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公开(公告)号:US20150255321A1
公开(公告)日:2015-09-10
申请号:US14430647
申请日:2013-09-17
Applicant: LINTEC Corporation
Inventor: Tomochika Tominaga , Kazuyuki Tamura
IPC: H01L21/683 , C09J7/02 , C09D133/14
CPC classification number: H01L21/6836 , C08G18/6229 , C08G18/672 , C08G18/8116 , C08G2170/40 , C08K5/37 , C09D133/14 , C09J7/29 , C09J175/16 , C09J2201/606 , C09J2201/622 , C09J2203/326 , C09J2205/102 , C09J2433/00 , C09J2433/001 , C09J2433/006 , C09J2475/00 , C09J2475/006 , H01L2221/68327 , H01L2221/6834 , Y10T428/24826 , Y10T428/2848
Abstract: The present invention relates to a back grinding sheet (BG sheet) (1a, 1b, 1c) having an unevenness-absorbing layer (12) on a substrate (11), in which the unevenness-absorbing layer is a layer formed of a film-forming composition containing (A) a urethane (meth)acrylate and (B) a polymerizable monomer except component (A) and the layer satisfies the following requirements (a) to (c): (a) a loss tangent at 70° C. measured at a frequency of 1 Hz is 1.5 or more, (b) a relaxation rate 300 seconds after a square (1 cm×1 cm) of the unevenness-absorbing layer is compressed at 25° C. and a compressive load of 10 N is 30% or less, and (c) a storage elastic modulus at 25° C. measured at a frequency of 1 Hz is 1.0 to 10.0 MPa. The BG sheet of the present invention has excellent absorptivity of uneven portions such as bumps in a semiconductor wafer and can suppress formation of gaps between bumps and the BG sheet and simultaneously suppress a phenomenon where the resin layer (unevenness-absorbing layer) of a BG sheet oozes from the edges of a roll when the BG sheet is wound up in the form of roll.
Abstract translation: 本发明涉及在基板(11)上具有凹凸吸收层(12)的背面研磨片(BG片)(1a,1b,1c),其中,所述不平坦性吸收层是由膜形成的层 (A)氨基甲酸酯(甲基)丙烯酸酯和(B)除了组分(A)之外的可聚合单体和该层的组合物满足以下要求(a)至(c):(a)70℃下的损耗角正切 以1Hz的频率测量为1.5以上,(b)在25℃下压缩不平坦吸收层的正方形(1cm×1cm)后的弛豫速度300秒,压缩载荷10 N为30%以下,(c)以1Hz的频率测定的25℃下的储能弹性模量为1.0〜10.0MPa。 本发明的BG片材具有对半导体晶片中的凸块等不均匀部分的吸收性优异,并且可以抑制凸块与BG片材之间的间隙的形成,同时抑制BG的树脂层(凹凸吸收层)的现象 当BG片以卷的形式卷绕时,片从辊的边缘渗出。
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公开(公告)号:US10315394B2
公开(公告)日:2019-06-11
申请号:US15519059
申请日:2015-10-19
Applicant: LINTEC CORPORATION
Inventor: Keishi Fuse , Kazuyuki Tamura , Shigeto Okuji
IPC: B32B27/20 , B32B27/30 , B32B27/40 , B32B27/18 , H01L21/683 , C09J7/25 , B32B7/04 , B32B25/08 , B32B27/06 , B32B27/08 , B32B27/24 , B32B27/28 , B32B7/05
Abstract: The substrate for surface protective sheet of the present invention is a substrate for surface protective sheet including a support film and an antistatic layer provided on one face of the support film, wherein a stress relaxation rate of the substrate for surface protective sheet is 60% or more; the antistatic layer is one formed by curing an antistatic layer-forming composition containing a curing component and a metal filler; and the content of a metal filler is 55 mass % or more relative to the total mass of the curing component and the metal filler, and the curing component includes a urethane acrylate oligomer.
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公开(公告)号:US10224230B2
公开(公告)日:2019-03-05
申请号:US15520121
申请日:2015-10-21
Applicant: LINTEC Corporation
Inventor: Kazuyuki Tamura , Shigeto Okuji
IPC: H01L21/683 , B32B27/00 , B32B27/18 , H01L21/304 , C09J7/29 , C09J7/20 , C09J7/38 , G06K19/077 , C09J7/25 , B32B7/04 , B32B25/08 , B32B25/14 , B32B27/08 , B32B27/16 , B32B27/20 , B32B27/30 , B32B27/32 , B32B27/38 , B32B27/40
Abstract: A surface protective sheet is used when grinding the rear surface of a semiconductor wafer having a circuit formed on the front surface, and is provided with: a base material comprising a support film and an antistatic coating layer which includes an inorganic conductive filler and a cured product of a curable resin (A); and an adhesive layer. The stress relaxation percentage of the base material after 1 minute at 10% elongation is at least 60%. The Young's modulus of the base material is 100-2000 MPa.
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公开(公告)号:US09443751B2
公开(公告)日:2016-09-13
申请号:US14430647
申请日:2013-09-17
Applicant: LINTEC CORPORATION
Inventor: Tomochika Tominaga , Kazuyuki Tamura
IPC: H01L21/683 , C09D133/14 , C09J7/02
CPC classification number: H01L21/6836 , C08G18/6229 , C08G18/672 , C08G18/8116 , C08G2170/40 , C08K5/37 , C09D133/14 , C09J7/29 , C09J175/16 , C09J2201/606 , C09J2201/622 , C09J2203/326 , C09J2205/102 , C09J2433/00 , C09J2433/001 , C09J2433/006 , C09J2475/00 , C09J2475/006 , H01L2221/68327 , H01L2221/6834 , Y10T428/24826 , Y10T428/2848
Abstract: The present invention relates to a back grinding sheet (BG sheet) (1a, 1b, 1c) having an unevenness-absorbing layer (12) on a substrate (11), in which the unevenness-absorbing layer is a layer formed of a film-forming composition containing (A) a urethane (meth)acrylate and (B) a polymerizable monomer except component (A) and the layer satisfies the following requirements (a) to (c): (a) a loss tangent at 70° C. measured at a frequency of 1 Hz is 1.5 or more, (b) a relaxation rate 300 seconds after a square (1 cm×1 cm) of the unevenness-absorbing layer is compressed at 25° C. and a compressive load of 10 N is 30% or less, and (c) a storage elastic modulus at 25° C. measured at a frequency of 1 Hz is 1.0 to 10.0 MPa. The BG sheet of the present invention has excellent absorptivity of uneven portions such as bumps in a semiconductor wafer and can suppress formation of gaps between bumps and the BG sheet and simultaneously suppress a phenomenon where the resin layer (unevenness-absorbing layer) of a BG sheet oozes from the edges of a roll when the BG sheet is wound up in the form of roll.
Abstract translation: 本发明涉及在基板(11)上具有凹凸吸收层(12)的背面研磨片(BG片)(1a,1b,1c),其中,所述不平坦性吸收层是由膜形成的层 (A)氨基甲酸酯(甲基)丙烯酸酯和(B)除了组分(A)之外的可聚合单体和该层的组合物满足以下要求(a)至(c):(a)70℃下的损耗角正切 以1Hz的频率测量为1.5以上,(b)在25℃下压缩不平坦吸收层的正方形(1cm×1cm)后的弛豫速度300秒,压缩载荷10 N为30%以下,(c)以1Hz的频率测定的25℃下的储能弹性模量为1.0〜10.0MPa。 本发明的BG片材具有对半导体晶片中的凸块等不均匀部分的吸收性优异,并且可以抑制凸块与BG片材之间的间隙的形成,同时抑制BG的树脂层(凹凸吸收层)的现象 当BG片以卷的形式卷绕时,片从辊的边缘渗出。
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公开(公告)号:US20170323820A1
公开(公告)日:2017-11-09
申请号:US15520121
申请日:2015-10-21
Applicant: LINTEC Corporation
Inventor: Kazuyuki Tamura , Shigeto Okuji
IPC: H01L21/683 , G06K19/077 , C09J7/02
CPC classification number: H01L21/6835 , B32B7/04 , B32B25/08 , B32B25/14 , B32B27/00 , B32B27/08 , B32B27/16 , B32B27/18 , B32B27/20 , B32B27/304 , B32B27/308 , B32B27/32 , B32B27/38 , B32B27/40 , B32B2250/02 , B32B2250/24 , B32B2255/10 , B32B2255/26 , B32B2264/10 , B32B2264/102 , B32B2264/104 , B32B2264/105 , B32B2307/202 , B32B2307/21 , B32B2307/4026 , B32B2307/50 , B32B2307/732 , B32B2307/748 , B32B2457/14 , C08K2201/001 , C09J7/20 , C09J7/25 , C09J7/29 , C09J7/38 , C09J2201/602 , C09J2201/622 , C09J2203/326 , C09J2205/102 , C09J2463/006 , C09J2475/006 , G06K19/077 , H01L21/304 , H01L21/683 , H01L21/6836 , H01L2221/68327 , H01L2221/6834
Abstract: A surface protective sheet is used when grinding the rear surface of a semiconductor wafer having a circuit formed on the front surface, and is provided with: a base material comprising a support film and an antistatic coating layer which includes an inorganic conductive filler and a cured product of a curable resin (A); and an adhesive layer. The stress relaxation percentage of the base material after 1 minute at 10% elongation is at least 60%. The Young's modulus of the base material is 100-2000 MPa.
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