公开(公告)号：US06834671B2

公开(公告)日：2004-12-28

申请号：US10743155

申请日：2003-12-22

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  John P. Simons ,  Charles J. Taft ,  Richard P. Volant

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  John P. Simons ,  Charles J. Taft ,  Richard P. Volant

IPC分类号： F16K1502

CPC分类号： F16K99/0001 ,  F15C5/00 ,  F16K15/023 ,  F16K99/0005 ,  F16K99/0007 ,  F16K99/0057 ,  F16K2099/0094 ,  Y10T137/7783 ,  Y10T137/7849 ,  Y10T137/7904

摘要： A check valve for micro electro mechanical structure devices (MEMS), and in particular pertains to a check valve which is adapted to be employed in connection with micro electro mechanical structure devices which are intended to be employed with supercritical fluids constituting working fluids. In a preferred embodiment, the check valve is equipped with a bypass channel including a freely moveable plug structure which, in the open position of the valve enables the ingress of supercritical fluids under high superatmospheric pressures, and subsequent to the filling of the system, let down to atmospheric pressure, causes the plug to be moved into a permanent valve-closed position.

摘要翻译： 一种用于微机电结构装置（MEMS）的止回阀，并且特别涉及一种适于与旨在与构成工作流体的超临界流体一起使用的微机电结构装置结合使用的止回阀。 在优选实施例中，止回阀配备有包括可自由移动的塞子结构的旁通通道，其在阀的打开位置使得能够在高超大气压下进入超临界流体，并且在系统的填充之后，让 降至大气压力，使插头移动到永久性阀关闭位置。

公开(公告)号：US06653233B2

公开(公告)日：2003-11-25

申请号：US09893266

申请日：2001-06-27

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft ,  Richard P. Volant

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft ,  Richard P. Volant

IPC分类号： H01L2144

CPC分类号： H01L21/7684 ,  H01L21/02063

摘要： A process of providing a semiconductor device with electrical interconnection capability wherein a sacrificial material is introduced into topographical features of the semiconductor device prior to chemical mechanical polishing so that debris formed during chemical mechanical polishing is incapable of falling into topographical features present on the semiconductor device. The sacrificial material is thereupon removed by liquid or supercritical carbon dioxide.

公开(公告)号：US06622507B2

公开(公告)日：2003-09-23

申请号：US09971515

申请日：2001-07-26

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  John P. Simons ,  Charles J. Taft ,  Richard P. Volant

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  John P. Simons ,  Charles J. Taft ,  Richard P. Volant

IPC分类号： F25D2312

CPC分类号： F16K99/0001 ,  F15B21/06 ,  F15C5/00 ,  F16K99/0057 ,  F25B2309/061 ,  F25B2400/15 ,  Y10T137/3662

摘要： An electromechanical device having a size no larger than about 10 microns utilizing a working fluid in the high pressure liquid or supercritical fluid state. A process of preparing the electromechanical device involves the introduction of the liquid or supercritical fluid therein which permits the retention of the working fluid in the liquid or supercritical state after introduction.

摘要翻译： 使用高压液体或超临界流体状态的工作流体的尺寸不大于约10微米的机电装置。 制备机电装置的过程包括在其中引入液体或超临界流体，其允许工作流体在引入之后保持在液体或超临界状态。

公开(公告)号：US06425956B1

公开(公告)日：2002-07-30

申请号：US09755267

申请日：2001-01-05

申请人： John Michael Cotte ,  Donald J. Delehanty ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  John P. Simons ,  Charles J. Taft ,  Richard P. Volant

发明人： John Michael Cotte ,  Donald J. Delehanty ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  John P. Simons ,  Charles J. Taft ,  Richard P. Volant

IPC分类号： C23G102

CPC分类号： H01L21/02074 ,  B08B7/0021 ,  C11D1/004 ,  C11D3/2075 ,  C11D3/43 ,  C23G5/00 ,  H01L21/02065 ,  Y10S134/902

摘要： A process of removing residual slurry resulting from chemical mechanical polishing of a workpiece in which the workpiece is contacted with a composition of a supercritical fluid, said supercritical fluid including supercritical, carbon dioxide and a co-solvent, and a surfactant.

摘要翻译： 一种从工件与超临界流体组合物，所述超临界流体包括超临界流体，二氧化碳和助溶剂以及表面活性剂接触的工件的化学机械抛光产生的剩余浆料的清除方法。

公开(公告)号：US06739346B2

公开(公告)日：2004-05-25

申请号：US10207509

申请日：2002-07-29

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： B08B310

CPC分类号： B08B7/0021

摘要： A process and apparatus for cleaning filters prior to recycling or disposal. In this process and apparatus liquid or supercritical carbon dioxide contacts the plugged pores of a filter under conditions in which carbon dioxide remains in the liquid or supercritical state.

摘要翻译： 用于在再循环或处理之前清洁过滤器的方法和设备。 在该方法和装置中，液体或超临界二氧化碳在二氧化碳保持在液体或超临界状态的条件下接触过滤器的堵塞孔。

公开(公告)号：US06398875B1

公开(公告)日：2002-06-04

申请号：US09893231

申请日：2001-06-27

申请人： John Michael Cotte ,  Dario L. Goldfarb ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Dario L. Goldfarb ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： B08B304

CPC分类号： H01L21/02054 ,  H01L21/02063 ,  H01L21/67034 ,  Y10S134/902

摘要： A process of drying a semiconductor wafer which includes at least one microelectric structure disposed thereon which includes contacting a water-containing thin film-covered semiconductor wafer with a composition which includes liquid or supercritical carbon dioxide and a surfactant.

摘要翻译： 一种干燥包括设置在其上的至少一个微电结构的半导体晶片的工艺，其包括使含水薄膜覆盖的半导体晶片与包括液体或超临界二氧化碳和表面活性剂的组合物接触。

公开(公告)号：US06451375B1

公开(公告)日：2002-09-17

申请号：US09755266

申请日：2001-01-05

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  John P. Simons ,  Charles J. Taft

IPC分类号： B05D512

CPC分类号： B05D1/18 ,  B05D2401/90 ,  C23C18/00

摘要： A process of depositing a thin film on a nanometer structure in which a coating, which may be an aerogel material or metallic seed layer, is prepared. The coating is combined with a supercritical composition to form a supercritical coating composition. The supercritical coating composition is deposited upon a nanometer structure under supercritical conditions. Supercritical conditions are removed whereby the supercritical composition is removed and the coating solidifies into a thin solid film.

摘要翻译： 在纳米结构上沉积薄膜的方法，其中制备可以是气凝胶材料或金属种子层的涂层。 将涂层与超临界组合物组合以形成超临界涂料组合物。 超临界涂料组合物在超临界条件下沉积在纳米结构上。 去除超临界条件，由此除去超临界组合物，并将涂层固化成薄的固体膜。

公开(公告)号：US06457480B1

公开(公告)日：2002-10-01

申请号：US09893208

申请日：2001-06-27

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： B08B900

CPC分类号： B08B7/0021

摘要： A process and apparatus for cleaning filters prior to recycling or disposal. In this process and apparatus liquid or supercritical carbon dioxide contacts the plugged pores of a filter under conditions in which carbon dioxide remains in the liquid or supercritical state.

摘要翻译： 用于在再循环或处理之前清洁过滤器的方法和设备。 在该方法和装置中，液体或超临界二氧化碳在二氧化碳保持在液体或超临界状态的条件下接触过滤器的堵塞孔。

公开(公告)号：US06838015B2

公开(公告)日：2005-01-04

申请号：US09945596

申请日：2001-09-04

申请人： John Michael Cotte ,  Dario L. Goldfarb ,  Pamela Jones ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Dario L. Goldfarb ,  Pamela Jones ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： B08B7/00 ,  C11D7/08 ,  C11D7/26 ,  C11D7/28 ,  C11D7/50 ,  C11D11/00 ,  H01L21/02 ,  H01L21/311 ,  H01L21/3213 ,  C09K13/00 ,  C09K13/04 ,  C09K13/06 ,  H01L21/302 ,  H01L21/3065

CPC分类号： H01L21/02071 ,  B08B7/0021 ,  C11D7/08 ,  C11D7/265 ,  C11D7/28 ,  C11D7/50 ,  C11D11/0047 ,  H01L21/31116

摘要： A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.

公开(公告)号：US06683008B1

公开(公告)日：2004-01-27

申请号：US10299130

申请日：2002-11-19

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： H01L21302

CPC分类号： G03F7/426 ,  G03F7/422 ,  H01L21/31133

摘要： A process of removing photoresist, previously subjected to ion implantation, from the surface of a workpiece. The process involves contacting the workpiece with a composition which includes liquid or supercritical carbon dioxide and between about 2% and about 20% of an alkanol having the structural formula CxX2x+1OH, where X is fluorine, hydrogen or mixtures thereof; and x is an integer of 1 to 8, said percentages being by volume, based on the total weight of the composition.

摘要翻译： 从工件表面除去预先进行离子注入的光致抗蚀剂的工艺。 该方法包括使工件与包含液体或超临界二氧化碳的组合物和约2％至约20％的具有结构式CxX2x + 1OH的链烷醇接触，其中X为氟，氢或其混合物; 并且x是1至8的整数，所述百分比是基于组合物的总重量的体积。