of each buried electrode. Second upper electrodes are formed in regions that do not overlie the buried electrodes. A bias voltage is applied to the set of buried electrodes to form a charged region including minority charge carriers over each of the buried electrodes, and to form a p-n junction around each portion of the graphene layer overlying a buried electrode. Charge carriers generated at the p-n junctions are collected by the first upper electrodes and the second upper electrodes, and are subsequently measured by a current measurement device or a voltage measurement device.

    摘要翻译: 一组掩埋电极嵌入电介质材料层中,并在其上形成具有第一导电类型掺杂的石墨烯层。 在每个掩埋电极的中心部分上形成第一上电极。 第二上电极形成在不覆盖埋电极的区域中。 偏置电压施加到该掩埋电极组,以在每个掩埋电极上形成包括少数电荷载流子的带电区域,并且在覆盖埋置电极的石墨烯层的每个部分周围形成p-n结。 在p-n结处产生的电荷载体由第一上电极和第二上电极收集,随后由电流测量装置或电压测量装置测量。