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    SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
    1.
    发明申请
    SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号：US20120052440A1

    公开(公告)日：2012-03-01

    申请号：US13216776

    申请日：2011-08-24

    申请人： Isao YOSHIDA ,  Koji ICHIKAWA

    发明人： Isao YOSHIDA ,  Koji ICHIKAWA

    IPC分类号： G03F7/039 ,  C07C309/24 ,  C07D327/08 ,  G03F7/38

    CPC分类号： C07C309/17 ,  C07C381/12 ,  C07C2603/74 ,  C07D233/60 ,  C07D327/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

    摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 and ring W2 independently each represent a C3-C36 aliphatic ring, R2 is independently in each occurrence a C1-C6 alkyl group, R4 is independently in each occurrence a C1-C6 alkyl group, R3 represents a C1-C12 hydrocarbon group, t represents an integer of 0 to 2, u represents an integer of 0 to 2, and Z+ represents an organic counter ion.

    摘要翻译： 本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1和L2各自表示C1-C17二价饱和烃基，其中一个或 更多的-CH 2 - 可被-O-或-CO-取代，环W1和环W2各自独立地表示C 3 -C 36脂族环，R 2在每次出现时独立地为C1-C6烷基，R4各自独立地为 C1-C6烷基，R3表示C1-C12烃基，t表示0〜2的整数，u表示0〜2的整数，Z +表示有机抗衡离子。

    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    2.
    发明申请
    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号：US20100304293A1

    公开(公告)日：2010-12-02

    申请号：US12786738

    申请日：2010-05-25

    申请人： Koji ICHIKAWA ,  Isao Yoshida

    发明人： Koji ICHIKAWA ,  Isao Yoshida

    IPC分类号： G03F7/004 ,  C07C309/02 ,  G03F7/20

    CPC分类号： G03F7/039 ,  C07C303/32 ,  C07C309/17 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

    摘要： A salt represented by the formula (a): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., X2 represents a single bond etc., Y1 represents a C3-C6 alicyclic hydrocarbon group etc., with the proviso that —X2—Y1 group has one or more fluorine atoms, and Z+ represents an organic counter cation, and a photoresist composition comprising the salt represented by the formula (a) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

    摘要翻译： 由式（a）表示的盐：其中Q1和Q2各自独立地表示氟原子等，X1表示单键等，X2表示单键等，Y1表示C3-C6脂肪族烃基等。 条件是-X2-Y1基团具有一个或多个氟原子，Z +表示有机抗衡阳离子，以及包含由式（a）表示的盐的光致抗蚀剂组合物和包含具有酸性基团的结构单元的树脂， 不稳定的基团，并且在碱性水溶液中不溶或难溶，但是通过酸的作用变得可溶于碱性水溶液。

    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
    4.
    发明申请
    SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
    含有它的盐和光催化剂组合物

    公开(公告)号：US20110117493A1

    公开(公告)日：2011-05-19

    申请号：US12946243

    申请日：2010-11-15

    申请人： Koji ICHIKAWA ,  Masako SUGIHARA ,  Isao YOSHIDA

    发明人： Koji ICHIKAWA ,  Masako SUGIHARA ,  Isao YOSHIDA

    IPC分类号： G03F7/004 ,  C07D307/93 ,  G03F7/20

    CPC分类号： C07D307/93 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C4-C36 lactone ring, R3 is a C1-C6 alkyl group etc., t represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein L2 represents a single bond etc., ring W2 represents a C3-C36 saturated hydrocarbon ring in which one —CH2— is replaced by —CO— and in which one or more —CH2— can be replaced by —O— or —CO—, R1 represents a C1-C12 hydrocarbon group, R2 is a C1-C6 alkyl group etc., and s represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein L3 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is a hydroxyl group etc., R5 is a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.

    摘要翻译： 由式（X）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被 -O-或-CO-，环W1表示C4-C36内酯环，R3表示C1-C6烷基等，t表示0〜2的整数，Z +表示有机抗衡离子，W10表示 由式（X-1）表示：其中L2表示单键等，环W2表示其中一个-CH 2 - 被-CO-替代的C 3 -C 36饱和烃环，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，R1表示C1-C12烃基，R2表示C1-C6烷基等，s表示0〜2的整数，或式（ X-2）：其中L3表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，环W3重复 呈现C3-C36饱和烃环，R4为羟基等，R5为C1-C6烷基等，v为1〜3的整数，w为0〜2的整数。

    COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
    7.
    发明申请
    COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN 有权
    化合物，树脂，光电组合物和制造光电子图案的方法

    公开(公告)号：US20120295201A1

    公开(公告)日：2012-11-22

    申请号：US13475594

    申请日：2012-05-18

    申请人： Koji ICHIKAWA ,  Isao YOSHIDA

    发明人： Koji ICHIKAWA ,  Isao YOSHIDA

    IPC分类号： C07C69/753 ,  C08F222/20 ,  G03F7/20 ,  G03F7/004 ,  G03F7/027 ,  C08F122/20 ,  C08F218/14

    CPC分类号： C08F122/20 ,  C07C69/757 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： A compound represented by formula (I): wherein T1 represents a single bond or a C6-C14 aromatic hydrocarbon group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L2 and L3 each independently represent a single bond or a C1-C6 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W1 and ring W2 each independently represent a C3-C36 hydrocarbon ring, R1 and R2 each independently represent a hydrogen atom, a hydroxyl group, or C1-C6 alkyl group, R3 and R4 each independently represent a hydroxyl group, or C1-C6 alkyl group, R5 represents a hydroxyl group or a methyl group, m represents 0 or 1, and t and u each independently represent an integer of 0 to 2.

    摘要翻译： 由式（I）表示的化合物：其中，T1表示单键或C6-C14芳香族烃基，L1表示可以被氧原子或羰基取代亚甲基的C1-C17二价饱和烃基 ，L2和L3各自独立地表示单键或C1-C6二价饱和烃基，其中亚甲基可被氧原子或羰基取代，环W1和环W2各自独立地表示C3-C36烃环 ，R 1和R 2各自独立地表示氢原子，羟基或C 1 -C 6烷基，R 3和R 4各自独立地表示羟基或C 1 -C 6烷基，R 5表示羟基或甲基，m 表示0或1，t和u各自独立地表示0〜2的整数。

    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    10.
    发明申请
    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
    耐蚀组合物及其制造方法

    公开(公告)号：US20130022923A1

    公开(公告)日：2013-01-24

    申请号：US13552278

    申请日：2012-07-18

    申请人： Koji ICHIKAWA ,  Takashi HIRAOKA ,  Mitsuyoshi OCHIAI

    发明人： Koji ICHIKAWA ,  Takashi HIRAOKA ,  Mitsuyoshi OCHIAI

    IPC分类号： G03F7/027 ,  G03F7/20

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, R2, Q1 and Q2, L1, ring W, Rf1 and Rf2, n and Z+ are defined in the specification.

    摘要翻译： 一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元 由式（I）表示的酸产生剂和由式（II）表示的酸产生剂，其中R1，A1，R2，Q1和Q2，L1，环W，Rf1和Rf2，n和Z +在说明书中定义。