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    Terminal structure of an ion implanter
    1.
    发明申请
    Terminal structure of an ion implanter 有权
    离子注入机的端子结构

    公开(公告)号：US20080073578A1

    公开(公告)日：2008-03-27

    申请号：US11527842

    申请日：2006-09-27

    Applicant: Kasegn D. Tekletsadik ,  Russell J. Low

    Inventor： Kasegn D. Tekletsadik ,  Russell J. Low

    IPC: H01J37/317

    CPC classification number: H01J37/3171 ,  H01J37/09 ,  H01J37/16 ,  H01J2237/0206 ,  H01J2237/026 ,  H01J2237/038 ,  H01J2237/08

    Abstract: An apparatus includes a conductive structure and an insulated conductor disposed proximate an exterior portion of the conductive structure to modify an electric field about the conductive structure. The insulated conductor has an insulator with a dielectric strength greater than 75 kilovolts (kV)/inch disposed about a conductor. An ion implanter is also provided. The ion implanter includes an ion source configured to provide an ion beam, a terminal structure defining a cavity, the ion source at least partially disposed within the cavity, and an insulated conductor. The insulated conductor is disposed proximate an exterior portion of the terminal structure to modify an electric field about the terminal structure. The insulated conductor has an insulator with a dielectric strength greater than 75 kV/inch disposed about a conductor.

    Abstract translation: 一种装置包括导电结构和布置在导电结构的外部附近的绝缘导体，以修改围绕导电结构的电场。 绝缘导体具有介于绝缘体上的介电强度大于75千伏（kV）/英寸的导体周围。 还提供了离子注入机。 离子注入机包括被配置为提供离子束的离子源，限定空腔的端子结构，至少部分地设置在空腔内的离子源和绝缘导体。 绝缘导体设置在端子结构的外部附近以修改围绕端子结构的电场。 绝缘导体具有介于绝缘体上的介电强度大于75kV /英寸的导体周围。

    Techniques for reducing an electrical stress in an acceleration/deceleraion system
    2.
    发明授权
    Techniques for reducing an electrical stress in an acceleration/deceleraion system 有权
    减少加速/减速系统中电应力的技术

    公开(公告)号：US07999239B2

    公开(公告)日：2011-08-16

    申请号：US11968527

    申请日：2008-01-02

    Applicant: Kasegn D. Tekletsadik ,  Russell J. Low

    Inventor： Kasegn D. Tekletsadik ,  Russell J. Low

    IPC: G21K5/04 ,  H05H5/06

    CPC classification number: H01J37/3171 ,  H01J2237/0206 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756

    Abstract: Techniques for reducing an electrical stress in a acceleration/deceleration system are disclosed. In one particular exemplary embodiment, the techniques may be realized as an acceleration/deceleration system. The acceleration/deceleration system may comprise an acceleration column including a plurality of electrodes having apertures through which a charged particle beam may pass. The acceleration/deceleration system may also comprise a plurality of voltage grading components respectively electrically coupled to the plurality of electrodes. The acceleration/deceleration system may further comprise a plurality of insulated conductors disposed proximate the plurality of voltage grading components to modify an electrical field about the plurality of voltage grading components.

    Abstract translation: 公开了一种用于减小加速/减速系统中的电应力的技术。 在一个特定的示例性实施例中，这些技术可以被实现为加速/减速系统。 加速/减速系统可以包括加速度柱，其包括多个具有带孔粒子束可以穿过的孔的电极。 加速/减速系统还可以包括分别电耦合到多个电极的多个电压分级部件。 加速/减速系统还可以包括多个绝缘导体，其布置在多个电压分级部件附近，以修改围绕多个电压分级部件的电场。

    Terminal structure of an ion implanter
    6.
    发明授权
    Terminal structure of an ion implanter 有权
    离子注入机的端子结构

    公开(公告)号：US07675046B2

    公开(公告)日：2010-03-09

    申请号：US11527842

    申请日：2006-09-27

    Applicant: Kasegn D. Tekletsadik ,  Russell J. Low

    Inventor： Kasegn D. Tekletsadik ,  Russell J. Low

    IPC: H01J37/317

    CPC classification number: H01J37/3171 ,  H01J37/09 ,  H01J37/16 ,  H01J2237/0206 ,  H01J2237/026 ,  H01J2237/038 ,  H01J2237/08

    Abstract: An apparatus includes a conductive structure and an insulated conductor disposed proximate an exterior portion of the conductive structure to modify an electric field about the conductive structure. The insulated conductor has an insulator with a dielectric strength greater than 75 kilovolts (kV)/inch disposed about a conductor. An ion implanter is also provided. The ion implanter includes an ion source configured to provide an ion beam, a terminal structure defining a cavity, the ion source at least partially disposed within the cavity, and an insulated conductor. The insulated conductor is disposed proximate an exterior portion of the terminal structure to modify an electric field about the terminal structure. The insulated conductor has an insulator with a dielectric strength greater than 75 kV/inch disposed about a conductor.

    Abstract translation: 一种装置包括导电结构和布置在导电结构的外部附近的绝缘导体，以修改围绕导电结构的电场。 绝缘导体具有介于绝缘体上的介电强度大于75千伏（kV）/英寸的导体周围。 还提供了离子注入机。 离子注入机包括被配置为提供离子束的离子源，限定空腔的端子结构，至少部分地设置在空腔内的离子源和绝缘导体。 绝缘导体设置在端子结构的外部附近以修改围绕端子结构的电场。 绝缘导体具有介于绝缘体上的介电强度大于75kV /英寸的导体周围。

    PARTICLE TRAP
    7.
    发明申请
    PARTICLE TRAP 失效
    颗粒捕捉

    公开(公告)号：US20090147435A1

    公开(公告)日：2009-06-11

    申请号：US12327888

    申请日：2008-12-04

    Applicant: Stephen E. Krause ,  Russell J. Low ,  Kasegn D. Tekletsadik

    Inventor： Stephen E. Krause ,  Russell J. Low ,  Kasegn D. Tekletsadik

    IPC: H01G7/02

    CPC classification number: H01J37/3171 ,  H01J37/16 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/038

    Abstract: An apparatus and method for trapping particles in a housing is disclosed. A high voltage terminal/structure is situated within a housing. A conductive material, having a plurality of holes, such as a mesh, is disposed a distance away from an interior surface of the housing, such as the floor of the housing, forming a particle trap. The conductive mesh is biased so that the electrical field within the trap is either non-existent or pushing toward the floor, so as to retain particles within the trap. Additionally, a particle mover, such as a fan or mechanical vibration device, can be used to urge particles into the openings in the mesh. Furthermore, a conditioning phase may be used prior to operating the high voltage terminal, whereby a voltage is applied to the conductive mesh so as to attract particles toward the particle trap.

    Abstract translation: 公开了一种用于将颗粒捕获在壳体中的装置和方法。 高压端子/结构位于壳体内。 具有诸如网的多个孔的导电材料设置成远离壳体的内表面（例如壳体的地板）一定距离，形成颗粒捕集器。 导电网被偏置，使得陷阱内的电场不存在或者朝向地板推动，以便将颗粒保持在陷阱内。 此外，诸如风扇或机械振动装置的颗粒移动器可用于将颗粒推入网中的开口中。 此外，可以在操作高电压端子之前使用调节阶段，由此将电压施加到导电网，以将颗粒吸引到颗粒捕集器。

    Particle trap
    9.
    发明授权
    Particle trap 失效
    粒子陷阱

    公开(公告)号：US08000080B2

    公开(公告)日：2011-08-16

    申请号：US12327888

    申请日：2008-12-04

    Applicant: Stephen E. Krause ,  Russell J. Low ,  Kasegn D. Tekletsadik

    Inventor： Stephen E. Krause ,  Russell J. Low ,  Kasegn D. Tekletsadik

    IPC: H01T23/00 ,  H01P1/10 ,  H01H47/00

    CPC classification number: H01J37/3171 ,  H01J37/16 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/038

    Abstract: An apparatus and method for trapping particles in a housing is disclosed. A high voltage terminal/structure is situated within a housing. A conductive material, having a plurality of holes, such as a mesh, is disposed a distance away from an interior surface of the housing, such as the floor of the housing, forming a particle trap. The conductive mesh is biased so that the electrical field within the trap is either non-existent or pushing toward the floor, so as to retain particles within the trap. Additionally, a particle mover, such as a fan or mechanical vibration device, can be used to urge particles into the openings in the mesh. Furthermore, a conditioning phase may be used prior to operating the high voltage terminal, whereby a voltage is applied to the conductive mesh so as to attract particles toward the particle trap.

    Abstract translation: 公开了一种用于将颗粒捕获在壳体中的装置和方法。 高压端子/结构位于壳体内。 具有诸如网的多个孔的导电材料设置成远离壳体的内表面（例如壳体的地板）一定距离，形成颗粒捕集器。 导电网被偏置，使得陷阱内的电场不存在或者朝向地板推动，以便将颗粒保持在陷阱内。 此外，诸如风扇或机械振动装置的颗粒移动器可用于将颗粒推入网中的开口中。 此外，可以在操作高电压端子之前使用调节阶段，由此将电压施加到导电网，以将颗粒吸引到颗粒捕集器。

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