公开(公告)号：US20090141378A1

公开(公告)日：2009-06-04

申请号：US12332628

申请日：2008-12-11

申请人： Kazuo TAWARAYAMA ,  Tatsuhiko Higashiki ,  Iwao Higashikawa

发明人： Kazuo TAWARAYAMA ,  Tatsuhiko Higashiki ,  Iwao Higashikawa

IPC分类号： G02B7/185

CPC分类号： G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G02B17/0663 ,  G03F1/24 ,  G03F1/38

摘要： An optical element includes a substrate, a magnetostrictive film arranged on the substrate, a film thickness of the magnetostrictive film varying in accordance with intensity of a magnetic field, and a reflection film arranged on the magnetostrictive film and reflects light. An optical apparatus includes a stage including a holder provided with plural holes arranged in a carrying surface thereof for carrying an optical element provided with a magnetostrictive film arranged on a substrate, a film thickness of the magnetostrictive film varying in accordance with intensity of a magnetic field, and a reflection film arranged on the magnetostrictive film and reflecting light, plural magnetic field generation parts embedded in the plural holes, and a control mechanism for controlling the magnetic field generated by each of the plural magnetic field generation parts, and controlling the film thickness of the magnetostrictive film.

摘要翻译： 光学元件包括基板，设置在基板上的磁致伸缩膜，磁致伸缩膜的膜厚度根据磁场的强度而变化，以及布置在磁致伸缩膜上并反射光的反射膜。 一种光学装置，包括：台架，其具有设置有多个孔的保持器，所述保持器设置在其承载表面上，用于承载设置有设置在基板上的磁致伸缩膜的光学元件，所述磁致伸缩膜的膜厚度根据磁场强度而变化 以及布置在磁致伸缩膜上并反射光的反射膜，嵌入在多个孔中的多个磁场产生部分和用于控制由多个磁场产生部分中的每一个产生的磁场的控制机构，并且控制膜厚度 的磁致伸缩膜。

公开(公告)号：US07985958B2

公开(公告)日：2011-07-26

申请号：US11268603

申请日：2005-11-08

申请人： Tetsuro Nakasugi ,  Kazuo Tawarayama ,  Hiroyuki Mizuno ,  Takumi Ota ,  Noriaki Sasaki ,  Tatsuhiko Higashiki ,  Takeshi Koshiba ,  Shunko Magoshi

发明人： Tetsuro Nakasugi ,  Kazuo Tawarayama ,  Hiroyuki Mizuno ,  Takumi Ota ,  Noriaki Sasaki ,  Tatsuhiko Higashiki ,  Takeshi Koshiba ,  Shunko Magoshi

IPC分类号： H01J37/153

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J2237/15 ,  H01J2237/30433

摘要： According to an aspect of the invention, there is provided an electron beam drawing apparatus comprising at least one stage of a deflection amplifier and a deflection unit, a first storage section which stores shot information at a drawing time, a second storage section which stores a correction table indicating a relation between the shot information and an output voltage of the deflection amplifier, and an adjusting section which adjusts an output of the deflection amplifier based on the correction table stored in the second storage section and the shot information stored in the first storage section.

摘要翻译： 根据本发明的一个方面，提供了一种电子束描绘装置，其包括偏转放大器和偏转单元的至少一个级，在绘制时存储镜头信息的第一存储部分， 指示拍摄信息和偏转放大器的输出电压之间的关系的校正表以及基于存储在第二存储部中的校正表来调整偏转放大器的输出的调节部和存储在第一存储部 部分。

公开(公告)号：US20060151721A1

公开(公告)日：2006-07-13

申请号：US11268603

申请日：2005-11-08

申请人： Tetsuro Nakasugi ,  Kazuo Tawarayama ,  Hiroyuki Mizuno ,  Takumi Ota ,  Noriaki Sasaki ,  Tatsuhiko Higashiki ,  Takeshi Koshiba ,  Shunko Magoshi

发明人： Tetsuro Nakasugi ,  Kazuo Tawarayama ,  Hiroyuki Mizuno ,  Takumi Ota ,  Noriaki Sasaki ,  Tatsuhiko Higashiki ,  Takeshi Koshiba ,  Shunko Magoshi

IPC分类号： G21K5/10

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J2237/15 ,  H01J2237/30433

摘要： According to an aspect of the invention, there is provided an electron beam drawing apparatus comprising at least one stage of a deflection amplifier and a deflection unit, a first storage section which stores shot information at a drawing time, a second storage section which stores a correction table indicating a relation between the shot information and an output voltage of the deflection amplifier, and an adjusting section which adjusts an output of the deflection amplifier based on the correction table stored in the second storage section and the shot information stored in the first storage section.

摘要翻译： 根据本发明的一个方面，提供了一种电子束描绘装置，其包括偏转放大器和偏转单元的至少一个级，在绘制时存储镜头信息的第一存储部分， 指示拍摄信息和偏转放大器的输出电压之间的关系的校正表以及基于存储在第二存储部中的校正表来调整偏转放大器的输出的调节部和存储在第一存储部 部分。

公开(公告)号：US08609014B2

公开(公告)日：2013-12-17

申请号：US13150961

申请日：2011-06-01

申请人： Tsukasa Azuma ,  Tatsuhiko Higashiki ,  Kyoichi Suguro

发明人： Tsukasa Azuma ,  Tatsuhiko Higashiki ,  Kyoichi Suguro

IPC分类号： B29C67/20

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： According to one embodiment, a template manufacturing method is a method for manufacturing a template for use in an imprint processing in which a pattern having irregularities are formed on a principal surface, and the pattern is brought into contact with a resist member formed on a substrate to be processed, to transfer the pattern to the resist member, the method including implanting charged particles at least into the bottoms of concave portions of the template.

摘要翻译： 根据一个实施例，模板制造方法是用于制造在压印处理中使用的模板的方法，其中在主表面上形成具有凹凸的图案，并且图案与形成在基板上的抗蚀剂部件接触 要被处理以将图案转印到抗蚀剂构件上，该方法包括将带电粒子至少注入到模板的凹部的底部中。

公开(公告)号：US07630052B2

公开(公告)日：2009-12-08

申请号：US11024322

申请日：2004-12-29

申请人： Takuya Kono ,  Nobuhiro Komine ,  Tatsuhiko Higashiki ,  Shoichi Harakawa ,  Makato Ikeda

发明人： Takuya Kono ,  Nobuhiro Komine ,  Tatsuhiko Higashiki ,  Shoichi Harakawa ,  Makato Ikeda

IPC分类号： G03B27/32 ,  G03B27/54 ,  G03D5/00 ,  G03C5/00 ,  H01L21/00

CPC分类号： H01L21/67253

摘要： An exposure processing system comprises an exposure apparatus to expose a resist on a wafer, a heating apparatus comprising heating apparatus units, the heating apparatus heating the exposed resist by a heating apparatus unit in the heating apparatus units, a developing apparatus comprising developing apparatus units, the developing apparatus developing the exposed and heated resist by a developing apparatus unit in the developing apparatus units, and a control apparatus to control the exposure apparatus by using correction data so that a wafer on process object being exposed, the correction data being data for correcting a dimensional dispersion of a resist pattern caused by a pair of heating apparatus unit and developing apparatus unit used for the wafer on the process object, the pair of heating and developing apparatus unit comprising a heating and developing apparatus unit in the heating and developing apparatus used for the wafer on the process object.

摘要翻译： 曝光处理系统包括：曝光装置，用于在晶片上曝光抗蚀剂，加热装置包括加热装置单元，加热装置通过加热装置单元中的加热装置加热曝光的抗蚀剂;显影装置，包括显影装置单元， 显影装置通过显影装置单元中的显影装置单元显影曝光和加热的抗蚀剂;以及控制装置，通过使用校正数据来控制曝光装置，使得处理对象被曝光的晶片，校正数据是用于校正的数据 由一对加热装置单元和用于处理对象上的晶片的显影装置单元引起的抗蚀剂图案的尺寸分散，所述一对加热显影装置单元包括使用的加热和显影装置中的加热和显影装置单元 用于处理对象上的晶圆。

公开(公告)号：US20070096764A1

公开(公告)日：2007-05-03

申请号：US11586527

申请日：2006-10-26

申请人： Takuya Kono ,  Tatsuhiko Higashiki

发明人： Takuya Kono ,  Tatsuhiko Higashiki

IPC分类号： G01R31/26

CPC分类号： G03F7/70341

摘要： An immersion exposure apparatus includes a substrate holding unit which holds a substrate to be exposed, a projection lens provided above the substrate holding unit to supply exposure light to the substrate held on the substrate holding unit, a liquid supply unit which supplies a liquid to an area between the substrate held on the substrate holding unit and the projection lens, and a structural unit which surrounds the substrate holding unit and which is configured to supply an interposer to an area between the structural unit and the substrate held on the substrate holding unit.

摘要翻译： 浸渍曝光装置包括：保持要曝光的基板的基板保持单元;设置在基板保持单元上方的投影透镜，用于向保持在基板保持单元上的基板提供曝光光;液体供应单元， 保持在基板保持单元上的基板与投影透镜之间的区域以及围绕基板保持单元的结构单元，其构造成将中介层提供给保持在基板保持单元上的结构单元和基板之间的区域。

公开(公告)号：US06479201B2

公开(公告)日：2002-11-12

申请号：US09866737

申请日：2001-05-30

申请人： Tatsuhiko Higashiki

发明人： Tatsuhiko Higashiki

IPC分类号： G03F900

CPC分类号： G03F9/7026 ,  G03F7/70358 ,  G03F9/7003 ,  G03F9/7011 ,  G03F9/7034

摘要： In an optical exposure apparatus of a scan-exposure system, scan-exposure is preliminarily executed before an actual scan-exposure, and a reticle position measuring device measures a positional change of a reticle in the upper and lower direction with the movement of a reticle stage to a scanning direction. Then, a calculation circuit obtains correction data for an offset based on the measuring value to be stored in a memory. Thereafter, correction data stored in the memory is sequentially supplied to a feedback controlling circuit at an actual scan-exposure time. Also, a measuring value of the position of a wafer in a Z-axial direction with the movement of the wafer stage to the scanning direction, relatively moving with the reticle stage, is supplied to the feedback controlling circuit from a wafer position measuring device. The feedback controlling circuit controls a wafer Z-axial driving mechanism such that the position of the wafer in the Z-axial direction is offset by a positional change of the reticle in upper and lower directions. Thereby, correcting a shift of a projection image from a focal position at an exposure surface on the wafer due to deformation (curve and tilt) of the reticle and the upper and lower movement.

摘要翻译： 在扫描曝光系统的光学曝光装置中，在实际的扫描曝光之前预先执行扫描曝光，并且光罩位置测量装置通过标线的移动来测量上模和下方向上的标线的位置变化 阶段到扫描方向。 然后，计算电路基于要存储在存储器中的测量值获得偏移的校正数据。 此后，存储在存储器中的校正数据以实际扫描曝光时间顺序地提供给反馈控制电路。 此外，通过晶片载台与扫描方向的移动相对于标线片载台移动的Z轴方向的晶片位置的测量值从晶片位置测量装置提供给反馈控制电路。 反馈控制电路控制晶片Z轴驱动机构，使得晶片在Z轴方向上的位置被上模和下方的标线的位置变化偏移。 由此，由于掩模版的变形（曲线和倾斜）以及上下运动，校正投影图像从晶片上的曝光表面的焦点位置的偏移。

公开(公告)号：US08174669B2

公开(公告)日：2012-05-08

申请号：US12510009

申请日：2009-07-27

申请人： Tatsuhiko Higashiki ,  Hiroshi Tomita

发明人： Tatsuhiko Higashiki ,  Hiroshi Tomita

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G02B27/0006 ,  G03F7/70341 ,  G03F7/70925

摘要： There is disclosed is a liquid immersion optical tool, which comprises a light source, an optical lens system, a stage which moves an object base on which an object is to be placed, a head comprising a liquid immersion medium fluid supply device and a liquid immersion medium fluid discharge device to provide a layer of liquid immersion medium fluid between the optical lens system and the object, a fence which limits a region of the layer of liquid immersion medium fluid, and a cleaning device which cleans a portion having been contacted with the liquid immersion medium fluid by means of a cleaning solution.

摘要翻译： 公开了一种液浸光学工具，其包括光源，光学透镜系统，移动待放置物体的物体基座的台，包括浸液介质流体供应装置的头部和液体 浸没介质流体排出装置，以在光学透镜系统和物体之间提供液浸介质流体层，限制液浸介质流体层的区域的栅栏，以及清洁与已经接触的部分的清洁装置 液体介质流体通过清洗溶液。

公开(公告)号：US07952071B2

公开(公告)日：2011-05-31

申请号：US12162071

申请日：2007-01-24

申请人： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Masahiro Hatakeyama ,  Kenji Terao ,  Takeshi Murakami ,  Katsuya Okumura ,  Tatsuhiko Higashiki

发明人： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Masahiro Hatakeyama ,  Kenji Terao ,  Takeshi Murakami ,  Katsuya Okumura ,  Tatsuhiko Higashiki

IPC分类号： G01N23/00

CPC分类号： H01J37/29 ,  H01J37/045 ,  H01J2237/2446

摘要： Provided is a defect inspection apparatus and an inspection (or evaluation) method with highly improved accuracy, which would not be provided by the prior art, in the defect inspection apparatus used in a manufacturing process of a semiconductor device.Provided is a method for inspecting a sample surface with a projection type electron beam inspection apparatus, comprising the steps of: forming such an irradiation area on the sample surface by an electron beam generated from an electron gun 21 that has approximately a circular or elliptical shape of a size larger than a pattern on the sample surface; irradiating the electron beam substantially onto a center of the pattern on the sample surface; and forming an image on an electron detection plane of a detector from secondary electrons emanating from the sample surface in response to the irradiation of the electron beam for inspecting the sample surface.

摘要翻译： 提供了在半导体器件的制造工艺中使用的缺陷检查装置中，现有技术不能提供高精度的缺陷检查装置和检查（或评价）方法。 提供一种用投影型电子束检查装置检查样品表面的方法，包括以下步骤：通过由具有大致圆形或椭圆形的电子枪21产生的电子束在样品表面上形成这样的照射区域 尺寸大于样品表面上的图案; 将电子束基本上照射到样品表面上的图案的中心; 以及响应于用于检查样品表面的电子束的照射，从从样品表面发射的二次电子在检测器的电子检测平面上形成图像。

公开(公告)号：US07100146B2

公开(公告)日：2006-08-29

申请号：US10636577

申请日：2003-08-08

申请人： Takashi Sato ,  Takuya Kouno ,  Takashi Sakamoto ,  Yoshiyuki Shioyama ,  Tatsuhiko Higashiki ,  Ichiro Mori ,  Noboru Yokoya

发明人： Takashi Sato ,  Takuya Kouno ,  Takashi Sakamoto ,  Yoshiyuki Shioyama ,  Tatsuhiko Higashiki ,  Ichiro Mori ,  Noboru Yokoya

IPC分类号： G06F17/50

CPC分类号： G03F9/7092

摘要： A design system of an alignment mark for manufacturing a semiconductor device includes a memory which stores at least mark data including pattern information regarding plural kinds of marks and process data including condition information of manufacturing processes, and a first process simulator which simulates a substrate structure before patterning based on the process data, the substrate structure being formed in an identified manufacturing process. Moreover, the design system includes a second process simulator which simulates a processed shape of an identified mark after the patterning based on the simulated substrate structure and the process data, the mark formed in the manufacturing process, a signal waveform simulator which simulates a detection signal waveform of the mark, the waveform being obtained from the simulated processed shape of the mark, and a signal evaluation device which evaluates a suitability of the mark for the identified manufacturing process based on the simulated detection signal waveform.

摘要翻译： 用于制造半导体器件的对准标记的设计系统包括：存储器，其至少存储包括关于多种标记的图案信息的标记数据和包括制造过程的条件信息的处理数据;以及第一处理模拟器，其模拟前面的衬底结构 基于工艺数据构图，基板结构在识别的制造工艺中形成。 此外，设计系统包括第二处理模拟器，其基于模拟的基板结构和处理数据，在制造​​过程中形成的标记，模拟检测信号的信号波形模拟器，模拟图案化之后的识别标记的处理形状 标记的波形，从标记的模拟处理形状获得的波形，以及基于模拟的检测信号波形来评估用于所识别的制造处理的标记的适合性的信号评估装置。