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    POLYMERIZABLE COMPOUND, LACTONE-CONTAINING COMPOUND, METHOD FOR MANUFACTURING LACTONE-CONTAINING COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND
    3.
    发明申请
    POLYMERIZABLE COMPOUND, LACTONE-CONTAINING COMPOUND, METHOD FOR MANUFACTURING LACTONE-CONTAINING COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND 审中-公开
    可聚合化合物，含有LACTONE的化合物，制备含Lactone的化合物的方法和通过聚合可聚合化合物获得的聚合物化合物

    公开(公告)号：US20100152400A1

    公开(公告)日：2010-06-17

    申请号：US12636076

    申请日：2009-12-11

    Applicant: Yusuke IIZUKA ,  Kaoru IWATO ,  Hiroshi SAEGUSA ,  Shuji HIRANO

    Inventor： Yusuke IIZUKA ,  Kaoru IWATO ,  Hiroshi SAEGUSA ,  Shuji HIRANO

    IPC: C08G63/08 ,  C07D307/77

    CPC classification number: C07D307/77 ,  C07D493/18 ,  C08F220/18 ,  C08F220/24 ,  C08F220/30 ,  C08F2220/1808

    Abstract: A polymerizable compound having a lactone structure represented by formula (1) is provided: wherein A represents a polymerizable site; R2 represents a single bond or an alkylene group; R3 represents a hydrocarbon group in which hydrogen atoms are substituted with a fluorine atom; R4 represents a halogen atom, a cyano group, a hydroxy group, an amide group, an alkyl group, a cycloalkyl group, an alkoxy group, a phenyl group, an acyl group, an alkoxycarbonyl group, or a group represented by R—C(═O)— or R—C(═O)O—, wherein R represents an alkyl group or a cycloalkyl group; X represents an alkylene group, an oxygen atom or a sulfur atom; Z represents a single bond, an ether bond, an ester bond, an amide bond, a urethane bond or a urea bond; n represents an integer of from 0 to 5; and m represents an integer of from 0 to 7.

    Abstract translation: 提供具有由式（1）表示的内酯结构的可聚合化合物：其中A表示可聚合位点; R2表示单键或亚烷基; R3表示氢原子被氟原子取代的烃基; R 4表示卤素原子，氰基，羟基，酰胺基，烷基，环烷基，烷氧基，苯基，酰基，烷氧基羰基或由R-C （= O） - 或R-C（= O）O-，其中R表示烷基或环烷基; X表示亚烷基，氧原子或硫原子; Z表示单键，醚键，酯键，酰胺键，氨基甲酸酯键或脲键; n表示0〜5的整数， m表示0〜7的整数。

    RESIST COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH
    6.
    发明申请
    RESIST COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH 有权
    耐腐蚀组合物及其形成方法

    公开(公告)号：US20100028804A1

    公开(公告)日：2010-02-04

    申请号：US12535240

    申请日：2009-08-04

    Applicant: Kaoru IWATO ,  Kazuto Kunita

    Inventor： Kaoru IWATO ,  Kazuto Kunita

    IPC: G03F7/20 ,  G03F7/004

    CPC classification number: G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/0758 ,  G03F7/2041 ,  G03F7/30

    Abstract: A resist composition comprises two or more polymers containing a first polymer and a second polymer and a compound that when exposed to actinic rays or radiation, generates an acid, wherein when the resist composition is formed into a dry resist film, the mixing ratios of at least the first and second polymers in the resist film exhibit a gradient distribution such that the mixing ratios continuously change in entirety or partially in the direction of the depth from the surface of the resist film on the air side toward a support, and wherein the mixing ratio of the first polymer at a superior portion of the resist film is higher than that of the second polymer, while the mixing ratio of the second polymer at an inferior portion of the resist film is higher than that of the first polymer.

    Abstract translation: 抗蚀剂组合物包括含有第一聚合物和第二聚合物的两种或更多种聚合物和当暴露于光化射线或辐射时产生酸的化合物，其中当抗蚀剂组合物形成干燥抗蚀剂膜时， 抗蚀剂膜中的第一和第二聚合物的至少表现出梯度分布，使得混合比在空气侧的抗蚀剂膜的表面朝向载体的深度方向全部或部分地连续变化，并且其中混合 抗蚀剂膜的上部的第一聚合物的比例高于第二聚合物，而抗蚀剂膜的下部的第二聚合物的混合比高于第一聚合物的比例。

    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME
    8.
    发明申请
    ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME 有权
    丙烯酸敏感或辐射敏感性树脂组合物，以及丙烯酸类敏感性或辐射敏感性膜和使用其的图案形成方法

    公开(公告)号：US20130020684A1

    公开(公告)日：2013-01-24

    申请号：US13539882

    申请日：2012-07-02

    Applicant: Kaoru IWATO

    Inventor： Kaoru IWATO

    IPC: G03F7/027 ,  H01L29/02 ,  H01L21/312 ,  G03F7/075 ,  G03F7/20

    CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/11 ,  G03F7/2041

    Abstract: The actinic ray-sensitive or radiation-sensitive resin composition according to the present invention includes a resin (A) which contains at least one type of repeating unit which is represented by the general formula (PG1), at least one type of repeating unit which is selected from the repeating units which are represented by the general formula (PG2) and the general formula (PG3), and at least one type of repeating unit which includes a lactone structure, a compound (B) which is a compound which is represented by the general formula (B1) and where the molecular weight of an anion moiety is 200 or less, and a solvent (C).

    Abstract translation: 根据本发明的光化射线敏感性或辐射敏感性树脂组合物包括含有至少一种由通式（PG1）表示的重复单元的树脂（A），至少一种类型的重复单元， 选自由通式（PG2）和通式（PG3）表示的重复单元，以及至少一种包含内酯结构的重复单元，作为代表的化合物的化合物（B） 通式（B1），阴离子部分的分子量为200以下，溶剂（C）等。

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