公开(公告)号：US20110259366A1

公开(公告)日：2011-10-27

申请号：US12867245

申请日：2009-02-11

申请人： Joseph D. Sweeney ,  Sharad N. Yedave ,  Oleg Byl ,  Robert Kaim ,  David Eldridge ,  Steven Sergi ,  Lin Feng ,  Steven E. Bishop ,  W. Karl Olander ,  Ying Tang

发明人： Joseph D. Sweeney ,  Sharad N. Yedave ,  Oleg Byl ,  Robert Kaim ,  David Eldridge ,  Steven Sergi ,  Lin Feng ,  Steven E. Bishop ,  W. Karl Olander ,  Ying Tang

IPC分类号： B08B7/00 ,  H01L21/265 ,  B08B5/00

CPC分类号： H01J37/3171 ,  C23C14/48 ,  C23C14/54 ,  C23C14/564 ,  H01J37/08 ,  H01J37/16 ,  H01J37/18 ,  H01J2237/082 ,  H01J2237/22

摘要： Cleaning of an ion implantation system or components thereof, utilizing a reactive cleaning reagent enabling growth/etching of the filament in an ion source of the arc chamber, by appropriate control of temperature in the arc chamber to effect the desired filament growth or alternative filament etching. Also described is the use of reactive gases such as XeFx, WFx, AsFx, PFx and TaFx, wherein x has a stoichioimetrically appropriate value or range of values, for cleaning regions of ion implanters, or components of implanters, in in situ or ex situ cleaning arrangements, under ambient temperature, elevated temperature or plasma conditions. Among specific reactive cleaning agents, BrF3 is described as useful for cleaning ion implant systems or component(s) thereof, in in situ or ex situ cleaning arrangements. Also described is a method of cleaning the forelines of an ion implant system for at least partial removal of ionization-related deposit from said forelines, comprising contacting said forelines with a cleaning gas wherein said cleaning gas is chemically reactive with said deposit. Also described is a method of improving the performance and extending the lifetime of an ion implant system, comprising contacting the cathode with a gas mixture.

摘要翻译： 使用能够在电弧室的离子源中生长/蚀刻细丝的反应性清洁剂来清洁离子注入系统或其组分，通过适当地控制电弧室中的温度以实现所需的长丝生长或替代的细丝蚀刻 。 还描述了使用诸如XeFx，WFx，AsFx，PFx和TaFx的反应性气体，其中x具有化学计量学上适当的值或值范围，用于清除离子注入器或植入物的组分的原位或非原生境 清洁布置，在环境温度，升高的温度或等离子体条件下。 在特定的反应性清洁剂中，BrF3被描述为用于在原位或非原位清洁装置中清洁离子注入系统或其组分。 还描述了一种清洁离子注入系统的前沿以从所述前线至少部分去除电离相关沉积物的方法，包括使所述前沿与清洁气体接触，其中所述清洁气体与所述沉积物化学反应。 还描述了改进离子注入系统的性能和延长寿命的方法，包括使阴极与气体混合物接触。

公开(公告)号：US09991095B2

公开(公告)日：2018-06-05

申请号：US13201188

申请日：2009-08-12

申请人： Joseph D. Sweeney ,  Sharad N. Yedave ,  Oleg Byl ,  Robert Kaim ,  David Eldridge ,  Lin Feng ,  Steven E. Bishop ,  W. Karl Olander ,  Ying Tang

发明人： Joseph D. Sweeney ,  Sharad N. Yedave ,  Oleg Byl ,  Robert Kaim ,  David Eldridge ,  Lin Feng ,  Steven E. Bishop ,  W. Karl Olander ,  Ying Tang

IPC分类号： B05D5/12 ,  H01J37/317 ,  C23C14/48 ,  C23C14/54 ,  C23C14/56 ,  H01J37/08 ,  H01J37/16 ,  H01J37/18

CPC分类号： H01J37/3171 ,  C23C14/48 ,  C23C14/54 ,  C23C14/564 ,  H01J37/08 ,  H01J37/16 ,  H01J37/18 ,  H01J2237/082 ,  H01J2237/22

摘要： Cleaning of an ion implantation system or components thereof, utilizing temperature and/or a reactive cleaning reagent enabling growth/etching of the cathode in an indirectly heated cathode for an ion implantation system by monitoring the cathode bias power and taking corrective action depending upon compared values to etch or regrow the cathode.

公开(公告)号：US20120058252A1

公开(公告)日：2012-03-08

申请号：US13201188

申请日：2009-08-12

申请人： Joseph D. Sweeney ,  Sharad N. Yedave ,  Oleg Byl ,  Robert Kaim ,  David Eldridge ,  Lin Feng ,  Steven E. Bishop ,  W. Karl Olander ,  Ying Tang

发明人： Joseph D. Sweeney ,  Sharad N. Yedave ,  Oleg Byl ,  Robert Kaim ,  David Eldridge ,  Lin Feng ,  Steven E. Bishop ,  W. Karl Olander ,  Ying Tang

IPC分类号： B08B5/00 ,  B05D3/10 ,  B05D5/12

CPC分类号： H01J37/3171 ,  C23C14/48 ,  C23C14/54 ,  C23C14/564 ,  H01J37/08 ,  H01J37/16 ,  H01J37/18 ,  H01J2237/082 ,  H01J2237/22

摘要： Cleaning of an ion implantation system or components thereof, utilizing temperature and/or a reactive cleaning reagent enabling growth/etching of the cathode in an indirectly heated cathode for an ion implantation system by monitoring the cathode bias power and taking corrective action depending upon compared values to etch or regrow the cathode.

摘要翻译： 使用温度和/或反应性清洗剂清洁离子注入系统或其组件，使得能够通过监测阴极偏置功率并根据比较值采取校正动作来增加/蚀刻用于离子注入系统的间接加热的阴极中的阴极 以蚀刻或再生阴极。

公开(公告)号：US08603252B2

公开(公告)日：2013-12-10

申请号：US12298727

申请日：2007-04-26

申请人： Frank Dimeo ,  James Dietz ,  W. Karl Olander ,  Robert Kaim ,  Steven Bishop ,  Jeffrey W. Neuner ,  Jose Arno ,  Paul J. Marganski ,  Joseph D. Sweeney ,  David Eldridge ,  Sharad Yedave ,  Oleg Byl ,  Gregory T. Stauf

发明人： Frank Dimeo ,  James Dietz ,  W. Karl Olander ,  Robert Kaim ,  Steven Bishop ,  Jeffrey W. Neuner ,  Jose Arno ,  Paul J. Marganski ,  Joseph D. Sweeney ,  David Eldridge ,  Sharad Yedave ,  Oleg Byl ,  Gregory T. Stauf

IPC分类号： B08B7/00

CPC分类号： C23C14/564 ,  C23C16/4405 ,  H01J37/32412 ,  H01J37/32862

摘要： A method and apparatus for cleaning residue from components of semiconductor processing systems used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive material for sufficient time and under sufficient conditions to at least partially remove the residue. When the residue and the material from which the components are constructed are different, the gas-phase reactive material is selectively reactive with the residue and minimally reactive with the materials from which the components of the ion implanter are constructed. When the residue and the material from which the components are constructed is the same, then the gas-phase reactive material may be reactive with both the residue and the component part. Particularly preferred gas-phase reactive materials utilized comprise gaseous compounds such as XeF2, XeF4, XeF6, NF3, IF5, IF7, SF6, C2F6, F2, CF4, KrF2, Cl2, HCl, ClF3, ClO2, N2F4, N2F2, N3F, NFH2, NH2F, HOBr, Br2, C3F8, C4F8, C5F8, CHF3, CH2F2, CH3F, COF2, HF, C2HF5, C2H2F4, C2H3F3, C2H4F2, C2H5F, C3F6, and organochlorides such as COCl2, CCl4, CHCl3, CH2Cl2 and CH3Cl.

摘要翻译： 一种清洁残留物的方法和装置，用于制造微电子装置中使用的半导体处理系统的组件。 为了有效地除去残留物，将组分与气相反应性材料接触足够的时间和足够的条件以至少部分地除去残余物。 当残留物和构成组分的材料不同时，气相反应性材料与残余物选择性反应，并与构成离子注入机的组分的材料具有最低的反应性。 当残留物和构成组分的材料相同时，气相反应性材料可以与残留物和组分部分反应。 使用的特别优选的气相反应性材料包括气态化合物如XeF 2，XeF 4，XeF 6，NF 3，IF 5，IF 7，SF 6，C 2 F 6，F 2，CF 4，KrF 2，Cl 2，HCl，ClF 3，ClO 2，N 2 F 4，N 2 F 2，N 3 F， ，NH2F，HOBr，Br2，C3F8，C4F8，C5F8，CHF3，CH2F2，CH3F，COF2，HF，C2HF5，C2H2F4，C2H3F3，C2H4F2，C2H5F，C3F6和有机氯化物，如COCl2，CCl4，CHCl3，CH2Cl2和CH3Cl。

公开(公告)号：US20100154835A1

公开(公告)日：2010-06-24

申请号：US12298727

申请日：2007-04-26

申请人： Frank Dimeo ,  James Dietz ,  Karl W. Olander ,  Robert Kaim ,  Steven Bishop ,  Jeffrey W. Neuner ,  Jose Arno ,  Paul J. Marganski ,  Joseph D. Sweeney ,  David Eldridge ,  Sharad Yedave ,  Oleg Byl ,  Gregory T. Stauf

发明人： Frank Dimeo ,  James Dietz ,  Karl W. Olander ,  Robert Kaim ,  Steven Bishop ,  Jeffrey W. Neuner ,  Jose Arno ,  Paul J. Marganski ,  Joseph D. Sweeney ,  David Eldridge ,  Sharad Yedave ,  Oleg Byl ,  Gregory T. Stauf

IPC分类号： B08B5/00

CPC分类号： C23C14/564 ,  C23C16/4405 ,  H01J37/32412 ,  H01J37/32862

摘要： A method and apparatus for cleaning residue from components of semiconductor processing systems used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive material for sufficient time and under sufficient conditions to at least partially remove the residue. When the residue and the material from which the components are constructed are different, the gas-phase reactive material is selectively reactive with the residue and minimally reactive with the materials from which the components of the ion implanter are constructed. When the residue and the material from which the components are constructed is the same, then the gas-phase reactive material may be reactive with both the residue and the component part. Particularly preferred gas-phase reactive materials utilized comprise gaseous compounds such as XeF2, XeF4, XeF6, NF3, IF5, IF7, SF6, C2F6, F2, CF4, KrF2, Cl2, HCl, ClF3, ClO2, N2F4, N2F2, N3F, NFH2, NH2F, HOBr, Br2, C3F8, C4F8, C5F8, CHF3, CH2F2, CH3F, COF2, HF, C2HF5, C2H2F4, C2H3F3, C2H4F2, C2H5F, C3F6, and organochlorides such as COCl2, CCl4, CHCl3, CH2Cl2 and CH3Cl.

摘要翻译： 一种清洁残留物的方法和装置，用于制造微电子装置中使用的半导体处理系统的组件。 为了有效地除去残留物，将组分与气相反应性材料接触足够的时间和足够的条件以至少部分地除去残余物。 当残留物和构成组分的材料不同时，气相反应性材料与残余物选择性反应，并与构成离子注入机的组分的材料具有最低的反应性。 当残留物和构成组分的材料相同时，气相反应性材料可以与残留物和组分部分反应。 使用的特别优选的气相反应性材料包括气态化合物如XeF 2，XeF 4，XeF 6，NF 3，IF 5，IF 7，SF 6，C 2 F 6，F 2，CF 4，KrF 2，Cl 2，HCl，ClF 3，ClO 2，N 2 F 4，N 2 F 2，N 3 F， ，NH2F，HOBr，Br2，C3F8，C4F8，C5F8，CHF3，CH2F2，CH3F，COF2，HF，C2HF5，C2H2F4，C2H3F3，C2H4F2，C2H5F，C3F6和有机氯化物，如COCl2，CCl4，CHCl3，CH2Cl2和CH3Cl。

公开(公告)号：US20080309359A1

公开(公告)日：2008-12-18

申请号：US11764230

申请日：2007-06-18

申请人： David Eldridge

发明人： David Eldridge

IPC分类号： G01R31/306

CPC分类号： G01R1/0466

摘要： Disclosed herein is a suspension system and adjustment mechanism for an integrated chip held in a clamping or similar assembly and a related method for same. The suspension system Includes a pressure plate member adapted to fit compatibly within the clamp assembly. A hinge assembly applies and releases pressure through the pressure plate member. The hinge assembly has a first open position where pressure is released and a second closed position where pressure is applied. A spring member between the pressure plate member and the hinge assembly has predetermined travel limits controlling the amount of pressure to be applied. In an exemplary embodiment of the invention disclosed herein the suspension system includes an adjustment mechanism which adjusts to the pressure to a fine degree. The adjustment mechanism includes a housing which applies and releases pressures in response to the turning of a control knob. The control knob is connected to a gear apparatus within the housing which responds to the movement of the control knob by moving the housing.

摘要翻译： 本文公开了一种用于夹持或类似组件的集成芯片的悬挂系统和调节机构及其相关方法。 悬挂系统包括适于在夹具组件内相配合的压板构件。 铰链组件通过压板构件施加并释放压力。 铰链组件具有第一打开位置，其中释放压力和施加压力的第二关闭位置。 压板构件和铰链组件之间的弹簧构件具有控制要施加的压力量的预定行程限制。 在本文公开的本发明的示例性实施例中，悬架系统包括调节机构，该调节机构能够将压力调节到很小程度。 调节机构包括响应于控制旋钮转动而施加和释放压力的壳体。 控制旋钮连接到外壳内的齿轮装置，通过移动外壳来响应控制旋钮的移动。

公开(公告)号：US20070204564A1

公开(公告)日：2007-09-06

申请号：US11709871

申请日：2007-02-23

申请人： Patrick Lancaster ,  David Eldridge ,  Willie Hall ,  Richard Johnson ,  Curtis Martin ,  Philip Moore ,  Joseph Norris

发明人： Patrick Lancaster ,  David Eldridge ,  Willie Hall ,  Richard Johnson ,  Curtis Martin ,  Philip Moore ,  Joseph Norris

IPC分类号： B65B13/04

CPC分类号： B65B11/025 ,  B65B11/006 ,  B65B11/045 ,  B65B57/04 ,  B65B2011/002 ,  B65B2210/14 ,  B65B2210/16 ,  B65B2210/18 ,  B65B2210/20

摘要： The present invention provides a method and apparatus for dispensing a predetermined fixed amount of pre-stretched packaging material based upon load girth. A non-rotating ring carries a belt driven by a motor. A packaging material dispenser is mounted on a rotating ring, and the rotating ring may include a pulley that connects to the band, such that the rotating ring is driven by the drive belt. Based upon the girth of the load to be wrapped, an amount of pre-stretched packaging material to be dispensed for each revolution made by the rotating ring is determined. Good wrapping performance in terms of load containment (wrap force) and optimum packaging material use is obtained by dispensing a length of pre-stretched packaging material that is between approximately 90% and approximately 120% of load girth. Once the amount of packaging material to be dispensed per revolution is determined, a ratio of rotating ring drive to final pre-stretch surface speed (i.e., number of pre-stretch roller revolution/rotating ring rotation) can be set and mechanically controlled. Thus, for each revolution of the rotating ring and dispenser, a predetermined fixed amount of packaging material is dispensed and wrapped around the load. In an alternative embodiment, the ratio is electronically controlled.

摘要翻译： 本发明提供一种用于基于载荷环分配预定固定量的预拉伸包装材料的方法和装置。 非旋转环带有由马达驱动的皮带。 包装材料分配器安装在旋转环上，并且旋转环可以包括连接到带的滑轮，使得旋转环由驱动带驱动。 根据要包裹的负载的周长，确定由旋转环制成的用于每次旋转的预分配的预拉伸包装材料的量。 通过分配一定长度的预拉伸包装材料，在负载围绕（包裹力）和最佳包装材料使用方面具有良好的包装性能。 一旦确定了每转需要分配的包装材料的数量，就可以设定并机械地控制旋转环驱动与最终预拉伸表面速度的比率（即，预拉伸辊旋转/旋转环旋转数）。 因此，对于旋转环和分配器的每次旋转，将预定的固定量的包装材料分配并缠绕在负载上。 在替代实施例中，该比率是电子控制的。

公开(公告)号：US20100083614A1

公开(公告)日：2010-04-08

申请号：US12493996

申请日：2009-06-29

申请人： Patrick R. Lancaster, III ,  Donnie Norris ,  David Eldridge

发明人： Patrick R. Lancaster, III ,  Donnie Norris ,  David Eldridge

IPC分类号： B65B13/04 ,  B65B53/00

CPC分类号： B65B11/006 ,  B65B11/02 ,  B65B11/025 ,  B65B11/045 ,  B65B41/16 ,  B65B2210/20

摘要： An apparatus and method for wrapping a palletized load are provided. The apparatus preferably includes a film dispenser for dispensing a film web, at least one guide rollers configured to engage the width of the film web, and at least one roping element. The at least one roping element may be a cable rolling roper configured to roll a portion of the film web into a rolled cable of film. The apparatus may also include means for providing relative rotation between the load and the dispenser to wrap a roped portion of the film web around a base of the load/top portion of a pallet supporting the load.

摘要翻译： 提供一种用于包装堆垛货物的装置和方法。 该设备优选地包括用于分配薄膜腹板的薄膜分配器，至少一个构造成接合薄膜腹板的宽度的引导辊和至少一个罗带元件。 所述至少一个绳索元件可以是被配置成将薄膜网的一部分滚动成卷状的薄膜电缆的电缆滚压罗拉。 该装置还可以包括用于在负载和分配器之间提供相对旋转的装置，以将卷筒纸的卷绕部分围绕支撑负载的托盘的负载/顶部的底部。

公开(公告)号：US07540128B2

公开(公告)日：2009-06-02

申请号：US11371254

申请日：2006-03-09

申请人： Patrick R. Lancaster, III ,  Richard L. Johnson ,  Willie Martin Hall ,  Jeremy D. Anderson ,  David Eldridge

发明人： Patrick R. Lancaster, III ,  Richard L. Johnson ,  Willie Martin Hall ,  Jeremy D. Anderson ,  David Eldridge

IPC分类号： B65B53/00

CPC分类号： B65B11/025 ,  B29C55/06 ,  B65B11/045 ,  B65B11/585 ,  B65B2011/002 ,  B65B2210/16 ,  B65H23/10 ,  B65H23/188

摘要： A film dispenser for a stretch wrapping apparatus is provided. The film dispenser includes a pre-stretch assembly having a top portion mounted to and extending downwardly from a drive plate of a roll carriage frame. The pre-stretch assembly includes two pre-stretch rollers having first ends connected to the roll carriage frame and second ends connected to one another. The pre-stretch rollers may be coated. The pre-stretch assembly further includes a cantilevered idle roller mounted to the drive plate and positioned between the pre-stretch rollers. A film path is defined by the space between the pre-stretch rollers and the idle roller. The film path is easily accessible via the bottom end of the pre-stretch assembly.

摘要翻译： 提供一种用于拉伸包装设备的胶片分配器。 胶片分配器包括预拉伸组件，其具有安装到辊架框架的驱动板并向下延伸的顶部部分。 预拉伸组件包括两个预拉伸辊，其具有连接到辊架框架的第一端和彼此连接的第二端。 预拉伸辊可以被涂覆。 预拉伸组件还包括安装到驱动板并且位于预拉伸辊之间的悬臂惰轮。 胶片路径由预拉伸辊和空转辊之间的空间限定。 胶片路径可以通过预拉伸组件的底端容易地接近。

公开(公告)号：US20050138897A1

公开(公告)日：2005-06-30

申请号：US10961371

申请日：2004-10-12

申请人： Patrick Lancaster ,  David Eldridge

发明人： Patrick Lancaster ,  David Eldridge

IPC分类号： B65B11/02 ,  B65B11/04 ,  B65B53/00

CPC分类号： B65B11/025 ,  B65B11/045

摘要： Apparatuses and related methods of use are provided for the accumulation and wrapping of palletized loads with packaging material. In an exemplary embodiment of the present disclosure, the apparatus includes a low profile conveyor having non-powered conveying elements. In another embodiment, the apparatus is a stretch wrapping system for wrapping palletized loads. The stretch wrapping system may include a dispenser, a means for providing relative rotation between the dispenser and the load to be wrapped, a low profile conveyor, and a powered pusher assembly for moving the loads.

摘要翻译： 提供了装置和相关的使用方法，用于堆垛和包装堆垛货物与包装材料。 在本公开的示例性实施例中，该装置包括具有非动力输送元件的低轮廓输送机。 在另一个实施例中，该装置是用于包装堆垛货物的拉伸包裹系统。 拉伸包裹系统可以包括分配器，用于在分配器和要包装的负载之间提供相对旋转的装置，低轮廓输送机和用于移动负载的动力推动器组件。