Apparatus and Method for Fabrication of Shield Plate

    公开(公告)号:US20240208762A1

    公开(公告)日:2024-06-27

    申请号:US18536792

    申请日:2023-12-12

    Applicant: JEOL Ltd.

    CPC classification number: B65H35/002 B65H59/06 H01J37/09 H01J37/3053

    Abstract: There is provided a shield plate fabrication apparatus capable of fabricating a shield plate easily. The shield plate is included in a sample milling apparatus which mills a sample by shielding a part of the sample with the shield plate and irradiating the sample with a charged particle beam. The fabrication apparatus includes: a base plate holding shaft for rotatably holding a base plate and winding tape around the base plate; and a tension mechanism for applying tension to the tape while it is being wound around the base plate.

    Apparatus and Method for Sample Preparation
    2.
    发明申请
    Apparatus and Method for Sample Preparation 审中-公开
    样品制备的装置和方法

    公开(公告)号:US20150311028A1

    公开(公告)日:2015-10-29

    申请号:US14630719

    申请日:2015-02-25

    Applicant: JEOL Ltd.

    Inventor: Tsutomu Negishi

    CPC classification number: H01J37/09 G01N1/32 H01J37/08 H01J37/226

    Abstract: A sample preparation apparatus (100) is used to prepare a cross section of a sample (S) by irradiating it with an ion beam. The apparatus (100) includes an ion beam generator (10), a shield plate (40) disposed to cover a part of the sample (S) to shield the sample (S) from the ion beam, and a controller (82) controlling the ion beam generator (10). The controller (82) controls performance of first and second operations. In the first operation, the ion beam is accelerated by a first accelerating voltage and hits the sample (S) while the sample (S) and the shield plate (40) are located in a given positional relationship. In the second operation, the ion beam is accelerated by a second accelerating voltage lower than the first accelerating voltage and hits the sample (S) while the given positional relationship is maintained.

    Abstract translation: 样品制备装置(100)用于通过用离子束照射来制备样品(S)的横截面。 设备(100)包括离子束发生器(10),设置成覆盖样品(S)的一部分以屏蔽样品(S)离子束的屏蔽板(40),以及控制器(82),其控制 离子束发生器(10)。 控制器(82)控制第一和第二操作的性能。 在第一操作中,离子束以第一加速电压加速,并且在样品(S)和屏蔽板(40)位于给定的位置关系中时,撞击样品(S)。 在第二操作中,离子束加速低于第一加速电压的第二加速电压,并且在保持给定的位置关系的同时击中样品(S)。

    Specimen Machining Device and Specimen Machining Method

    公开(公告)号:US20220392739A1

    公开(公告)日:2022-12-08

    申请号:US17832054

    申请日:2022-06-03

    Applicant: JEOL Ltd.

    Abstract: A specimen machining device for machining a specimen by irradiating the specimen with an ion beam includes an ion source for irradiating the specimen with the ion beam, a shielding member disposed on the specimen to block the ion beam, a specimen stage for holding the specimen, a camera for photographing the specimen, a coaxial illumination device for irradiating the specimen with illumination light along an optical axis of the camera, and a processing unit for determining whether to terminate the machining based on an image photographed by the camera. The processing unit performs processing for acquiring information indicating a target machined width, processing for acquiring the image, processing for measuring a machined width on the acquired image, and processing for terminating the machining when the measured machined width equals or exceeds the target machined width.

    Sample holder system and sample observation apparatus

    公开(公告)号:US10930467B2

    公开(公告)日:2021-02-23

    申请号:US16004927

    申请日:2018-06-11

    Applicant: JEOL Ltd.

    Inventor: Tsutomu Negishi

    Abstract: A sample holder system includes a sample holder and a sample adjusting unit. The sample holder includes a shielding plate, a holder body, a holding portion, and a fastening mechanism. The fastening mechanism fastens the holding portion to the holder body, the fastening mechanism preventing the holding portion from swinging when the holding portion is fastened to the holder body. The sample adjusting unit includes a position adjusting jig that comes into contact with the holding portion, and a swinging mechanism that supports the position adjusting jig such that the position adjusting jig is swingable.

    Specimen Holder, Specimen Preparation Device, and Positioning Method
    5.
    发明申请
    Specimen Holder, Specimen Preparation Device, and Positioning Method 有权
    试样支架,试样制备装置和定位方法

    公开(公告)号:US20160139398A1

    公开(公告)日:2016-05-19

    申请号:US14944517

    申请日:2015-11-18

    Applicant: JEOL Ltd.

    Abstract: A specimen holder is used for an optical microscope, comprising: a specimen support that supports a specimen to enable the specimen to tilt relative to the optical axis of the optical microscope; an adjustment plate that has an observation surface for making observations using the optical microscope; and an adjustment plate support that supports the adjustment plate, so that the angle formed by the optical axis and the observation surface is larger than the angle formed by the optical axis and a specimen surface of the specimen.

    Abstract translation: 样品架用于光学显微镜,包括:样品支撑体,其支撑试样以使样品相对于光学显微镜的光轴倾斜; 调整板,其具有使用光学显微镜进行观察的观察面; 以及支撑调节板的调节板支撑件,使得由光轴和观察表面形成的角度大于由光轴和样本的样本表面形成的角度。

    Specimen Holder, Specimen Holder Set, and Specimen Preparation Method

    公开(公告)号:US20240248014A1

    公开(公告)日:2024-07-25

    申请号:US18416425

    申请日:2024-01-18

    Applicant: JEOL Ltd.

    CPC classification number: G01N1/36

    Abstract: A specimen holder includes a holder main body, a specimen mount to which a specimen is to be fixed, and a pressing member which slidably presses the specimen mount against the holder main body. A through-hole is provided in the specimen mount, and the specimen mount is tilted with respect to the holder main body by tilting a rod-like member which is inserted into the through-hole.

    Vacuum cooling apparatus and ion milling apparatus

    公开(公告)号:US11043355B2

    公开(公告)日:2021-06-22

    申请号:US16701650

    申请日:2019-12-03

    Applicant: JEOL Ltd.

    Inventor: Tsutomu Negishi

    Abstract: An ion milling apparatus includes a sample holder, a vacuum chamber, an evacuation section, a vacuum gauge, a heater, a gas inlet assembly, and a control section. The evacuation section vents gas in the interior space of the vacuum chamber. The vacuum gauge measures the pressure in the interior space of the vacuum chamber. The heater heats the sample holder. The gas inlet assembly admits a dry gas containing no moisture into the interior space of the vacuum chamber. When the pressure in the interior space has reached below a given pressure, the control section controls the gas inlet assembly based on information about the pressure in the interior space so as to admit the dry gas into the vacuum chamber.

    Sample Holder System and Sample Observation Apparatus

    公开(公告)号:US20180358201A1

    公开(公告)日:2018-12-13

    申请号:US16004927

    申请日:2018-06-11

    Applicant: JEOL Ltd.

    Inventor: Tsutomu Negishi

    CPC classification number: H01J37/20 H01J37/3005 H01J37/3053 H01J2237/2007

    Abstract: A sample holder system includes a sample holder and a sample adjusting unit. The sample holder includes a shielding plate, a holder body, a holding portion, and a fastening mechanism. The fastening mechanism fastens the holding portion to the holder body, the fastening mechanism preventing the holding portion from swinging when the holding portion is fastened to the holder body. The sample adjusting unit includes a position adjusting jig that comes into contact with the holding portion, and a swinging mechanism that supports the position adjusting jig such that the position adjusting jig is swingable.

    Ion Beam Processing System and Sample Processing Method
    10.
    发明申请
    Ion Beam Processing System and Sample Processing Method 有权
    离子束处理系统和样品处理方法

    公开(公告)号:US20130134325A1

    公开(公告)日:2013-05-30

    申请号:US13680292

    申请日:2012-11-19

    Applicant: Jeol Ltd.

    Inventor: Tsutomu Negishi

    CPC classification number: G01N1/44 G01N1/32

    Abstract: An ion beam processing system (100) processes the sample (S) mounted on a sample stage (30) by irradiating the sample with an ion beam in a sample chamber (2). The system has a sample container (20) including a cover portion (26) formed to be detachably mountable to a base portion (24), the sample stage (30) on which the container (20) is detachably mountable, and cover mounting/dismounting apparatus (40) for mounting and dismounting the cover portion (26) from outside the sample chamber (2).

    Abstract translation: 离子束处理系统(100)通过在样品室(2)中用离子束照射样品来处理安装在样品台(30)上的样品(S)。 该系统具有样本容器(20),其包括形成为可拆卸地安装到基部(24)的盖部分(26),容器(20)可拆卸地安装在其上的样品台(30) 用于从所述样品室(2)的外部安装和拆卸所述盖部(26)的拆卸装置(40)。

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