Method of forming ion sensors
    6.
    发明授权

    公开(公告)号:US12140557B2

    公开(公告)日:2024-11-12

    申请号:US17267772

    申请日:2019-08-16

    Abstract: A method for manufacturing a sensor includes etching an insulator layer disposed over a substrate to define an opening exposing a sensor surface of a sensor disposed on the substrate, a native oxide forming on the sensor surface; sputtering the sensor surface with a noble gas to at least partially remove the native oxide from the sensor surface; and annealing the sensor surface in a hydrogen atmosphere.

    Method for treating a semiconductor device
    10.
    发明授权
    Method for treating a semiconductor device 有权
    半导体器件的处理方法

    公开(公告)号:US09555451B2

    公开(公告)日:2017-01-31

    申请号:US15079532

    申请日:2016-03-24

    Abstract: A method of treating a sensor array including a plurality of sensors and an isolation structure, where a sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array and the isolation structure is disposed between the sensor pad and sensor pads of other sensors of the plurality of sensors, comprises exposing the sensor pad and the isolation structure to a non-aqueous organo-silicon solution including an organo-silicon compound and a first non-aqueous carrier; applying an acid solution including an organic acid and a second non-aqueous carrier to the sensor pad; and rinsing the acid solution from the sensor pad and the isolation structure.

    Abstract translation: 一种处理包括多个传感器和隔离结构的传感器阵列的方法,其中所述多个传感器中的传感器具有在所述传感器阵列的表面处暴露的传感器垫,并且所述隔离结构设置在所述传感器垫和传感器垫之间 所述多个传感器中的其它传感器包括将所述传感器垫和所述隔离结构暴露于包括有机硅化合物和第一非水载体的非水有机硅溶液; 将包含有机酸和第二非水性载体的酸溶液施加到传感器垫; 以及从传感器垫和隔离结构冲洗酸溶液。

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