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公开(公告)号:US20200083071A1
公开(公告)日:2020-03-12
申请号:US16493145
申请日:2018-03-14
Applicant: LAM RESEARCH CORPORATION
Inventor: Richard H. GOULD , Richard BLANK
IPC: H01L21/67 , H01L21/677
Abstract: An atmosphere-to-vacuum (ATV) transfer module for a substrate processing tool includes a first side configured to interface with at least one loading station, a transfer robot assembly arranged within the ATV transfer module, and a second side opposite the first side. The transfer robot assembly is configured to transfer substrates between the at least one loading station and at least one load lock arranged between the ATV transfer module and a vacuum transfer module (VTM). The second side is configured to interface with the at least one load lock. The transfer robot assembly is arranged adjacent to the second side, and the at least one load lock extends through the second side into an interior volume of the ATV transfer module.
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公开(公告)号:US20240136161A1
公开(公告)日:2024-04-25
申请号:US18278276
申请日:2022-03-11
Applicant: LAM RESEARCH CORPORATION
Inventor: Karl Frederick LEESER , Richard BLANK , Jacob L. HIESTER
IPC: H01J37/32 , C23C16/455 , C23C16/458 , C23C16/50 , C23C16/52 , H01L21/683
CPC classification number: H01J37/32715 , C23C16/45565 , C23C16/4583 , C23C16/50 , C23C16/52 , H01J37/3244 , H01J37/32541 , H01J37/32568 , H01L21/6833 , H01J2237/2007 , H01J2237/20207
Abstract: A system comprises a pedestal and a controller. The pedestal is arranged below a showerhead in a processing chamber and includes at least three electrodes to clamp a substrate to the pedestal during processing. The controller is configured to measure a pedestal-to-showerhead gap and at least one of a magnitude and a direction of a relative tilt between the pedestal and the showerhead by sensing impedances between the at least three electrodes and the showerhead.
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公开(公告)号:US20240234106A9
公开(公告)日:2024-07-11
申请号:US18278276
申请日:2022-03-11
Applicant: LAM RESEARCH CORPORATION
Inventor: Karl Frederick LEESER , Richard BLANK , Jacob L. HIESTER
IPC: H01J37/32 , C23C16/455 , C23C16/458 , C23C16/50 , C23C16/52 , H01L21/683
CPC classification number: H01J37/32715 , C23C16/45565 , C23C16/4583 , C23C16/50 , C23C16/52 , H01J37/3244 , H01J37/32541 , H01J37/32568 , H01L21/6833 , H01J2237/2007 , H01J2237/20207
Abstract: A system comprises a pedestal and a controller. The pedestal is arranged below a showerhead in a processing chamber and includes at least three electrodes to clamp a substrate to the pedestal during processing. The controller is configured to measure a pedestal-to-showerhead gap and at least one of a magnitude and a direction of a relative tilt between the pedestal and the showerhead by sensing impedances between the at least three electrodes and the showerhead.
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公开(公告)号:US20210320029A1
公开(公告)日:2021-10-14
申请号:US17306226
申请日:2021-05-03
Applicant: Lam Research Corporation
Inventor: Michael NORDIN , Karl Frederick LEESER , Richard BLANK , Robert SCULAC , Damien Martin SLEVIN
IPC: H01L21/687 , H01L21/67 , H01L21/677
Abstract: A process module for a substrate processing tool includes a plurality of processing stations each configured to perform a process on a substrate and a mechanical indexer arranged within the process module. The mechanical indexer includes a plurality of end effectors including at least a first end effector, a second end effector, and a third end effector. Each of the plurality of end effectors extends in a radial direction from a central axis of the mechanical indexer and is configured to rotate about the central axis within the process module. The mechanical indexer is configured to position each of the plurality of end effectors at any one of the plurality of processing stations within the process module. The mechanical indexer is configured to position more than one of the plurality of end effectors at a same one of the plurality of processing stations at a same time.
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公开(公告)号:US20240353217A1
公开(公告)日:2024-10-24
申请号:US18684086
申请日:2022-08-02
Applicant: LAM RESEARCH CORPORATION
Inventor: Jacob L. HIESTER , Richard BLANK
IPC: G01B7/14 , C23C16/507 , C23C16/52 , H01L21/67
CPC classification number: G01B7/14 , C23C16/507 , C23C16/52 , H01L21/67259
Abstract: A sensor disc configured to measure a gap between a first structure and a second structure in a processing chamber of a substrate processing system includes an upper surface, at least one first capacitive sensor arranged on the upper surface of the sensor disc that is configured to generate a first measurement signal indicative of a first distance between the upper surface of the sensor disc and the first structure, a lower surface, and at least one second capacitive sensor arranged on the lower surface of the sensor disc that is configured to generate a second measurement signal indicative of a second distance between the lower surface of the sensor disc and the second structure.
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公开(公告)号:US20220134568A1
公开(公告)日:2022-05-05
申请号:US17435020
申请日:2020-02-27
Applicant: LAM RESEARCH CORPORATION
Inventor: Richard BLANK , Aravind ALWAN , Behnam BEHZIZ , Peter THAULAD , Mark E. EMERSON
Abstract: A robot calibration system includes a calibration fixture configured to be mounted on a substrate processing chamber. The calibration fixture includes at least one camera arranged to capture an image including an outer edge of a test substrate and an edge ring surrounding the test substrate. A controller is configured to receive the captured image, analyze the captured image to measure a distance between the outer edge of the test substrate and the edge ring, calculate a center of the test substrate based on the measured distance, and calibrate a robot configured to transfer substrate to and from the substrate processing chamber based on the calculated center of the test substrate.
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