-
1.发明授权公开(公告)号：US07746447B2
公开(公告)日：2010-06-29
申请号：US11314157
申请日：2005-12-22
申请人： Koen Jacobus Johannes Maria Zaal , Johannes Henricus Wilhelmus Jacobs , Erik Roelof Loopstra , Joost Jeroen Ottens , Frederik Eduard De Jong
发明人： Koen Jacobus Johannes Maria Zaal , Johannes Henricus Wilhelmus Jacobs , Erik Roelof Loopstra , Joost Jeroen Ottens , Frederik Eduard De Jong
CPC分类号： G03F7/70716 , G03F7/70341
摘要： An immersion lithographic apparatus has a plurality of substrate holders arranged to hold substrates, each substrate holder having a conduit therein for passing a temperature control fluid. The thermal responses of the different substrate holders are calibrated and flow rates calculated and used so that all the holders return to a predetermined temperature in the same time.
摘要翻译： 浸没式光刻设备具有布置成保持基板的多个基板保持器，每个基板保持器具有用于使温度控制流体通过的导管。 对不同衬底保持器的热响应进行校准，并计算和使用流量，以便所有保持器在同一时间内恢复到预定温度。
-
公开(公告)号：US20080297744A1
公开(公告)日：2008-12-04
申请号：US11806662
申请日：2007-06-01
申请人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
发明人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
摘要翻译： 浸没式光刻设备被描述为具有排出构造以从衬底的边缘和其上支撑衬底的衬底台之间的间隙去除液体的漏液。 排水管设置有向衬底提供液体的装置，而与衬底台的位置无关，和/或在排水管内使气体饱和的装置。 这些措施减少了由于排水管中的液体蒸发导致的热负荷变化。
-
公开(公告)号：US08514365B2
公开(公告)日：2013-08-20
申请号：US11806662
申请日：2007-06-01
申请人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
发明人： Frederik Eduard De Jong , Marcel Hendrikus Maria Beems , Marinus Aart Van Den Brink , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Leon Martin Levasier , Frits Van Der Meulen , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Richard Bernardus Johannes Droste , Johannes Wilhelmus De Klerk , Peter Franciscus Wanten , Jan Cornelis Van Der Hoeven , Edwin Cornelis Kadijk , Marteijn De Jong , David Lucien Anstotz
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
摘要翻译： 浸没式光刻设备被描述为具有排出构造以从衬底的边缘和其上支撑衬底的衬底台之间的间隙去除液体的漏液。 排水管设置有向衬底提供液体的装置，而与衬底台的位置无关，和/或使排水管内的气体饱和的装置。 这些措施减少了由于排水管中的液体蒸发导致的热负荷变化。
-
4.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07528935B2
公开(公告)日：2009-05-05
申请号：US11312654
申请日：2005-12-21
申请人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Johannes Maria Meijer , Joost Jeroen Ottens , Marco Le Kluse , Jan Hopman
发明人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Johannes Maria Meijer , Joost Jeroen Ottens , Marco Le Kluse , Jan Hopman
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783
摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.
摘要翻译： 公开了一种光刻投影装置。 该装置包括用于调节辐射束的照明器和物品保持器。 物品保持器包括多个突出部，其布置成提供基本平坦的支撑平面，用于支撑待放置在辐射束的光束路径中的物品。 这些突起通常在第一距离处等距离间隔开。 物品保持器还包括用于将物品夹持到保持器的一对电极。 电极设置在突起上方或下方的基本上相同的平面中，并且通过间隙彼此间隔开。 位于间隙的相对侧上的多个突起内的相邻突起被间隔开大于第一距离的第二距离。
-
公开(公告)号：US07411657B2
公开(公告)日：2008-08-12
申请号：US10990323
申请日：2004-11-17
申请人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
-
公开(公告)号：US07187433B2
公开(公告)日：2007-03-06
申请号：US11099650
申请日：2005-04-06
申请人： Joost Jeroen Ottens , Hendrik Antony Johannes Neerhof , Koen Jacobus Johannes Maria Zaal , Marco Le Kluse
发明人： Joost Jeroen Ottens , Hendrik Antony Johannes Neerhof , Koen Jacobus Johannes Maria Zaal , Marco Le Kluse
CPC分类号： H01L21/6831 , G03F7/707 , G03F7/70708
摘要： An electrostatic clamp assembly for a lithographic apparatus is provided. The clamp assembly includes an electrostatic clamp structured to clamp an article against an article support structure during projection of a beam of radiation, and a controller structured to control at least one of the clamp and a backfill gas pressure to release the article from the article support structure by use of the backfill gas pressure.
摘要翻译： 提供了一种用于光刻设备的静电夹持组件。 夹具组件包括静电夹具，其被构造成在辐射束投影期间将制品夹紧在物品支撑结构上;以及控制器，其被构造成控制夹具和回填气体压力中的至少一个以将物品从物品支撑件 结构通过使用回填气压力。
-
公开(公告)号：US07133120B2
公开(公告)日：2006-11-07
申请号：US10837914
申请日：2004-05-04
申请人： Koen Jacobus Johannes Maria Zaal , Aschwin Lodewijk Hendricus Johannes Van Meer , Joost Jeroen Ottens
发明人： Koen Jacobus Johannes Maria Zaal , Aschwin Lodewijk Hendricus Johannes Van Meer , Joost Jeroen Ottens
CPC分类号： G03F7/707
摘要： A lithographic apparatus having an illumination system for providing a projection beam of radiation; an article support member for supporting an article to be placed in a beam path of the projection beam of radiation on the article support; and a clamp for providing a clamping pressure for clamping the article against the article support during projection. The article support member includes a section that is trimmed for locally adjusting a clamping pressure.
摘要翻译： 一种具有用于提供投影射线束的照明系统的光刻设备; 物品支撑构件，用于支撑将物品放置在所述物品支撑件上的所述投影射束的光束路径中; 以及用于在投影期间提供用于将物品夹紧在物品支撑件上的夹紧压力的夹具。 物品支撑构件包括用于局部调整夹紧压力的部分。
-
8.发明授权Using unflatness information of the substrate table or mask table for decreasing overlay 有权使用衬底表或掩模台的不平坦信息减少重叠公开(公告)号：US07239368B2
公开(公告)日：2007-07-03
申请号：US10998179
申请日：2004-11-29
申请人： Rene Oesterholt , Ralph Brinkhof , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Koenraad Stephan Silvester Salden
发明人： Rene Oesterholt , Ralph Brinkhof , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Koenraad Stephan Silvester Salden
CPC分类号： G03F7/70783 , G03F7/707
摘要： A lithographic system includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The system also comprises a processor arranged to calculate overlay corrections using a reference height map representing a surface of the substrate table or the mask table. Feed forward correction of non-flatness induced wafer grid distortion is allowed during alignment and during exposure, thereby reducing overlay errors caused by differences in flatness characteristics. It provides an indirect qualification method for overlay accuracy related to exposure chuck flatness based on height map information.
摘要翻译： 光刻系统包括用于提供投射辐射束的照明系统，用于支撑掩模的掩模台，用于使投影光束在其横截面上赋予图案的掩模，用于保持基板的基板台，以及 投影系统，用于将图案化的光束投影到基板的目标部分上。 该系统还包括处理器，其被布置为使用表示衬底台或掩模台的表面的参考高度图计算覆盖校正。 在对准和曝光期间允许非平坦度引起的晶片网格变形的前馈校正，从而减少由平坦度特性的差异引起的重叠误差。 它提供了基于高度图信息的与曝光卡盘平坦度相关的覆盖精度的间接鉴定方法。
-
公开(公告)号：US07119885B2
公开(公告)日：2006-10-10
申请号：US10926402
申请日：2004-08-26
申请人： Joost Jeroen Ottens , Tjarko Adriaan Rudolf Van Empel , Aschwin Lodewijk Hendricus Johannes Van Meer , Jan Rein Miedema , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen Ottens , Tjarko Adriaan Rudolf Van Empel , Aschwin Lodewijk Hendricus Johannes Van Meer , Jan Rein Miedema , Koen Jacobus Johannes Maria Zaal
CPC分类号： G03F7/707 , G03F7/70825
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and an article support for supporting a substantially flat article to be placed in the beam of radiation. The article support includes a plurality of supporting protrusions for supporting the article, and at least one protective member located near a boundary of the supporting protrusions for protecting at least a boundary portion of the supporting protrusions during release of the article. The apparatus also includes a releasing device for releasing said article from said article support.
摘要翻译： 公开了一种光刻设备。 该装置包括用于调节辐射束的照明系统和用于支撑待放置在辐射束中的基本平坦的制品的物品支撑件。 物品支撑件包括用于支撑物品的多个支撑突起和位于支撑突起的边界附近的至少一个保护构件，用于在物品释放期间至少保护支撑突起的边界部分。 该装置还包括用于从所述物品支撑件释放所述物品的释放装置。
-
10.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07110091B2
公开(公告)日：2006-09-19
申请号：US10896367
申请日：2004-07-22
申请人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Joost Jeroen Ottens , Jan Hopman
发明人： Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Joost Jeroen Ottens , Jan Hopman
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783
摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation, and at least one clamping electrode for generating an electrostatic clamping force for clamping the article against the article holder. The clamping electrode includes an electric field changer for locally changing the electrostatic clamping force for leveling local height variations of the substrate.
摘要翻译： 公开了一种光刻投影装置。 该装置包括用于调节辐射束的照明器和物品保持器。 物品保持器包括多个突起，其被布置成提供基本平坦的支撑平面，用于支撑待放置在辐射束的光束路径中的物品;以及至少一个夹紧电极，用于产生用于夹紧物品的静电夹紧力 反对文章持有人。 夹持电极包括用于局部地改变静电夹持力的电场改变器，用于调平衬底的局部高度变化。
-
-
-
-
-
-
-
-
-
搜索结果
43 条记录 (耗时 0.03 秒)
