公开(公告)号：US5211825A

公开(公告)日：1993-05-18

申请号：US764161

申请日：1991-09-23

申请人： Katsuaki Saito ,  Takuya Fukuda ,  Michio Ohue ,  Tadasi Sonobe

发明人： Katsuaki Saito ,  Takuya Fukuda ,  Michio Ohue ,  Tadasi Sonobe

IPC分类号： C23C16/50 ,  C23C16/44 ,  C23C16/511 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  H05H1/46

CPC分类号： H01J37/32862 ,  C23C16/4405 ,  C23C16/511 ,  H01J37/32192 ,  H01J37/3266 ,  H05H1/46

摘要： A plasma processing apparatus performs a sample processing and cleaning processing. The sample processing is carried out by generating a reaction gas plasma within a vacuum vessel of the apparatus using an electron cyclotron resonance excitation. The cleaning processing is carried out to clean the inner wall of the vacuum vessel by generating a cleaning gas plasma within the vacuum vessel. Generation of the cleaning gas plasma takes place by using either one of the following processes:(1) The plasma diameter during the cleaning processing is made larger than that during the sample processing. The end of the plasma during cleaning processing is made to reach the inside wall of the vacuum vessel.(2) The cleaning gas plasma is scanned within the vacuum vessel.

摘要翻译： 等离子体处理装置进行样品处理和清洗处理。 通过使用电子回旋共振激发在装置的真空容器内产生反应气体等离子体来进行样品处理。 进行清洁处理以通过在真空容器内产生清洁气体等离子体来清洁真空容器的内壁。 清洁气体等离子体的产生通过使用以下任一方法进行：（1）清洁处理期间的等离子体直径大于样品处理期间的等离子体直径。 在清洁处理期间等离子体的末端到达真空容器的内壁。 （2）在真空容器内扫描清洁气体等离子体。

公开(公告)号：US5182495A

公开(公告)日：1993-01-26

申请号：US619338

申请日：1990-11-29

申请人： Takuya Fukuda ,  Michio Ohue ,  Tadasi Sonobe

发明人： Takuya Fukuda ,  Michio Ohue ,  Tadasi Sonobe

IPC分类号： C23C14/40 ,  C23C14/34 ,  C23C14/35 ,  C23C16/50 ,  C23C16/511 ,  C23F4/00 ,  H01J37/32 ,  H01L21/203 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31

CPC分类号： H01J37/32477 ,  H01J37/32192 ,  H01J37/32678 ,  H01J37/32706 ,  H01J2237/0206

摘要： In a plasma processing apparatus using ECR, faces in contact with plasma excepting a substance to be processed are covered by an insulating material. By such configuration, discharge caused between the plasma and the substance to be processed in plasma processing is prevented beforehand.

摘要翻译： 在使用ECR的等离子体处理装置中，除了被处理物质以外的与等离子体接触的面被绝缘材料覆盖。 通过这样的结构，可以预先防止等离子体和等离子体处理物质之间产生的放电。

公开(公告)号：US5162633A

公开(公告)日：1992-11-10

申请号：US372716

申请日：1989-06-27

申请人： Tadasi Sonobe ,  Kazuo Suzuki ,  Takuya Fukuda ,  Michio Ohue

发明人： Tadasi Sonobe ,  Kazuo Suzuki ,  Takuya Fukuda ,  Michio Ohue

IPC分类号： C23C14/34 ,  C23C16/511 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  H05B6/80

CPC分类号： H01J37/32678 ,  H01J37/32192 ,  H01J37/32238 ,  H01J37/32697 ,  H05B6/80

摘要： The present invention relates to a plasma treatment apparatus for making plasma surface processing of a specimen such as thin-film formation, etching, sputtering or plasma oxidation by use of plasma produced through microwave discharge. In a specimen chamber provided with a specimen table for holding at least one specimen thereon, a microwave is introduced from a direction intersecting a magnetic line of force so as to propagate in the longitudinal direction of an ECR region or in a direction along the plane of the ECR region. Since the microwave is introduced from the transverse direction of the specimen chamber, the provision of a microwave introducing window at an upper portion of the specimen chamber is not required and hence a counter electrode for applying an electric field to the specimen can be disposed at the upper portion of the specimen chamber, thereby making it possible to apply a uniform electric field to the specimen so that the specimen is subjected to a uniform treatment.

摘要翻译： 本发明涉及一种等离子体处理装置，其用于通过使用通过微波放电产生的等离子体来进行诸如薄膜形成，蚀刻，溅射或等离子体氧化等试样的等离子体表面处理。 在设置有用于保持至少一个样本的样本台的样本室中，从与磁力线相交的方向引入微波，以沿ECR区域的纵向方向或沿着ECR区域的平面的方向传播微波 ECR地区。 由于微波从试样室的横向导入，因此不需要在试样室的上部设置微波导入窗，因此可以在试样室的上部设置用于向试样施加电场的对电极 从而能够对试样施加均匀的电场，使样品经受均匀的处理。

公开(公告)号：US5433788A

公开(公告)日：1995-07-18

申请号：US131519

申请日：1993-10-04

申请人： Yasuhiro Mochizuki ,  Naohiro Momma ,  Shigeru Takahashi ,  Takuya Fukuda ,  Noboru Suzuki ,  Tadasi Sonobe ,  Kiyoshi Chiba ,  Kazuo Suzuki

发明人： Yasuhiro Mochizuki ,  Naohiro Momma ,  Shigeru Takahashi ,  Takuya Fukuda ,  Noboru Suzuki ,  Tadasi Sonobe ,  Kiyoshi Chiba ,  Kazuo Suzuki

IPC分类号： C23C16/511 ,  H01J37/32 ,  H05H1/46 ,  C23C16/50

CPC分类号： H01J37/32192 ,  C23C16/511 ,  H01J37/32678 ,  H05H1/46

摘要： A plasma treatment apparatus for forming a thin film on a substrate in a vacuum vessel includes a magnetic field generator which can be positioned inside or outside the vacuum vessel, and a microwave source. The magnetic field strength is controllable such that an electron cyclotron resonance (ECR) area is defined near the substrate. The magnetic field generator can be arranged so that plasma and reactive gas introduction ports are on the microwave introduction side of the ECR area and the substrate is on the opposite side of the ECR area. Alternatively, a gas introduction port can be positioned such that reactive gas is introduced into the ECR area or onto the substrate.

摘要翻译： 用于在真空容器中的基板上形成薄膜的等离子体处理装置包括可位于真空容器内部或外部的磁场发生器和微波源。 磁场强度是可控制的，使得在衬底附近限定电子回旋共振（ECR）区域。 磁场发生器可以布置成等离子体和反应性气体引入口位于ECR区域的微波引入侧，衬底位于ECR区域的相对侧。 或者，可以将气体引入口定位成使得反应气体被引入到ECR区域或衬底上。

公开(公告)号：US4876983A

公开(公告)日：1989-10-31

申请号：US145371

申请日：1988-01-19

申请人： Takuya Fukuda ,  Yasuhiro Mochizuki ,  Naohiro Momma ,  Shigeru Takahashi ,  Noboru Suzuki ,  Tadasi Sonobe ,  Kiyosi Chiba ,  Kazuo Suzuki

发明人： Takuya Fukuda ,  Yasuhiro Mochizuki ,  Naohiro Momma ,  Shigeru Takahashi ,  Noboru Suzuki ,  Tadasi Sonobe ,  Kiyosi Chiba ,  Kazuo Suzuki

IPC分类号： C23C16/511 ,  H01J37/32

CPC分类号： H01J37/32192 ,  C23C16/511 ,  H01J37/32678

摘要： A plasma operation apparatus utilizes plasma generated by a microwave cooperative with a magnetic field as to perform a surface operation on a specimen such as semiconductor substrates, such as, for example, thin film deposition, etching, sputtering and plasma oxidation. The apparatus particularly takes advantage of electron cyclotron resonance and is suitable for performing highly efficient and high-quality plasma operations.

公开(公告)号：US5036290A

公开(公告)日：1991-07-30

申请号：US490450

申请日：1990-03-08

申请人： Tadasi Sonobe ,  Mamoru Katane ,  Takashi Ikeguchi ,  Manabu Matsumoto ,  Shinjiro Ueda ,  Toshiaki Kobari ,  Takao Takahashi ,  Toa Hayasaka ,  Toyoki Kitayama

发明人： Tadasi Sonobe ,  Mamoru Katane ,  Takashi Ikeguchi ,  Manabu Matsumoto ,  Shinjiro Ueda ,  Toshiaki Kobari ,  Takao Takahashi ,  Toa Hayasaka ,  Toyoki Kitayama

IPC分类号： H05H7/14 ,  H01J41/12 ,  H05H7/04 ,  H05H13/04

CPC分类号： H05H7/04 ,  H01J41/12

摘要： Synchrotron radiation is generated when a base of charged particles is bent by a bending magnet. The synchrotron radiation passes down a lead-out duct as the total number of pumps is limited by the size of the apparatus and many pumps are needed in order to achieve a good vacuum. An ion pump has a main magnetic field, normally generated by a magnet of the ion pump which controls the behavior of the electrons in the ion pump. However, the leakage magnetic field of the bending magnet affects the ion pump, and therefore the ion pump is arranged so that its main magnetic field is aligned with the leakage magnetic field at the ion pump, or at least with a main component thereof. In this way, the effect of the leakage magnetic field on the ion pump is reduced. Indeed, it is possible to use the leakage magnetic field as the main magnetic field of the ion pump.

公开(公告)号：US4128780A

公开(公告)日：1978-12-05

申请号：US725630

申请日：1976-09-22

申请人： Tadasi Sonobe

发明人： Tadasi Sonobe

IPC分类号： H02K1/30 ,  H02K1/22

CPC分类号： H02K1/30

摘要： A rotor for use with rotary electric machinery, which includes a rotary shaft, a rotor core disposed around the rotary shaft and consisting of a plurality of silicon steel plates laminated to a predetermined thickness in the axial direction of the rotary shaft, a plurality of mounts secured to the rotor core by means of dove-tail joints as well as by welding and disposed on the inner circumferential surface of the rotor core plurality sets of arms, each set consisting of at least two arms whose one ends are connected to the mounts by welding, and whose other ends are connected to the rotary shaft by welding, said arms being inclined or curved to the radial direction in cross section perpendicular to the axial direction of the rotary shaft.

摘要翻译： 一种用于旋转电机的转子，其包括旋转轴，设置在旋转轴周围的转子芯，并且由在旋转轴的轴向上层叠成预定厚度的多个硅钢板组成，多个安装件 通过鸠尾接头以及通过焊接固定到转子芯上，并且通过焊接设置在转子芯的多个组的内圆周表面上，每组由至少两个臂组成，所述至少两个臂的一端通过 焊接，并且其另一端通过焊接连接到旋转轴，所述臂在与旋转轴的轴向方向垂直的截面中沿径向方向倾斜或弯曲。

公开(公告)号：US4931744A

公开(公告)日：1990-06-05

申请号：US265702

申请日：1988-11-01

申请人： Tadasi Sonobe ,  Shinjiro Ueda ,  Takashi Ikeguchi ,  Manabu Matsumoto ,  Kazuo Kuroishi

发明人： Tadasi Sonobe ,  Shinjiro Ueda ,  Takashi Ikeguchi ,  Manabu Matsumoto ,  Kazuo Kuroishi

IPC分类号： H05H13/04 ,  G21K5/02 ,  H05H7/00

CPC分类号： H05H7/00

摘要： A synchrotron radiation source and a method of making the same. As assembly of a beam absorber for absorbing synchrotron radiation beams and a piping for cooling the beam absorber is mounted in a charged particle beam duct of a bending section of the synchrotron radiation source for bending a charged particle beam. Fixed to at least one straight duct that is connectable to either of the opposite ends of the charged particle beam duch is a piping guide duct through which the beam absorber cooling piping is drawn to the outside, so that the assembly of the beam absorber and the beam absorber cooling piping can readily be mounted in the synchrotron radiation source.

公开(公告)号：US5400668A

公开(公告)日：1995-03-28

申请号：US996138

申请日：1992-12-23

申请人： Toshio Hattori ,  Hiroshi Aoyama ,  Saburo Usami ,  Toshio Ishizuki ,  Tosuke Hirata ,  Shigeru Sakamoto ,  Yumiko Seki ,  Tadasi Sonobe ,  Fumio Suzuki ,  Sueo Kawai

发明人： Toshio Hattori ,  Hiroshi Aoyama ,  Saburo Usami ,  Toshio Ishizuki ,  Tosuke Hirata ,  Shigeru Sakamoto ,  Yumiko Seki ,  Tadasi Sonobe ,  Fumio Suzuki ,  Sueo Kawai

IPC分类号： B60L13/06 ,  H01F6/00 ,  H01F6/04 ,  H01L39/04 ,  G01M19/00 ,  B60L13/04 ,  H01F7/02

CPC分类号： B60L13/06 ,  H01F6/00 ,  B60L2200/26

摘要： A superconducting magnet includes a superconducting coil, an inner tank for containing the coil, a shield plate for covering the inner tank, and an outer tank for accommodating the superconducting coil, the inner tank and the shield plate. The inner tank is supported on the outer tank by a load support member and the outer tank forms a vacuum vessel. At least one of the inner tank, the load support member, the shield plate and the outer tank includes a detection arrangement for detecting abnormality and/or deterioration of the inner tank, load support member, shield plate and outer tank associated with the respective detection arrangement.

摘要翻译： 超导磁体包括超导线圈，用于容纳线圈的内部容器，用于覆盖内部容器的屏蔽板以及用于容纳超导线圈，内部容器和屏蔽板的外部容器。 内罐通过负载支撑构件支撑在外箱上，外罐形成真空容器。 内箱，负载支承构件，屏蔽板和外箱中的至少一个包括用于检测与相应检测相关联的内箱，负载支承构件，屏蔽板和外箱的异常和/或劣化的检测装置 安排。

公开(公告)号：US5177448A

公开(公告)日：1993-01-05

申请号：US616844

申请日：1990-11-21

申请人： Takashi Ikeguchi ,  Manabu Matsumoto ,  Shinjiroo Ueda ,  Tadasi Sonobe ,  Toru Murashita ,  Satoshi Ido ,  Kazuo Kuroichi ,  Akinori Shibayama

发明人： Takashi Ikeguchi ,  Manabu Matsumoto ,  Shinjiroo Ueda ,  Tadasi Sonobe ,  Toru Murashita ,  Satoshi Ido ,  Kazuo Kuroichi ,  Akinori Shibayama

IPC分类号： H05H7/00

CPC分类号： H05H7/00

摘要： An industrial compact synchrotron radiation source includes, for the purpose of prolonging lifetime of a charged particle beam, beam absorbers made of a material having a low photodesorption yield and disposed inside a bending section/vacuum chamber at at least positions upon which the synchrotron radiation is irradiated, and electrically conductive beam stabilizers disposed at positions inside the bending section/vacuum chamber which are distant by a predetermined distance from an orbit of the charged particle beam toward the outer circumferential wall of the bending section/vacuum chamber.

摘要翻译： 为了延长带电粒子束的使用寿命，工业致密同步加速器辐射源包括由具有低光解吸收率的材料制成的光束吸收器，并且设置在至少位置上的弯曲部分/真空室内，同步加速器辐射为 照射和导电的光束稳定器，其设置在弯曲部分/真空室内部位于与带电粒子束的轨道相距预定距离的位置处，弯曲部分/真空室的外周壁。