公开(公告)号：US20080203828A1

公开(公告)日：2008-08-28

申请号：US11814003

申请日：2006-01-10

申请人： Johan Cornelis Compter ,  Petrus Carolus Maria Frissen ,  Jan Van Eijk

发明人： Johan Cornelis Compter ,  Petrus Carolus Maria Frissen ,  Jan Van Eijk

IPC分类号： H02K41/00

CPC分类号： G03F7/70758 ,  Y10S414/135

摘要： Especially for use in the semiconductor industry, a displacement device (701) is disclosed comprising a first part comprising a carrier (714) on which a system of magnets (710) is arranged according to a pattern of row and columns extending parallel to the X-direction and the Y-direction, respectively. The magnets in each row and column are arranged according to a Halbach array, i.e. the magnetic orientation of successive magnets in each row and each column rotates 90° counter-clockwise. The second part comprises an electric coil system (712) with two types of electric coils, one type having an angular offset of +45°, and the other type having an offset of −45° with respect to the X-direction. The first part (714, 710) is movable over a range of centimeters or more with respect to the stationary second part (712). For high precision positioning of the first part, an interferometer system (731, 730) is provided.

摘要翻译： 特别是用于半导体工业中，公开了一种位移装置（701），其包括第一部分，该第一部分包括载体（714），磁体系统（710）根据平行于X的行和列的图案排列在其上 方向和Y方向。 每行和列中的磁体根据Halbach阵列布置，即每行中的连续磁体的磁性取向，并且每列逆时针旋转90°。 第二部分包括具有两种类型的电线圈的电线圈系统（712），一种类型的角偏移为+ 45°，另一种类型相对于X方向具有-45°的偏移。 第一部分（714,710）可相对于固定的第二部分（712）在一厘米或更多的范围内移动。 对于第一部分的高精度定位，提供了干涉仪系统（731,730）。

公开(公告)号：US07948122B2

公开(公告)日：2011-05-24

申请号：US11814003

申请日：2006-01-10

申请人： Johan Cornelis Compter ,  Petrus Carolus Maria Frissen ,  Jan Van Eijk

发明人： Johan Cornelis Compter ,  Petrus Carolus Maria Frissen ,  Jan Van Eijk

IPC分类号： H02K41/00 ,  G03F7/20

CPC分类号： G03F7/70758 ,  Y10S414/135

摘要： Especially for use in the semiconductor industry, a displacement device (701) is disclosed comprising a first part comprising a carrier (714) on which a system of magnets (710) is arranged according to a pattern of row and columns extending parallel to the X-direction and the Y-direction, respectively. The magnets in each row and column are arranged according to a Halbach array, i.e. the magnetic orientation of successive magnets in each row and each column rotates 90° counter-clockwise. The second part comprises an electric coil system (712) with two types of electric coils, one type having an angular offset of +45°, and the other type having an offset of −45° with respect to the X-direction. The first part (714, 710) is movable over a range of centimeters or more with respect to the stationary second part (712). For high precision positioning of the first part, an interferometer system (731, 730) is provided.

摘要翻译： 特别是用于半导体工业中，公开了一种位移装置（701），其包括第一部分，该第一部分包括载体（714），磁体系统（710）根据平行于X的行和列的图案排列在其上 方向和Y方向。 每行和列中的磁体根据Halbach阵列布置，即每行中的连续磁体的磁性取向，并且每列逆时针旋转90°。 第二部分包括具有两种类型的电线圈的电线圈系统（712），一种类型的角偏移为+ 45°，另一种类型相对于X方向具有-45°的偏移。 第一部分（714,710）可相对于固定的第二部分（712）在一厘米或更多的范围内移动。 对于第一部分的高精度定位，提供了干涉仪系统（731,730）。

公开(公告)号：US07375479B2

公开(公告)日：2008-05-20

申请号：US10539371

申请日：2003-12-15

申请人： Jan Van Eijk ,  Arjan Franklin Bakker ,  Dennis Erwin Bos ,  Johan Cornelis Compter ,  Angelo Cesar Peter De Klerk ,  Franciscus Martinus Roes ,  Hubert Gerard Jean Joseph Amaury Vroomen ,  Thomas Petrus Hendricus Warmerdam

发明人： Jan Van Eijk ,  Arjan Franklin Bakker ,  Dennis Erwin Bos ,  Johan Cornelis Compter ,  Angelo Cesar Peter De Klerk ,  Franciscus Martinus Roes ,  Hubert Gerard Jean Joseph Amaury Vroomen ,  Thomas Petrus Hendricus Warmerdam

IPC分类号： H02K41/00 ,  H02P1/00 ,  H02P3/00 ,  H02P5/00 ,  H02P7/00

CPC分类号： F16C32/0472 ,  F16C32/0444 ,  G05B2219/41327 ,  G05B2219/42092 ,  G05B2219/49276 ,  H01J37/20 ,  H01J2237/20278 ,  H01J2237/3175 ,  H02K11/22 ,  H02K41/031

摘要： A apparatus processes an object (19), such as a semi-conductor wafer at accurately controlled positions. The object (19) is supported by a working platform (12) that is moveable along a path. A suspension actuator part (14) attached to the working platform (12), contains a soft magnetic core (24) with poles facing the surface of a soft magnetic element (34) on the support structure along the path and a winding (20) for application of a current to generate a magnetic field that runs through the core (24) v the poles and returns via the soft magnetic element (34). A sensor (17) senses a measured position of the suspension actuator part (14) relative to the position reference element (16). A control circuit comprises an outer control circuit (40) and an inner control circuit (42). The outer control circuit (40) receives a sensing result and determines force set point information to regulate the measured position of the actuator part (14) to a required value. The inner control circuit (42) receives the force set point information and controls the current to realize a force between the actuator part (14) and the support structure (10) according to the force set point information.

摘要翻译： 一种设备在精确控制的位置处理诸如半导体晶片的物体（19）。 物体（19）由可沿着路径移动的工作平台（12）支撑。 安装在工作平台（12）上的悬架致动器部件（14）包含一个软磁芯（24），该软磁芯（24）具有面向沿该路径的支撑结构上的软磁元件（34）表面的磁极和一个绕组（20） 用于施加电流以产生穿过磁芯（24）的磁场，并通过软磁元件（34）返回磁极。 传感器（17）相对于位置参考元件（16）感测悬架致动器部件（14）的测量位置。 控制电路包括外部控制电路（40）和内部控制电路（42）。 外部控制电路（40）接收感测结果并且确定力设定点信息以将致动器部件（14）的测量位置调节到所需值。 内部控制电路（42）接收力设定点信息并根据力设定点信息控制电流以实现致动器部件（14）和支撑结构（10）之间的力。

公开(公告)号：US08896811B2

公开(公告)日：2014-11-25

申请号：US12853916

申请日：2010-08-10

申请人： Sven Antoin Johan Hol ,  Jan Van Eijk ,  Antonius Franciscus Johannes De Groot ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Geert-Jan Petrus Naaijkens ,  Marijn Kessels ,  Daniël Godfried Emma Hobbelen

发明人： Sven Antoin Johan Hol ,  Jan Van Eijk ,  Antonius Franciscus Johannes De Groot ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Geert-Jan Petrus Naaijkens ,  Marijn Kessels ,  Daniël Godfried Emma Hobbelen

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70758

摘要： A method for positioning a substage, supported by a main stage, relative to a reference object, the substage moveable in a direction between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems, each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero.

摘要翻译： 一种用于定位由主台支撑的子台相对于参考对象的方法，所述子台可在相对于主台的第一和第二位置之间的方向上移动。 该方法包括使用通过定位主平台来激活的被动力系统来定位第一阶段。 被动力系统包括两个磁体系统，每个磁体系统构造成以非接触方式相对于第二平台向第一阶段施加力，所述力施加到第一阶段 被动力系统的方向。 合力的大小和/或方向取决于第一级相对于第二级的位置，第一级在合力为零的第一和第二位置之间具有零力位置。

公开(公告)号：US20120300188A1

公开(公告)日：2012-11-29

申请号：US13477748

申请日：2012-05-22

申请人： Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yang-Shan Huang

发明人： Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yang-Shan Huang

IPC分类号： G03B27/60

CPC分类号： G03F7/70783 ,  G03F7/70758

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.

摘要翻译： 光刻设备包括被配置为调节辐射束和构造成支撑图案形成装置的支撑件的照明系统，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述光刻设备还包括构造成保持基板的基板台; 定位器，其被构造成定位所述衬底台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，布置成接合面向投影系统的衬底的表面的一部分;以及位置控制器，其被配置为控制衬底台的位置，位置控制器布置成驱动定位器和衬底表面致动器。

公开(公告)号：US08059261B2

公开(公告)日：2011-11-15

申请号：US10855976

申请日：2004-05-28

申请人： Antoine Hendrik Verweij ,  Jacobus Frederik Molenaar ,  Gerbrand Petrus Johannes Van Den Hoven ,  Michael Johannes Vervoordeldonk ,  Michel Gerardus Pardoel ,  Gerardus Johannes Verdoes ,  Jan Van Eijk

发明人： Antoine Hendrik Verweij ,  Jacobus Frederik Molenaar ,  Gerbrand Petrus Johannes Van Den Hoven ,  Michael Johannes Vervoordeldonk ,  Michel Gerardus Pardoel ,  Gerardus Johannes Verdoes ,  Jan Van Eijk

IPC分类号： G03B27/72

CPC分类号： G03F7/70066 ,  G03F7/70858

摘要： A lithographic projection apparatus having a masking device for obscuring part of at least one of a patterning device used for patterning a projection beam before imaging the patterned beam onto a substrate. The masking device includes a first masking structure to obscure said part of said patterning device in a first direction and a second masking structure to obscure said part in a second different direction, wherein said first and second masking structure are disposed in the vicinity of said focal plane in a mechanically uncoupled arrangement with respect to each other.

摘要翻译： 一种具有掩模装置的光刻投影装置，其用于遮蔽在将图案化光束成像到基板上之前将投影光束图案化的图案形成装置中的至少一个的部分。 掩模装置包括第一掩模结构，以使第一方向上的所述图案形成装置的所述部分模糊，以及在第二不同方向上遮蔽所述部分的第二掩模结构，其中所述第一和第二掩模结构设置在所述焦点附近 平面相对于彼此以机械方式分离布置。

公开(公告)号：US07248339B2

公开(公告)日：2007-07-24

申请号：US10880606

申请日：2004-07-01

申请人： Gerard Van Schothorst ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

发明人： Gerard Van Schothorst ,  Jan Van Eijk ,  Erik Roelof Loopstra ,  Robert-Han Munnig Schmidt ,  Felix Godfried Peter Peeters

IPC分类号： G03B27/58

CPC分类号： F16F7/1005 ,  G03F7/709

摘要： A lithographic apparatus is presented in which vibrations induced by reaction forces exerted on a base frame BF by accelerations within the apparatus are eliminated without the need for complex positioning systems and several balance masses. This is achieved by using feed-forward control to apply a compensating force using actuators to the base frame, based on knowledge of the movements and accelerations of the substrate table and other parts within the apparatus.

摘要翻译： 提出了一种光刻设备，其中消除了由设备内的加速度施加在基架BF上的反作用力引起的振动，而不需要复杂的定位系统和几个平衡块。 这是通过使用前馈控制来实现的，其基于对基板台和设备内的其它部件的运动和加速度的了解，将使用致动器的补偿力施加到基架上。

公开(公告)号：US5264982A

公开(公告)日：1993-11-23

申请号：US664074

申请日：1991-03-04

申请人： Hendrikus H. M. Cox ,  Jan Van Eijk

发明人： Hendrikus H. M. Cox ,  Jan Van Eijk

IPC分类号： G05D3/00 ,  F16C39/06 ,  H01F7/20 ,  H02N15/00

CPC分类号： F16C32/0451

摘要： A device for positioning a body (5) by means of at least one pair of electromagnets (13, 15). A position sensor (29) measures the size of an air gap (23) between one of the electromagnets (13, 15) and a guide beam (1). An output signal of the position sensor (29) is applied to an electronic control unit (35) which passes a control current through the electromagnets (13, 15) in dependence on a difference between the measured and a desired size of the air gap (23). In one embodiment an electrical switch (53) is connected between the control unit (35) and the two electromagnets (13, 15) controlled by the control unit (35), applying the control current to only one of the two electromagnets (13, 15) in dependence on the polarity of a control signal from the control unit (35). The use of the switch insures that the control current flows through only one of the two electromagnets at a time so that in a simple manner a difference necessary for supporting the body is achieved between the forces exerted on the guide beam (1) by the electromagnets (13, 15). the electrical resistance losses in the electromagnets (13, 15) in such a device are low, the device is eminently suitable for use as an electromagnetic bearing in an optical lithographical device for the irradiation of semiconductor substrates, or in other precision machines.

公开(公告)号：US09110387B2

公开(公告)日：2015-08-18

申请号：US13477748

申请日：2012-05-22

申请人： Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yang-Shan Huang

发明人： Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yang-Shan Huang

IPC分类号： G03F7/20

CPC分类号： G03F7/70783 ,  G03F7/70758

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.

摘要翻译： 光刻设备包括被配置为调节辐射束和构造成支撑图案形成装置的支撑件的照明系统，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述光刻设备还包括构造成保持基板的基板台; 定位器，其被构造成定位所述衬底台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，布置成接合面向投影系统的衬底的表面的一部分;以及位置控制器，其被配置为控制衬底台的位置，位置控制器布置成驱动定位器和衬底表面致动器。

公开(公告)号：US08368868B2

公开(公告)日：2013-02-05

申请号：US12627087

申请日：2009-11-30

申请人： Johannes Petrus Martinus Bernardus Vermeulen ,  Marcel Koenraad Marie Baggen ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Jan Van Eijk ,  Andre Bernardus Jeunink ,  Nicolaas Rudolf Kemper ,  Robert-Han Munnig Schmidt ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Theodorus Petrus Maria Cadee ,  Fransiscus Mathijs Jacobs ,  Christiaan Louis Valentin

发明人： Johannes Petrus Martinus Bernardus Vermeulen ,  Marcel Koenraad Marie Baggen ,  Hans Butler ,  Henrikus Herman Marie Cox ,  Jan Van Eijk ,  Andre Bernardus Jeunink ,  Nicolaas Rudolf Kemper ,  Robert-Han Munnig Schmidt ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst ,  Theodorus Petrus Maria Cadee ,  Fransiscus Mathijs Jacobs ,  Christiaan Louis Valentin

IPC分类号： G03B27/42

CPC分类号： G03B27/42 ,  G03F7/707 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866

摘要： A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.

摘要翻译： 光刻设备包括位置控制器，其被配置为通过选择性地按压图案形成装置的侧面中的至少一个来控​​制图案形成装置在其平面方向上的位置。 位置控制器包括气体压力供给器和朝向图案形成装置的至少一个侧面的一个或多个流出开口，以在该侧面上施加加压气体，以便控制图案形成装置在其平面方向上的位置 一个非接触的方式。