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    Specimen holding method and fluid treatment method of specimen surface and systems therefor
    2.
    发明授权
    Specimen holding method and fluid treatment method of specimen surface and systems therefor 失效
    试样表面及其系统的试样保持方法和流体处理方法

    公开(公告)号：US5979475A

    公开(公告)日：1999-11-09

    申请号：US430429

    申请日：1995-04-28

    申请人： Takao Satoh ,  Haruo Itoh ,  Hitoshi Oka ,  Yoichi Takahara ,  Akio Saito

    发明人： Takao Satoh ,  Haruo Itoh ,  Hitoshi Oka ,  Yoichi Takahara ,  Akio Saito

    IPC分类号： H01L21/00 ,  H01L21/683 ,  B08B3/02

    CPC分类号： H01L21/67017 ,  H01L21/6838

    摘要： A highly clean fluid treatment system having a small system volume is provided by using a Bernoulli holder to accomplish stable holding of a specimen in a simple configuration. A holder having a specimen hold face formed almost the same as a specimen or having a Bernoulli effect producing region and a region surrounding the Bernoulli region made of a specific combination of materials is used and fluid supply sources are connected to the holder for supplying one or more fluids containing a treatment agent of a specimen. Since a force for inhibiting a position shift occurs on the end face of the specimen 10, stable specimen holding is enabled. The space between the specimen and the holder where treatment is executed is narrow and fluid always flows from the treatment space to the outside. Therefore, the fluid treatment system of a small volume producing high treatment efficiency and minimizing the chances of recontamination of the specimen can be provided.

    摘要翻译： 通过使用伯努利支架提供具有小系统体积的高度清洁的流体处理系统，以简单的配置实现样品的稳定保持。 使用具有与样本几乎相同或具有伯努利效应产生区域和由特定材料组合的伯努利区域周围的区域的样本保持面的保持器，并且流体供应源连接到保持器，用于供应一个或 含有样品处理剂的更多液体。 由于在试样10的端面发生用于抑制位移的力，因此能够进行稳定的试样保持。 试样与执行处理的保持器之间的空间狭窄，液体总是从处理空间流向外部。 因此，可以提供小体积的流体处理系统，其产生高的处理效率并最小化试样的再污染机会。

    Piezoelectric Ceramics and Piezoelectric Element
    4.
    发明申请
    Piezoelectric Ceramics and Piezoelectric Element 审中-公开
    压电陶瓷和压电元件

    公开(公告)号：US20070257228A1

    公开(公告)日：2007-11-08

    申请号：US10581277

    申请日：2004-12-03

    申请人： Takeo Tsukada ,  Tomohisa Azuma ,  Masakazu Hirose ,  Hitoshi Oka

    发明人： Takeo Tsukada ,  Tomohisa Azuma ,  Masakazu Hirose ,  Hitoshi Oka

    IPC分类号： H01L41/083

    CPC分类号： C04B35/475 ,  C04B2235/3208 ,  C04B2235/3213 ,  C04B2235/3224 ,  C04B2235/3227 ,  H01L41/187

    摘要： A piezoelectric ceramics having ceramic particles, wherein said ceramic particles comprises bismuth layer compound containing at least Sr, Ln (note that Ln is a lanthanoid element), Bi, Ti and O and including MIIBi4Ti4O15 type crystal (MII is an element composed of Sr and Ln) as a main component, and an oxide of Mn as a subcomponent; and an average particle diameter by the code length measuring method is 0.8 to 4.7 μm: by which it is possible to provide piezoelectric ceramics having a large Qmax in a third harmonic mode of thickness vertical vibration in a relatively high frequency band (for example, 16 to 65 MHz), a resonator an other piezoelectric element comprising the piezoelectric ceramics as a piezoelectric substance thereof.

    摘要翻译： 一种具有陶瓷颗粒的压电陶瓷，其中所述陶瓷颗粒包括至少含有Sr，Ln的铋层化合物（注意Ln是镧系元素），Bi，Ti和O，并且包括M II > 4 15 15 类型晶体（M II）是由Sr和Ln组成的元素作为主要成分， 和Mn的氧化物作为副成分; 并且通过代码长度测量方法的平均粒径为0.8至4.7μm：通过该压电陶瓷可以在相对的厚度垂直振动的三次谐波模式中提供具有大Q最大值的压电陶瓷 高频带（例如，16至65MHz），谐振器和包括作为其压电体的压电陶瓷的其它压电元件。

    Piezoelectric ceramics
    5.
    发明授权
    Piezoelectric ceramics 有权
    压电陶瓷

    公开(公告)号：US6090306A

    公开(公告)日：2000-07-18

    申请号：US248314

    申请日：1999-02-11

    申请人： Taeko Tsubokura ,  Hitoshi Oka ,  Kazuo Miyabe ,  Masayoshi Inoue

    发明人： Taeko Tsubokura ,  Hitoshi Oka ,  Kazuo Miyabe ,  Masayoshi Inoue

    IPC分类号： C04B35/46 ,  C04B35/472 ,  H01L41/187 ,  H01L41/29 ,  H01L41/333 ,  H01L41/39 ,  H01L41/00 ,  C04B35/475 ,  C04B35/499

    CPC分类号： C04B35/472 ,  H01L41/187

    摘要： Provided is a piezoelectric ceramic which achieves a high density, good temperature characteristics and a high Curie temperature, which can fully prevent (a) a decrease in Qmax (Qmax refers to a tan.theta.max when the maximum value of phase angles of third harmonic is a .theta.max), (b) a decrease in q (dynamic range of resonance frequency), (c) an increase in a fundamental wave and (d) the occurrence of a spurious mode in the vicinity of third harmonic, caused by downsizing, and which can materialize a small-sized high-performance piezoelectric element, the piezoelectric ceramic having a composition of the general formula,(Pb.sub.a-k-y-z Sr.sub.x Ln.sub.y Bi.sub.z)(Ti.sub.1-b-c Mn.sub.b Me.sub.c)O.sub.3wherein Ln is at least one element selected from the group consisting of La, Ce and Pr, Me is at least one element selected from the group consisting of Nb, Sb and Ta, and x, y, z, a, b and c represent molar ratios, the composition satisfying 0.ltoreq.x.ltoreq.0.2, 0

    摘要翻译： 提供了一种实现高密度，良好的温度特性和高居里温度的压电陶瓷，其可以完全防止（a）Qmax的降低（Qmax是指当三次谐波的相位角的最大值为 （θ）），（b）q（共振频率的动态范围）的减小，（c）基波的增加和（d）由于尺寸缩小引起的三次谐波附近的杂散模式的发生， 并且其可以实现小型高性能压电元件，具有通式为（Pba-ky-zSrxLnyBiz）（Ti1-b-cMnbMec）O3的组成的压电陶瓷是其中Ln中的至少一种元素， 由La，Ce和Pr组成，Me是选自Nb，Sb和Ta中的至少一种元素，x，y，z，a，b和c表示摩尔比，组成满足0 0.05和0.005 < = 0。 05。

    Electroless copper plating solution
    8.
    发明授权
    Electroless copper plating solution 失效
    化学镀铜溶液

    公开(公告)号：US4563217A

    公开(公告)日：1986-01-07

    申请号：US623173

    申请日：1984-06-22

    申请人： Hiroshi Kikuchi ,  Akira Tomizawa ,  Hitoshi Oka

    发明人： Hiroshi Kikuchi ,  Akira Tomizawa ,  Hitoshi Oka

    IPC分类号： C23C18/40

    CPC分类号： C23C18/40

    摘要： An electroless copper plating solution comprising cupric ions, complexing agents, a reducing agent, a pH adjustor, a polyoxyethylene series surface active agent, these being conventionally used, and (i) an inorganic compound containing at least Si or Ge, or (ii) a cationic surface active agent, or (iii) an inorganic compound containing at least Si, Ge or V and a cationic surface active agent, can give plated films with excellent mechanical properties even if operated for a long period of time with excellent stability of the plating solution.

    摘要翻译： 包含铜离子的无电镀铜溶液，络合剂，还原剂，pH调节剂，聚氧乙烯系列表面活性剂，以及（i）至少含有Si或Ge的无机化合物，或（ii） 阳离子表面活性剂，或（iii）至少含有Si，Ge或V的无机化合物和阳离子表面活性剂，即使长时间运行也能赋予具有优异机械性能的电镀膜，具有良好的稳定性 电镀液。

    Abrasive material having an antiloading coating
    9.
    发明申请
    Abrasive material having an antiloading coating 审中-公开
    具有抗负荷涂层的磨料

    公开(公告)号：US20060016128A1

    公开(公告)日：2006-01-26

    申请号：US11166538

    申请日：2005-06-24

    申请人： Hitoshi Oka

    发明人： Hitoshi Oka

    IPC分类号： B24D11/00

    CPC分类号： B24D3/342 ,  B24B3/346

    摘要： To determine what fine structure of the surface on which antiloading agents are applied performs the function of antiloading agents sufficiently. An abrasive material having an antiloading coating on an outermost surface thereof, in which the antiloading coating contains an antiloading agent and a binding resin, the binding resin is formed into a film with cracks, and a reticulate fine structure is formed on an entire surface of the antiloading coating by the cracks.

    摘要翻译： 为了确定施加防滑剂的表面的什么细微结构充分发挥抗载剂的功能。 在其最外表面上具有抗载荷涂层的研磨材料，其中防负荷涂层含有防负荷剂和粘合树脂，粘合树脂形成为具有裂纹的膜，并且在整个表面上形成网状微细结构 防滑涂层由裂纹引起。