公开(公告)号：US06895032B2

公开(公告)日：2005-05-17

申请号：US10625529

申请日：2003-07-24

申请人： Katsumi Watanabe ,  Takahiko Ishii ,  Shogo Sarumaru ,  Hideshi Yamane

发明人： Katsumi Watanabe ,  Takahiko Ishii ,  Shogo Sarumaru ,  Hideshi Yamane

IPC分类号： H01L21/31 ,  B01J3/00 ,  B01J3/03 ,  B30B11/00 ,  H01L21/00 ,  H01L21/677 ,  F27D7/06

CPC分类号： H01L21/67751 ,  B30B11/001 ,  B30B11/002 ,  H01L21/67126 ,  Y10T83/9387 ,  Y10T83/9423

摘要： A high-pressure processing apparatus for supplying a pressure medium into a high-pressure processing chamber 4, which is formed in a pressure vessel 1 to treat a workpiece at a high pressure, is provided. The pressure vessel 1 includes a first vessel section 2 and a second vessel section 3, which can be separated from each other in the axial direction, wherein the high-pressure processing chamber 4 is formed between the first and second vessel sections 2 and 3. Furthermore, a face seal section 5 for tightly sealing the high-pressure processing chamber 4 is formed in the abutment of the first and second vessel sections 2 and 3. A press apparatus 7 for providing an axial force to the face seal section 5 is disposed and the press apparatus 7 has a space 15 for storing a supplementary apparatus, such as a stirrer or the like at a position corresponding to the axial center of the pressure vessel 1. Such a structural arrangement allows a face seal type high-pressure processing apparatus to be realized, onto which the supplementary apparatus, such as a stirrer or the like, can be mounted.

摘要翻译： 提供了一种用于将压力介质供应到形成在压力容器1中以高压处理工件的高压处理室4中的高压处理装置。 压力容器1包括第一容器部分2和第二容器部分3，其可以在轴向上彼此分离，其中高压处理室4形成在第一和第二容器部分2和3之间。 此外，在第一和第二容器部分2和3的邻接处形成用于紧密密封高压处理室4的面密封部分5。 设置用于向面部密封部5提供轴向力的按压装置7，压力装置7具有用于在与压力的轴心对应的位置例如搅拌器等存放辅助装置的空间15 船1。 这种结构布置允许实现面密封型高压处理装置，其上可以安装诸如搅拌器等的辅助装置。

公开(公告)号：US07246984B2

公开(公告)日：2007-07-24

申请号：US10801007

申请日：2004-03-16

申请人： Shogo Sarumaru ,  Hideshi Yamane ,  Katsumi Watanabe ,  Hiroyuki Ueno ,  Hideki Adachi ,  Eiji Fukatsu

发明人： Shogo Sarumaru ,  Hideshi Yamane ,  Katsumi Watanabe ,  Hiroyuki Ueno ,  Hideki Adachi ,  Eiji Fukatsu

IPC分类号： H01L21/677

CPC分类号： H01L21/67751 ,  H01L21/67126 ,  H01L21/68728 ,  H01L21/68735 ,  Y10S414/139

摘要： A transferring apparatus transfers an article to be processed, which is carried by a carrier device, to a holder provided in a processing chamber defined by a processing vessel and adapted to hold the article at a specified processing position. The transferring apparatus includes a temporarily holding member, and transfers the article from the intermediate position to the processing position after receiving the article carried by the carrier device at an intermediate position distanced from the holder and temporarily holding it. The temporarily holding member is retracted to a position in the outside of the processing vessel after the article is transferred.

摘要翻译： 传送装置将由承载装置携带的待处理物品传送到设置在由处理容器限定的处理室中的保持器，并适于将物品保持在指定的处理位置。 传送装置包括临时保持构件，并且在远离保持器的中间位置接收由托架装置承载的物品并暂时保持物品后，将物品从中间位置传送到处理位置。 在传送物品之后，临时保持构件缩回到处理容器的外部的位置。

公开(公告)号：US07252719B2

公开(公告)日：2007-08-07

申请号：US11249444

申请日：2005-10-14

申请人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： B08B3/02

CPC分类号： H01L21/67017 ,  B08B7/0021 ,  H01L21/67126 ,  Y10S134/902

摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

摘要翻译： 高压处理装置包括：处理容器，其包括形成在其中的处理室，以对处理室中的物体执行一定的处理; 流体供给装置，其将高压流体供给到处理室中; 从处理室排出高压流体的流体排出装置; 搅拌单元，其布置在处理室中并且可操作以通过相对于处理容器的旋转将高压流体流过物体; 形成在所述处理容器中以在所述处理室内部和外部连通的连通通道; 旋转驱动构件，其经由设置在所述连通通道中的轴部联接到所述搅拌单元; 以及密封部，其设置在所述轴部和所述处理容器之间，以将所述处理室与所述旋转驱动构件断开。 流体排出装置包括形成在与密封部分相比更靠近处理室的连通通道的特定位置中以排出高压流体的流体排放口。

公开(公告)号：US06823880B2

公开(公告)日：2004-11-30

申请号：US10131193

申请日：2002-04-25

申请人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Masahiro Yamagata ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： B08B1500

CPC分类号： H01L21/67017 ,  B08B7/0021 ,  H01L21/67126 ,  Y10S134/902

摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

摘要翻译： 高压处理装置包括：处理容器，其包括形成在其中的处理室，以对处理室中的物体执行一定的处理; 流体供给装置，其将高压流体供给到处理室中; 从处理室排出高压流体的流体排出装置; 搅拌单元，其布置在处理室中并且可操作以通过相对于处理容器的旋转将高压流体流过物体; 形成在所述处理容器中以在所述处理室内部和外部连通的连通通道; 旋转驱动构件，其经由设置在所述连通通道中的轴部联接到所述搅拌单元; 以及密封部，其设置在所述轴部和所述处理容器之间，以将所述处理室与所述旋转驱动构件断开。 流体排出装置包括形成在与密封部分相比更靠近处理室的连通通道的特定位置中以排出高压流体的流体排放口。

公开(公告)号：US07000653B2

公开(公告)日：2006-02-21

申请号：US10826309

申请日：2004-04-19

申请人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： B65B1/30

CPC分类号： H01L21/67017 ,  B08B7/0021 ,  H01L21/67126 ,  Y10S134/902

摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

公开(公告)号：US20060032520A1

公开(公告)日：2006-02-16

申请号：US11249444

申请日：2005-10-14

申请人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

发明人： Yoshihiko Sakashita ,  Katsumi Watanabe ,  Hisanori Oshiba ,  Shogo Sarumaru ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Ikuo Mizobata ,  Ryuji Kitakado

IPC分类号： B08B3/00

CPC分类号： H01L21/67017 ,  B08B7/0021 ,  H01L21/67126 ,  Y10S134/902

摘要： A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; fluid discharging means which discharges the high-pressure fluid from the processing chamber; an agitating unit which is arranged in the processing chamber and is operative to flow the high-pressure fluid over the object by relative rotation to the processing vessel; a communicating channel which is formed in the processing vessel to communicate inside and outside of the processing chamber; a rotary driving member which is coupled to the agitating unit via a shaft portion provided in the communicating channel; and a sealing portion which is provided between the shaft portion and the processing vessel to disconnect the processing chamber from the rotary driving member. The fluid discharging means includes a fluid discharging port formed in a certain position of the communicating channel closer to the processing chamber than the sealing portion to discharge the high-pressure fluid.

摘要翻译： 高压处理装置包括：处理容器，其包括形成在其中的处理室，以对处理室中的物体执行一定的处理; 流体供给装置，其将高压流体供给到处理室中; 从处理室排出高压流体的流体排出装置; 搅拌单元，其布置在处理室中并且可操作以通过相对于处理容器的旋转将高压流体流过物体; 形成在所述处理容器中以在所述处理室内部和外部连通的连通通道; 旋转驱动构件，其经由设置在所述连通通道中的轴部联接到所述搅拌单元; 以及密封部，其设置在所述轴部和所述处理容器之间，以将所述处理室与所述旋转驱动构件断开。 流体排出装置包括形成在与密封部分相比更靠近处理室的连通通道的特定位置中以排出高压流体的流体排放口。

公开(公告)号：US07384484B2

公开(公告)日：2008-06-10

申请号：US10700020

申请日：2003-11-03

申请人： Yusuke Muraoka ,  Kimitsugu Saito ,  Tomomi Iwata ,  Eiji Fukatsu ,  Ikuo Mizobata ,  Hiroyuki Ueno ,  Yasuo Okuyama ,  Takashi Gama ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Jun Munemasa ,  Hisanori Oshiba ,  Shogo Sarumaru

发明人： Yusuke Muraoka ,  Kimitsugu Saito ,  Tomomi Iwata ,  Eiji Fukatsu ,  Ikuo Mizobata ,  Hiroyuki Ueno ,  Yasuo Okuyama ,  Takashi Gama ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Jun Munemasa ,  Hisanori Oshiba ,  Shogo Sarumaru

IPC分类号： B05C13/02 ,  B05B1/26 ,  B05B7/00 ,  C23C14/00 ,  B08B3/00 ,  H01L21/677

CPC分类号： H01L21/67051 ,  G11B7/261 ,  G11B7/265 ,  H01L21/67028 ,  Y10S134/902

摘要： After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unit 10A, 10B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unit 20 by a primary transport robot 30. The supercritical drying unit 20 performs a high-pressure drying process (supercritical drying process) in a dedicated manner. Accordingly, by virtue of the presence of the anti-drying solution, the substrate W is effectively prevented from becoming air-dry during the transportation of the substrate W.

摘要翻译： 在显影单元10A，10B中经过显影处理之后，依次进行漂洗处理和替换处理，用防干燥溶液湿润的基板W通过初级干燥器湿式输送到超临界干燥单元20 运输机器人30。 超临界干燥单元20以专用的方式进行高压干燥处理（超临界干燥处理）。 因此，通过存在防干燥溶液，能够有效地防止基板W在基板W的输送过程中变得风干。

公开(公告)号：US06703316B2

公开(公告)日：2004-03-09

申请号：US10132212

申请日：2002-04-26

申请人： Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Nobuyuki Kawakami ,  Takahiko Ishii ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Tomomi Iwata ,  Ikuo Mizobata ,  Takashi Miyake ,  Ryuji Kitakado

发明人： Yoichi Inoue ,  Yoshihiko Sakashita ,  Katsumi Watanabe ,  Nobuyuki Kawakami ,  Takahiko Ishii ,  Yusuke Muraoka ,  Kimitsugu Saito ,  Tomomi Iwata ,  Ikuo Mizobata ,  Takashi Miyake ,  Ryuji Kitakado

IPC分类号： H01L21302

CPC分类号： H01L21/02052 ,  H01L21/67028

摘要： A method and system for processing a substrate includes performing a wet process by supplying a working liquid to a substrate in a wet processing apparatus, transferring the substrate in a non-dry state from the wet processing apparatus to a drying apparatus, and subjecting the substrate to a supercritical drying by a supercritical fluid in the drying apparatus.

摘要翻译： 用于处理衬底的方法和系统包括通过在湿法处理设备中将工作液体供应到衬底来进行湿法处理，将非干燥状态的衬底从湿法处理设备转移到干燥设备，并对衬底 在干燥装置中通过超临界流体进行超临界干燥。

公开(公告)号：US08995942B2

公开(公告)日：2015-03-31

申请号：US12890768

申请日：2010-09-27

申请人： Katsumi Watanabe

发明人： Katsumi Watanabe

IPC分类号： H04B17/00 ,  H04W56/00 ,  H04B1/40

CPC分类号： H04W56/00 ,  H04B1/40

摘要： There is provided a radio communication device including a radio receiving unit to receive a radio signals, a synchronization unit to detect synchronization based on a result of a correlation for received signals output from the radio receiving unit, and a signal strength output unit to output, as signal strength of the received signals that is RSSI (Received Signal Strength Indicator) value, a level of a correlation signal that is output as a result of the correlation by the synchronization unit.

摘要翻译： 提供一种无线电通信装置，包括：无线电接收单元，用于接收无线电信号;基于从无线电接收单元输出的接收信号的相关结果来检测同步的同步单元;以及信号强度输出单元， 作为RSSI（接收信号强度指示符）值的接收信号的信号强度，作为由同步单元进行相关的结果输出的相关信号的电平。

公开(公告)号：USRE41511E1

公开(公告)日：2010-08-17

申请号：US11726763

申请日：2007-03-22

申请人： Yutaka Aoki ,  Ichiro Mihara ,  Takeshi Wakabayashi ,  Katsumi Watanabe

发明人： Yutaka Aoki ,  Ichiro Mihara ,  Takeshi Wakabayashi ,  Katsumi Watanabe

IPC分类号： H01L23/522 ,  H01L23/50

CPC分类号： H01L23/3114 ,  H01L23/5223 ,  H01L23/5225 ,  H01L23/5227 ,  H01L23/5228 ,  H01L23/525 ,  H01L2924/0002 ,  H01L2924/1423 ,  H01L2924/19041 ,  H01L2924/00

摘要： In a semiconductor device, re-wiring is provided on a circuit element formation region of a semiconductor substrate. A columnar electrode for connection with a circuit board is provided on the rewiring. A first insulating film is provided over the semiconductor substrate excluding a connection pad, and a ground potential layer connected to a ground potential is provided on an upper surface of the first insulating film. A re-wiring is provided over the ground potential layer with a second insulating film interposed. The ground potential layer serves as a barrier layer for preventing crosstalk between the re-wiring and circuit element formation region. A thin-film circuit element is provided on the second insulating film, and a second ground potential layer is provided as a second barrier layer over the thin-film circuit element with an insulating film interposed. Re-wiring is provided over the second ground potential layer.

摘要翻译： 在半导体器件中，在半导体衬底的电路元件形成区域上设置再布线。 在重新布线时提供用于与电路板连接的柱状电极。 第一绝缘膜设置在除了连接焊盘之外的半导体衬底上，并且在第一绝缘膜的上表面上设置连接到接地电位的接地电位层。 在地电位层上提供再布线，其中插入有第二绝缘膜。 地电位层用作防止重新布线和电路元件形成区域之间的串扰的阻挡层。 薄膜电路元件设置在第二绝缘膜上，第二接地电位层设置在薄膜电路元件上，作为第二阻挡层，绝缘膜被插入。 在第二接地电位层上提供重新布线。