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    P3 fabrication with NiFe and alumina mask using resist shrinking process
    2.
    发明申请
    P3 fabrication with NiFe and alumina mask using resist shrinking process 失效
    P3使用抗蚀剂收缩工艺制备NiFe和氧化铝掩模

    公开(公告)号：US20060232882A1

    公开(公告)日：2006-10-19

    申请号：US11110534

    申请日：2005-04-19

    申请人： Kim Lee ,  Jyh-Shuey Lo ,  Yi Zheng

    发明人： Kim Lee ,  Jyh-Shuey Lo ,  Yi Zheng

    IPC分类号： G11B5/147

    CPC分类号： G11B5/3163 ,  G11B5/1278 ,  Y10T29/49043 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T29/49071 ,  Y10T29/49073

    摘要： A method for forming a P3 layer with NiFe and alumina mask using resist shrink process for use in perpendicular magnetic write heads. The method includes forming a laminated layer, forming an alumina layer on top of the laminated layer, depositing a conductive layer onto the laminated layer, forming a plating frame on a gap layer. The plating frame has a trench defined by plating track, the alumina, laminated and conductive layers each including an area below the trench. The method further includes shrinking the trench, plating NiFe into a portion of the shrunk trench, stripping the plating frame, removing the conductive layer except the conductive layer formed below the trench, removing the alumina layer except the alumina layer formed below the trench, removing the laminated layer except the laminated layer formed below the trench and patterning the laminated layer formed below the trench.

    摘要翻译： 用于使用用于垂直磁写头的抗蚀剂收缩工艺形成具有NiFe和氧化铝掩模的P3层的方法。 该方法包括形成叠层，在叠层上形成氧化铝层，在层压层上沉积导电层，在间隙层上形成电镀框架。 电镀框架具有由电镀轨道限定的沟槽，氧化铝，层压和导电层各自包括沟槽下方的区域。 该方法还包括收缩沟槽，将NiFe电镀到收缩沟槽的一部分中，剥离电镀框架，除去形成在沟槽下方的导电层以外的导电层，除去形成在沟槽下方的氧化铝层以外的氧化铝层，除去 除了形成在沟槽下方的层压层之外的层压层，并且对形成在沟槽下方的叠层进行图案化。

    Methods of making magnetic write heads with use of a resist channel shrinking solution having corrosion inhibitors
    4.
    发明申请
    Methods of making magnetic write heads with use of a resist channel shrinking solution having corrosion inhibitors 审中-公开
    使用具有腐蚀抑制剂的抗蚀剂通道收缩溶液制造磁性写入头的方法

    公开(公告)号：US20060096081A1

    公开(公告)日：2006-05-11

    申请号：US11312064

    申请日：2005-12-19

    申请人： Christian Bonhote ,  Jila Tabib ,  Dennis McKean ,  Daniel Bedell ,  Jyh-Shuey Lo ,  Hieu Lam ,  Kim Lee

    发明人： Christian Bonhote ,  Jila Tabib ,  Dennis McKean ,  Daniel Bedell ,  Jyh-Shuey Lo ,  Hieu Lam ,  Kim Lee

    IPC分类号： G11B5/127 ,  H04R31/00

    CPC分类号： G11B5/3116 ,  G11B5/3163 ,  Y10T29/49032 ,  Y10T29/49039 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： One preferred method for use in making a magnetic write head with use of the resist channel shrinking solution includes the steps of forming a first pole piece layer of a first pole piece; forming a gap layer over the first pole piece layer; forming a patterned resist over the first pole piece layer and the gap layer; electroplating a first pedestal portion of a second pole piece over the gap layer within a channel of the patterned resist; forming an oxide layer over the first pedestal portion; applying the resist channel shrinking solution comprising the resist channel shrinking film and the corrosion inhibitors over the patterned resist; baking the resist channel shrinking solution over the patterned resist to thereby reduce a width of the channel; removing the resist channel shrinking solution; electroplating a second pedestal portion of the second pole piece within the reduced-width channel of the patterned resist; removing the patterned resist; and milling the structure. Advantageously, the oxide layer and the corrosion inhibitors of the resist channel shrinking solution reduce corrosion in the pole piece during the act of baking the resist channel shrinking solution.

    摘要翻译： 使用抗蚀剂通道收缩溶液制造磁性写入头的一种优选方法包括以下步骤：形成第一极片的第一极片层; 在所述第一极片层上形成间隙层; 在所述第一极片层和所述间隙层上形成图案化的抗蚀剂; 在图案化的抗蚀剂的通道内的间隙层上电镀第二极片的第一基座部分; 在所述第一基座部分上形成氧化物层; 在图案化的抗蚀剂上施加包含抗蚀剂通道收缩膜和腐蚀抑制剂的抗蚀剂通道收缩溶液; 在图案化的抗蚀剂上烘烤抗蚀剂通道收缩溶液，从而减小通道的宽度; 去除抗蚀剂通道收缩溶液; 在所述图案化抗蚀剂的所述减小宽度的通道内电镀所述第二极靴的第二基座部分; 去除图案化的抗蚀剂; 并研磨结构。 有利地，抗蚀剂通道收缩溶液的氧化物层和腐蚀抑制剂在烘烤抗蚀剂通道收缩溶液的作用期间减少极片中的腐蚀。

    Magnetic write head having a self aligned, steep shoulder pole structure and method of manufacture thereof
    5.
    发明申请
    Magnetic write head having a self aligned, steep shoulder pole structure and method of manufacture thereof 失效
    具有自对准陡肩极结构的磁写头及其制造方法

    公开(公告)号：US20070058293A1

    公开(公告)日：2007-03-15

    申请号：US11228783

    申请日：2005-09-15

    申请人： Daniel Bedell ,  Hieu Lam ,  Kim Lee ,  Jyh-Shuey Lo

    发明人： Daniel Bedell ,  Hieu Lam ,  Kim Lee ,  Jyh-Shuey Lo

    IPC分类号： G11B5/147

    CPC分类号： G11B5/3116 ,  G11B5/3163

    摘要： A magnetic write head and method of manufacture thereof that has a first pole structure having a notched structure configured with a steep shoulder portion and a narrow vertical notch portion extending from the top of the steep shoulder portion. The write head also includes a second pole structure (P2) that has a very narrow width (track width) and that is self aligned with the narrow vertical notch structure of the first pole structure. The write head provides excellent magnetic properties including a very narrow track width and minimal side writing, while avoiding magnetic saturation of the poles.

    摘要翻译： 一种磁写头及其制造方法，其具有第一极结构，其具有构造为具有陡峭肩部的切口结构和从陡峭肩部的顶部延伸的窄垂直切口部。 写头还包括具有非常窄的宽度（轨道宽度）并且与第一极结构的窄垂直切口结构自对准的第二极结构（P 2）。 写头提供优异的磁性，包括非常窄的轨道宽度和最小的侧面写入，同时避免极点的磁饱和。

    Methods of making magnetic write heads with use of linewidth shrinkage techniques
    6.
    发明申请
    Methods of making magnetic write heads with use of linewidth shrinkage techniques 失效
    使用线宽收缩技术制造磁头的方法

    公开(公告)号：US20060010684A1

    公开(公告)日：2006-01-19

    申请号：US10881782

    申请日：2004-06-30

    申请人： Kim Lee ,  Jyh-Shuey Lo ,  Dennis McKean

    发明人： Kim Lee ,  Jyh-Shuey Lo ,  Dennis McKean

    IPC分类号： G11B5/127 ,  H04R31/00

    CPC分类号： G11B5/3163 ,  G11B5/3116 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： A method for use in making a magnetic write head includes the steps of forming a first pole piece layer of a first pole piece; forming a patterned resist over the first pole piece layer; electroplating a pedestal over the first pole piece layer within a channel of the patterned resist; electroplating a metal gap layer over the pedestal within the channel of the patterned resist; forming a resist channel shrinking film over the patterned resist; baking the resist channel shrinking film over the patterned to thereby reduce a width of the channel; removing the resist channel shrinking film; electroplating a second pole piece within the reduced-width channel of the patterned resist; removing the patterned resist; and milling the pedestal, using the second pole piece as a mask, to form a central notched pedestal having side walls with angled slopes. Advantageously, the reduction in channel width using the resist channel shrinking film provides for self-alignment of the second pole piece with the pedestal which can be symmetrically notched for improved overwrite (OW) properties and reduced adjacent track interference (ATI).

    摘要翻译： 一种用于制造磁写头的方法包括以下步骤：形成第一极片的第一极片层; 在所述第一极片层上形成图案化抗蚀剂; 在图案化的抗蚀剂的通道内的第一极片层上电镀一个基座; 在图案化的抗蚀剂的通道内的基座上方电镀金属间隙层; 在图案化的抗蚀剂上形成抗蚀剂通道收缩膜; 在图案上烘烤抗蚀剂通道收缩膜，从而减小通道的宽度; 去除抗蚀剂通道收缩膜; 在图案化的抗蚀剂的减小宽度的通道内电镀第二极片; 去除图案化的抗蚀剂; 并使用第二极片作为掩模铣削基座，以形成具有倾斜斜面的侧壁的中心凹口底座。 有利地，使用抗蚀剂通道收缩薄膜的通道宽度的减小提供了第二极靴与基座的自对准，该基座可对称切口以改善覆盖（OW）特性和减小的相邻轨道干涉（ATI）。

    Methods of making magnetic write heads using electron beam lithography
    7.
    发明申请
    Methods of making magnetic write heads using electron beam lithography 失效
    使用电子束光刻制作磁写头的方法

    公开(公告)号：US20050241139A1

    公开(公告)日：2005-11-03

    申请号：US10836136

    申请日：2004-04-30

    申请人： Kim Lee ,  Jyh-Shuey Lo

    发明人： Kim Lee ,  Jyh-Shuey Lo

    IPC分类号： G11B5/147 ,  G11B5/187

    CPC分类号： G11B5/1878 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49039 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49046 ,  Y10T29/49052

    摘要： A pedestal is formed over a first pole piece layer and insulator materials are formed to surround it. A gap layer made of a non-magnetic insulator or metal is then formed over the pedestal and the insulator, followed by the optional formation of a seed layer. A second pole piece is formed over the gap layer with or without the seed layer by forming a patterned resist using E-beam lithography and electroplating second pole piece materials within the patterned resist. After milling to remove side portions of the gap layer and the optional seed layer, a chemical etch is performed to remove a top portion of the insulator materials. The pedestal is then notched and trimmed by ion milling using the second pole piece as a mask to form a central notched structure. Since the second pole piece is precisely centered over the pedestal prior to notching, the pedestal is notched symmetrically to form a notched structure having side walls with angled slopes.

    摘要翻译： 在第一极片层上形成基座，并且形成绝缘体材料以围绕它。 然后在基座和绝缘体上形成由非磁性绝缘体或金属制成的间隙层，随后可选地形成种子层。 通过在图案化的抗蚀剂内使用电子束光刻和电镀第二极片材料形成图案化的抗蚀剂，形成具有或不具有种子层的间隙层上的第二极片。 在研磨以除去间隙层和任选种子层的侧面部分之后，进行化学蚀刻以去除绝缘体材料的顶部。 然后通过使用第二极片作为掩模的离子铣削将基座切口并修整以形成中心的切口结构。 由于第二极靴在开槽之前精确地位于基座上方，因此基座被对称地切口以形成具有斜边的侧壁的凹口结构。

    HYBRID-GUIDED BLOCK COPOLYMER ASSEMBLY
    8.
    发明申请
    HYBRID-GUIDED BLOCK COPOLYMER ASSEMBLY 审中-公开
    混合型嵌段共聚物组件

    公开(公告)号：US20120196094A1

    公开(公告)日：2012-08-02

    申请号：US13018416

    申请日：2011-01-31

    申请人： Yuan Xu ,  Kim Lee ,  Wei Hu ,  Koichi Wago ,  David Shiao-Min Kuo

    发明人： Yuan Xu ,  Kim Lee ,  Wei Hu ,  Koichi Wago ,  David Shiao-Min Kuo

    IPC分类号： B32B3/00 ,  B05D1/36 ,  B05D3/06 ,  B05D3/12 ,  B05D3/00 ,  B05D3/10

    CPC分类号： G11B5/84 ,  G11B5/746 ,  G11B5/855 ,  Y10T428/24479 ,  Y10T428/24802

    摘要： A method for nano-patterning includes imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the imprinted resist. A a block copolymer (“BCP”) material is deposited on the imprinted resist, wherein a molecular dimension L0 of the BCP material correlates by an integer multiple to a spacing dimension of the one or more topographic surface patterns on the imprinted resist. The deposited BCP is annealed and at least a portion of the annealed BCP is removed, forming a template having discrete domains.

    摘要翻译： 纳米图案的方法包括在抗蚀剂中用压印模具压印特征以在印刷抗蚀剂上形成一个或多个形貌表面图案。 在压印抗蚀剂上沉积嵌段共聚物（“BCP”）材料，其中BCP材料的分子尺寸L0与印迹抗蚀剂上的一个或多个形貌表面图案的间隔尺寸相乘一整数倍。 将沉积的BCP退火，并且去除退火的BCP的至少一部分，形成具有离散区域的模板。

    Multiple path hybrid for subscriber line services
    9.
    发明申请
    Multiple path hybrid for subscriber line services 失效
    用于用户线服务的多路混合

    公开(公告)号：US20060067517A1

    公开(公告)日：2006-03-30

    申请号：US10955235

    申请日：2004-09-30

    申请人： Kim Lee

    发明人： Kim Lee

    IPC分类号： H04M9/00

    CPC分类号： H04M11/062 ,  H04M3/007

    摘要： A hybrid with a plurality of selectable hybrid input paths each having an associated hybrid input path filter is provided. The hybrid includes a plurality of selectable receive paths each having an associated receive path filter. The hybrid further includes a hybrid output. The selection of any filter is non-mutually exclusive to the concurrent selection of another filter.

    摘要翻译： 提供了具有多个可选择的混合输入路径的混合，每个具有相关联的混合输入路径滤波器。 混合动力车包括多个可选择的接收路径，每个路径具有相关联的接收路径过滤器。 混合动力还包括混合输出。 任何过滤器的选择与并行选择另一个过滤器是非互斥的。

    TOPOGRAPHICALLY DEFINED THIN FILM CPP READ HEAD
    10.
    发明申请
    TOPOGRAPHICALLY DEFINED THIN FILM CPP READ HEAD 失效
    地理定义薄膜CPP阅读头

    公开(公告)号：US20080062576A1

    公开(公告)日：2008-03-13

    申请号：US11938677

    申请日：2007-11-12

    申请人： David Heim ,  Kim Lee ,  Tsann Lin ,  Jih-Shiuan Luo

    发明人： David Heim ,  Kim Lee ,  Tsann Lin ,  Jih-Shiuan Luo

    IPC分类号： G11B5/33

    CPC分类号： B82Y10/00 ,  G11B5/3163 ,  Y10T29/49048 ,  Y10T403/58

    摘要： A narrow track-width magnetoresistive sensor by defining a trench formed between first and second hard bias layers and depositing the sensor into the trench. The sensor can include a sensor stack sandwiched between first and second electrically conductive lead layers. First and second electrically insulating side walls are formed at either side of the sensor stack. First and second hard bias layers extend from the sides of the sensor stack, being separated from the sensor stack by the first and second electrically insulating side walls. First and second physically hard insulation layers are provided over each of the hard bias layers.

    摘要翻译： 通过限定形成在第一和第二硬偏置层之间的沟槽并将传感器沉积到沟槽中的窄轨道宽度磁阻传感器。 传感器可以包括夹在第一和第二导电引线层之间的传感器堆叠。 第一和第二电绝缘侧壁形成在传感器堆叠的任一侧。 第一和第二硬偏压层从传感器堆叠的侧面延伸，通过第一和第二电绝缘侧壁与传感器堆叠分离。 第一和第二物理硬绝缘层设置在每个硬偏压层上。