摘要:
An anti-roll device for a vehicle may include a lower arm disposed at both sides of a sub-frame, a rotation mounter formed at a middle portion of the sub-frame, a spring unit of which the middle portion is rotatably disposed at the rotation mounter, and a push rod connected to both sides of the spring unit and the lower arm, wherein the spring unit includes a plate spring of which both end portions are bent in opposite directions, an engagement portion having an engagement hole in the middle portion thereof is formed, and a bolt hole is formed at both ends thereof, an assistant spring that is disposed at both sides of the engagement portion and an assemble hole is formed in the middle portion corresponding to the engagement hole, and an engagement yoke engaged with the plate spring and the assistant spring and disposed on the rotation mounter.
摘要:
Disclosed herein is a method for producing nanowires. The method comprises the steps of providing a porous template with a plurality of holes in the form of tubes, filling the tubes with nanoparticles or nanoparticle precursors, and forming the filled nanoparticles or nanoparticle precursors into nanowires. According to the method, highly rectilinear and well-ordered nanowires can be produced in a simple manner.
摘要:
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.
摘要:
Electrochromic tungsten or molybdenum oxide and their doped derivative nanomaterials are prepared using sol-gel or vapor deposition methods from precursors containing only tungsten, oxygen, carbon and hydrogen, as other elements can generate optical defects impacting the electrochromic performances. Preferably, the liquid and volatile compound W(═O)(OsBu)4 is the precursor used.
摘要:
Provided is a device for supplying warm water and a method thereof. The device for supplying warm water includes a first heater configured to have a first set capacity and heating received water, a second heater configured to have a second set capacity greater than the first set capacity and heating received water, and a control part calculating heater driving cycles of the first heater and the second heater according to a set water temperature, and driving the first heater and the second heater according to the heater driving cycles. The control part calculates the heater driving cycle of the first heater by using a phase control method, and calculates the heater driving cycle of the second heater by using a zero-crossing control method.
摘要:
A CMOS image sensor and a method for manufacturing the same. In one example embodiment, a CMOS image sensor includes a field region and an active region, a second conductive bottom region, a first conductive well region, a second conductive top region, and a first conductive high concentration region. The field region and the active region are formed in a first conductive semiconductor substrate. The second conductive bottom region has a first depth in part of the active region. The first conductive well region is formed in the active region. The second conductive top region has a depth that is less than the first depth. The first conductive high concentration region has a depth that is less than the depth of the second conductive top region.
摘要:
An image forming apparatus includes a heat roller having a heat source thereinside, at least two press rollers disposed opposite to the heat roller, at least one cam member to move at least one of the press rollers close to the heat roller or away from the heat roller, a driving unit to rotate the cam member, and a control unit to control the driving unit to determine a position of the cam member. A sensor is mounted in an upstream side of the press rollers with respect to a feeding direction of a printing medium to detect a position of the printing medium. When a front end of the printing medium is sensed by the sensor, the control unit controls the driving unit to rotate the cam member. If the cam member rotates, the press rollers interlock with the cam member to move close to the heat roller or away from the heat roller.
摘要:
Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby preventing diffusion of the ions. Etching of Cr and MoSiON layers due to a cleaning process is suppressed in order to significantly reduce a change in phase and transmissivity of optical properties of Cr and MoSiON.
摘要:
A touch pad including an ElectroMagnetic Interference (EMI) shielding plate and method for detecting a touch on the touch pad is provided. The touch pad includes a touch plate for generating, when a touch is generated on a surface of the touch plate, a change of a physical property, a touch sensor coupled to the touch plate for detecting a position of the generated touch by measuring the change of the physical property, and an EMI shielding plate disposed adjacent to or attached to a surface of the touch plate and formed with a plurality of openings. The density of the openings formed at a position of the EMI shielding plate increases as the position becomes farther from the touch sensor. Accordingly, the touch pad having an EMI shielding plate can more accurately detect a touch generated at any position close to or remote from the touch sensor of the touch pad, and thereby increase user convenience of a portable terminal.
摘要:
A method of multi-stage substrate etching and a terahertz oscillator manufactured by using the method are provided. The method comprises the steps of forming a first mask pattern on any one surface of a first substrate, forming a hole by etching the first substrate using the first mask pattern as an etching mask, bonding, to the first substrate, a second substrate having the same thickness as a depth to be etched, forming a second mask pattern on the second substrate bonded, forming a hole by etching the second substrate using the second mask pattern as an etching mask, and removing an oxide layer having the etching selectivity between the first substrate and the second substrate, whereby the etched bottom is made uniformly even in a deep step, the edge curvature is minimized, and a T-shape is prevented from being formed on the etched wall face to thereby improve the etching quality. Further, the etching depth is previously controlled by lapping or polishing, the upper and lower substrates are precisely boned to each other using the alignment key, and a multi-layer processing is possibly performed thereto, so that the precision and the uniformity in structure of the oscillator or amplifier is obtained.