Method for exposing a substrate and lithographic projection apparatus
    2.
    发明授权
    Method for exposing a substrate and lithographic projection apparatus 有权
    曝光基板和光刻投影装置的方法

    公开(公告)号:US07732110B2

    公开(公告)日:2010-06-08

    申请号:US12392744

    申请日:2009-02-25

    IPC分类号: G03F9/00 G03B27/52 G03B27/58

    CPC分类号: G03F7/70333 G03F7/70425

    摘要: A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.

    摘要翻译: 公开了一种用于将基板上的抗蚀剂层暴露于掩模上的图案的图像的方法,其中,在开始曝光之后并且在完成曝光之前,控制器通过控制器在抗蚀剂层的图像中引入受控量的对比度损失 在曝光期间改变衬底保持器的位置。 对比度损耗影响光刻投影设备的分辨率的音调依赖性,并且其控制用于匹配不同光刻投影设备之间的分辨率的音调依赖性。

    Method for patterning a radiation beam, patterning device for patterning a radiation beam
    7.
    发明授权
    Method for patterning a radiation beam, patterning device for patterning a radiation beam 有权
    图案化辐射束的方法,用于图案化辐射束的图案形成装置

    公开(公告)号:US07889316B2

    公开(公告)日:2011-02-15

    申请号:US11433766

    申请日:2006-05-15

    IPC分类号: G03B27/42

    摘要: A multiple-die mask pattern is arranged with dies having the same pattern in mutually opposite orientations. The method for arranging the dies includes analyzing the pattern of a single die to identify a pattern characteristic property which is non uniformly distributed over the area of the die. If the distribution is found to be asymmetric, a line separating the die area into two half-die areas is defined with respect to which the asymmetry is apparent. Half-die areas of different dies with the same pattern characteristic property are grouped together in the mask pattern. The resulting enhanced symmetry of the distribution of the pattern characteristic property over the mask area increases lithographic processability and thereby improves die yield.

    摘要翻译: 多模掩模图案布置成具有相同取向相同图案的模具。 用于布置模具的方法包括分析单个模具的图案以识别不均匀分布在模具区域上的图案特性。 如果发现分布是不对称的,则将裸片区域分成两个半裸片区域的线被定义为不对称性是显而易见的。 具有相同图案特性的不同模具的半裸片区域在掩模图案中分组在一起。 所得到的掩模区域上的图案特性分布分布的增强的对称增加了光刻加工性能,从而提高了模头产量。