公开(公告)号：US11692732B2

公开(公告)日：2023-07-04

申请号：US16909949

申请日：2020-06-23

Applicant: Lam Research Corporation

Inventor： Saravanapriyan Sriraman ,  John Drewery ,  Jon McChesney ,  Alex Paterson

IPC: C23C16/00 ,  F24F13/00 ,  H01J37/32

CPC classification number: F24F13/00 ,  H01J37/321 ,  H01J37/32522 ,  H01J37/32651 ,  H01J37/32963

Abstract: A chamber is provided. The chamber includes a Faraday shield positioned above a substrate support of the chamber. A dielectric window is disposed over the Faraday shield, and the dielectric window has a center opening. A hub having an internal plenum for passing a flow of fluid received from an input conduit and removing the flow of fluid from an output conduit is further provided. The hub has sidewalls and a center cavity inside of the sidewalls for an optical probe, and the internal plenum is disposed in the sidewalls. The hub has an interface surface that is in physical contact with a back side of the Faraday shield. The physical contact provides for a thermal couple to the Faraday shield at a center region around said center opening, and an outer surface of the sidewalls of the hub are disposed within the center opening of the dielectric window.

公开(公告)号：US10825661B2

公开(公告)日：2020-11-03

申请号：US15969583

申请日：2018-05-02

Applicant: Lam Research Corporation

Inventor： Jon McChesney ,  Saravanapriyan Sriraman ,  Richard A. Marsh ,  Alexander Miller Paterson ,  John Holland

IPC: H01J37/32

Abstract: In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.

公开(公告)号：US10541168B2

公开(公告)日：2020-01-21

申请号：US15799011

申请日：2017-10-31

Applicant: LAM RESEARCH CORPORATION

Inventor： Ali Sucipto Tan ,  Haoquan Yan ,  Marc Estoque ,  Damon Tyrone Genetti ,  Jon McChesney ,  Alexander Miller Paterson

IPC: H01L21/68 ,  H01L21/687

Abstract: A system for determining an alignment of an edge ring on a substrate support includes a robot control module configured to control a robot to place the edge ring onto the substrate support and retrieve the edge ring from the substrate support. An alignment module is configured to determine a plurality of first positions of the edge ring on the robot prior to being placed onto the substrate support and determine a plurality of second positions of the edge ring on the robot subsequent to being retrieved from the substrate support. An edge ring position module configured to determine a centered position of the edge ring relative to the substrate support based on offsets between the plurality of first positions and the plurality of second positions.

公开(公告)号：US10124492B2

公开(公告)日：2018-11-13

申请号：US15048940

申请日：2016-02-19

Applicant: Lam Research Corporation

Inventor： Damon Tyrone Genetti ,  Jon McChesney ,  Alex Paterson ,  Derek John Witkowicki ,  Austin Ngo

IPC: B25J15/00 ,  B25J11/00 ,  H01L21/67 ,  H01L21/673 ,  H01L21/677 ,  H01L21/687

Abstract: A cluster tool assembly includes a vacuum transfer module, a process module having a first side connected to the vacuum transfer module. An isolation valve having a first side and a second side, the first side of the isolation valve coupled to a second side of the process module. A replacement station is coupled to the second side of the isolation valve. The replacement station includes an exchange handler and a part buffer. The part buffer includes a plurality of compartments to hold new or used consumable parts. The process module includes a lift mechanism to enable placement of a consumable part installed in the process module to a raised position. The raised position provides access to the exchange handler to enable removal of the consumable part from the process module and store in a compartment of the part buffer. The exchange handler of the replacement station is configured to provide a replacement for the consumable part from the part buffer back to the process module. The lift mechanism is configured to receive the consumable part provided for replacement by the exchange handler and lower the consumable part to an installed position. The replacement by the exchange handler and the process module is conducted while the process module and the replacement station are maintained in a vacuum state.

公开(公告)号：US20180156489A1

公开(公告)日：2018-06-07

申请号：US15885728

申请日：2018-01-31

Applicant: Lam Research Corporation

Inventor： Saravanapriyan Sriraman ,  John Drewery ,  Jon McChesney ,  Alex Paterson

IPC: F24F13/00 ,  H01J37/32

CPC classification number: F24F13/00 ,  H01J37/321 ,  H01J37/32522 ,  H01J37/32651 ,  H01J37/32963

Abstract: A chamber is provided. The chamber includes a Faraday shield positioned above a substrate support of the chamber. A dielectric window is disposed over the Faraday shield, and the dielectric window has a center opening. A hub having an internal plenum for passing a flow of fluid received from an input conduit and removing the flow of fluid from an output conduit is further provided. The hub has sidewalls and a center cavity inside of the sidewalls for an optical probe, and the internal plenum is disposed in the sidewalls. The hub has an interface surface that is in physical contact with a back side of the Faraday shield. The physical contact provides for a thermal couple to the Faraday shield at a center region around said center opening, and an outer surface of the sidewalls of the hub are disposed within the center opening of the dielectric window.

公开(公告)号：US20170117172A1

公开(公告)日：2017-04-27

申请号：US15048960

申请日：2016-02-19

Applicant: Lam Research Corporation

Inventor： Damon Tyrone Genetti ,  Jon McChesney ,  Alex Paterson ,  Derek John Witkowicki ,  Austin Ngo

IPC: H01L21/677 ,  H01L21/687 ,  H01L21/683

CPC classification number: H01L21/6875 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67386 ,  H01L21/67742 ,  H01L21/6838 ,  H01L21/68707 ,  H01L21/68735 ,  H01L21/68785

Abstract: A cluster tool assembly includes a vacuum transfer module, a process module having a first side connected to the vacuum transfer module. An isolation valve having a first side and a second side, the first side of the isolation valve coupled to a second side of the process module. A replacement station is coupled to the second side of the isolation valve. The replacement station includes an exchange handler and a part buffer. The part buffer includes a plurality of compartments to hold new or used consumable parts. The process module includes a lift mechanism to enable placement of a consumable part installed in the process module to a raised position. The raised position provides access to the exchange handler to enable removal of the consumable part from the process module and store in a compartment of the part buffer. The exchange handler of the replacement station is configured to provide a replacement for the consumable part from the part buffer back to the process module. The lift mechanism is configured to receive the consumable part provided for replacement by the exchange handler and lower the consumable part to an installed position. The replacement by the exchange handler and the process module is conducted while the process module and the replacement station are maintained in a vacuum state.

公开(公告)号：US20210183687A1

公开(公告)日：2021-06-17

申请号：US17181571

申请日：2021-02-22

Applicant: Lam Research Corporation

Inventor： Haoquan Yan ,  Robert Griffith O'Neill ,  Raphael Casaes ,  Jon McChesney ,  Alex Paterson

IPC: H01L21/687 ,  H01L21/67 ,  H01J37/02 ,  H01J37/20 ,  H01J37/32

Abstract: An edge ring arrangement for a processing chamber includes a first ring configured to surround and overlap a radially outer edge of an upper plate of a pedestal arranged in the processing chamber, a second ring arranged below the first moveable ring, wherein a portion of the first ring overlaps the second ring, a first actuator configured to actuate a first pillar to selectively move the first ring to a raised position and a lowered position relative to the pedestal, and a second actuator configured to actuate a second pillar to selectively move the second ring to a raised position and a lowered position relative to the pedestal.

公开(公告)号：US11011353B2

公开(公告)日：2021-05-18

申请号：US15403786

申请日：2017-01-11

Applicant: LAM RESEARCH CORPORATION

Inventor： Marcus Musselman ,  Andrew D. Bailey, III ,  Jon McChesney

IPC: H01J37/32 ,  H01L21/687 ,  H01L21/68 ,  H01L21/67

Abstract: A substrate support in a substrate processing system includes an inner portion arranged to support a substrate, an edge ring surrounding the inner portion, and a controller. The controller at least one of raises the edge ring to selectively cause the edge ring to engage the substrate and lowers the inner portion to selectively cause the edge ring to engage the substrate. The controller determines when the edge ring engages the substrate and calculates at least one characteristic of the substrate processing system based on the determination of when the edge ring engages the substrate.

公开(公告)号：US20200318852A1

公开(公告)日：2020-10-08

申请号：US16909949

申请日：2020-06-23

Applicant: Lam Research Corporation

Inventor： Saravanapriyan Sriraman ,  John Drewery ,  Jon McChesney ,  Alex Paterson

IPC: F24F13/00 ,  H01J37/32

Abstract: A chamber is provided. The chamber includes a Faraday shield positioned above a substrate support of the chamber. A dielectric window is disposed over the Faraday shield, and the dielectric window has a center opening. A hub having an internal plenum for passing a flow of fluid received from an input conduit and removing the flow of fluid from an output conduit is further provided. The hub has sidewalls and a center cavity inside of the sidewalls for an optical probe, and the internal plenum is disposed in the sidewalls. The hub has an interface surface that is in physical contact with a back side of the Faraday shield. The physical contact provides for a thermal couple to the Faraday shield at a center region around said center opening, and an outer surface of the sidewalls of the hub are disposed within the center opening of the dielectric window.

公开(公告)号：US10651013B2

公开(公告)日：2020-05-12

申请号：US16542241

申请日：2019-08-15

Applicant: Lam Research Corporation

Inventor： Jon McChesney ,  Alexander Paterson

IPC: H01J37/32 ,  H03H7/38 ,  H01J37/244 ,  H03H7/40

Abstract: Systems and methods for tuning to reduce reflected power in multiple states are described. The methods include determining values of one or more parameters of an impedance matching circuit so that reflected power is reduced for multiple states. Such a reduction in the reflected power increases a life of a radio frequency generator coupled to the impedance matching circuit while simultaneously processing a substrate using the multiple states.