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    Production of gravure printing plates having plastic printing layers
    1.
    发明授权
    Production of gravure printing plates having plastic printing layers 失效
    生产具有塑料印刷层的凹版印刷版

    公开(公告)号：US4565771A

    公开(公告)日：1986-01-21

    申请号：US525509

    申请日：1983-08-22

    申请人： John Lynch ,  Reinhold J. Leyrer ,  Dietrich Saenger

    发明人： John Lynch ,  Reinhold J. Leyrer ,  Dietrich Saenger

    IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03F7/38 ,  G03C5/16 ,  G03C1/495 ,  G03C1/72

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/2022 ,  G03F7/38 ,  Y10S430/128 ,  Y10S430/136

    摘要： Gravure printing plates comprising a plastic printing layer applied on a printing plate base are produced by a method wherein a solid photosensitive layer (L) firmly bonded on the printing plate base is exposed imagewise to actinic light, and the exposed layer is washed out with a developer and then subjected to thermal hardening to form the plastic printing layer. In this process, the photosensitive layer (L) employed contains, as the photosensitive component, a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups, and a compound which effects crosslinking and possesses two or more reactive groups which are capable of reacting with --COOH groups under the action of heat to form a covalent chemical bond. After imagewise exposure, the layer is either washed out with an aqueous developer, post-exposed uniformly to actinic light and then subjected to thermal hardening and crosslinking, or subjected to selective thermal hardening and crosslinking in the exposed areas and then washed out with a developer.

    摘要翻译： 通过以下方法制造包含印刷印版基板上的塑料印刷层的凹版印刷版，其中牢固地结合在印版基板上的固体感光层（L）以光化的方式成像曝光，并将曝光层用 然后进行热硬化以形成塑料印刷层。 在该方法中，使用的感光层（L）含有作为感光性成分的具有两个以上芳香族和/或杂芳族邻硝基甲醇酯基的化合物和具有两个以上反应性基团的化合物， 能够在热作用下与-COOH基团反应形成共价的化学键。 在成像曝光后，将该层用水性显影剂洗涤，均匀曝光至光化光，然后进行热硬化和交联，或在暴露的区域中进行选择性热硬化和交联，然后用显影剂 。

    Production of relief images or resist images by a positive-working method
    2.
    发明授权
    Production of relief images or resist images by a positive-working method 失效
    通过积极的工作方式生产浮雕图像或抵抗图像

    公开(公告)号：US4456679A

    公开(公告)日：1984-06-26

    申请号：US525395

    申请日：1983-08-22

    申请人： Reinhold J. Leyrer ,  Dietrich Saenger

    发明人： Reinhold J. Leyrer ,  Dietrich Saenger

    IPC分类号： G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03C5/00

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S522/904

    摘要： Relief images or resist images are produced by a positive-working process, using a solid photosensitive resist layer which is applied to a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups and crosslinking compounds possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are then washed out with an aqueous developer, the remaining resist layer is post-exposed uniformly to actinic light and finally the post-exposed resist layer is thermally crosslinked and hardened.

    摘要翻译： 缓冲图像或抗蚀剂图像通过正性工艺制备，使用固体感光性抗蚀剂层，其施加于碱并含有具有两个或多个芳族和/或杂芳族邻硝基甲醇酯基团的化合物和具有两个或多个 更多的反应性基团能够在热作用下与羧基反应形成共价的化学键。 为了产生浮雕图像或抗蚀剂图像，首先将光敏抗蚀剂层成像曝光于光化光，然后用水性显影剂将该层的曝光区域洗出，将剩余的抗蚀剂层均匀曝光至光化反应 后曝光抗蚀剂层热交联并硬化。

    Production of relief images or resist images by a negative-working method
    3.
    发明授权
    Production of relief images or resist images by a negative-working method 失效
    通过负面工作方法生产浮雕图像或抗蚀图像

    公开(公告)号：US4465760A

    公开(公告)日：1984-08-14

    申请号：US525394

    申请日：1983-08-22

    申请人： Reinhold J. Leyrer ,  Dietrich Saenger ,  Uwe Klinsmann

    发明人： Reinhold J. Leyrer ,  Dietrich Saenger ,  Uwe Klinsmann

    IPC分类号： G03F7/038 ,  G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03F7/38 ,  G03F7/10 ,  G03C1/495 ,  G03C1/71 ,  G03C5/16

    CPC分类号： G03F7/2022 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/38

    摘要： Relief images or resist images are produced by a negative-working process, using a photosensitive resist layer which is applied on a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups as well as a crosslinking compound possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are subjected to selective thermal hardening and crosslinking and the resist layer is then post-exposed uniformly to actinic light and finally washed out with an aqueous developer.

    摘要翻译： 缓冲图像或抗蚀剂图像是通过负性工艺制造的，其中使用光敏抗蚀剂层，该光致抗蚀剂层施加在基底上并含有具有两个或更多个芳族和/或杂芳族邻硝基甲醇酯基团的化合物以及具有 两个或多个反应性基团，其能够在热作用下与羧基反应形成共价的化学键。 为了产生浮雕图像或抗蚀剂图像，首先将光敏抗蚀剂层成像曝光于光化光，该层的暴露区域进行选择性热硬化和交联，然后将抗蚀剂层均匀曝光至光化反应 用含水显影剂洗掉。

    Polymer dispersion with a colour effect
    4.
    发明授权
    Polymer dispersion with a colour effect 有权
    聚合物色散具有色彩效果

    公开(公告)号：US07776237B2

    公开(公告)日：2010-08-17

    申请号：US10553793

    申请日：2004-05-04

    申请人： Xu He ,  Reinhold J. Leyrer ,  Holger Schöpke

    发明人： Xu He ,  Reinhold J. Leyrer ,  Holger Schöpke

    IPC分类号： B05D5/06 ,  C09D5/36 ,  C09D7/14 ,  C09D5/02 ,  C09D151/10 ,  C08F2/22 ,  C08F265/00

    CPC分类号： C08L51/003 ,  B05D3/0254 ,  B05D5/06 ,  C08F257/02 ,  C08F265/00 ,  C08F265/04 ,  C08F265/06 ,  C08F291/00 ,  C09D151/003 ,  Y10S525/902 ,  C08L2666/02

    摘要： Process for improving the brilliance of color and the stability of a colored polymer system, which is composed of a matrix and of discrete polymer particles distributed in accordance with a defined spatial lattice structure in the matrix, and which is obtained by filming of an emulsion polymer with core/shell structure, which comprises using an emulsion polymer obtainable by polymerizing monomers in at least one first stage (core monomers), then polymerizing monomers in at least one further, second stage (transition stage), and finally polymerizing monomers in a third stage (shell monomers), where, based on the percentage constitution of the monomer mixtures of the three stages, at most 30% by weight of the monomers of the first stage are identical with those of the third stage, and 5% of the monomers of the second stage are identical with, respectively, those of the first and those of the third stage, and not more than 60% by weight of the monomers of the 2nd stage here are monomers absent in the 1st stage and also absent in the 3rd stage.

    摘要翻译： 用于提高颜色亮度和着色聚合物体系的稳定性的方法，其由基质和根据基质中限定的空间格子结构分布的离散聚合物颗粒组成，并且其通过将乳液聚合物 具有核/壳结构，其包括使用可通过在至少一个第一阶段（核心单体）中聚合单体获得的乳液聚合物，然后在至少一个第二阶段（过渡阶段）中聚合单体，最后在第三阶段中聚合单体 阶段（壳单体），其中基于三个阶段的单体混合物的百分比构成，至多30重量％的第一阶段的单体与第三阶段的单体相同，并且5％的单体 第二阶段的单体分别与第一阶段和第三阶段的相同，并且不超过60重量％的第二阶段的单体是单体a 在第一阶段也没有在第三阶段。

    Aqueous polymer dispersions containing amphiphilic block copolymers, method for producing said dispersions and the use thereof
    5.
    发明授权
    Aqueous polymer dispersions containing amphiphilic block copolymers, method for producing said dispersions and the use thereof 失效
    含有两亲性嵌段共聚物的水性聚合物分散体，所述分散体的制造方法及其用途

    公开(公告)号：US07767748B2

    公开(公告)日：2010-08-03

    申请号：US10586682

    申请日：2005-02-08

    申请人： Reinhold J. Leyrer ,  Ingolf Kuehn ,  Darijo Mijolovic

    发明人： Reinhold J. Leyrer ,  Ingolf Kuehn ,  Darijo Mijolovic

    IPC分类号： C08F2/16 ,  A61K9/16 ,  C07C37/00

    CPC分类号： C08F2/24

    摘要： Aqueous polymer dispersions which are obtainable by emulsion polymerization of ethylenically unsaturated monomers in an aqueous medium in the presence of free radical polymerization initiators and stabilizers, amphiphilic polymers which comprise one or more hydrophobic units (A) and one or more hydrophilic units (B) being used as the stabilizer before, during or after the polymerization, and the hydrophobic units (A) being formed from a polyisobutene block, at least 50 mol % of whose polyisobutene macromolecules have terminally arranged doubled bonds, processes for the preparation of the aqueous polymer dispersions by polymerizing ethylenically unsaturated monomers in the presence of free radical initiators and said amphiphilic polymers, which are used before, during or after the polymerization, and the use of the resulting aqueous polymer dispersions as associative thickeners in paper coating slips, in textile production, as thickeners for textile print pastes, in the pharmaceutical and cosmetics sector, for surface coatings, for detergents and cleaning agents, in foods and as oil field chemicals.

    摘要翻译： 在自由基聚合引发剂和稳定剂的存在下，通过在水性介质中的烯属不饱和单体的乳液聚合可获得的聚合物水分散体，包含一个或多个疏水单元（A）和一个或多个亲水单元（B）的两亲性聚合物是 在聚合之前，期间或之后用作稳定剂，并且疏水单元（A）由聚异丁烯嵌段形成，其至少50摩尔％的聚异丁烯大分子具有末端排列的双键，制备聚合物水分散体的方法 通过在自由基引发剂和在聚合之前，期间或之后使用的所述两亲性聚合物的存在下聚合烯属不饱和单体，以及在纺织品生产中使用所得水性聚合物分散体作为纸涂布纸中的缔合增稠剂，如 纺织印花糊剂增稠剂，制药业a 化妆品行业，用于表面涂料，洗涤剂和清洁剂，食品和油田化学品。

    Production of resist images, and a suitable dry film resist
    9.
    发明授权
    Production of resist images, and a suitable dry film resist 失效
    生产抗蚀剂图像和合适的干膜抗蚀剂

    公开(公告)号：US4789622A

    公开(公告)日：1988-12-06

    申请号：US886177

    申请日：1986-07-16

    申请人： Reinhold J. Leyrer ,  Gerhard Wegner ,  Michael Mueller

    发明人： Reinhold J. Leyrer ,  Gerhard Wegner ,  Michael Mueller

    IPC分类号： G03F7/039 ,  G03C1/495

    CPC分类号： G03F7/039 ,  Y10S430/145 ,  Y10S430/146 ,  Y10S438/949

    摘要： In the production of resist images by application of a radiation-sensitive positive-working resist layer based on degradable polymers onto a substrate, imagewise exposure of the resist layer to actinic radiation and removal of the irradiated parts of the layer with development of the resist image, the radiation-sensitive resist layer used is composed of poly(diacetylenes), in particular soluble ones. Preferably, the radiation-sensitive resist layer based on the poly(diacetylenes) contains sensitizers which can be activated by actinic radiation and which, after being activated, induce or accelerate molecular degradation of the poly(diacetylenes). Dry film resists comprise a temporary dimensionally stable base and a radiation-sensitive resist layer which is applied on the base, can be degraded by exposure to actinic radiation and is based on poly(diacetylenes), in particular soluble ones, with or without a cover sheet on top of the said resist layer.

    摘要翻译： 在通过将基于可降解聚合物的辐射敏感的正性抗蚀剂层应用于基底上来制备抗蚀剂图像时，抗蚀剂层成像曝光于光化辐射并且随着抗蚀剂图像的显影而去除被照射部分 所用的辐射敏感抗蚀剂层由聚（二乙炔），特别是可溶性抗蚀剂层组成。 优选地，基于聚（二乙炔）的辐射敏感抗蚀剂层包含可以通过光化辐射活化的敏化剂，并且在被激活后，引发或加速聚（二乙炔）的分子降解。 干膜抗蚀剂包括临时尺寸稳定的基底和施加在基底上的辐射敏感抗蚀剂层，可以通过暴露于光化辐射而降解，并且基于聚（​​二乙炔），特别是可溶性的，具有或不具有覆盖物 在所述抗蚀剂层的顶部上。