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公开(公告)号：US10982313B2
公开(公告)日：2021-04-20
申请号：US16300476
申请日：2017-05-04
摘要： A coated body having a substrate and a wear-resistant coating applied to the substrate by physical vapor deposition, the coating comprising a main layer applied to the substrate in a thickness of 1 to 10 μm, wherein said main layer is formed from a nitride of aluminum and at least one other metal from the group consisting of Ti, Cr, Si, Zr and combinations thereof; and a cover layer adjacent to the main layer at a thickness of 0.1 to 5 μm, wherein the cover layer comprises at least one alternating layer consisting of an oxynitride layer and a nitride layer arranged over the oxynitride layer, wherein the oxynitride layer is formed from an oxynitride of aluminum and optionally further metals from the group consisting of chromium, hafnium, zirconium, yttrium, silicon and combinations thereof, and the nitride layer is formed from a nitride of aluminum and at least one other metal from the group consisting of Ti, Cr, Si, Zr and combinations thereof.
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2.发明公开公开(公告)号：US20240093378A1
公开(公告)日：2024-03-21
申请号：US18370499
申请日：2023-09-20
申请人： KENNAMETAL INC.
CPC分类号： C23C28/044 , B23B27/148 , C23C14/0635 , C23C14/0641 , C23C14/0664 , C23C14/35 , B23B2224/32
摘要： The invention relates to a method for producing a coated body, with a substrate and a coating arranged on the substrate, which coating comprises at least one base layer applied to the substrate and at least one metal carbide-containing layer arranged over the base layer, which layers are applied by means of magnetron sputtering. Furthermore, the invention relates to a coated body produced according to the method.
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公开(公告)号：US20230271260A1
公开(公告)日：2023-08-31
申请号：US18136081
申请日：2023-04-18
申请人： KENNAMETAL INC
发明人： Joern Kohlscheen
CPC分类号： B23B27/148 , B23B27/14 , C23C14/0641 , C23C28/42 , B23C5/16 , C23C30/005 , B23B2224/36 , B23B2224/08
摘要： A method for coating a substrate 11 is disclosed. The method includes at least the following steps: depositing a first base layer 22 comprising a nitride of at least Al and Cr on the substrate 11 by physical vapor deposition at a gradually increasing substrate bias voltage from a first substrate bias voltage to a second substrate bias voltage; depositing a second base layer 23 comprising a nitride of at least Al and Cr on the first base layer 22 by physical vapor deposition at a constant substrate bias voltage that is greater or equal to the second substrate bias voltage; and depositing an outermost indicator layer 24 on the second base layer 23, wherein the outermost indicator layer 24 comprises a nitride of Si and Me, wherein Me is at least one of Ti, Zr, Hf, and Cr, wherein the outermost indicator layer 24 is deposited by physical vapor deposition at a substrate bias voltage that is less than the constant substrate bias voltage applied during deposition of the second base layer 23.
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公开(公告)号：US11731202B2
公开(公告)日：2023-08-22
申请号：US17234578
申请日：2021-04-19
申请人： KENNAMETAL INC.
发明人： Joern Kohlscheen
CPC分类号： B23B27/148 , B23B27/14 , B23C5/16 , C23C14/0641 , C23C28/42 , C23C30/005 , B23B2224/08 , B23B2224/36
摘要： A coating includes a first base layer including a nitride of at least Al and Cr, a second base layer including a nitride of at least Al and Cr overlying the first base layer, and an outermost indicator layer overlying the second base layer. The first base layer has a positive residual compressive stress gradient. The second base layer has substantially constant residual compressive stresses. The outermost indicator layer includes a nitride of Si and Me, wherein Me is at least one of Ti, Zr, Hf, and Cr. The outermost indicator layer has residual compressive stresses that are less than the residual compressive stresses of the second base layer.
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公开(公告)号：US20210285109A1
公开(公告)日：2021-09-16
申请号：US16817578
申请日：2020-03-12
申请人： Kennametal Inc.
摘要： A coated body has a substrate and a coating applied to the substrate by physical vapor deposition. The coating includes a main layer adjacent to the substrate and a multilayer adjacent to the main layer. The main layer includes a nitride of at least Al and Ti. The multilayer includes alternating layers of an oxide or oxynitride layer and a nitride layer. The oxide or oxynitride layer includes an oxide or oxynitride of at least one of Zr, Hf, and Cr. The nitride layer includes a nitride of at least one of Zr, Hf, and Cr. A metallic interlayer is between the main layer and the multilayer or between the oxide or oxynitride layer and the nitride layer of the multilayer.
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6.发明授权Tool for the cutting machining of workpieces and process for coating substrate bodies 有权用于工件切割加工的工具和用于涂覆基体的工艺公开(公告)号：US09126273B2
公开(公告)日：2015-09-08
申请号：US14107268
申请日：2013-12-16
申请人： Kennametal, Inc.
发明人： Joern Kohlscheen
CPC分类号： B23C5/16 , C23C14/0641 , C23C14/352 , Y10T407/1904
摘要： The invention relates to a tool having at least one layer of TixAl1-xN, where 0.2≦x≦0.8, which is composed of a plurality of laminar plies to give an overall layer thickness of 0.01 μm to 3 μm and which has crystallites having a size of ≦10 nm. To produce such a layer, by magnetron sputtering in an N2 atmosphere, Ti and Al are respectively released from separately arranged cathode targets, wherein the tool is moved past the cathode repeatedly at a speed which is such that in each case only a nanocrystalline layer forms upon this movement.
摘要翻译： 本发明涉及一种具有至少一层TixAl1-xN的工具，其中0.2＆lt; NlE; x＆nlE; 0.8由多个层状层构成，以使整个层厚度为0.01μm至3μm，并且其具有 尺寸为＆nlE; 10nm。 为了制造这样的层，通过在N 2气氛中的磁控管溅射，Ti和Al分别从单独布置的阴极靶上释放出来，其中工具以一定的速度移动通过阴极，使得在每种情况下只有纳米晶层形成 在这个运动。
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7.发明申请公开(公告)号：US20140169891A1
公开(公告)日：2014-06-19
申请号：US14107268
申请日：2013-12-16
申请人： Kennametal, Inc.
发明人： Joern Kohlscheen
CPC分类号： B23C5/16 , C23C14/0641 , C23C14/352 , Y10T407/1904
摘要： The invention relates to a tool having at least one layer of TixAl1-xN, where 0.2 ≦x≦0.8, which is composed of a plurality of laminar plies to give an overall layer thickness of 0.01 μm to 3 μm and which has crystallites having a size of ≦10 nm. To produce such a layer, by magnetron sputtering in an N2 atmosphere, Ti and Al are respectively released from separately arranged cathode targets, wherein the tool is moved past the cathode repeatedly at a speed which is such that in each case only a nanocrystalline layer forms upon this movement.
摘要翻译： 本发明涉及一种具有至少一层TixAl1-xN的工具，其中0.2＆lt; NlE; x＆nlE; 0.8由多个层状层构成，以使整个层厚度为0.01μm至3μm，并且其具有 尺寸为＆nlE; 10nm。 为了制造这样的层，通过在N 2气氛中的磁控管溅射，Ti和Al分别从单独布置的阴极靶上释放出来，其中工具以一定的速度移动通过阴极，使得在每种情况下只有纳米晶层形成 在这个运动。
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公开(公告)号：US11724317B1
公开(公告)日：2023-08-15
申请号：US17691546
申请日：2022-03-10
申请人： KENNAMETAL INC.
发明人： Joern Kohlscheen
CPC分类号： B23B27/148 , C23C14/0617 , C23C30/005 , B23B2224/08 , B23B2224/24 , B23B2226/125 , B23B2226/315
摘要： In one aspect, refractory coatings are described herein having multiple cubic phases. In some embodiments, a coating comprises a refractory layer of TiAlN deposited by PVD adhered to the substrate, the refractory layer comprising a cubic TiAlN phase and a cubic A1N phase, wherein a ratio of intensity in the X-ray diffractogram (XRD) of a (200) reflection of the cubic AlN phase to intensity of a (200) reflection of the cubic TiAlN phase, I(200)/I(200), is at least 0.5.
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公开(公告)号：US20220331879A1
公开(公告)日：2022-10-20
申请号：US17234578
申请日：2021-04-19
申请人： KENNAMETAL INC.
发明人： Joern Kohlscheen
摘要： A coating includes a first base layer including a nitride of at least Al and Cr, a second base layer including a nitride of at least Al and Cr overlying the first base layer, and an outermost indicator layer overlying the second base layer. The first base layer has a positive residual compressive stress gradient. The second base layer has substantially constant residual compressive stresses. The outermost indicator layer includes a nitride of Si and Me, wherein Me is at least one of Ti, Zr, Hf, and Cr. The outermost indicator layer has residual compressive stresses that are less than the residual compressive stresses of the second base layer.
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公开(公告)号：US09822438B2
公开(公告)日：2017-11-21
申请号：US14672515
申请日：2015-03-30
申请人： Kennametal Inc.
发明人： Joern Kohlscheen
CPC分类号： C23C14/0036 , C23C14/0057 , C23C14/0676 , C23C14/08 , C23C14/3485 , C23C28/042 , C23C28/044
摘要： The invention relates to a method for producing a coated cutting tool in which a coating with at least one oxide layer is applied to a base layer by means of a PVD method. The method includes voltage-pulsed sputtering of at least one cathode metal selected from the group of aluminum, scandium, yttrium, silicon, zinc, titanium, zirconium, hafnium, chromium, niobium, and tantalum, as well as mixtures and alloys thereof in the presence of a reactive gas; and the depositing of at least one oxide layer formed by converting the reactive gas with the sputtered cathode metal onto the base body. The cathode metal includes at least aluminum. Dinitrogen oxide is used as the reactive gas. The at least one oxide layer is in the form of an oxide, mixed oxide, or oxide mixture of the at least one cathode metal.
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