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    PARTICLE TRAP
    4.
    发明申请
    PARTICLE TRAP 失效
    颗粒捕捉

    公开(公告)号：US20090147435A1

    公开(公告)日：2009-06-11

    申请号：US12327888

    申请日：2008-12-04

    申请人： Stephen E. Krause ,  Russell J. Low ,  Kasegn D. Tekletsadik

    发明人： Stephen E. Krause ,  Russell J. Low ,  Kasegn D. Tekletsadik

    IPC分类号： H01G7/02

    CPC分类号： H01J37/3171 ,  H01J37/16 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/038

    摘要： An apparatus and method for trapping particles in a housing is disclosed. A high voltage terminal/structure is situated within a housing. A conductive material, having a plurality of holes, such as a mesh, is disposed a distance away from an interior surface of the housing, such as the floor of the housing, forming a particle trap. The conductive mesh is biased so that the electrical field within the trap is either non-existent or pushing toward the floor, so as to retain particles within the trap. Additionally, a particle mover, such as a fan or mechanical vibration device, can be used to urge particles into the openings in the mesh. Furthermore, a conditioning phase may be used prior to operating the high voltage terminal, whereby a voltage is applied to the conductive mesh so as to attract particles toward the particle trap.

    摘要翻译： 公开了一种用于将颗粒捕获在壳体中的装置和方法。 高压端子/结构位于壳体内。 具有诸如网的多个孔的导电材料设置成远离壳体的内表面（例如壳体的地板）一定距离，形成颗粒捕集器。 导电网被偏置，使得陷阱内的电场不存在或者朝向地板推动，以便将颗粒保持在陷阱内。 此外，诸如风扇或机械振动装置的颗粒移动器可用于将颗粒推入网中的开口中。 此外，可以在操作高电压端子之前使用调节阶段，由此将电压施加到导电网，以将颗粒吸引到颗粒捕集器。

    Particle trap
    5.
    发明授权
    Particle trap 失效
    粒子陷阱

    公开(公告)号：US08000080B2

    公开(公告)日：2011-08-16

    申请号：US12327888

    申请日：2008-12-04

    申请人： Stephen E. Krause ,  Russell J. Low ,  Kasegn D. Tekletsadik

    发明人： Stephen E. Krause ,  Russell J. Low ,  Kasegn D. Tekletsadik

    IPC分类号： H01T23/00 ,  H01P1/10 ,  H01H47/00

    CPC分类号： H01J37/3171 ,  H01J37/16 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/038

    摘要： An apparatus and method for trapping particles in a housing is disclosed. A high voltage terminal/structure is situated within a housing. A conductive material, having a plurality of holes, such as a mesh, is disposed a distance away from an interior surface of the housing, such as the floor of the housing, forming a particle trap. The conductive mesh is biased so that the electrical field within the trap is either non-existent or pushing toward the floor, so as to retain particles within the trap. Additionally, a particle mover, such as a fan or mechanical vibration device, can be used to urge particles into the openings in the mesh. Furthermore, a conditioning phase may be used prior to operating the high voltage terminal, whereby a voltage is applied to the conductive mesh so as to attract particles toward the particle trap.

    摘要翻译： 公开了一种用于将颗粒捕获在壳体中的装置和方法。 高压端子/结构位于壳体内。 具有诸如网的多个孔的导电材料设置成远离壳体的内表面（例如壳体的地板）一定距离，形成颗粒捕集器。 导电网被偏置，使得陷阱内的电场不存在或者朝向地板推动，以便将颗粒保持在陷阱内。 此外，诸如风扇或机械振动装置的颗粒移动器可用于将颗粒推入网中的开口中。 此外，可以在操作高电压端子之前使用调节阶段，由此将电压施加到导电网，以将颗粒吸引到颗粒捕集器。

    Techniques for controlling a charged particle beam
    6.
    发明授权
    Techniques for controlling a charged particle beam 有权
    用于控制带电粒子束的技术

    公开(公告)号：US07821213B2

    公开(公告)日：2010-10-26

    申请号：US11865336

    申请日：2007-10-01

    申请人： Piotr R. Lubicki ,  Russell J. Low ,  Stephen E. Krause ,  Frank Sinclair

    发明人： Piotr R. Lubicki ,  Russell J. Low ,  Stephen E. Krause ,  Frank Sinclair

    IPC分类号： H05H9/00

    CPC分类号： H05H7/04 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/002 ,  H01J2237/04735 ,  H01J2237/304

    摘要： Techniques for controlling a charged particle beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as a charged particle acceleration/deceleration system. The charged particle acceleration/deceleration system may comprise an accelerator column, which may comprise a plurality of electrodes. The plurality of electrodes may have apertures through which a charged particle beam may pass. The charged particle acceleration/deceleration system may also comprise a voltage grading system. The voltage grading system may comprise a first fluid reservoir and a first fluid circuit. The first fluid circuit may have conductive connectors connecting to at least one of the plurality of electrodes. The voltage grading system may further comprise fluid in the first fluid circuit. The fluid may have an electrical resistance.

    摘要翻译： 公开了用于控制带电粒子束的技术。 在一个特定的示例性实施例中，这些技术可以被实现为带电粒子加速/减速系统。 带电粒子加速/减速系统可以包括加速器柱，其可以包括多个电极。 多个电极可以具有带电粒子束可以通过的孔。 带电粒子加速/减速系统还可以包括电压分级系统。 电压分级系统可以包括第一流体储存器和第一流体回路。 第一流体回路可以具有连接到多个电极中的至少一个的导电连接器。 电压分级系统还可以包括第一流体回路中的流体。 流体可能具有电阻。

    TECHNIQUES FOR CONTROLLING A CHARGED PARTICLE BEAM
    7.
    发明申请
    TECHNIQUES FOR CONTROLLING A CHARGED PARTICLE BEAM 有权
    用于控制充电颗粒光束的技术

    公开(公告)号：US20090085504A1

    公开(公告)日：2009-04-02

    申请号：US11865336

    申请日：2007-10-01

    申请人： Piotr R. Lubicki ,  Russell J. Low ,  Stephen E. Krause ,  Frank Sinclair

    发明人： Piotr R. Lubicki ,  Russell J. Low ,  Stephen E. Krause ,  Frank Sinclair

    IPC分类号： H05H7/00

    CPC分类号： H05H7/04 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/002 ,  H01J2237/04735 ,  H01J2237/304

    摘要： Techniques for controlling a charged particle beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as a charged particle acceleration/deceleration system. The charged particle acceleration/deceleration system may comprise an accelerator column, which may comprise a plurality of electrodes. The plurality of electrodes may have apertures through which a charged particle beam may pass. The charged particle acceleration/deceleration system may also comprise a voltage grading system. The voltage grading system may comprise a first fluid reservoir and a first fluid circuit. The first fluid circuit may have conductive connectors connecting to at least one of the plurality of electrodes. The voltage grading system may further comprise fluid in the first fluid circuit. The fluid may have an electrical resistance.

    摘要翻译： 公开了用于控制带电粒子束的技术。 在一个特定的示例性实施例中，这些技术可以被实现为带电粒子加速/减速系统。 带电粒子加速/减速系统可以包括加速器柱，其可以包括多个电极。 多个电极可以具有带电粒子束可以通过的孔。 带电粒子加速/减速系统还可以包括电压分级系统。 电压分级系统可以包括第一流体储存器和第一流体回路。 第一流体回路可以具有连接到多个电极中的至少一个的导电连接器。 电压分级系统还可以包括第一流体回路中的流体。 流体可能具有电阻。

    Techniques for preventing parasitic beamlets from affecting ion implantation
    8.
    发明授权
    Techniques for preventing parasitic beamlets from affecting ion implantation 有权
    防止寄生子束影响离子注入的技术

    公开(公告)号：US07482598B2

    公开(公告)日：2009-01-27

    申请号：US11567485

    申请日：2006-12-06

    申请人： Russell J. Low ,  Jonathan Gerald England ,  Stephen E. Krause ,  Eric D. Hermanson

    发明人： Russell J. Low ,  Jonathan Gerald England ,  Stephen E. Krause ,  Eric D. Hermanson

    IPC分类号： H01J37/317

    CPC分类号： H01J37/3171 ,  H01J37/09 ,  H01J37/15 ,  H01J37/18 ,  H01J37/302 ,  H01J37/3023 ,  H01J2237/0455 ,  H01J2237/0458 ,  H01J2237/1503 ,  H01J2237/182 ,  H01J2237/188 ,  H01J2237/30488 ,  H01J2237/31705 ,  H01L21/266

    摘要： Techniques for preventing parasitic beamlets from affecting ion implantation are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for preventing parasitic beamlets from affecting ion implantation. The apparatus may comprise a controller that is configured to scan a spot beam back and forth, thereby forming an ion beam spanning a predetermined width. The apparatus may also comprise an aperture mechanism that, if kept stationary, allows the spot beam to pass through. The apparatus may further comprise a synchronization mechanism, coupled to the controller and the aperture mechanism, that is configured to cause the aperture mechanism to move in synchronization with the scanned spot beam, allowing the scanned spot beam to pass through but blocking one or more parasitic beamlets associated with the spot beam.

    摘要翻译： 公开了用于防止寄生子束影响离子注入的技术。 在一个特定的示例性实施例中，技术可以被实现为用于防止寄生子束影响离子注入的装置。 该装置可以包括配置成来回扫描点波束的控制器，从而形成横跨预定宽度的离子束。 该装置还可以包括孔机构，如果保持静止，则允许点束通过。 该装置还可以包括耦合到控制器和孔机构的同步机构，其被配置为使得孔径机构与扫描的点光束同步地移动，允许扫描的光束穿过但阻挡一个或多个寄生 与点光束相关的子束。