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公开(公告)号：US20050271984A1
公开(公告)日：2005-12-08
申请号：US10863151
申请日：2004-06-07
申请人： Karl Brueckner , Brian West , Hong Wang
发明人： Karl Brueckner , Brian West , Hong Wang
CPC分类号： C23C14/564 , C23C16/4404 , G03F7/0015 , H01J37/32477
摘要： A method of fabricating a process chamber component having a textured surface includes applying a resist layer on an underlying surface of the component. A predetermined pattern of apertures is formed in the resist layer that exposes the underlying surface of the component. The underlying surface is etched through the apertures in the resist layer to form a textured surface having raised features with top corners. The resist layer is removed, and a treatment step is performed to form top corners that are rounded. In another method, the textured surface is formed by providing a patterned mask having apertures above the surface of the component. A material is sprayed through the apertures in the patterned mask and onto the surface to form a textured surface with raised features having the material.
摘要翻译： 制造具有纹理化表面的处理室部件的方法包括在部件的下表面上施加抗蚀剂层。 在抗蚀剂层中形成预定的孔径图案，其暴露组件的下表面。 底层表面通过抗蚀剂层中的孔蚀刻，以形成具有顶角的凸起特征的纹理表面。 去除抗蚀剂层，并且执行处理步骤以形成圆形的顶角。 在另一种方法中，纹理化表面通过提供在组件表面上方具有孔的图案化掩模形成。 将材料通过图案化掩模中的孔喷射到表面上以形成具有具有该材料的凸起特征的纹理表面。
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公开(公告)号：US07618769B2
公开(公告)日：2009-11-17
申请号：US10863151
申请日：2004-06-07
申请人： Karl Brueckner , Brian West , Hong Wang
发明人： Karl Brueckner , Brian West , Hong Wang
IPC分类号： G03F7/00
CPC分类号： C23C14/564 , C23C16/4404 , G03F7/0015 , H01J37/32477
摘要： A method of fabricating a process chamber component having a textured surface includes applying a resist layer on an underlying surface of the component. A predetermined pattern of apertures is formed in the resist layer that exposes the underlying surface of the component. The underlying surface is etched through the apertures in the resist layer to form a textured surface having raised features with top corners. The resist layer is removed, and a treatment step is performed to form top corners that are rounded. In another method, the textured surface is formed by providing a patterned mask having apertures above the surface of the component. A material is sprayed through the apertures in the patterned mask and onto the surface to form a textured surface with raised features having the material.
摘要翻译： 制造具有纹理化表面的处理室部件的方法包括在部件的下表面上施加抗蚀剂层。 在抗蚀剂层中形成预定的孔径图案，其暴露组件的下表面。 底层表面通过抗蚀剂层中的孔蚀刻，以形成具有顶角的凸起特征的纹理表面。 去除抗蚀剂层，并且执行处理步骤以形成圆形的顶角。 在另一种方法中，纹理化表面通过提供在组件表面上方具有孔的图案化掩模形成。 将材料通过图案化掩模中的孔喷射到表面上以形成具有具有该材料的凸起特征的纹理表面。
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公开(公告)号：US08142989B2
公开(公告)日：2012-03-27
申请号：US12618693
申请日：2009-11-13
申请人： Karl Brueckner , Brian West , Hong Wang
发明人： Karl Brueckner , Brian West , Hong Wang
IPC分类号： G03F7/00
CPC分类号： C23C14/564 , C23C16/4404 , G03F7/0015 , H01J37/32477
摘要： A method of fabricating a process chamber component having a textured surface with raised features. The method comprises providing a process chamber component having a surface, and forming a patterned resist layer on the process chamber component, the patterned resist layer having apertures that expose portions of the surface of the process chamber component therethrough. A textured surface having raised features is formed on the process chamber component by propelling grit particles with a gas that is pressurized to a pressure sufficiently high to cause the grit particles to erode and remove material from the surface.
摘要翻译： 一种制造具有凸起特征的纹理表面的处理室部件的方法。 该方法包括提供具有表面的处理室部件，并且在处理室部件上形成图案化的抗蚀剂层，所述图案化的抗蚀剂层具有使处理室部件的表面的部分透过的孔。 具有凸起特征的纹理表面通过用加压到足够高的压力的气体推动砂粒来形成在处理室部件上，从而使砂粒微粒从表面上侵蚀并除去材料。
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公开(公告)号：US20060105182A1
公开(公告)日：2006-05-18
申请号：US10989975
申请日：2004-11-16
CPC分类号： C23C14/564 , C23C16/4404 , H01J37/16 , H01J37/32504 , H01J37/32862 , H01J37/32871 , H01J2237/022 , H01L21/6875 , H01L21/68757 , Y10T428/24 , Y10T428/31678
摘要： A component for a substrate processing chamber has a structure having an overlying metal coating. The metal coating has a plurality of electron beam textured features that are formed by scanning an electron beam across a surface of the metal coating. The electron beam textured features include a plurality of depressions and protuberances on the surface that are capable of accumulating process deposits during processing of a substrate to reduce contamination of the substrate. The component having the metal coating provides improved processing results, and exhibits reduced erosion during cleaning processes performed to remove process deposits from the component.
摘要翻译： 用于基板处理室的部件具有具有上覆金属涂层的结构。 金属涂层具有通过扫描金属涂层表面上的电子束而形成的多个电子束纹理特征。 电子束纹理特征包括表面上的多个凹陷和突起，其能够在处理基底期间积累处理沉积物以减少基底的污染。 具有金属涂层的部件提供了改进的加工结果，并且在清洁过程中表现出减少的侵蚀，以从部件中除去工艺沉积物。
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公开(公告)号：US07264679B2
公开(公告)日：2007-09-04
申请号：US10777866
申请日：2004-02-11
CPC分类号： B08B7/0092 , B08B9/08 , C23C16/4407
摘要： In a method of cleaning a surface of a substrate processing chamber component to remove process deposits, the component surface is cooled to a temperature below about −40° C. to fracture the process deposits on the surface. The surface can be cooled by immersing the surface in a low temperature fluid, such as liquid nitrogen. In another version, the component surface is heated to fracture and delaminate the deposits, and optionally, subsequently rapidly cooled to form more fractures. The component surface cleaning can also be performed by bead blasting followed by a chemical cleaning step.
摘要翻译： 在清洗基板处理室部件的表面以去除工艺沉积物的方法中，将部件表面冷却至低于约-40℃的温度以破坏表面上的工艺沉积物。 表面可以通过将表面浸入诸如液氮的低温流体中来冷却。 在另一个版本中，组件表面被加热以使沉积物断裂并分层，并且任选地随后快速冷却以形成更多的裂缝。 组件表面清洁也可以通过喷丸处理，然后进行化学清洁步骤。
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公开(公告)号：US20050172984A1
公开(公告)日：2005-08-11
申请号：US10777866
申请日：2004-02-11
申请人： Marc Schweitzer , Jennifer Tiller , Brian West , Karl Brueckner
发明人： Marc Schweitzer , Jennifer Tiller , Brian West , Karl Brueckner
CPC分类号： B08B7/0092 , B08B9/08 , C23C16/4407
摘要： In a method of cleaning a surface of a substrate processing chamber component to remove process deposits, the component surface is cooled to a temperature below about −40° C. to fracture the process deposits on the surface. The surface can be cooled by immersing the surface in a low temperature fluid, such as liquid nitrogen. In another version, the component surface is heated to fracture and delaminate the deposits, and optionally, subsequently rapidly cooled to form more fractures. The component surface cleaning can also be performed by bead blasting followed by a chemical cleaning step.
摘要翻译： 在清洗基板处理室部件的表面以去除工艺沉积物的方法中，将部件表面冷却至低于约-40℃的温度以破坏表面上的工艺沉积物。 表面可以通过将表面浸入诸如液氮的低温流体中来冷却。 在另一个版本中，组件表面被加热以使沉积物断裂并分层，并且任选地随后快速冷却以形成更多的裂缝。 组件表面清洁也可以通过喷丸处理，然后进行化学清洁步骤。
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公开(公告)号：US06902627B2
公开(公告)日：2005-06-07
申请号：US10742604
申请日：2003-12-19
申请人： Karl Brueckner , Hong Wang
发明人： Karl Brueckner , Hong Wang
CPC分类号： C23G1/125 , B24C1/06 , C22B7/007 , C23C14/564 , C23F1/36 , Y02P10/234 , Y10S134/902
摘要： In a method of cleaning metal-containing deposits such as tantalum from a surface of a process chamber component, such as a metal surface, the surface is immersed in a cleaning solution. In one version, the cleaning solution is a solution having HF and HNO3 in a ratio that removes deposits from the surface substantially without eroding the surface. In another version, the cleaning solution is a solution having KOH and H2O2. The solution can be treated after cleaning the surface to recover tantalum-containing materials and one or more of the cleaning solutions.
摘要翻译： 在诸如金属表面的处理室部件的表面上清洗含金属沉积物如钽的方法中，将表面浸入清洁溶液中。 在一个版本中，清洁溶液是具有HF和HNO 3 3的溶液，其比例基本上不侵蚀表面从表面除去沉积物。 在另一个版本中，清洁溶液是具有KOH和H 2 O 2 O 2的溶液。 在清洁表面后可以处理溶液以回收含钽材料和一种或多种清洁溶液。
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公开(公告)号：US20120107520A1
公开(公告)日：2012-05-03
申请号：US13345317
申请日：2012-01-06
申请人： Brian T. West , Karl Brueckner , Shun Wu , Robert Haney
发明人： Brian T. West , Karl Brueckner , Shun Wu , Robert Haney
CPC分类号： B08B7/0021 , B08B1/00 , B08B3/02 , B08B3/08 , C23C16/4407 , H01J37/32862
摘要： Residues are removed from a surface of a substrate processing component which has a polymer coating below the residues. In one version, the component surfaces are contacted with an organic solvent to remove the residues without damaging or removing the polymer coating. The residues can be process residues or adhesive residues. The cleaning process can be conducted as part of a refurbishment process. In another version, the residues are ablated by scanning a laser across the component surface. In yet another version, the residues are vaporized by scanning a plasma cutter across the surface of the component.
摘要翻译： 残留物从具有低于残留物的聚合物涂层的底物处理组分的表面除去。 在一个版本中，组分表面与有机溶剂接触以去除残留物而不损坏或去除聚合物涂层。 残留物可以是工艺残留物或粘合剂残留物。 清洁过程可以作为翻新过程的一部分进行。 在另一个版本中，通过在组件表面上扫描激光来消除残留物。 在另一个版本中，通过扫描等离子体切割器跨部件的表面来蒸发残留物。
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公开(公告)号：US20050028838A1
公开(公告)日：2005-02-10
申请号：US10846894
申请日：2004-05-13
申请人： Karl Brueckner
发明人： Karl Brueckner
IPC分类号： B08B3/08 , C22B3/06 , C22B7/00 , C22B34/24 , C23C14/56 , C23C16/44 , C23G1/08 , C23G1/10 , C23G1/12 , C23G1/19 , C23G1/20 , C23G1/22 , C23G1/02
CPC分类号： C23C14/564 , B08B3/08 , C22B3/065 , C22B7/007 , C22B34/24 , C23C16/4407 , C23F1/44 , C23F1/46 , C23G1/086 , C23G1/103 , C23G1/106 , C23G1/125 , C23G1/19 , C23G1/205 , C23G1/22 , C23G1/36 , Y02P10/234
摘要： A method of cleaning tantalum-containing deposits from a copper surface of a process chamber component involves immersing the surface of the component in a cleaning solution. The cleaning solution has HF and an oxidizing agent. The cleaning solution can have a molar ratio of HF to the oxidizing agent of at least about 6:1, and the oxidizing agent can include at least one of HNO3, H2O2, H2SO3 and O3. The cleaning solution removes the tantalum-containing deposits from the surface substantially without eroding the surface.
摘要翻译： 从处理室组件的铜表面清洗含钽沉积物的方法包括将组分的表面浸入清洁溶液中。 清洗液具有HF和氧化剂。 清洗溶液可以具有至少约6:1的HF与氧化剂的摩尔比，并且氧化剂可以包括HNO 3，H 2 O 2，H 2 SO 3和O 3中的至少一种。 清洁溶液从表面去除含钽沉积物，基本上不侵蚀表面。
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10.发明授权
公开(公告)号：US4759598A
公开(公告)日：1988-07-26
申请号：US934041
申请日：1986-11-24
申请人： Joachim Mohr , Helmut Becker-Ross , Karl Brueckner , Hans Fischer , Guenther Moebius , Winfried Quillfeldt
发明人： Joachim Mohr , Helmut Becker-Ross , Karl Brueckner , Hans Fischer , Guenther Moebius , Winfried Quillfeldt
CPC分类号： G02B6/3616 , G02B6/4471 , G02B6/3644 , G02B6/3684 , G02B6/3692
摘要： An apparatus for the positioning of ends of flexible light-conducting elements with the object of attaining a high position reproducibility of the fiber ends in an effective large-scale production technique, having the object of developing a technical solution so that it can be manufactured with a production technology in accordance with the accuracy requirements, so that a multitude of light-conducting fibers having defined positions are exactly fixedly correlated to defined positions. According to the invention, there are provided to one another essentially parallel thin surface elements which are secured at a distance and form an element package which is divided into two adjacent areas and within each one of the two areas there is provided at least an approximately equal distribution of pierced openings for the light-conducting elements.
摘要翻译： 本发明的目的是提供一种用于定位柔性导光元件的端部的装置，其目的是以有效的大规模生产技术获得纤维端部的高位置再现性，其目的是开发技术方案，使得其可以用 根据精度要求的生产技术，使得具有定义位置的多个导光纤维与定义的位置精确地固定相关。 根据本发明，提供了一种基本上平行的薄表面元件，它们以一定距离固定并形成元件封装，元件封装被分成两个相邻的区域，并且在两个区域中的每一个区域内至少设置有近似相等的 导光元件穿孔的分布。
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