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公开(公告)号：US20160246169A1
公开(公告)日：2016-08-25
申请号：US14968127
申请日：2015-12-14
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B29C2059/023 , B82Y10/00 , B82Y40/00 , Y10T428/24479
摘要： The invention relates to a method for forming a relief layer employing a stamp having a stamping surface including a template relief pattern. A solution comprising a siliconoxide compound is sandwiched between a substrate surface and the stamp surface and dried while sandwiched. After removal of the template relief pattern the relief layer obtained has a high inorganic mass content making it robust and directly usable for a number of applications such as semiconductor, optical or micromechanical.
摘要翻译： 本发明涉及一种使用具有包括模板浮雕图案的冲压表面的印模形成浮雕层的方法。 将包含二氧化硅化合物的溶液夹在基材表面和印模表面之间，并干燥。 在去除模板浮雕图案之后，所获得的浮雕层具有高的无机质量含量，使其稳固，并可直接用于诸如半导体，光学或微机械的许多应用。
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公开(公告)号：US20180292311A1
公开(公告)日：2018-10-11
申请号：US16009285
申请日：2018-06-15
摘要： The present invention relates to fluorescence imaging. In order to enhance compatibility with multiple fluorescence channels for calibrating a fluorescence microscope, a calibration slide is provided that comprises a substrate and a pixel layout. The pixel layout comprises a plurality of spaced apart metal nanostructures arranged on a surface of the substrate. The metal nanostructures are arranged to produce plasmon resonances that allow absorbing light at an excitation wavelength to produce photo-luminescence and/or fluorescence light for generating a fluorescent image. The fluorescent image comprises a plurality of pixel intensity values that are provided for calibration of a fluorescence microscope.
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公开(公告)号：US20210165314A1
公开(公告)日：2021-06-03
申请号：US16065307
申请日：2016-12-16
摘要： The invention relates to creating a nano-sized recess into a layer of material. For that, a first layer (100) is provided, which defines a first recess (101). The first layer (100) is then conformally covered with a second layer (107) such that the second layer evenly covers the boundaries of the first recess. In this way, the second layer defines a nano-sized recess. Furthermore, the invention relates to using such a structure with a second nano-sized recess for etching a nanoslit into a graphene layer. Furthermore, such a graphene layer with a nanoslit is described to be used for creating a crossed-nanoslit device for sequencing molecules.
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公开(公告)号：US20160131813A1
公开(公告)日：2016-05-12
申请号：US14898167
申请日：2014-06-05
发明人： Rifat Ata Mustafa HIKMET , Dirk Kornelis Gerhardus DE BOER , Ties VAN BOMMEL , Wilhelmina Maria HARDEMAN , Marcus Antonius VERSCHUUREN
CPC分类号： G02B6/0003 , G02B6/0018 , G02B6/0035 , G02B6/0041 , G02B6/005 , G02B6/0076 , G03B21/208
摘要： A light emitting device (1) comprising a light source (2) adapted for, in operation, emitting light (13) with a first spectral distribution, a first light guide (3) comprising a first light input surface (31) and a first light exit surface (32) arranged opposite to one another, and further comprising an end surface (35) extending perpendicular with respect to the first light input surface (31), and a second light guide (4) comprising a second light input surface (41) and a second light exit surface (42) extending perpendicular with respect to one another. The first light guide (3) is adapted for receiving the light with the first spectral distribution from the light source (2) at the first light input surface (31), guiding the light with the first spectral distribution to the first light exit surface (32) and to the end surface (35) and coupling a part of the light with the first spectral distribution out of the first light exit surface (32) into the second light guide (4) and coupling another part of the light with the first spectral distribution out of the end surface (35). The second light guide (4) is adapted for receiving light with the first spectral distribution coupled out of the first light guide (3) at the second light input surface (41), guiding the light to the second light exit surface (42), converting at least a part of the light (13) with the first spectral distribution to light (14) with a second spectral distribution and coupling the light with the second spectral distribution out of the second light exit surface (42).
摘要翻译： 一种发光器件（1），包括适于在工作中发射具有第一光谱分布的光（13）的光源（2），包括第一光输入表面（31）和第一光输入表面（31）的第一光导（3） 光出射表面（32）彼此相对布置，并且还包括相对于第一光输入表面（31）垂直延伸的端表面（35）和包括第二光输入表面（2）的第二光导（4） 41）和相对于彼此垂直延伸的第二光出射表面（42）。 第一光导（3）适于在第一光输入表面（31）处接收来自光源（2）的第一光谱分布的光，将具有第一光谱分布的光引导到第一光出射表面 并且将一部分光与第一光谱分布从第一光出射表面（32）耦合到第二光导（4）中，并将另一部分光与第一光出射表面 光谱分布从端面（35）出来。 第二光导（4）适于接收在第二光输入表面（41）处耦合出第一光导（3）的第一光谱分布的光，将光引导到第二光出射表面（42） 将具有第一光谱分布的光（13）的至少一部分以第二光谱分布转换为光（14），并将光与第二光谱分布耦合出第二光出射表面（42）。
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公开(公告)号：US20230119298A1
公开(公告)日：2023-04-20
申请号：US17640844
申请日：2021-06-16
摘要： Provided is a method of providing a patterned layer (50). The method comprises providing (2, 3A, 3B) a substrate (10) having a surface (11) to which a compound is applied. The compound has at least one condensable group which is reactive with surface groups on the surface of the substrate by condensation reaction. The compound also has a basic group for accepting protons. A layer of a polycondensable imprinting composition (30) is applied (4) onto the layer of the compound. The imprinting composition layer is imprinted (5A, 5B, 5C) with a patterned stamp. During the imprinting, polycondensation of the imprinting composition leads to forming of the patterned layer. Further provided is the patterned layer itself, as well as an optical element and an etch mask, each of which comprises the patterned layer.
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公开(公告)号：US20180004084A1
公开(公告)日：2018-01-04
申请号：US15538354
申请日：2015-12-09
IPC分类号： G03F7/00 , H01L21/027 , G03F7/20 , G03F7/004 , G03F7/11
CPC分类号： G03F7/0002 , G03F7/0046 , G03F7/11 , G03F7/2012 , G03F7/70241 , H01L21/0274
摘要： A method of manufacturing a patterned stamp (100) for patterning a contoured surface (10) is disclosed. The method comprises applying a layer (115) of a pliable material precursor over a master (50) carrying an inverse pattern (52) to form a desired pattern (112) in said layer; curing the pliable material precursor to form a pliable stamp layer (120) comprising said desired pattern; providing an intermediate stamp structure by adhering a porous pliable support layer (130) to the pliable stamp layer; releasing the intermediate stamp structure from the master; forcing the intermediate stamp structure onto the contoured surface with said pattern of features facing the contoured surface; forming the patterned stamp by filling the porous pliable support layer with a filler material to reduce the pliability of the support layer; and removing the patterned stamp from the contoured surface. A corresponding patterned stamp, imprinting method and imprinted article are also disclosed.
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公开(公告)号：US20240103363A1
公开(公告)日：2024-03-28
申请号：US18532109
申请日：2023-12-07
CPC分类号： G03F7/0002 , G03F1/68 , G03F7/0005 , B82Y30/00
摘要： Provided is a method of providing a patterned layer (50). The method comprises providing (2, 3A, 3B) a substrate (10) having a surface (11) to which a compound is applied. The compound has at least one condensable group which is reactive with surface groups on the surface of the substrate by condensation reaction. The compound also has a basic group for accepting protons. A layer of a polycondensable imprinting composition (30) is applied (4) onto the layer of the compound. The imprinting composition layer is imprinted (5A, 5B, 5C) with a patterned stamp. During the imprinting, polycondensation of the imprinting composition leads to forming of the patterned layer. Further provided is the patterned layer itself, as well as an optical element and an etch mask, each of which comprises the patterned layer.
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公开(公告)号：US20220288815A1
公开(公告)日：2022-09-15
申请号：US17291639
申请日：2019-11-08
摘要： A method of imprinting a substrate (180), comprising affixing a flexible stamp (104) carrying an imprinting pattern (106) to a first carrier (102) comprising an array of apertures (112) which, by gas pressure, either pull the flexible stamp towards the first carrier or push it away; pushing it to a second carrier (170) carrying a substrate (180) with a resist layer (182), leaving a gap (190) for creating a controllable contact area between the flexible stamp and the substrate and space (196) between the first carrier and the flexible stamp; progressively pushing areas of the flexible stamp into the resist layer to imprint it; developing the resist layer; and progressively releasing the flexible stamp by applying suction through successive apertures whilst controlling the inward flow of gas to the space (196) through the apertures that are not yet under suction in order to maintain the space (196) there above ambient but below a pre-determined maximum pressure.
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公开(公告)号：US20160079490A1
公开(公告)日：2016-03-17
申请号：US14781058
申请日：2014-03-14
发明人： Dirk Kornelis Gerhardus DE BOER , Dominique Maria BRULS , Wido VAN DUIJNEVELDT , Nancy NIEUBORG , Leendert VAN DER TEMPEL , Cornelis Eustatius TIMMERING , Marcus Antonius VERSCHUUREN
IPC分类号： H01L33/50 , H01L33/64 , H01L33/60 , H01L25/075 , H01L33/58
CPC分类号： H01L33/508 , F21K9/64 , H01L25/0753 , H01L33/502 , H01L33/505 , H01L33/58 , H01L33/60 , H01L33/644 , H01L2924/0002 , H01L2924/00
摘要： A light source (104) arranged on a substrate (100) and having a light exit surface, a wavelength converter (106) configured to convert light from a first wavelength to a second wavelength, the wavelength converter (106) having a light exit surface (110) and a light entrance surface (114) and an optical coupling element (112), arranged between and in contact with the light exit surface of the light source (104) and the light entrance surface (114) of the wavelength converter (106), and configured to couple light from the light source (104) to the wavelength converter (106), wherein at least a major portion of the surface of the wavelength converter (106), other than the light exit surface (110) and the light entrance surface (114), has a surface roughness, RA, less than 100 nm.
摘要翻译： 1.一种布置在基板（100）上并具有光出射表面的光源（104），被配置为将来自第一波长的光转换成第二波长的波长转换器（106），所述波长转换器（106）具有光出射表面 （110）和光入射表面（114）和光耦合元件（112），其布置在光源（104）的光出射表面和波长转换器的光入射表面（114）之间并与之接触 106），并且被配置为将来自所述光源（104）的光耦合到所述波长转换器（106），其中所述波长转换器（106）的除了所述光出射表面（110）以外的表面的至少大部分和 光入射面（114）的表面粗糙度RA小于100nm。
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