摘要:
To provide a novel fluorinated compound, a fluoropolymer and a method for producing the compound.A compound represented by the formula CF2═CFCF2C(X)(C(O)OZ)(CH2)nCR═CHR (wherein X is a hydrogen atom, a cyano group or a group represented by the formula —C(O)OZ, Z is a hydrogen atom or a C1-20 monovalent organic group, n is 0, 1, or 2, and R is a hydrogen atom or a C1-20 monovalent organic group), a method for producing it, and a fluoropolymer obtained by polymerizing the compound.
摘要:
To provide a novel fluorinated compound, a fluoropolymer and a method for producing the compound.A compound represented by the formula CF2═CFCF2C(X)(C(O)OZ)(CH2)nCR═CHR (wherein X is a hydrogen atom, a cyano group or a group represented by the formula —C(O)OZ, Z is a hydrogen atom or a C1-20 monovalent organic group, n is 0, 1, or 2, and R is a hydrogen atom or a C1-20 monovalent organic group), a method for producing it, and a fluoropolymer obtained by polymerizing the compound.
摘要:
Provided is a novel fluorinated compound, a fluoropolymer, and a method for producing the compound. A monomer of the compound has a formula F2═CFCF2C(X)(C(O)OZ)(CH2)nCR═CHR, wherein X is a hydrogen atom, a cyano group, or a group of formula —C(O)OZ; Z is a hydrogen atom or a C1-20 monovalent organic group, n is 0, 1, or 2; and R is a hydrogen atom or a C1-20 monovalent organic group.
摘要:
To provide a resist protective film material for immersion lithography.An alkali soluble resist protective film material for immersion lithography, which comprises a polymer (F) containing repeating units (FU) formed by polymerizing a polymerizable compound (fm) having a fluorine-containing bridged cyclic structure. For example, repeating units (FU) are repeating units formed by polymerizing a compound (f) selected from the group consisting of the following formulae (f1) to (f4) (RF represents H, F, a C1-3 alkyl group or a C1-3 fluoroalkyl group, and XF represents F, OH or CH2OH.)
摘要翻译:提供用于浸没光刻的抗蚀保护膜材料。 一种用于浸渍光刻的碱溶性抗蚀剂保护膜材料,其包含通过聚合具有含氟桥连环状结构的可聚合化合物(fm)形成的重复单元(FU)的聚合物(F)。 例如,重复单元(FU)是通过使从下述式(f1)〜(f4)中选择的化合物(f)聚合形成的重复单元(RF表示H,F,C1-3烷基或 C 3氟烷基,X F表示F,OH或CH 2 OH)
摘要:
To provide a novel fluoroadamantane derivative, a novel polymerizable fluoroadamantane derivativeand a novel fluoropolymer, and processes for production thereof.To provide the following compound (3), the following compound (4), a polymer obtained by polymerizing the compound (4) and processes for production thereof: provided that Q represents —CHF— or —CF2— (provided that six Qs may be the same or different), Z represents —H, —F or —CH2OH (provided that three Zs may be the same or different), W represents —H or a C1-10 hydrocarbon group, R represents —H, —F, —CH3 or —CF3, and J represents —H, —F, —CHWOH or —CHWOCOCR═CH2 (provided that three Js may be the same or different).
摘要:
To provide a novel fluoroadamantane derivative, a novel polymerizable fluoroadamantane derivative and a novel fluoropolymer, and processes for production thereof. To provide the following compound (3), the following compound (4), a polymer obtained by polymerizing the compound (4) and processes for production thereof: provided that Q represents —CHF— or —CF2— (provided that six Qs may be the same or different), Z represents —H, —F or —CH2OH (provided that three Zs may be the same or different), W represents —H or a C1-10 hydrocarbon group, R represents —H, —F, —CH3 or —CF3, and J represents —H, —F, —CHWOH or —CHWOCOCR═CH2 (provided that three Js may be the same or different).
摘要:
To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg.A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1═CR2—Q—CR3═CHR4 (1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.
摘要:
A fluoropolymer having functional groups and having high transparency in a wide wavelength range is provided, and a resist composition and a composition for a resist protective film, comprising the fluoropolymer, wherein the fluoropolymer has monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (1): CF2═CFCF2C(CF3)(OR1)—(CH2)nCR2═CHR3 (1) wherein R1 is a hydrogen atom, an alkyl group having at most 20 carbon atoms, or (CH2)aCOOR4 (wherein a is 0 or 1, and R4 is a hydrogen atom or an alkyl group having at most 20 carbon atoms), each of R2 and R3, which are independent of each other, is a hydrogen atom or an alkyl group having at most 12 carbon atoms, and n is 0 or 2, provided that when n is 0, at least one of R1, R2 and R3 is other than a hydrogen atom.
摘要:
To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength range, and a resist composition and a composition for a resist protective film, comprising the fluoropolymer. A fluoropolymer having monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (1): CF2═CFCF2C(CF3)(OR1)—(CH2)nCR2═CHR3 (1) wherein R1 is a hydrogen atom, an alkyl group having at most 20 carbon atoms, or (CH2)aCOOR4 (wherein a is 0 or 1, and R4 is a hydrogen atom or an alkyl group having at most 20 carbon atoms), each of R2 and R3, which are independent of each other, is a hydrogen atom or an alkyl group having at most 12 carbon atoms, and n is 0 or 2, provided that when n is 0, at least one of R1, R2 and R3 is other than a hydrogen atom.
摘要:
The present invention relates to a coating material composition for a liquid immersion exposure apparatus, which is used for the purpose of forming a lyophobic layer on a surface of a component member of the liquid immersion exposure apparatus which performs a light exposure of a substrate by irradiating with an exposure beam through a liquid, in which the composition contains a fluorine-containing polymer which has, in the main chain, a repeating unit that has a fluorine-containing aliphatic ring structure containing two or three etheric oxygen atoms which are not adjacent to each other, in the ring structure.