Software processing method and software processing system
    1.
    发明授权
    Software processing method and software processing system 有权
    软件处理方法和软件处理系统

    公开(公告)号:US07584464B2

    公开(公告)日:2009-09-01

    申请号:US10727055

    申请日:2003-12-04

    IPC分类号: G06F9/44 G06F9/45

    CPC分类号: G06F9/52 G06F2209/508

    摘要: In a multi-processor system constituted by a processor such as a CPU and a DSP, in which the processor and the DSP have an external memory and a bus as shared resources and the DSP carries out a process in response to a processing request from the processor, a monitoring step for status of use includes a step of monitoring the status of use of the DSP, and when contention information obtained in the monitoring step for the status of use indicates frequent uses, an altering step for software process appropriately alters a software processing method to be executed, and switches the corresponding process to an equivalent process so that it becomes possible to avoid bus contention, and consequently to prevent a reduction in the processing speed.

    摘要翻译: 在由诸如CPU和DSP的处理器构成的多处理器系统中,其中处理器和DSP具有外部存储器和总线作为共享资源,并且DSP响应于来自所述处理器的处理请求执行处理 处理器,用于使用状态的监视步骤包括监视DSP的使用状态的步骤,并且当在用于使用状态的监视步骤中获得的争用信息指示频繁使用时,软件处理的改变步骤适当地改变软件 处理方法,并将相应的处理切换到等效处理,使得可以避免总线争用,从而防止处理速度的降低。

    COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FORMING MULTILAYER RESIST PATTERN
    3.
    发明申请
    COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FORMING MULTILAYER RESIST PATTERN 有权
    用于形成基片的组合物和形成多层耐蚀图案的方法

    公开(公告)号:US20100316950A1

    公开(公告)日:2010-12-16

    申请号:US12746421

    申请日:2008-12-01

    CPC分类号: C08G10/02 G03F7/094

    摘要: A composition for forming an underlayer film for lithography for imparting excellent optical characteristics and etching resistance to an underlayer film for lithography, an underlayer film being formed of the composition and having a high refractive index (n) and a low extinction coefficient (k), being transparent, having high etching resistance, containing a significantly small amount of a sublimable component, and a method for forming a pattern using the underlayer film are provided. The composition for forming an underlayer film contains a naphthalene formaldehyde polymer having a specific unit obtained by reacting naphthalene and/or alkylnaphthalene with formaldehyde, and an organic solvent.

    摘要翻译: 一种用于形成用于光刻的下层膜的组合物,用于赋予用于光刻的下层膜优异的光学特性和耐蚀刻性,由该组合物形成且具有高折射率(n)和低消光系数(k)的下层膜, 具有高耐腐蚀性,含有极少量的可升华成分的透明性,以及使用该下层膜形成图案的方法。 用于形成下层膜的组合物含有具有通过萘和/或烷基萘与甲醛反应获得的特定单元的萘甲醛聚合物和有机溶剂。

    Method of Producing Low Viscosity Phenol-Modified Aromatic Hydrocarbon Formaldehyde Resin
    6.
    发明申请
    Method of Producing Low Viscosity Phenol-Modified Aromatic Hydrocarbon Formaldehyde Resin 有权
    生产低粘度苯酚改性芳香烃甲醛树脂的方法

    公开(公告)号:US20070238850A1

    公开(公告)日:2007-10-11

    申请号:US11697315

    申请日:2007-04-06

    IPC分类号: C08G14/02

    CPC分类号: C08G8/28 C08G8/30

    摘要: Provided is a method of producing a low viscosity phenol-modified aromatic hydrocarbon formaldehyde resin (C), including subjecting an aromatic hydrocarbon formaldehyde resin (A) and a phenol (B) to condensation reaction under the presence of an acid catalyst. The method includes: terminating, when a reaction mixture has a viscosity at 25° C. of 200 to 1,500 mPa·S, the condensation reaction by adding an inorganic basic compound and/or a tertiary amine compound having a boiling point of 300° C. or more; and distilling and removing the phenol (B) unreacted and a low boiling component after termination of the condensation reaction, whereby there can be produced a low viscosity phenol-modified aromatic hydrocarbon formaldehyde resin which is kept in a liquid state and contains small amounts of unreacted phenols, and in which increase in viscosity is small even after removal of low boiling components.

    摘要翻译: 本发明提供一种低粘度苯酚改性芳香族甲醛树脂(C)的制造方法,其特征在于,在酸催化剂的存在下,使芳香族甲醛树脂(A)和苯酚(B)进行缩合反应。 该方法包括:当反应混合物在25℃下的粘度为200至1,500mPa.S时,终止通过加入沸点为300℃的无机碱性化合物和/或叔胺化合物的缩合反应 。 或者更多; 并在缩合反应结束后蒸馏除去未反应的苯酚(B)和低沸点成分,由此可以制备保持液态的低粘度苯酚改性芳香族甲醛树脂,并含有少量未反应的 即使在除去低沸点组分之后,粘度的增加也很小。