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    Salt and photoresist composition comprising the same
    1.
    发明授权
    Salt and photoresist composition comprising the same 有权
    包含其的盐和光致抗蚀剂组合物

    公开(公告)号：US08530138B2

    公开(公告)日：2013-09-10

    申请号：US13216776

    申请日：2011-08-24

    申请人： Isao Yoshida ,  Koji Ichikawa

    发明人： Isao Yoshida ,  Koji Ichikawa

    IPC分类号： G03F7/00 ,  G03F7/028 ,  C07D343/00 ,  C07D411/00 ,  C07C309/00

    CPC分类号： C07C309/17 ,  C07C381/12 ,  C07C2603/74 ,  C07D233/60 ,  C07D327/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

    摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 and ring W2 independently each represent a C3-C36 aliphatic ring, R2 is independently in each occurrence a C1-C6 alkyl group, R4 is independently in each occurrence a C1-C6 alkyl group, R3 represents a C1-C12 hydrocarbon group, t represents an integer of 0 to 2, u represents an integer of 0 to 2, and Z+ represents an organic counter ion.

    摘要翻译： 本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1和L2各自表示C1-C17二价饱和烃基，其中一个或 更多的-CH 2 - 可被-O-或-CO-取代，环W1和环W2各自独立地表示C 3 -C 36脂族环，R 2在每次出现时独立地为C1-C6烷基，R4各自独立地为 C1-C6烷基，R3表示C1-C12烃基，t表示0〜2的整数，u表示0〜2的整数，Z +表示有机抗衡离子。

    Photoresist composition
    2.
    发明授权
    Photoresist composition 有权
    光刻胶组成

    公开(公告)号：US08530135B2

    公开(公告)日：2013-09-10

    申请号：US12888243

    申请日：2010-09-22

    申请人： Satoshi Yamaguchi ,  Soon Shin Kim ,  Isao Yoshida ,  Koji Ichikawa

    发明人： Satoshi Yamaguchi ,  Soon Shin Kim ,  Isao Yoshida ,  Koji Ichikawa

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

    摘要： The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein Z1 represents a C7-C20 alkylene group, a C3-C20 divalent saturated cyclic group or a divalent group formed by combining at least one C1-C6 alkylene group with at least one C3-C20 divalent saturated cyclic group.

    摘要翻译： 本发明提供了一种光致抗蚀剂组合物，其包含具有酸不稳定基团的树脂，并且在碱性水溶液中不溶或难溶，但是通过酸，酸产生剂和由 式（I）：其中Z1表示C7-C20亚烷基，C3-C20二价饱和环状基团或通过将至少一个C 1 -C 6亚烷基与至少一个C 3 -C 20二价饱和环状基团结合形成的二价基团 。

    CHEMICALLY AMPLIFIED RESIST COMPOSITION AND SALT EMPLOYED THEREIN
    3.
    发明申请
    CHEMICALLY AMPLIFIED RESIST COMPOSITION AND SALT EMPLOYED THEREIN 有权
    化学稳定组合物和盐使用的盐

    公开(公告)号：US20110020749A1

    公开(公告)日：2011-01-27

    申请号：US12844557

    申请日：2010-07-27

    申请人： Koji Ichikawa ,  Isao Yoshida ,  Satoshi Yamaguchi

    发明人： Koji Ichikawa ,  Isao Yoshida ,  Satoshi Yamaguchi

    IPC分类号： G03F7/004 ,  C07C69/757 ,  C07D307/77 ,  C07C69/78 ,  C07C69/65 ,  C07D333/46

    CPC分类号： C07C381/12 ,  C07C309/17 ,  C07C2601/14 ,  C07C2603/74 ,  C07D307/77 ,  C07D333/46 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

    摘要： The object of the present invention is to provide a chemically amplified resist composition excellent in a resolution and a mask error enhancement factor.By employing the salt represented by the formulae (A1) as an acid generator of a resist composition, the above mentioned object is achieved. wherein Z+ represents an organic cation, Q1 and Q2 each independently represent a fluorine atom or a perfluoroalkyl group, Ra2 represents a divalent alicyclic hydrocarbon group pr the like, Ra2 represents an elimination group represented by the formulae (II-1) or (II-2). In the formulae (II-1) or (II-2), Ra3 and Ra4 each independently represent a hydrogen atom or an aliphatic hydrocarbon group, Ra5 represents an aliphatic hydrocarbon group, Ra6 represents a divalent aliphatic hydrocarbon group, and Ra7 represents an aliphatic hydrocarbon group.

    摘要翻译： 本发明的目的是提供一种分辨率和掩模误差增强因子优异的化学放大抗蚀剂组合物。 通过使用由式（A1）表示的盐作为抗蚀剂组合物的酸产生剂，实现了上述目的。 其中Z +表示有机阳离子，Q1和Q2各自独立地表示氟原子或全氟烷基，Ra2表示二价脂环族烃基，Ra2表示由式（II-1）或（II- 2）。 在式（II-1）或（II-2）中，Ra 3和Ra 4各自独立地表示氢原子或脂肪族烃基，Ra 5表示脂肪族烃基，Ra 6表示二价脂肪族烃基，Ra 7表示脂肪族 烃基。

    Salt and photoresist composition containing the same
    4.
    发明授权
    Salt and photoresist composition containing the same 有权
    含有其的盐和光致抗蚀剂组合物

    公开(公告)号：US08765351B2

    公开(公告)日：2014-07-01

    申请号：US12946243

    申请日：2010-11-15

    申请人： Koji Ichikawa ,  Masako Sugihara ,  Isao Yoshida

    发明人： Koji Ichikawa ,  Masako Sugihara ,  Isao Yoshida

    IPC分类号： G03F7/00 ,  C07C309/19

    CPC分类号： C07D307/93 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C4-C36 lactone ring, R3 is a C1-C6 alkyl group etc., t represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein L2 represents a single bond etc., ring W2 represents a C3-C36 saturated hydrocarbon ring in which one —CH2— is replaced by —CO— and in which one or more —CH2— can be replaced by —O— or —CO—, R1 represents a C1-C12 hydrocarbon group, R2 is a C1-C6 alkyl group etc., and s represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein L3 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is a hydroxyl group etc., R5 is a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.

    摘要翻译： 由式（X）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被 -O-或-CO-，环W1表示C4-C36内酯环，R3表示C1-C6烷基等，t表示0〜2的整数，Z +表示有机抗衡离子，W10表示 由式（X-1）表示：其中L2表示单键等，环W2表示其中一个-CH 2 - 被-CO-替代的C 3 -C 36饱和烃环，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，R1表示C1-C12烃基，R2表示C1-C6烷基等，s表示0〜2的整数，或式（ X-2）：其中L3表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，环W3重复 呈现C3-C36饱和烃环，R4为羟基等，R5为C1-C6烷基等，v为1〜3的整数，w为0〜2的整数。

    PHOTORESIST COMPOSITION
    7.
    发明申请
    PHOTORESIST COMPOSITION 有权
    光电组合物

    公开(公告)号：US20110076617A1

    公开(公告)日：2011-03-31

    申请号：US12888243

    申请日：2010-09-22

    申请人： Satoshi Yamaguchi ,  Soon Shin Kim ,  Isao Yoshida ,  Koji Ichikawa

    发明人： Satoshi Yamaguchi ,  Soon Shin Kim ,  Isao Yoshida ,  Koji Ichikawa

    IPC分类号： G03F7/20 ,  G03C1/73

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

    摘要： The present invention provides a photoresist composition comprising a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein Z1 represents a C7-C20 alkylene group, a C3-C20 divalent saturated cyclic group or a divalent group formed by combining at least one C1-C6 alkylene group with at least one C3-C20 divalent saturated cyclic group.

    摘要翻译： 本发明提供了一种光致抗蚀剂组合物，其包含具有酸不稳定基团的树脂，并且在碱性水溶液中不溶或难溶，但是通过酸，酸产生剂和由 式（I）：其中Z1表示C7-C20亚烷基，C3-C20二价饱和环状基团或通过将至少一个C 1 -C 6亚烷基与至少一个C 3 -C 20二价饱和环状基团结合形成的二价基团 。

    Salt and photoresist composition containing the same
    9.
    发明授权
    Salt and photoresist composition containing the same 有权
    含有其的盐和光致抗蚀剂组合物

    公开(公告)号：US08735044B2

    公开(公告)日：2014-05-27

    申请号：US12786738

    申请日：2010-05-25

    申请人： Koji Ichikawa ,  Isao Yoshida

    发明人： Koji Ichikawa ,  Isao Yoshida

    IPC分类号： G03F7/039 ,  C07C303/32 ,  G03F7/004

    CPC分类号： G03F7/039 ,  C07C303/32 ,  C07C309/17 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

    摘要： A salt represented by the formula (a): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., X2 represents a single bond etc., Y1 represents a C3-C6 alicyclic hydrocarbon group etc., with the proviso that —X2—Y1 group has one or more fluorine atoms, and Z+ represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

    摘要翻译： 由式（a）表示的盐：其中Q1和Q2各自独立地表示氟原子等，X1表示单键等，X2表示单键等，Y1表示C3-C6脂肪族烃基等。 条件是-X2-Y1基团具有一个或多个氟原子，Z +表示有机抗衡阳离子，以及包含由式（a）表示的盐的光致抗蚀剂组合物和包含具有酸性基团的结构单元的树脂， 不稳定的基团，并且在碱性水溶液中不溶或难溶，但是通过酸的作用变得可溶于碱性水溶液。