PATTERNING DEVICES USING FLUORINATED COMPOUNDS
    4.
    发明申请
    PATTERNING DEVICES USING FLUORINATED COMPOUNDS 有权
    使用氟化合物的图案装置

    公开(公告)号:US20100289019A1

    公开(公告)日:2010-11-18

    申请号:US12864407

    申请日:2009-04-10

    摘要: A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.

    摘要翻译: 用于制造空间图案化结构的方法包括在空间图案化结构的子结构的至少一部分上形成材料层,在材料层上形成氟化材料的阻挡层以提供中间结构,并暴露 将所述中间结构结合到所述第二材料或辐射中的至少一种以引起所述中间结构的至少一部分的化学变化或结构变化中的至少一种。 阻挡层在曝光期间基本上保护材料层免受化学和结构变化的影响。 按照这种方法生产子结构。

    PATTERNING DEVICES USING FLUORINATED COMPOUNDS
    7.
    发明申请
    PATTERNING DEVICES USING FLUORINATED COMPOUNDS 审中-公开
    使用氟化合物的图案装置

    公开(公告)号:US20150380651A1

    公开(公告)日:2015-12-31

    申请号:US14742894

    申请日:2015-06-18

    IPC分类号: H01L51/00 H01L51/52

    摘要: A method for producing a spatially patterned structure includes forming a layer of a material on at least a portion of a substructure of the spatially patterned structure, forming a barrier layer of a fluorinated material on the layer of material to provide an intermediate structure, and exposing the intermediate structure to at least one of a second material or radiation to cause at least one of a chemical change or a structural change to at least a portion of the intermediate structure. The barrier layer substantially protects the layer of the material from chemical and structural changes during the exposing. Substructures are produced according to this method.

    摘要翻译: 用于制造空间图案化结构的方法包括在空间图案化结构的子结构的至少一部分上形成材料层,在材料层上形成氟化材料的阻挡层以提供中间结构,并暴露 将所述中间结构结合到所述第二材料或辐射中的至少一种以引起所述中间结构的至少一部分的化学变化或结构变化中的至少一种。 阻挡层在曝光期间基本上保护材料层免受化学和结构变化的影响。 按照这种方法生产子结构。