公开(公告)号：US20100177321A1

公开(公告)日：2010-07-15

申请号：US12684632

申请日：2010-01-08

申请人： Jochen HETZLER ,  Frank Schillke ,  Stefan Schulte ,  Rolf Freimann ,  Bernd Doerband

发明人： Jochen HETZLER ,  Frank Schillke ,  Stefan Schulte ,  Rolf Freimann ,  Bernd Doerband

IPC分类号： G01B11/02

CPC分类号： G01B9/021 ,  G01B9/02039 ,  G01B11/2441 ,  G01M11/025 ,  G01M11/0271 ,  Y10T29/49771

摘要： Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.

摘要翻译： 具有光学表面的光学元件，该光学表面适于非球形目标形状，使得光学表面的实际形状相对于目标形状的长波变化被限制为最大值为0.2nm， 其中所述长波变化仅包括具有等于或大于10mm的最小空间波长的空间波长的振荡。

公开(公告)号：US08089634B2

公开(公告)日：2012-01-03

申请号：US12684632

申请日：2010-01-08

申请人： Jochen Hetzler ,  Frank Schillke ,  Stefan Schulte ,  Rolf Freimann ,  Bernd Doerband

发明人： Jochen Hetzler ,  Frank Schillke ,  Stefan Schulte ,  Rolf Freimann ,  Bernd Doerband

IPC分类号： G01B9/02 ,  G01B11/02

CPC分类号： G01B9/021 ,  G01B9/02039 ,  G01B11/2441 ,  G01M11/025 ,  G01M11/0271 ,  Y10T29/49771

摘要： Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.

摘要翻译： 具有光学表面的光学元件，该光学表面适于非球形目标形状，使得光学表面的实际形状相对于目标形状的长波变化被限制为最大值为0.2nm， 其中所述长波变化仅包括具有等于或大于10mm的最小空间波长的空间波长的振荡。

公开(公告)号：US20050275849A1

公开(公告)日：2005-12-15

申请号：US11133329

申请日：2005-05-20

申请人： Rolf Freimann ,  Bernd Doerband ,  Frank Schillke ,  Susanne Beder ,  Stefan Schulte

发明人： Rolf Freimann ,  Bernd Doerband ,  Frank Schillke ,  Susanne Beder ,  Stefan Schulte

IPC分类号： G01B9/02 ,  G01M11/00

CPC分类号： G01B9/02072 ,  G01B9/02039 ,  G01M11/005

摘要： A method of calibrating an interferometer for determining an optical property of the interferometer uses a calibrating optical arrangement. The calibrating optical arrangement comprises at least one diffractive pattern and a mirror having a reflecting surface. The diffractive pattern and the reflecting surface are disposed at a distance from each other in a beam path of measuring light emitted from an interferometer optics of the interferometer system to be calibrated.

摘要翻译： 校准用于确定干涉仪的光学特性的干涉仪的方法使用校准光学装置。 校准光学装置包括至少一个衍射图案和具有反射表面的反射镜。 衍射图案和反射表面设置在从待校准的干涉仪系统的干涉仪光学器件发射的测量光束的光束路径中彼此间隔一定距离处。

公开(公告)号：US20050225774A1

公开(公告)日：2005-10-13

申请号：US11098546

申请日：2005-04-05

申请人： Rolf Freimann ,  Susanne Beder ,  Guenther Seitz ,  Frank Schillke ,  Bernd Doerband ,  Heinz Martin ,  Franz Krug

发明人： Rolf Freimann ,  Susanne Beder ,  Guenther Seitz ,  Frank Schillke ,  Bernd Doerband ,  Heinz Martin ,  Franz Krug

IPC分类号： G01B9/02 ,  G01M11/02 ,  G02B13/18 ,  G02B27/62

CPC分类号： G01M11/0214 ,  G01M11/025 ,  G01M11/0271 ,  G02B13/18 ,  G02B27/62

摘要： A method of processing an optical element comprises testing the optical surface of the optical element using an interferometer optics for generating a beam of measuring light; wherein the interferometer optics has a plurality of optical elements which are configured and arranged such that the measuring light is substantially orthogonally incident on a reflecting surface, at each location thereof; and wherein the method further comprises: measuring at least one property of the interferometer optics, disposing the optical surface of the optical element at a measuring position relative to the interferometer optics within the beam of measuring light, and performing at least one interferometric measurement; determining deviations of the optical surface of the first optical element from a target shape thereof, based on the interferometric measurement and the at least one measured property of the interferometer optics.

摘要翻译： 一种处理光学元件的方法包括使用用于产生测量光束的干涉仪光学器件来测试光学元件的光学表面; 其中所述干涉仪光学元件具有多个光学元件，所述多个光学元件被配置和布置成使得所述测量光在其每个位置处基本正交入射在反射表面上; 并且其中所述方法还包括：测量所述干涉仪光学器件的至少一个属性，将所述光学元件的光学表面相对于所述测量光束内的所述干涉仪光学器件设置在测量位置处，并且执行至少一个干涉测量; 基于干涉测量和干涉仪光学器件的至少一个测量特性，确定第一光学元件的光学表面与其目标形状的偏差。

公开(公告)号：US07133225B1

公开(公告)日：2006-11-07

申请号：US10965909

申请日：2004-10-18

申请人： Rolf Freimann ,  Bernhard Fellner ,  Hans-Guenther Sachs ,  Hartmut Brandenburg ,  Bernd Doerband ,  Frank Schillke

发明人： Rolf Freimann ,  Bernhard Fellner ,  Hans-Guenther Sachs ,  Hartmut Brandenburg ,  Bernd Doerband ,  Frank Schillke

IPC分类号： G02B7/02 ,  G01B11/00 ,  G01N23/207

CPC分类号： G02B7/023 ,  G02B7/1821 ,  G03F7/70258 ,  G03F7/70825

摘要： A method of manufacturing an optical system comprises assembling an optical element on a mounting frame thereof. The mounting frame is disposed on a rotary table having an axis of rotation, and the mounting frame is adjusted such that a predefined axis of symmetry thereof is parallel to the axis of rotation. The optical element is placed on the mounting frame, and an interferometric measurement of a surface of the optical element is performed. The interferometric measurement is analyzed to arrange the optical element relative to the mounting frame such that a predefined axis of the optical element is parallel to the axis of rotation.

摘要翻译： 制造光学系统的方法包括在其安装框架上组装光学元件。 安装框架设置在具有旋转轴线的旋转工作台上，并且调整安装框架使其预定的对称轴线平行于旋转轴线。 将光学元件放置在安装框架上，并执行光学元件的表面的干涉测量。 分析干涉测量以使光学元件相对于安装框架布置，使得光学元件的预定轴线平行于旋转轴线。

公开(公告)号：US08593642B2

公开(公告)日：2013-11-26

申请号：US13417487

申请日：2012-03-12

申请人： Rolf Freimann ,  Bernd Doerband ,  Stefan Schulte ,  Albrecht Hof ,  Frank Riepenhausen ,  Matthias Manger ,  Dietmar Neugebauer ,  Helmut Issler ,  Armin Bich

发明人： Rolf Freimann ,  Bernd Doerband ,  Stefan Schulte ,  Albrecht Hof ,  Frank Riepenhausen ,  Matthias Manger ,  Dietmar Neugebauer ,  Helmut Issler ,  Armin Bich

IPC分类号： G01B11/02

CPC分类号： G01B11/2441 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02072 ,  G01B2290/15 ,  G01M11/005 ,  G01M11/025 ,  G01M11/0271 ,  G02B3/02 ,  G02B5/10

摘要： Measuring a shape of an optical surface (14) of a test object (12) includes: providing an interferometric measuring device (16) generating a measurement wave (18); arranging the measuring device (16) and the test object (12) consecutively at different measurement positions relative to each other, such that different regions (20) of the optical surface (14) are illuminated by the measurement wave (18); measuring positional coordinates of the measuring device (16) at the different measurement positions in relation to the test object (12); obtaining surface region measurements by interferometrically measuring the wavefront of the measurement wave (18) after interaction with the respective region (20) of the optical surface (14) using the measuring device (16) in each of the measurement positions; and determining the actual shape of the optical surface (14) by computationally combining the surface region measurements based on the measured positional coordinates of the measuring device (16) at each of the measurement positions.

摘要翻译： 测量被测物体（12）的光学表面（14）的形状包括：提供产生测量波（18）的干涉测量装置（16）; 使测量装置（16）和测试对象（12）相对于彼此的不同测量位置连续布置，使得光学表面（14）的不同区域（20）被测量波（18）照亮; 测量所述测量装置（16）在与所述测试对象（12）相关的不同测量位置处的位置坐标; 通过在每个测量位置中使用测量装置（16）在与光学表面（14）的相应区域（20）相互作用之后干涉测量测量波（18）的波前来获得表面区域测量; 以及通过基于在每个测量位置处测量装置（16）的测量位置坐标计算地组合表面区域测量来确定光学表面（14）的实际形状。

公开(公告)号：US07581305B2

公开(公告)日：2009-09-01

申请号：US10821959

申请日：2004-04-12

申请人： Bernhard Geuppert ,  Jens Kugler ,  Thomas Ittner ,  Bernd Geh ,  Rolf Freimann ,  Guenther Seitz ,  Bernhard Fellner ,  Bernd Doerband ,  Stefan Schulte

发明人： Bernhard Geuppert ,  Jens Kugler ,  Thomas Ittner ,  Bernd Geh ,  Rolf Freimann ,  Guenther Seitz ,  Bernhard Fellner ,  Bernd Doerband ,  Stefan Schulte

IPC分类号： G01R31/28

CPC分类号： G03F7/706 ,  B24B13/0055 ,  G03F7/70825 ,  Y10T29/49002 ,  Y10T29/49004 ,  Y10T29/4902 ,  Y10T29/49131 ,  Y10T29/49171

摘要： A method of manufacturing an optical component comprising a substrate and a mounting frame with plural contact portions disposed at predetermined distances from each other is provided. The method comprises providing a measuring frame separate from the mounting frame for mounting the substrate, which measuring frame comprises a number of contact portions equal to a number of the contact portions of the mounting frame, wherein respective distances between the contact portions of the measuring frame are substantially equal to the corresponding distances between those of the mounting frame, measuring a shape of the optical surface of the substrate, while the substrate is mounted on the measuring frame, and mounting the substrate on the mounting frame such that the contact portions of the mounting frame are attached to the substrate at regions which are substantially the same as contact regions at which the substrate was attached to the measuring frame.

摘要翻译： 提供了一种制造光学部件的方法，该光学部件包括基板和安装框架，所述安装框架具有彼此以预定距离设置的多个接触部分。 该方法包括提供与用于安装基板的安装框架分离的测量框架，该测量框架包括等于安装框架的多个接触部分的多个接触部分，其中测量框架的接触部分之间的相应距离 基本上等于安装框架的相应距离，测量基板的光学表面的形状，同时将基板安装在测量框架上，以及将基板安装在安装框架上，使得接触部分 安装框架在与基板附接到测量框架的接触区域基本相同的区域处附接到基板。

公开(公告)号：US20050223539A1

公开(公告)日：2005-10-13

申请号：US10821959

申请日：2004-04-12

申请人： Bernhard Geuppert ,  Jens Kugler ,  Thomas Ittner ,  Bernd Geh ,  Rolf Freimann ,  Guenther Seitz ,  Bernhard Fellner ,  Bernd Doerband ,  Stefan Schulte

发明人： Bernhard Geuppert ,  Jens Kugler ,  Thomas Ittner ,  Bernd Geh ,  Rolf Freimann ,  Guenther Seitz ,  Bernhard Fellner ,  Bernd Doerband ,  Stefan Schulte

IPC分类号： B24B13/005 ,  G02B7/00 ,  G03F7/20 ,  G11B7/24

CPC分类号： G03F7/706 ,  B24B13/0055 ,  G03F7/70825 ,  Y10T29/49002 ,  Y10T29/49004 ,  Y10T29/4902 ,  Y10T29/49131 ,  Y10T29/49171

摘要： A method of manufacturing an optical component comprising a substrate and a mounting frame with plural contact portions disposed at predetermined distances from each other is provided. The method comprises providing a measuring frame separate from the mounting frame for mounting the substrate, which measuring frame comprises a number of contact portions equal to a number of the contact portions of the mounting frame, wherein respective distances between the contact portions of the measuring frame are substantially equal to the corresponding distances between those of the mounting frame, measuring a shape of the optical surface of the substrate, while the substrate is mounted on the measuring frame, and mounting the substrate on the mounting frame such that the contact portions of the mounting frame are attached to the substrate at regions which are substantially the same as contact regions at which the substrate was attached to the measuring frame.

摘要翻译： 提供了一种制造光学部件的方法，该光学部件包括基板和安装框架，所述安装框架具有彼此以预定距离设置的多个接触部分。 该方法包括提供与用于安装基板的安装框架分离的测量框架，该测量框架包括等于安装框架的多个接触部分的多个接触部分，其中测量框架的接触部分之间的相应距离 基本上等于安装框架的相应距离，测量基板的光学表面的形状，同时将基板安装在测量框架上，以及将基板安装在安装框架上，使得接触部分 安装框架在与基板附接到测量框架的接触区域基本相同的区域处附接到基板。

公开(公告)号：US08345262B2

公开(公告)日：2013-01-01

申请号：US13361442

申请日：2012-01-30

申请人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

发明人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

IPC分类号： G01B11/02

CPC分类号： G01B11/2441 ,  G01B9/02039

摘要： An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting sphere of at least 5 μm or a substantially rotationally symmetrical surface having a deviation from its best-fitting sphere of at least 0.5 mm.

摘要翻译： 一种具有光学表面（12; 103）的光学元件，该光学表面具有实际形状，实际形状偏离所需形状最大为0.2nm，其中所需形状为：自由曲面与 其最适合的球体至少为5μm，或者具有与其最佳拟合球体至少为0.5mm的偏差的基本上旋转对称的表面。

公开(公告)号：US08104905B2

公开(公告)日：2012-01-31

申请号：US12263564

申请日：2008-11-03

申请人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

发明人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

IPC分类号： G02B5/08 ,  G01B11/02 ,  G01B9/02 ,  G02B5/18 ,  G02B27/44

CPC分类号： G01B11/2441 ,  G01B9/02039

摘要： An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting sphere of at least 5 μm or a substantially rotationally symmetrical surface having a deviation from its best-fitting sphere of at least 0.5 mm.

摘要翻译： 一种具有光学表面（12; 103）的光学元件，该光学表面具有实际形状，实际形状偏离所需形状最大为0.2nm，其中所需形状为：自由曲面与 其最适合的球体至少为5μm，或者具有与其最佳拟合球体至少为0.5mm的偏差的基本上旋转对称的表面。