公开(公告)号：US08805556B2

公开(公告)日：2014-08-12

申请号：US12495915

申请日：2009-07-01

申请人： Kazuaki Saiki ,  Ping-Wei Chang

发明人： Kazuaki Saiki ,  Ping-Wei Chang

IPC分类号： G05B19/18

CPC分类号： H01L21/67092 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/709 ,  H01L21/68785

摘要： A damping apparatus that supports and dampens a stage apparatus that positions and drives a stage to a target position is provided herein. The damping apparatus including a support plate part, a support force generating means, and a first controlling means. The support plate part supports the stage apparatus. The support force generating means exerts a damping action by applying a support force to the support plate part in the vertical directions. The first controlling means uses the acceleration of the stage, which is derived from a target track, to the target position, to control the support force generated by the support force generating means so as to compensate for forces that both occur as a result of the acceleration of the stage and cause the support plate part to tilt. The present invention controls vibration and the tilt of a base plate with high precision.

摘要翻译： 本文提供了一种阻尼装置，其支撑和阻尼将台架定位和驱动到目标位置的平台装置。 该阻尼装置包括支撑板部分，支撑力产生装置和第一控制装置。 支撑板部件支撑平台装置。 支撑力产生装置通过在垂直方向上向支撑板部分施加支撑力来施加阻尼作用。 第一控制装置使用从目标轨道导出的平台的加速度到目标位置，以控制由支撑力产生装置产生的支撑力，以便补偿由于 加速阶段并使支撑板部分倾斜。 本发明以高精度控制基板的振动和倾斜。

公开(公告)号：US20100001168A1

公开(公告)日：2010-01-07

申请号：US12495915

申请日：2009-07-01

申请人： Kazuaki Saiki ,  Ping-Wei Chang

发明人： Kazuaki Saiki ,  Ping-Wei Chang

IPC分类号： H01L21/67 ,  H01L21/027

CPC分类号： H01L21/67092 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/709 ,  H01L21/68785

摘要： A damping apparatus that supports and dampens a stage apparatus that positions and drives a stage to a target position is provided herein. The damping apparatus including a support plate part, a support force generating means, and a first controlling means. The support plate part supports the stage apparatus. The support force generating means exerts a damping action by applying a support force to the support plate part in the vertical directions. The first controlling means uses the acceleration of the stage, which is derived from a target track, to the target position, to control the support force generated by the support force generating means so as to compensate for forces that both occur as a result of the acceleration of the stage and cause the support plate part to tilt. The present invention controls vibration and the tilt of a base plate with high precision.

摘要翻译： 本文提供了一种阻尼装置，其支撑和阻尼将台架定位和驱动到目标位置的平台装置。 该阻尼装置包括支撑板部分，支撑力产生装置和第一控制装置。 支撑板部件支撑平台装置。 支撑力产生装置通过在垂直方向上向支撑板部分施加支撑力来施加阻尼作用。 第一控制装置使用从目标轨道导出的平台的加速度到目标位置，以控制由支撑力产生装置产生的支撑力，以便补偿由于 加速阶段并使支撑板部分倾斜。 本发明以高精度控制基板的振动和倾斜。

公开(公告)号：US06320345B1

公开(公告)日：2001-11-20

申请号：US09036401

申请日：1998-03-05

申请人： Bausan Yuan ,  Kazuaki Saiki ,  Henry Kwok Pang Chau

发明人： Bausan Yuan ,  Kazuaki Saiki ,  Henry Kwok Pang Chau

IPC分类号： H02P704

CPC分类号： G03F7/70725 ,  G03F7/709 ,  G05B19/416 ,  G05B2219/41117 ,  G05B2219/41408 ,  G05B2219/43065 ,  G05B2219/45028

摘要： A command trajectory drives a stage to produce a smooth motion while minimizing any vibrations or oscillations of the structure. The command trajectory provides an acceleration and a deceleration that have derivatives, known as the jerk, equal to zero at the beginning and end of the acceleration and deceleration periods. Because the jerk is equal to zero at the beginning and end of acceleration and deceleration, the influence of the reactive forces on the positioning system's structure is reduced, thereby minimizing oscillation of the structure. Moreover, the jerk is continuous throughout the acceleration and deceleration periods, resulting in a smooth continuous motion of the stage. The jerk on the stage during acceleration and deceleration has an adjustable duration to reduce the structural disturbances and decrease settling time.

摘要翻译： 命令轨迹驱动一个阶段以产生平滑的运动，同时最小化结构的任何振动或振荡。 命令轨迹提供加速度和减速度，其具有在加速和减速周期的开始和结束时具有等于零的导数。 由于加速和减速开始和结束时的加加速度等于零，因此减小了反作用力对定位系统结构的影响，从而使结构的振荡最小化。 而且，加速和减速期间的加加速度都是连续的，导致平台的平稳连续运动。 加速和减速期间舞台上的冲击具有可调节的持续时间，以减少结构干扰并减少建立时间。

公开(公告)号：US5715037A

公开(公告)日：1998-02-03

申请号：US615853

申请日：1996-03-12

申请人： Kazuaki Saiki ,  Susumu Mori ,  Hiroshi Shirasu

发明人： Kazuaki Saiki ,  Susumu Mori ,  Hiroshi Shirasu

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/00 ,  G03F9/70

摘要： The present invention provides a scanning exposure apparatus for projecting an image of a pattern area of a mask having a first alignment mark onto a photosensitive substrate disposed on a substrate stage. A second alignment mark is provided on at least one of the photosensitive substrate and the substrate stage. The scanning exposure apparatus includes a plurality of projection optical systems disposed along a predetermined direction and adapted to receive the luminous fluxes passed through the mask and to project elected images of unchanged dimension of the plurality of illuminated regions of the mask onto the substrate. There is provided a mark detection system for detecting the first alignment mark on the mask and the second alignment mark, and at least one of the projection optical systems constitutes a part of the mark detection system.

摘要翻译： 本发明提供了一种用于将具有第一对准标记的掩模的图案区域的图像投影到设置在基板台上的感光基板上的扫描曝光装置。 在感光基板和基板台的至少一个上设置第二对准标记。 扫描曝光装置包括沿着预定方向设置的多个投影光学系统，其适于接收通过掩模的光通量，并将掩模的多个照明区域的未改变尺寸的选定图像投影到基板上。 提供了一种用于检测掩模上的第一对准标记和第二对准标记的标记检测系统，并且至少一个投影光学系统构成标记检测系统的一部分。

公开(公告)号：US09188878B2

公开(公告)日：2015-11-17

申请号：US13981733

申请日：2012-01-27

申请人： Hiroshi Fujimoto ,  Kazuaki Saiki ,  Koichi Sakata

发明人： Hiroshi Fujimoto ,  Kazuaki Saiki ,  Koichi Sakata

IPC分类号： G03F7/20

CPC分类号： G03F7/70775 ,  G03F7/70725 ,  G03F7/70758

摘要： At a carriage that shows a resonance mode in opposite phase to a resonance mode shown by a plate table where an interferometer which measures a position (a first controlled variable) of a plate stage driven according to a control input is installed, another interferometer is installed which measures a position (the second controlled variable) of the plate stage. By using the interferometer and the another interferometer, it becomes possible to design a driving system robust in a high bandwidth that drives the plate stage.

摘要翻译： 在显示与由平板表所示的谐振模式相反的谐振模式的托架上，其中安装了根据控制输入驱动的板级位置（第一受控变量）的干涉仪，另一干涉仪被安装 其测量平台的位置（第二受控变量）。 通过使用干涉仪和另一干涉仪，可以设计在驱动平板台的高带宽中坚固的驱动系统。

公开(公告)号：US06509953B1

公开(公告)日：2003-01-21

申请号：US09020876

申请日：1998-02-09

申请人： Kazuaki Saiki ,  Bausan Yuan

发明人： Kazuaki Saiki ,  Bausan Yuan

IPC分类号： G03B2742

CPC分类号： G03F9/7003 ,  G03F7/70358 ,  G03F7/70716 ,  G03F7/70725 ,  G03F9/70

摘要： A high-precision scanning positioning system with magnification and orthogonality correction. A scanning position system, such as a microlithographic system, has a mask fine stage and a plate fine stage mounted on a coarse stage that moves at a constant velocity during exposure. By moving one fine stage relative to the other fine stage in the same or opposite direction of the scan during the exposure of the plate, an increase or decrease in magnification may be achieved. Likewise, by moving one fine stage relative to the other fine stage perpendicular to the direction of the scan during the exposure, a change in orthogonality may be achieved, and by rotating one fine stage relative to the other, correction of any rotation error may be achieved. A position control apparatus controls the motion of the fine stage relative to the other fine stage, such that the scanning position system can simultaneously correct synchronous error between the fine stages and reduce settling time while changing the magnification and orthogonality.

摘要翻译： 具有放大和正交校正的高精度扫描定位系统。 诸如微光刻系统的扫描位置系统具有掩模精细级和安装在粗暴平台上的平板精细平台，其在曝光期间以恒定速度移动。 通过在平板曝光期间在扫描的相同或相反方向上相对于另一个细小阶段移动一个细小阶段，可以实现放大率的增加或减少。 类似地，通过在曝光期间相对于垂直于扫描方向的另一个精细阶段移动一个精细阶段，可以实现正交性的改变，并且通过相对于另一个旋转一个精细阶段，任何旋转误差的校正可以是 实现了 位置控制装置控制精细级相对于另一细级的运动，使得扫描位置系统可以同时校正精细级之间的同步误差，并且在改变放大率和正交性的同时减少建立时间。

公开(公告)号：US5777722A

公开(公告)日：1998-07-07

申请号：US654382

申请日：1996-05-28

申请人： Seiji Miyazaki ,  Tsuyoshi Narabe ,  Kei Nara ,  Tomohide Hamada ,  Kazuaki Saiki ,  Hideji Goto ,  Muneyasu Yokota

发明人： Seiji Miyazaki ,  Tsuyoshi Narabe ,  Kei Nara ,  Tomohide Hamada ,  Kazuaki Saiki ,  Hideji Goto ,  Muneyasu Yokota

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/32 ,  G01B11/00

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： A scanning exposure apparatus is arranged to illuminate a mask, to project an image of the mask through a projection optical system onto a photosensitive substrate, and to move the mask and the photosensitive substrate relative to the projection optical system, thereby effecting exposure of an entire surface of the mask on the photosensitive substrate, and the exposure apparatus comprises a position detector which detects a relative positional relation between the mask and the photosensitive substrate; a memory which stores positional information obtained by the position detector; a position correcting device which corrects the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory device; and a controller which makes the position detector detect the relative positional relation between the mask and the photosensitive substrate while the mask and the photosensitive substrate are carried past a projection region of the projection optical system to an exposure start position, and makes the position correcting device correct the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory, while the mask and the photosensitive substrate are stopped at the exposure start position and/or during the exposure.

摘要翻译： 扫描曝光装置被布置为照亮掩模，通过投影光学系统将光掩模的图像投射到感光基板上，并且使掩模和感光基板相对于投影光学系统移动，从而实现整个曝光 感光基板上的掩模表面，曝光装置包括检测掩模和感光基板之间的相对位置关系的位置检测器; 存储器，其存储由所述位置检测器获取的位置信息; 基于从存储装置读出的位置信息来校正掩模和感光基板之间的相对位置关系的位置校正装置; 以及控制器，其使得位置检测器在将掩模和感光基板通过投影光学系统的投影区域到曝光开始位置时检测掩模和感光基板之间的相对位置关系，并使位置校正装置 基于从存储器读出的位置信息，掩模和感光基板在曝光开始位置和/或曝光期间停止时，校正掩模和感光基板之间的相对位置关系。

公开(公告)号：US06606146B2

公开(公告)日：2003-08-12

申请号：US09824061

申请日：2001-04-03

申请人： Kazuaki Saiki

发明人： Kazuaki Saiki

IPC分类号： G03B2758

CPC分类号： G03F7/70716 ,  G03F7/70725 ,  G03F7/709 ,  Y10T29/41

摘要： A stage device, usable in, e.g., an exposure apparatus, can include an inexpensive passive type vibration control pad system, while avoiding problems such as contact between stationary and movable parts and deterioration of stage control performance. The stage device includes a stage main body that moves on a base, and a support that is vibrationally isolated from the base. A movable part is disposed on the stage main body. A stationary part is supported by the support, the movable part moving relative to the stationary part. A detector detects a size of a gap between the movable part and the stationary part. An actuator adjusts a relative positional relationship between the movable part and the stationary part based on the detected gap size.

摘要翻译： 可以在例如曝光装置中使用的舞台装置可以包括便宜的无源型振动控制垫系统，同时避免静态和可动部件之间的接触以及舞台控制性能的劣化等问题。 舞台装置包括在基座上移动的舞台主体和与基座振动隔离的支架。 可动部件设置在台架主体上。 固定部分由支撑件支撑，可动部分相对于静止部分移动。 检测器检测可动部和静止部之间的间隙的大小。 致动器基于检测到的间隙尺寸来调节可动部和固定部之间的相对位置关系。

公开(公告)号：US06084244A

公开(公告)日：2000-07-04

申请号：US126639

申请日：1998-07-30

申请人： Kazuaki Saiki ,  Tomohide Hamada

发明人： Kazuaki Saiki ,  Tomohide Hamada

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01N21/86

CPC分类号： G03F7/70358 ,  G03F9/7034

摘要： A scanning exposure apparatus of the present invention is constructed in such an arrangement that while a mask and a substrate are moved relatively to a projection optical system, a pattern formed on the mask is projected for exposure through the projection optical system onto the substrate. The scanning exposure apparatus is provided with a leveling control portion for successively controlling an amount of relative inclination between the substrate and the mask with movement thereof, based on a predetermined leveling angle command .theta., so that an exposure area of the substrate becomes approximately coincident with an image plane of the pattern of the mask, a positional deviation measuring and control portion for measuring and controlling an amount of relative positional deviation between the mask and the substrate, and a positional deviation calculating and correcting portion for calculating an amount of relative positional deviation between the mask and the substrate, which will be caused by the control of the leveling control portion, based on the leveling angle command, and effecting correction of the relative positional deviation on the positional deviation measuring and control portion.

摘要翻译： 本发明的扫描曝光装置被构造成这样一种布置，即当掩模和基片相对于投影光学系统移动时，形成在掩模上的图案被投影以通过投影光学系统曝光到基底上。 扫描曝光装置设置有调平控制部分，用于基于预定的调平角度指令θ来连续地控制基板和掩模之间的相对倾斜量，使得基板的曝光区域大致与 掩模图案的图像平面，用于测量和控制掩模和基板之间的相对位置偏差量的位置偏差测量和控制部分，以及用于计算相对位置偏差量的位置偏差计算和校正部分 基于平整角度指令，由调平控制部的控制引起的掩模和基板之间的位置偏差测量和控制部的相对位置偏差的校正。

公开(公告)号：US6008610A

公开(公告)日：1999-12-28

申请号：US45218

申请日：1998-03-20

申请人： Bausan Yuan ,  Kazuaki Saiki

发明人： Bausan Yuan ,  Kazuaki Saiki

IPC分类号： H01L21/027 ,  G03F7/20 ,  G03F9/00 ,  G05B11/18

CPC分类号： G03F7/70358 ,  G03F7/70725

摘要： A position control apparatus for synchronously controlling the movement of fine stages in a high-precision scanning positioning instrument. The position control apparatus uses actuators to adjust the fine stages with six degrees of freedom. By adjusting the fine stages, any synchronous errors between the fine stages during scanning may be dynamically corrected. Further, the fine stages may be adjusted during periods of acceleration and deceleration to reduce the settling time and consequently increasing throughput. Encoders directly attached to the actuators produce signals that are used in a velocity feedback loop. The locations of the fine stages are measured by interferometers. The position control apparatus uses a position control circuit to control the actuators to compensate for synchronous error.

摘要翻译： 一种位置控制装置，用于同步控制高精度扫描定位装置中精细台阶的移动。 位置控制装置使用致动器以六自由度来调节细级。 通过调整精细阶段，可以动态校正扫描期间精细阶段之间的任何同步误差。 此外，可以在加速和减速期间调整细小阶段以减少建立时间并因此提高生产量。 直接连接到执行器的编码器产生用于速度反馈回路的信号。 精细级的位置由干涉仪测量。 位置控制装置使用位置控制电路来控制致动器来补偿同步误差。