Abstract:
The present application relates to an electrochromic element and a method for manufacturing the same. A method for manufacturing an electrochromic element according to an exemplary embodiment of the present application comprises: forming a first electrode on a first substrate, and then forming a first electrochromic unit on the first electrode; forming a second electrode on a second substrate, and then forming a second electrochromic unit on the second electrode; and forming an electrolyte layer between the first electrochromic unit and the second electrochromic unit, in which the forming of the first electrochromic unit is carried out by an E-beam deposition method (E-beam evaporation) using a carrier gas.
Abstract:
The present invention relates to a method of manufacturing a mold substrate for a diffraction lattice light guide plate, and a method of manufacturing a diffraction lattice light guide plate.
Abstract:
The present application relates to an electrochromic device and a method for manufacturing the electrochromic device. The present application can provide an electrochromic device having increased productivity and improved electrochromic rate and durability, and a method for manufacturing the electrochromic device. The electrochromic device may be advantageously used in various devices such as smart windows, smart mirrors, displays, electronic papers and adaptive camouflage.
Abstract:
An exemplary embodiment of the present invention relates to a conductive structure body that comprises a darkening pattern layer having AlOxNy, and a method for manufacturing the same. The conductive structure body according to the exemplary embodiment of the present invention may prevent reflection by a conductive pattern layer without affecting conductivity of the conductive pattern layer, and improve a concealing property of the conductive pattern layer by improving absorbance. Accordingly, a display panel having improved visibility may be developed by using the conductive structure body according to the exemplary embodiment of the present invention.
Abstract:
A plasma etching method using a Faraday cage which is capable of inhibiting the formation of a needle-like structure and forming a pattern portion having a depth gradient on an etching base.
Abstract:
The present invention relates to a method of manufacturing a mold for a diffraction grating light guide plate by using two mask films, the mold having first to fourth pattern portions provided on one surface thereof, and to a method of manufacturing a diffraction grating light guide plate.
Abstract:
An exemplary embodiment of the present invention relates to a conductive structure body that comprises a darkening pattern layer having AlOxNy, and a method for manufacturing the same. The conductive structure body according to the exemplary embodiment of the present invention may prevent reflection by a conductive pattern layer without affecting conductivity of the conductive pattern layer, and improve a concealing property of the conductive pattern layer by improving absorbance. Accordingly, a display panel having improved visibility may be developed by using the conductive structure body according to the exemplary embodiment of the present invention.
Abstract translation:本发明的示例性实施例涉及一种导电结构体,其包括具有AlO x N y的变暗图案层及其制造方法。 根据本发明的示例性实施例的导电结构体可以防止导电图案层的反射而不影响导电图案层的导电性,并且通过改善吸光度来改善导电图案层的隐蔽性。 因此,可以通过使用根据本发明的示例性实施例的导电结构体来开发具有改善的可视性的显示面板。